TW200723851A - Tracing data acquiring method and device as well as tracing method and device - Google Patents

Tracing data acquiring method and device as well as tracing method and device

Info

Publication number
TW200723851A
TW200723851A TW095135542A TW95135542A TW200723851A TW 200723851 A TW200723851 A TW 200723851A TW 095135542 A TW095135542 A TW 095135542A TW 95135542 A TW95135542 A TW 95135542A TW 200723851 A TW200723851 A TW 200723851A
Authority
TW
Taiwan
Prior art keywords
exposing
data
locus
tracing
dot data
Prior art date
Application number
TW095135542A
Other languages
English (en)
Chinese (zh)
Inventor
Naoto Kinjo
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of TW200723851A publication Critical patent/TW200723851A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/706835—Metrology information management or control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/706843—Metrology apparatus

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
TW095135542A 2005-09-29 2006-09-26 Tracing data acquiring method and device as well as tracing method and device TW200723851A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005283518A JP4179477B2 (ja) 2005-09-29 2005-09-29 描画データ取得方法および装置並びに描画方法および装置

Publications (1)

Publication Number Publication Date
TW200723851A true TW200723851A (en) 2007-06-16

Family

ID=37899593

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095135542A TW200723851A (en) 2005-09-29 2006-09-26 Tracing data acquiring method and device as well as tracing method and device

Country Status (5)

Country Link
US (1) US8014585B2 (enExample)
JP (1) JP4179477B2 (enExample)
KR (1) KR101274534B1 (enExample)
TW (1) TW200723851A (enExample)
WO (1) WO2007037165A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20120107772A (ko) * 2011-03-22 2012-10-04 삼성디스플레이 주식회사 감광성 패턴의 형성 방법, 이를 이용한 표시 기판의 제조 방법 및 표시 기판
US8620987B2 (en) * 2011-09-10 2013-12-31 Hewlett-Packard Development Company, L.P. Multi-regime detection in streaming data
JP5946620B2 (ja) * 2011-09-30 2016-07-06 株式会社Ｓｃｒｅｅｎホールディングス 直接描画装置用の画像表示装置、およびプログラム
KR102151254B1 (ko) * 2013-08-19 2020-09-03 삼성디스플레이 주식회사 노광장치 및 그 방법
EP3286907A1 (en) * 2015-04-24 2018-02-28 OCE-Technologies B.V. Method for establishing a position of a media object on a flatbed surface of a printer
CN117591579B (zh) * 2023-11-21 2025-03-14 中航信移动科技有限公司 一种航班轨迹视频生成方法、电子设备及存储介质
US20250348003A1 (en) * 2024-05-10 2025-11-13 Zs Systems Llc Apparatus and Method for Lithographic Exposure of Large Area Substrates

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4807158A (en) * 1986-09-30 1989-02-21 Daleco/Ivex Partners, Ltd. Method and apparatus for sampling images to simulate movement within a multidimensional space
US5022087A (en) * 1988-05-03 1991-06-04 Peppers Norman A Apparatus for detecting primitive patterns in an image
GB9111086D0 (en) * 1991-05-22 1991-10-16 Marconi Gec Ltd Aircraft terrain and obstacle avoidance system
US5132723A (en) * 1991-09-05 1992-07-21 Creo Products, Inc. Method and apparatus for exposure control in light valves
US6876494B2 (en) * 2002-09-30 2005-04-05 Fuji Photo Film Co., Ltd. Imaging forming apparatus
JP4315694B2 (ja) * 2003-01-31 2009-08-19 富士フイルム株式会社 描画ヘッドユニット、描画装置及び描画方法
JP2004235487A (ja) * 2003-01-31 2004-08-19 Renesas Technology Corp パターン描画方法
JP4478411B2 (ja) * 2003-07-22 2010-06-09 株式会社リコー パターン形成方法
JP4373731B2 (ja) * 2003-07-22 2009-11-25 富士フイルム株式会社 描画装置及び描画方法
JP4351078B2 (ja) 2004-01-22 2009-10-28 日立ビアメカニクス株式会社 プリント配線板の製造方法

Also Published As

Publication number Publication date
JP4179477B2 (ja) 2008-11-12
US20090136119A1 (en) 2009-05-28
WO2007037165A1 (ja) 2007-04-05
JP2007094033A (ja) 2007-04-12
KR20080049841A (ko) 2008-06-04
KR101274534B1 (ko) 2013-06-13
US8014585B2 (en) 2011-09-06

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