KR101274534B1 - 묘화 데이터 취득 방법 및 장치, 그리고 묘화 방법 및 장치 - Google Patents

묘화 데이터 취득 방법 및 장치, 그리고 묘화 방법 및 장치 Download PDF

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KR101274534B1
KR101274534B1 KR1020087009573A KR20087009573A KR101274534B1 KR 101274534 B1 KR101274534 B1 KR 101274534B1 KR 1020087009573 A KR1020087009573 A KR 1020087009573A KR 20087009573 A KR20087009573 A KR 20087009573A KR 101274534 B1 KR101274534 B1 KR 101274534B1
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South Korea
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KR1020087009573A
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English (en)
Korean (ko)
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KR20080049841A (ko
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나오토 킨조
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후지필름 가부시키가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/706835—Metrology information management or control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/706843—Metrology apparatus

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
KR1020087009573A 2005-09-29 2006-09-21 묘화 데이터 취득 방법 및 장치, 그리고 묘화 방법 및 장치 Expired - Fee Related KR101274534B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2005-00283518 2005-09-29
JP2005283518A JP4179477B2 (ja) 2005-09-29 2005-09-29 描画データ取得方法および装置並びに描画方法および装置
PCT/JP2006/318742 WO2007037165A1 (ja) 2005-09-29 2006-09-21 描画データ取得方法および装置並びに描画方法および装置

Publications (2)

Publication Number Publication Date
KR20080049841A KR20080049841A (ko) 2008-06-04
KR101274534B1 true KR101274534B1 (ko) 2013-06-13

Family

ID=37899593

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KR1020087009573A Expired - Fee Related KR101274534B1 (ko) 2005-09-29 2006-09-21 묘화 데이터 취득 방법 및 장치, 그리고 묘화 방법 및 장치

Country Status (5)

Country Link
US (1) US8014585B2 (enExample)
JP (1) JP4179477B2 (enExample)
KR (1) KR101274534B1 (enExample)
TW (1) TW200723851A (enExample)
WO (1) WO2007037165A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20120107772A (ko) * 2011-03-22 2012-10-04 삼성디스플레이 주식회사 감광성 패턴의 형성 방법, 이를 이용한 표시 기판의 제조 방법 및 표시 기판
US8620987B2 (en) * 2011-09-10 2013-12-31 Hewlett-Packard Development Company, L.P. Multi-regime detection in streaming data
JP5946620B2 (ja) * 2011-09-30 2016-07-06 株式会社Ｓｃｒｅｅｎホールディングス 直接描画装置用の画像表示装置、およびプログラム
KR102151254B1 (ko) * 2013-08-19 2020-09-03 삼성디스플레이 주식회사 노광장치 및 그 방법
EP3286907A1 (en) * 2015-04-24 2018-02-28 OCE-Technologies B.V. Method for establishing a position of a media object on a flatbed surface of a printer
CN117591579B (zh) * 2023-11-21 2025-03-14 中航信移动科技有限公司 一种航班轨迹视频生成方法、电子设备及存储介质
US20250348003A1 (en) * 2024-05-10 2025-11-13 Zs Systems Llc Apparatus and Method for Lithographic Exposure of Large Area Substrates

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004233718A (ja) 2003-01-31 2004-08-19 Fuji Photo Film Co Ltd 描画ヘッドユニット、描画装置及び描画方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4807158A (en) * 1986-09-30 1989-02-21 Daleco/Ivex Partners, Ltd. Method and apparatus for sampling images to simulate movement within a multidimensional space
US5022087A (en) * 1988-05-03 1991-06-04 Peppers Norman A Apparatus for detecting primitive patterns in an image
GB9111086D0 (en) * 1991-05-22 1991-10-16 Marconi Gec Ltd Aircraft terrain and obstacle avoidance system
US5132723A (en) * 1991-09-05 1992-07-21 Creo Products, Inc. Method and apparatus for exposure control in light valves
US6876494B2 (en) * 2002-09-30 2005-04-05 Fuji Photo Film Co., Ltd. Imaging forming apparatus
JP2004235487A (ja) * 2003-01-31 2004-08-19 Renesas Technology Corp パターン描画方法
JP4478411B2 (ja) * 2003-07-22 2010-06-09 株式会社リコー パターン形成方法
JP4373731B2 (ja) * 2003-07-22 2009-11-25 富士フイルム株式会社 描画装置及び描画方法
JP4351078B2 (ja) 2004-01-22 2009-10-28 日立ビアメカニクス株式会社 プリント配線板の製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004233718A (ja) 2003-01-31 2004-08-19 Fuji Photo Film Co Ltd 描画ヘッドユニット、描画装置及び描画方法

Also Published As

Publication number Publication date
JP4179477B2 (ja) 2008-11-12
TW200723851A (en) 2007-06-16
US20090136119A1 (en) 2009-05-28
WO2007037165A1 (ja) 2007-04-05
JP2007094033A (ja) 2007-04-12
KR20080049841A (ko) 2008-06-04
US8014585B2 (en) 2011-09-06

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