JP4179477B2 - 描画データ取得方法および装置並びに描画方法および装置 - Google Patents

描画データ取得方法および装置並びに描画方法および装置 Download PDF

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Publication number
JP4179477B2
JP4179477B2 JP2005283518A JP2005283518A JP4179477B2 JP 4179477 B2 JP4179477 B2 JP 4179477B2 JP 2005283518 A JP2005283518 A JP 2005283518A JP 2005283518 A JP2005283518 A JP 2005283518A JP 4179477 B2 JP4179477 B2 JP 4179477B2
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Japan
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data
information
virtual
point data
trajectory information
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JP2005283518A
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English (en)
Japanese (ja)
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JP2007094033A (ja
JP2007094033A5 (enExample
Inventor
金城　　直人
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
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Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2005283518A priority Critical patent/JP4179477B2/ja
Priority to US12/088,833 priority patent/US8014585B2/en
Priority to KR1020087009573A priority patent/KR101274534B1/ko
Priority to PCT/JP2006/318742 priority patent/WO2007037165A1/ja
Priority to TW095135542A priority patent/TW200723851A/zh
Publication of JP2007094033A publication Critical patent/JP2007094033A/ja
Publication of JP2007094033A5 publication Critical patent/JP2007094033A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/706835—Metrology information management or control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/706843—Metrology apparatus

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2005283518A 2005-09-29 2005-09-29 描画データ取得方法および装置並びに描画方法および装置 Expired - Fee Related JP4179477B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2005283518A JP4179477B2 (ja) 2005-09-29 2005-09-29 描画データ取得方法および装置並びに描画方法および装置
US12/088,833 US8014585B2 (en) 2005-09-29 2006-09-21 Image plotting data obtaining method and apparatus, and image plotting method and apparatus
KR1020087009573A KR101274534B1 (ko) 2005-09-29 2006-09-21 묘화 데이터 취득 방법 및 장치, 그리고 묘화 방법 및 장치
PCT/JP2006/318742 WO2007037165A1 (ja) 2005-09-29 2006-09-21 描画データ取得方法および装置並びに描画方法および装置
TW095135542A TW200723851A (en) 2005-09-29 2006-09-26 Tracing data acquiring method and device as well as tracing method and device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005283518A JP4179477B2 (ja) 2005-09-29 2005-09-29 描画データ取得方法および装置並びに描画方法および装置

Publications (3)

Publication Number Publication Date
JP2007094033A JP2007094033A (ja) 2007-04-12
JP2007094033A5 JP2007094033A5 (enExample) 2008-04-03
JP4179477B2 true JP4179477B2 (ja) 2008-11-12

Family

ID=37899593

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005283518A Expired - Fee Related JP4179477B2 (ja) 2005-09-29 2005-09-29 描画データ取得方法および装置並びに描画方法および装置

Country Status (5)

Country Link
US (1) US8014585B2 (enExample)
JP (1) JP4179477B2 (enExample)
KR (1) KR101274534B1 (enExample)
TW (1) TW200723851A (enExample)
WO (1) WO2007037165A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20120107772A (ko) * 2011-03-22 2012-10-04 삼성디스플레이 주식회사 감광성 패턴의 형성 방법, 이를 이용한 표시 기판의 제조 방법 및 표시 기판
US8620987B2 (en) * 2011-09-10 2013-12-31 Hewlett-Packard Development Company, L.P. Multi-regime detection in streaming data
JP5946620B2 (ja) * 2011-09-30 2016-07-06 株式会社Ｓｃｒｅｅｎホールディングス 直接描画装置用の画像表示装置、およびプログラム
KR102151254B1 (ko) * 2013-08-19 2020-09-03 삼성디스플레이 주식회사 노광장치 및 그 방법
EP3286907A1 (en) * 2015-04-24 2018-02-28 OCE-Technologies B.V. Method for establishing a position of a media object on a flatbed surface of a printer
CN117591579B (zh) * 2023-11-21 2025-03-14 中航信移动科技有限公司 一种航班轨迹视频生成方法、电子设备及存储介质
US20250348003A1 (en) * 2024-05-10 2025-11-13 Zs Systems Llc Apparatus and Method for Lithographic Exposure of Large Area Substrates

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4807158A (en) * 1986-09-30 1989-02-21 Daleco/Ivex Partners, Ltd. Method and apparatus for sampling images to simulate movement within a multidimensional space
US5022087A (en) * 1988-05-03 1991-06-04 Peppers Norman A Apparatus for detecting primitive patterns in an image
GB9111086D0 (en) * 1991-05-22 1991-10-16 Marconi Gec Ltd Aircraft terrain and obstacle avoidance system
US5132723A (en) * 1991-09-05 1992-07-21 Creo Products, Inc. Method and apparatus for exposure control in light valves
US6876494B2 (en) * 2002-09-30 2005-04-05 Fuji Photo Film Co., Ltd. Imaging forming apparatus
JP4315694B2 (ja) * 2003-01-31 2009-08-19 富士フイルム株式会社 描画ヘッドユニット、描画装置及び描画方法
JP2004235487A (ja) * 2003-01-31 2004-08-19 Renesas Technology Corp パターン描画方法
JP4478411B2 (ja) * 2003-07-22 2010-06-09 株式会社リコー パターン形成方法
JP4373731B2 (ja) * 2003-07-22 2009-11-25 富士フイルム株式会社 描画装置及び描画方法
JP4351078B2 (ja) 2004-01-22 2009-10-28 日立ビアメカニクス株式会社 プリント配線板の製造方法

Also Published As

Publication number Publication date
TW200723851A (en) 2007-06-16
US20090136119A1 (en) 2009-05-28
WO2007037165A1 (ja) 2007-04-05
JP2007094033A (ja) 2007-04-12
KR20080049841A (ko) 2008-06-04
KR101274534B1 (ko) 2013-06-13
US8014585B2 (en) 2011-09-06

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