KR101150312B1 - 본드 패드를 강화하기 위한 방법들 및 시스템 - Google Patents
본드 패드를 강화하기 위한 방법들 및 시스템 Download PDFInfo
- Publication number
- KR101150312B1 KR101150312B1 KR1020040078075A KR20040078075A KR101150312B1 KR 101150312 B1 KR101150312 B1 KR 101150312B1 KR 1020040078075 A KR1020040078075 A KR 1020040078075A KR 20040078075 A KR20040078075 A KR 20040078075A KR 101150312 B1 KR101150312 B1 KR 101150312B1
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- South Korea
- Prior art keywords
- metal
- layer
- wire bonding
- reinforcement layer
- bonding pad
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
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- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Wire Bonding (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/675,260 US6960836B2 (en) | 2003-09-30 | 2003-09-30 | Reinforced bond pad |
| US10/675,260 | 2003-09-30 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20050032013A KR20050032013A (ko) | 2005-04-06 |
| KR101150312B1 true KR101150312B1 (ko) | 2012-06-08 |
Family
ID=33311157
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020040078075A Expired - Lifetime KR101150312B1 (ko) | 2003-09-30 | 2004-09-30 | 본드 패드를 강화하기 위한 방법들 및 시스템 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6960836B2 (enExample) |
| JP (2) | JP4959929B2 (enExample) |
| KR (1) | KR101150312B1 (enExample) |
| GB (1) | GB2406707B (enExample) |
| TW (1) | TWI364833B (enExample) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7372153B2 (en) * | 2003-10-07 | 2008-05-13 | Taiwan Semiconductor Manufacturing Co., Ltd | Integrated circuit package bond pad having plurality of conductive members |
| JP4517843B2 (ja) * | 2004-12-10 | 2010-08-04 | エルピーダメモリ株式会社 | 半導体装置 |
| US7404513B2 (en) * | 2004-12-30 | 2008-07-29 | Texas Instruments Incorporated | Wire bonds having pressure-absorbing balls |
| US20080014732A1 (en) * | 2006-07-07 | 2008-01-17 | Yanping Li | Application of PVD W/WN bilayer barrier to aluminum bondpad in wire bonding |
| DE102006043133B4 (de) * | 2006-09-14 | 2009-09-24 | Infineon Technologies Ag | Anschlusspad zu einem Kontaktieren eines Bauelements und Verfahren zu dessen Herstellung |
| US7652378B2 (en) * | 2006-10-17 | 2010-01-26 | Taiwan Semiconductor Manufacturing Company, Ltd. | Aluminum-based interconnection in bond pad layer |
| DE102006052202B3 (de) * | 2006-11-06 | 2008-02-21 | Infineon Technologies Ag | Halbleiterbauelement sowie Verfahren zur Herstellung eines Halbleiterbauelements |
| JP4694519B2 (ja) * | 2007-02-28 | 2011-06-08 | 富士通株式会社 | マイクロ構造体およびマイクロ構造体製造方法 |
| DE102007011126B4 (de) | 2007-03-07 | 2009-08-27 | Austriamicrosystems Ag | Halbleiterbauelement mit Anschlusskontaktfläche |
| US7750852B2 (en) * | 2007-04-13 | 2010-07-06 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
| JP5034740B2 (ja) | 2007-07-23 | 2012-09-26 | ルネサスエレクトロニクス株式会社 | 半導体装置及びその製造方法 |
| US7919839B2 (en) * | 2007-07-24 | 2011-04-05 | Northrop Grumman Systems Corporation | Support structures for on-wafer testing of wafer-level packages and multiple wafer stacked structures |
| JP5205066B2 (ja) * | 2008-01-18 | 2013-06-05 | ルネサスエレクトロニクス株式会社 | 半導体装置およびその製造方法 |
| US7727781B2 (en) * | 2008-07-22 | 2010-06-01 | Agere Systems Inc. | Manufacture of devices including solder bumps |
| JP5677115B2 (ja) * | 2011-02-07 | 2015-02-25 | セイコーインスツル株式会社 | 半導体装置 |
| JP5772926B2 (ja) | 2013-01-07 | 2015-09-02 | 株式会社デンソー | 半導体装置 |
| IN2013CH05121A (enExample) * | 2013-11-12 | 2015-05-29 | Sandisk Technologies Inc | |
| JP6929254B2 (ja) * | 2018-08-23 | 2021-09-01 | 三菱電機株式会社 | 電力用半導体装置 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000195896A (ja) | 1998-12-25 | 2000-07-14 | Nec Corp | 半導体装置 |
| JP2002324797A (ja) | 2001-04-24 | 2002-11-08 | Mitsubishi Electric Corp | 半導体装置及びその製造方法 |
| JP2003068740A (ja) | 2001-08-30 | 2003-03-07 | Hitachi Ltd | 半導体集積回路装置およびその製造方法 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6439035A (en) * | 1987-08-04 | 1989-02-09 | Nec Corp | Semiconductor device |
| US5248903A (en) * | 1992-09-18 | 1993-09-28 | Lsi Logic Corporation | Composite bond pads for semiconductor devices |
| US6143396A (en) * | 1997-05-01 | 2000-11-07 | Texas Instruments Incorporated | System and method for reinforcing a bond pad |
| US6448650B1 (en) | 1998-05-18 | 2002-09-10 | Texas Instruments Incorporated | Fine pitch system and method for reinforcing bond pads in semiconductor devices |
| KR100319896B1 (ko) * | 1998-12-28 | 2002-01-10 | 윤종용 | 반도체 소자의 본딩 패드 구조 및 그 제조 방법 |
| US6187680B1 (en) * | 1998-10-07 | 2001-02-13 | International Business Machines Corporation | Method/structure for creating aluminum wirebound pad on copper BEOL |
| JP2000183104A (ja) | 1998-12-15 | 2000-06-30 | Texas Instr Inc <Ti> | 集積回路上でボンディングするためのシステム及び方法 |
| US6803302B2 (en) * | 1999-11-22 | 2004-10-12 | Freescale Semiconductor, Inc. | Method for forming a semiconductor device having a mechanically robust pad interface |
| JP3468188B2 (ja) * | 2000-01-24 | 2003-11-17 | ヤマハ株式会社 | 半導体装置とその製法 |
| KR100421043B1 (ko) * | 2000-12-21 | 2004-03-04 | 삼성전자주식회사 | 비정렬되고 소정 거리 이격된 섬형 절연체들의 배열을 갖는 도전막을 포함하는 집적 회로 본딩 패드 |
| KR100416614B1 (ko) | 2002-03-20 | 2004-02-05 | 삼성전자주식회사 | 본딩패드 하부구조를 보강하기 위한 반도체 소자 및 그제조방법 |
-
2003
- 2003-09-30 US US10/675,260 patent/US6960836B2/en not_active Expired - Lifetime
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2004
- 2004-09-08 TW TW093127180A patent/TWI364833B/zh not_active IP Right Cessation
- 2004-09-21 GB GB0420953A patent/GB2406707B/en not_active Expired - Fee Related
- 2004-09-28 JP JP2004281010A patent/JP4959929B2/ja not_active Expired - Fee Related
- 2004-09-30 KR KR1020040078075A patent/KR101150312B1/ko not_active Expired - Lifetime
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2011
- 2011-09-12 JP JP2011197816A patent/JP5562308B2/ja not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000195896A (ja) | 1998-12-25 | 2000-07-14 | Nec Corp | 半導体装置 |
| JP2002324797A (ja) | 2001-04-24 | 2002-11-08 | Mitsubishi Electric Corp | 半導体装置及びその製造方法 |
| JP2003068740A (ja) | 2001-08-30 | 2003-03-07 | Hitachi Ltd | 半導体集積回路装置およびその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI364833B (en) | 2012-05-21 |
| JP4959929B2 (ja) | 2012-06-27 |
| JP2005109491A (ja) | 2005-04-21 |
| JP2012028795A (ja) | 2012-02-09 |
| GB2406707B (en) | 2006-10-11 |
| KR20050032013A (ko) | 2005-04-06 |
| GB0420953D0 (en) | 2004-10-20 |
| GB2406707A (en) | 2005-04-06 |
| US6960836B2 (en) | 2005-11-01 |
| TW200515577A (en) | 2005-05-01 |
| US20050067709A1 (en) | 2005-03-31 |
| JP5562308B2 (ja) | 2014-07-30 |
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