KR101170182B1 - 마이크로 리소그래피 투영 노광 장치용 조명 시스템 - Google Patents

마이크로 리소그래피 투영 노광 장치용 조명 시스템 Download PDF

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Publication number
KR101170182B1
KR101170182B1 KR1020067016279A KR20067016279A KR101170182B1 KR 101170182 B1 KR101170182 B1 KR 101170182B1 KR 1020067016279 A KR1020067016279 A KR 1020067016279A KR 20067016279 A KR20067016279 A KR 20067016279A KR 101170182 B1 KR101170182 B1 KR 101170182B1
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South Korea
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micro
optical raster
raster element
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optical
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Korean (ko)
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KR20060123538A (ko
Inventor
다미안 피올카
맨프레드 마울
아셀 스콜츠
마커스 데귄터
요하네스 웽글러
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칼 짜이스 에스엠티 게엠베하
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/54—Lamp housings; Illuminating means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020067016279A 2004-02-17 2005-02-15 마이크로 리소그래피 투영 노광 장치용 조명 시스템 Expired - Lifetime KR101170182B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US54510504P 2004-02-17 2004-02-17
US60/545,105 2004-02-17
PCT/EP2005/001501 WO2005078522A2 (en) 2004-02-17 2005-02-15 Illumination system for a microlithographic projection exposure apparatus

Publications (2)

Publication Number Publication Date
KR20060123538A KR20060123538A (ko) 2006-12-01
KR101170182B1 true KR101170182B1 (ko) 2012-08-01

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KR1020067016279A Expired - Lifetime KR101170182B1 (ko) 2004-02-17 2005-02-15 마이크로 리소그래피 투영 노광 장치용 조명 시스템

Country Status (6)

Country Link
US (2) US8004656B2 (enExample)
EP (1) EP1716458B1 (enExample)
JP (1) JP4846600B2 (enExample)
KR (1) KR101170182B1 (enExample)
AT (1) ATE511668T1 (enExample)
WO (1) WO2005078522A2 (enExample)

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JP4846600B2 (ja) 2004-02-17 2011-12-28 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投射露光装置用照射システム
WO2007093433A1 (de) 2006-02-17 2007-08-23 Carl Zeiss Smt Ag Beleuchtungssystem für die mikro-lithographie, projektionsbelichtungsanlage mit einem derartigen beleuchtungssystem
TWI545352B (zh) * 2006-02-17 2016-08-11 卡爾蔡司Ｓｍｔ有限公司 用於微影投射曝光設備之照明系統
WO2007093436A1 (en) 2006-02-17 2007-08-23 Carl Zeiss Smt Ag Optical integrator for an illumination system of a microlithographic projection exposure apparatus
DE102007023411A1 (de) * 2006-12-28 2008-07-03 Carl Zeiss Smt Ag Optisches Element, Beleuchtungsoptik für die Mikrolithographie mit mindestens einem derartigen optischen Element sowie Beleuchtungssystem mit einer derartigen Beleuchtungsoptik
WO2008086827A1 (en) 2007-01-16 2008-07-24 Carl Zeiss Smt Ag Projection exposure method and projection exposure system therefor
JP2008182244A (ja) * 2007-01-25 2008-08-07 Carl Zeiss Smt Ag マイクロリソグラフ投影露光装置の照明系用光インテグレータ
DE102008006637A1 (de) 2007-01-25 2008-07-31 Carl Zeiss Smt Ag Optischer Integrator für ein Beleuchtungssystem einer mikrolithographischen Projektionsbelichtungsanlage
US8405890B2 (en) 2007-01-29 2013-03-26 Celloptic, Inc. System, apparatus and method for extracting image cross-sections of an object from received electromagnetic radiation
WO2008131928A1 (en) * 2007-04-25 2008-11-06 Carl Zeiss Smt Ag Illumination system for illuminating a mask in a microlithographic exposure apparatus
EP2146248B1 (en) 2008-07-16 2012-08-29 Carl Zeiss SMT GmbH Illumination system of a microlithographic projection exposure apparatus
DE102008036569A1 (de) * 2008-07-31 2009-10-22 Carl Zeiss Laser Optics Gmbh Wabenkondensor und Vorrichtung zum Aufschmelzen von Schichten auf ein Substrat
EP2169464A1 (en) 2008-09-29 2010-03-31 Carl Zeiss SMT AG Illumination system of a microlithographic projection exposure apparatus
EP2202580B1 (en) 2008-12-23 2011-06-22 Carl Zeiss SMT GmbH Illumination system of a microlithographic projection exposure apparatus
CN102349026B (zh) 2009-03-13 2015-07-29 卡尔蔡司Smt有限责任公司 微光刻投射曝光设备
JP5390691B2 (ja) 2009-03-19 2014-01-15 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置の照明系
US8164046B2 (en) 2009-07-16 2012-04-24 Carl Zeiss Smt Gmbh Illumination system for illuminating a mask in a microlithographic projection exposure apparatus
EP2454636B1 (en) 2009-07-17 2013-06-05 Carl Zeiss SMT GmbH Microlithographic projection exposure apparatus and method of measuring a parameter related to an optical surface contained therein
EP2354853B1 (en) 2010-02-09 2013-01-02 Carl Zeiss SMT GmbH Optical raster element, optical integrator and illumination system of a microlithographic projection exposure apparatus
DE102013204443A1 (de) * 2013-03-14 2014-10-02 Carl Zeiss Smt Gmbh Optische Baugruppe zur Lichtleitwerterhöhung
US8875066B2 (en) * 2013-03-15 2014-10-28 Synopsys, Inc. Performing image calculation based on spatial coherence
CN103412465B (zh) 2013-07-01 2015-04-15 中国科学院上海光学精密机械研究所 步进扫描投影光刻机的照明系统
WO2017108448A1 (en) * 2015-12-22 2017-06-29 Carl Zeiss Smt Gmbh Illumination system of a microlithographic apparatus
CN105589300A (zh) * 2016-01-07 2016-05-18 中国科学院上海光学精密机械研究所 一种光刻照明系统
US10823531B2 (en) * 2017-02-09 2020-11-03 Lightforce Usa, Inc. Reticle disc with fiber illuminated aiming dot
CN114127617A (zh) * 2019-07-23 2022-03-01 埃博茨股份有限公司 用于具有高精度和实时对象跟踪的3d姿态测量的系统和方法

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KR20060123538A (ko) 2006-12-01
US20110285978A1 (en) 2011-11-24
EP1716458B1 (en) 2011-06-01
US20070206171A1 (en) 2007-09-06
JP4846600B2 (ja) 2011-12-28
EP1716458A2 (en) 2006-11-02
JP2007525027A (ja) 2007-08-30
ATE511668T1 (de) 2011-06-15
US8730455B2 (en) 2014-05-20
WO2005078522A2 (en) 2005-08-25
US8004656B2 (en) 2011-08-23
WO2005078522A3 (en) 2006-03-02

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