KR101112979B1 - 표면 처리 동박과 그 표면 처리 방법, 및 적층 회로 기판 - Google Patents
표면 처리 동박과 그 표면 처리 방법, 및 적층 회로 기판 Download PDFInfo
- Publication number
- KR101112979B1 KR101112979B1 KR1020080095888A KR20080095888A KR101112979B1 KR 101112979 B1 KR101112979 B1 KR 101112979B1 KR 1020080095888 A KR1020080095888 A KR 1020080095888A KR 20080095888 A KR20080095888 A KR 20080095888A KR 101112979 B1 KR101112979 B1 KR 101112979B1
- Authority
- KR
- South Korea
- Prior art keywords
- copper foil
- surface treatment
- circuit board
- treated
- peel strength
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 120
- 239000011889 copper foil Substances 0.000 title claims abstract description 119
- 238000000034 method Methods 0.000 title claims abstract description 20
- 238000004381 surface treatment Methods 0.000 claims abstract description 24
- 239000002335 surface treatment layer Substances 0.000 claims abstract description 18
- 229910001297 Zn alloy Inorganic materials 0.000 claims abstract description 14
- 239000010410 layer Substances 0.000 claims description 23
- 239000000203 mixture Substances 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims description 14
- 239000011347 resin Substances 0.000 claims description 12
- 229920005989 resin Polymers 0.000 claims description 12
- 229910052759 nickel Inorganic materials 0.000 claims description 7
- 238000011282 treatment Methods 0.000 claims description 7
- 229910052698 phosphorus Inorganic materials 0.000 claims description 4
- 230000032798 delamination Effects 0.000 claims 1
- 230000035617 depilation Effects 0.000 claims 1
- 229920001721 polyimide Polymers 0.000 abstract description 23
- 239000004642 Polyimide Substances 0.000 abstract description 22
- 238000005530 etching Methods 0.000 abstract description 20
- 239000000853 adhesive Substances 0.000 abstract description 16
- 230000001070 adhesive effect Effects 0.000 abstract description 16
- 239000002253 acid Substances 0.000 abstract description 14
- 239000011701 zinc Substances 0.000 description 43
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 29
- 230000000052 comparative effect Effects 0.000 description 27
- 229910052751 metal Inorganic materials 0.000 description 24
- 239000002184 metal Substances 0.000 description 24
- 238000012545 processing Methods 0.000 description 13
- 238000005259 measurement Methods 0.000 description 12
- 238000007747 plating Methods 0.000 description 10
- 238000010306 acid treatment Methods 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- 241000080590 Niso Species 0.000 description 7
- 229910045601 alloy Inorganic materials 0.000 description 5
- 239000000956 alloy Substances 0.000 description 5
- 238000007788 roughening Methods 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- 238000011221 initial treatment Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- JVKRKMWZYMKVTQ-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]pyrazol-1-yl]-N-(2-oxo-3H-1,3-benzoxazol-6-yl)acetamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C=1C=NN(C=1)CC(=O)NC1=CC2=C(NC(O2)=O)C=C1 JVKRKMWZYMKVTQ-UHFFFAOYSA-N 0.000 description 1
- DEXFNLNNUZKHNO-UHFFFAOYSA-N 6-[3-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperidin-1-yl]-3-oxopropyl]-3H-1,3-benzoxazol-2-one Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C1CCN(CC1)C(CCC1=CC2=C(NC(O2)=O)C=C1)=O DEXFNLNNUZKHNO-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910018104 Ni-P Inorganic materials 0.000 description 1
- 229910018536 Ni—P Inorganic materials 0.000 description 1
- 229910018605 Ni—Zn Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 229960003280 cupric chloride Drugs 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
- 229910002058 ternary alloy Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/20—Layered products comprising a layer of metal comprising aluminium or copper
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2311/00—Metals, their alloys or their compounds
- B32B2311/12—Copper
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2311/00—Metals, their alloys or their compounds
- B32B2311/20—Zinc
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2311/00—Metals, their alloys or their compounds
- B32B2311/22—Nickel or cobalt
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/08—PCBs, i.e. printed circuit boards
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/06—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the heating method
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electroplating Methods And Accessories (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2007-00304396 | 2007-11-26 | ||
| JP2007304396 | 2007-11-26 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20090054368A KR20090054368A (ko) | 2009-05-29 |
| KR101112979B1 true KR101112979B1 (ko) | 2012-04-18 |
Family
ID=40741818
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020080095888A Active KR101112979B1 (ko) | 2007-11-26 | 2008-09-30 | 표면 처리 동박과 그 표면 처리 방법, 및 적층 회로 기판 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP5075099B2 (enExample) |
| KR (1) | KR101112979B1 (enExample) |
| CN (1) | CN101445947B (enExample) |
| TW (1) | TW200934330A (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5650023B2 (ja) * | 2011-03-03 | 2015-01-07 | Jx日鉱日石金属株式会社 | プリント配線板用銅箔及びそれを用いた積層板 |
| KR101315364B1 (ko) * | 2011-03-11 | 2013-10-07 | 엘에스엠트론 주식회사 | 내열성이 개선된 표면 처리 동박 및 그 제조방법 |
| JP6487704B2 (ja) * | 2015-02-12 | 2019-03-20 | 福田金属箔粉工業株式会社 | 処理銅箔及び該処理銅箔を用いた銅張積層板並びにプリント配線板 |
| JP6023367B1 (ja) * | 2015-06-17 | 2016-11-09 | Jx金属株式会社 | キャリア付銅箔、積層体、プリント配線板の製造方法及び電子機器の製造方法 |
| JP7085394B2 (ja) * | 2018-04-13 | 2022-06-16 | 東洋鋼鈑株式会社 | 積層電解箔 |
| JP7014884B1 (ja) * | 2020-12-23 | 2022-02-01 | Jx金属株式会社 | 表面処理銅箔、銅張積層板及びプリント配線板 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4758479A (en) * | 1987-03-30 | 1988-07-19 | General Motors Corporation | Corrosion resistant nickel-zinc-phosphorus coating and method of electroplating said coating |
| JP2000178787A (ja) | 1998-12-14 | 2000-06-27 | Nikko Materials Co Ltd | 光沢面の耐酸化性に優れた銅箔及びその製造方法 |
| JP2000269637A (ja) * | 1999-03-18 | 2000-09-29 | Furukawa Circuit Foil Kk | 高密度超微細配線板用銅箔 |
| KR20070003880A (ko) * | 2004-02-17 | 2007-01-05 | 닛코킨조쿠 가부시키가이샤 | 흑화 처리 면 또는 층을 가지는 동박 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4202840B2 (ja) * | 2003-06-26 | 2008-12-24 | 日鉱金属株式会社 | 銅箔及びその製造方法 |
| JP2005064110A (ja) * | 2003-08-08 | 2005-03-10 | Tdk Corp | 電子部品用部材並びにこれを用いた電子部品 |
| JP2005344174A (ja) * | 2004-06-03 | 2005-12-15 | Mitsui Mining & Smelting Co Ltd | 表面処理銅箔及びその表面処理銅箔を用いて製造したフレキシブル銅張積層板並びにフィルムキャリアテープ |
| JP4652020B2 (ja) * | 2004-11-16 | 2011-03-16 | 新日鐵化学株式会社 | 銅張り積層板 |
-
2008
- 2008-09-08 TW TW097134379A patent/TW200934330A/zh unknown
- 2008-09-27 CN CN200810168887XA patent/CN101445947B/zh active Active
- 2008-09-30 KR KR1020080095888A patent/KR101112979B1/ko active Active
- 2008-11-25 JP JP2008299671A patent/JP5075099B2/ja active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4758479A (en) * | 1987-03-30 | 1988-07-19 | General Motors Corporation | Corrosion resistant nickel-zinc-phosphorus coating and method of electroplating said coating |
| JP2000178787A (ja) | 1998-12-14 | 2000-06-27 | Nikko Materials Co Ltd | 光沢面の耐酸化性に優れた銅箔及びその製造方法 |
| JP2000269637A (ja) * | 1999-03-18 | 2000-09-29 | Furukawa Circuit Foil Kk | 高密度超微細配線板用銅箔 |
| KR20070003880A (ko) * | 2004-02-17 | 2007-01-05 | 닛코킨조쿠 가부시키가이샤 | 흑화 처리 면 또는 층을 가지는 동박 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101445947B (zh) | 2011-04-27 |
| TW200934330A (en) | 2009-08-01 |
| KR20090054368A (ko) | 2009-05-29 |
| CN101445947A (zh) | 2009-06-03 |
| JP5075099B2 (ja) | 2012-11-14 |
| JP2009149977A (ja) | 2009-07-09 |
| TWI376174B (enExample) | 2012-11-01 |
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