KR101092092B1 - 전극 회로 보호용 실리콘 고무 조성물, 전극 회로 보호재및 전기·전자 부품 - Google Patents
전극 회로 보호용 실리콘 고무 조성물, 전극 회로 보호재및 전기·전자 부품 Download PDFInfo
- Publication number
- KR101092092B1 KR101092092B1 KR1020040081642A KR20040081642A KR101092092B1 KR 101092092 B1 KR101092092 B1 KR 101092092B1 KR 1020040081642 A KR1020040081642 A KR 1020040081642A KR 20040081642 A KR20040081642 A KR 20040081642A KR 101092092 B1 KR101092092 B1 KR 101092092B1
- Authority
- KR
- South Korea
- Prior art keywords
- group
- silicone rubber
- rubber composition
- electrode circuit
- curable silicone
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/38—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals
- B01J23/40—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals of the platinum group metals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/06—Preparatory processes
- C08G77/08—Preparatory processes characterised by the catalysts used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
- C23F11/10—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2203/00—Applications
- C08L2203/20—Applications use in electrical or conductive gadgets
- C08L2203/206—Applications use in electrical or conductive gadgets use in coating or encapsulating of electronic parts
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2003-00354122 | 2003-10-14 | ||
JP2003354122A JP4645793B2 (ja) | 2003-10-14 | 2003-10-14 | 電極回路保護用シリコーンゴム組成物、電極回路保護材及び電気・電子部品 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20050036749A KR20050036749A (ko) | 2005-04-20 |
KR101092092B1 true KR101092092B1 (ko) | 2011-12-12 |
Family
ID=34612202
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020040081642A Expired - Fee Related KR101092092B1 (ko) | 2003-10-14 | 2004-10-13 | 전극 회로 보호용 실리콘 고무 조성물, 전극 회로 보호재및 전기·전자 부품 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4645793B2 (enrdf_load_stackoverflow) |
KR (1) | KR101092092B1 (enrdf_load_stackoverflow) |
CN (1) | CN100513485C (enrdf_load_stackoverflow) |
TW (1) | TW200513498A (enrdf_load_stackoverflow) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006206816A (ja) * | 2005-01-31 | 2006-08-10 | Ge Toshiba Silicones Co Ltd | 室温硬化性ポリオルガノシロキサン組成物 |
JP4647321B2 (ja) * | 2005-01-31 | 2011-03-09 | モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社 | 室温硬化性ポリオルガノシロキサン組成物 |
JP2006330277A (ja) * | 2005-05-25 | 2006-12-07 | Fuji Xerox Co Ltd | 静電潜像現像剤用キャリア及びその製造方法、静電潜像現像剤、画像形成装置 |
JP2007161999A (ja) * | 2005-11-17 | 2007-06-28 | Shin Etsu Chem Co Ltd | 圧縮永久歪特性に優れた硬化物を与えるcipg用付加硬化型シリコーン組成物及び該組成物の硬化物の圧縮永久歪低減方法 |
JP5015476B2 (ja) * | 2006-03-01 | 2012-08-29 | 東レ・ダウコーニング株式会社 | 電極・電気回路の保護剤組成物 |
WO2009099099A1 (ja) * | 2008-02-07 | 2009-08-13 | Nippon Steel Chemical Co., Ltd. | シリコーン樹脂及びその製造方法並びにこのシリコーン樹脂を含んだ硬化型樹脂組成物 |
US20130032853A1 (en) * | 2010-04-22 | 2013-02-07 | Nippon Kayaku Kabushiki Kaisha | Silver Anti-Tarnishing Agent, Silver Anti-Tarnishing Resin Composition, Silver Anti-Tarnishing Method, And Light-Emitting Diode Using Same |
WO2013118752A1 (ja) * | 2012-02-10 | 2013-08-15 | 三菱樹脂株式会社 | カバーレイフィルム、発光素子搭載用基板、及び光源装置 |
DE102014200492A1 (de) * | 2014-01-14 | 2015-07-16 | Robert Bosch Gmbh | Schaltungsträger mit einer Silikonpolymer-Beschichtung |
US20160230044A1 (en) * | 2015-02-10 | 2016-08-11 | International Business Machines Corporation | Modified Conformal Coatings With Decreased Sulfur Solubility |
JP6637674B2 (ja) * | 2015-04-30 | 2020-01-29 | 信越化学工業株式会社 | プリント配線板、プリント配線板の製造方法、及び半導体装置 |
CN105489418B (zh) * | 2015-12-31 | 2017-09-01 | 宝鸡市晨光真空电器有限责任公司 | 用于户外高压真空断路器的固封式极柱模块的固封工艺 |
EP4186953A4 (en) * | 2020-07-22 | 2024-08-14 | Shin-Etsu Chemical Co., Ltd. | ANTI-SULFURIZATION COATING MATERIAL, CURED PRODUCT THEREOF, AND ELECTRONIC DEVICE |
JP2022034356A (ja) * | 2020-08-18 | 2022-03-03 | 信越化学工業株式会社 | ゼオライト含有シリコーンゴム組成物及びその製造方法 |
JP2024502054A (ja) * | 2020-12-31 | 2024-01-17 | エルケム・シリコーンズ・シャンハイ・カンパニー・リミテッド | 積層造形物体の後処理方法 |
AT525377B1 (de) * | 2021-08-30 | 2025-02-15 | Hraschan Jakob | Überzug für Oberflächen von Gegenständen aus Holz |
Citations (3)
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JP3127093B2 (ja) | 1994-03-03 | 2001-01-22 | 信越化学工業株式会社 | 熱伝導性シリコーンゴム組成物 |
KR100289625B1 (ko) * | 1993-08-27 | 2001-05-02 | 카나가와 치히로 | 항균성.항곰팡이성 실리콘 고무 조성물 |
JP3444199B2 (ja) | 1998-06-17 | 2003-09-08 | 信越化学工業株式会社 | 熱伝導性シリコーンゴム組成物及びその製造方法 |
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DE3871866D1 (de) * | 1987-07-17 | 1992-07-16 | Dow Corning | Haertbare zusammensetzung. |
JP2560067B2 (ja) * | 1988-03-01 | 1996-12-04 | 第一稀元素化学工業株式会社 | 脱臭剤 |
JPH03285907A (ja) * | 1990-03-31 | 1991-12-17 | Toshiba Corp | エポキシ樹脂組成物及び樹脂封止型半導体装置 |
JPH04296046A (ja) * | 1991-03-26 | 1992-10-20 | Toshiba Corp | 樹脂封止型半導体装置 |
JP2626377B2 (ja) * | 1991-11-05 | 1997-07-02 | 信越化学工業株式会社 | エポキシ樹脂組成物及び半導体装置 |
US5276414A (en) * | 1991-12-10 | 1994-01-04 | Mitsubishi Denki Kabushiki Kaisha | Moistureproof structure for module circuits |
JPH10155883A (ja) * | 1996-12-02 | 1998-06-16 | Toagosei Co Ltd | 硫黄系悪臭ガス用消臭剤及び消臭性繊維 |
JPH10277373A (ja) * | 1997-04-04 | 1998-10-20 | Yoshihiko Kanchiku | イオン交換性中空濾過膜およびその製法 |
DE19740631A1 (de) * | 1997-09-16 | 1999-03-18 | Ge Bayer Silicones Gmbh & Co | Additionsvernetzende Siliconkautschukmischungen, ein Verfahren zu deren Herstellung und deren Verwendung |
DE19855912A1 (de) * | 1998-12-03 | 2000-06-08 | Wacker Chemie Gmbh | Siliconkautschukzusammensetzung zur Herstellung von Kabeln bzw. Profilen mit Funktionserhalt im Brandfall |
JP4112125B2 (ja) * | 1999-08-13 | 2008-07-02 | 電気化学工業株式会社 | 微細球状シリカ粉末の製造方法 |
DE10062181A1 (de) * | 2000-12-14 | 2002-07-04 | Wacker Chemie Gmbh | Härtbare Organopolysiloxanmassen |
JP2002275446A (ja) * | 2001-03-21 | 2002-09-25 | Showa Denko Kk | 表面実装用接着剤組成物 |
JP2002371195A (ja) * | 2001-06-18 | 2002-12-26 | Kyocera Chemical Corp | 封止用樹脂組成物および半導体封止装置 |
JP2002371194A (ja) * | 2001-06-18 | 2002-12-26 | Kyocera Chemical Corp | 封止用樹脂組成物および半導体封止装置 |
JP2003052800A (ja) * | 2001-08-21 | 2003-02-25 | Toagosei Co Ltd | 硫黄系悪臭の消臭に適した消臭剤組成物 |
JP4114037B2 (ja) * | 2001-09-25 | 2008-07-09 | 信越化学工業株式会社 | 電気・電子部品の硫化防止又は遅延用シリコーンゴム封止・シール材及び硫化防止又は遅延方法 |
JP2003138098A (ja) * | 2001-10-30 | 2003-05-14 | Sumitomo Bakelite Co Ltd | エポキシ樹脂組成物及び半導体装置 |
JP3868272B2 (ja) * | 2001-11-15 | 2007-01-17 | 電気化学工業株式会社 | 球状無機質粉末およびこれを充填した樹脂組成物 |
JP2003160644A (ja) * | 2001-11-27 | 2003-06-03 | Matsushita Electric Works Ltd | 半導体封止用エポキシ樹脂組成物及び半導体装置 |
JP2003213083A (ja) * | 2002-01-24 | 2003-07-30 | Nippon Kayaku Co Ltd | エポキシ樹脂組成物及びそれを用いたフレキシブル印刷配線板材料。 |
JP4189626B2 (ja) * | 2002-03-08 | 2008-12-03 | 信越化学工業株式会社 | 有機ケイ素化合物の精製方法及び硬化性シリコーン組成物 |
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JP2004115583A (ja) * | 2002-09-24 | 2004-04-15 | Hitachi Chem Co Ltd | 封止用エポキシ樹脂成形材料及び電子部品装置 |
JP4530137B2 (ja) * | 2003-09-17 | 2010-08-25 | 信越化学工業株式会社 | 精密電子部品封止・シール用オルガノポリシロキサン組成物、精密電子部品の腐蝕防止又は遅延方法、並びに銀含有精密電子部品 |
-
2003
- 2003-10-14 JP JP2003354122A patent/JP4645793B2/ja not_active Expired - Fee Related
-
2004
- 2004-06-25 TW TW093118657A patent/TW200513498A/zh not_active IP Right Cessation
- 2004-10-13 KR KR1020040081642A patent/KR101092092B1/ko not_active Expired - Fee Related
- 2004-10-14 CN CNB2004100852991A patent/CN100513485C/zh not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100289625B1 (ko) * | 1993-08-27 | 2001-05-02 | 카나가와 치히로 | 항균성.항곰팡이성 실리콘 고무 조성물 |
JP3127093B2 (ja) | 1994-03-03 | 2001-01-22 | 信越化学工業株式会社 | 熱伝導性シリコーンゴム組成物 |
JP3444199B2 (ja) | 1998-06-17 | 2003-09-08 | 信越化学工業株式会社 | 熱伝導性シリコーンゴム組成物及びその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20050036749A (ko) | 2005-04-20 |
JP4645793B2 (ja) | 2011-03-09 |
JP2005120155A (ja) | 2005-05-12 |
CN100513485C (zh) | 2009-07-15 |
TW200513498A (en) | 2005-04-16 |
TWI335348B (enrdf_load_stackoverflow) | 2011-01-01 |
CN1621448A (zh) | 2005-06-01 |
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