KR101092092B1 - 전극 회로 보호용 실리콘 고무 조성물, 전극 회로 보호재및 전기·전자 부품 - Google Patents

전극 회로 보호용 실리콘 고무 조성물, 전극 회로 보호재및 전기·전자 부품 Download PDF

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Publication number
KR101092092B1
KR101092092B1 KR1020040081642A KR20040081642A KR101092092B1 KR 101092092 B1 KR101092092 B1 KR 101092092B1 KR 1020040081642 A KR1020040081642 A KR 1020040081642A KR 20040081642 A KR20040081642 A KR 20040081642A KR 101092092 B1 KR101092092 B1 KR 101092092B1
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South Korea
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silicone rubber
rubber composition
electrode circuit
curable silicone
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Expired - Fee Related
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Korean (ko)
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KR20050036749A (ko
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즈또무 가시와기
도시오 시오바라
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신에쓰 가가꾸 고교 가부시끼가이샤
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/18Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20Oxides; Hydroxides
    • C08K3/22Oxides; Hydroxides of metals
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/38Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals
    • B01J23/40Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals of the platinum group metals
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/06Preparatory processes
    • C08G77/08Preparatory processes characterised by the catalysts used
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F11/00Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
    • C23F11/08Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
    • C23F11/10Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2203/00Applications
    • C08L2203/20Applications use in electrical or conductive gadgets
    • C08L2203/206Applications use in electrical or conductive gadgets use in coating or encapsulating of electronic parts

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Paints Or Removers (AREA)
KR1020040081642A 2003-10-14 2004-10-13 전극 회로 보호용 실리콘 고무 조성물, 전극 회로 보호재및 전기·전자 부품 Expired - Fee Related KR101092092B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2003-00354122 2003-10-14
JP2003354122A JP4645793B2 (ja) 2003-10-14 2003-10-14 電極回路保護用シリコーンゴム組成物、電極回路保護材及び電気・電子部品

Publications (2)

Publication Number Publication Date
KR20050036749A KR20050036749A (ko) 2005-04-20
KR101092092B1 true KR101092092B1 (ko) 2011-12-12

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Country Link
JP (1) JP4645793B2 (enrdf_load_stackoverflow)
KR (1) KR101092092B1 (enrdf_load_stackoverflow)
CN (1) CN100513485C (enrdf_load_stackoverflow)
TW (1) TW200513498A (enrdf_load_stackoverflow)

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JP2006330277A (ja) * 2005-05-25 2006-12-07 Fuji Xerox Co Ltd 静電潜像現像剤用キャリア及びその製造方法、静電潜像現像剤、画像形成装置
JP2007161999A (ja) * 2005-11-17 2007-06-28 Shin Etsu Chem Co Ltd 圧縮永久歪特性に優れた硬化物を与えるcipg用付加硬化型シリコーン組成物及び該組成物の硬化物の圧縮永久歪低減方法
JP5015476B2 (ja) * 2006-03-01 2012-08-29 東レ・ダウコーニング株式会社 電極・電気回路の保護剤組成物
WO2009099099A1 (ja) * 2008-02-07 2009-08-13 Nippon Steel Chemical Co., Ltd. シリコーン樹脂及びその製造方法並びにこのシリコーン樹脂を含んだ硬化型樹脂組成物
US20130032853A1 (en) * 2010-04-22 2013-02-07 Nippon Kayaku Kabushiki Kaisha Silver Anti-Tarnishing Agent, Silver Anti-Tarnishing Resin Composition, Silver Anti-Tarnishing Method, And Light-Emitting Diode Using Same
WO2013118752A1 (ja) * 2012-02-10 2013-08-15 三菱樹脂株式会社 カバーレイフィルム、発光素子搭載用基板、及び光源装置
DE102014200492A1 (de) * 2014-01-14 2015-07-16 Robert Bosch Gmbh Schaltungsträger mit einer Silikonpolymer-Beschichtung
US20160230044A1 (en) * 2015-02-10 2016-08-11 International Business Machines Corporation Modified Conformal Coatings With Decreased Sulfur Solubility
JP6637674B2 (ja) * 2015-04-30 2020-01-29 信越化学工業株式会社 プリント配線板、プリント配線板の製造方法、及び半導体装置
CN105489418B (zh) * 2015-12-31 2017-09-01 宝鸡市晨光真空电器有限责任公司 用于户外高压真空断路器的固封式极柱模块的固封工艺
EP4186953A4 (en) * 2020-07-22 2024-08-14 Shin-Etsu Chemical Co., Ltd. ANTI-SULFURIZATION COATING MATERIAL, CURED PRODUCT THEREOF, AND ELECTRONIC DEVICE
JP2022034356A (ja) * 2020-08-18 2022-03-03 信越化学工業株式会社 ゼオライト含有シリコーンゴム組成物及びその製造方法
JP2024502054A (ja) * 2020-12-31 2024-01-17 エルケム・シリコーンズ・シャンハイ・カンパニー・リミテッド 積層造形物体の後処理方法
AT525377B1 (de) * 2021-08-30 2025-02-15 Hraschan Jakob Überzug für Oberflächen von Gegenständen aus Holz

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JP3444199B2 (ja) 1998-06-17 2003-09-08 信越化学工業株式会社 熱伝導性シリコーンゴム組成物及びその製造方法

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KR20050036749A (ko) 2005-04-20
JP4645793B2 (ja) 2011-03-09
JP2005120155A (ja) 2005-05-12
CN100513485C (zh) 2009-07-15
TW200513498A (en) 2005-04-16
TWI335348B (enrdf_load_stackoverflow) 2011-01-01
CN1621448A (zh) 2005-06-01

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