KR101073517B1 - 실리콘 단결정 제조방법 및 실리콘 단결정 - Google Patents
실리콘 단결정 제조방법 및 실리콘 단결정 Download PDFInfo
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- KR101073517B1 KR101073517B1 KR1020067023273A KR20067023273A KR101073517B1 KR 101073517 B1 KR101073517 B1 KR 101073517B1 KR 1020067023273 A KR1020067023273 A KR 1020067023273A KR 20067023273 A KR20067023273 A KR 20067023273A KR 101073517 B1 KR101073517 B1 KR 101073517B1
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- Prior art keywords
- carbon
- single crystal
- silicon single
- organic compound
- silicon
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 139
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 138
- 239000010703 silicon Substances 0.000 title claims abstract description 138
- 239000013078 crystal Substances 0.000 title claims abstract description 88
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 21
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 161
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 102
- 150000002894 organic compounds Chemical class 0.000 claims abstract description 62
- 239000002994 raw material Substances 0.000 claims abstract description 35
- 238000000034 method Methods 0.000 claims abstract description 29
- 239000002019 doping agent Substances 0.000 claims abstract description 16
- 230000008018 melting Effects 0.000 claims abstract description 16
- 238000002844 melting Methods 0.000 claims abstract description 16
- -1 dope Chemical compound 0.000 claims abstract description 9
- 239000000155 melt Substances 0.000 claims abstract description 7
- 235000012431 wafers Nutrition 0.000 claims description 61
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 32
- 229910052757 nitrogen Inorganic materials 0.000 claims description 16
- 239000001257 hydrogen Substances 0.000 claims description 10
- 229910052739 hydrogen Inorganic materials 0.000 claims description 10
- 239000004698 Polyethylene Substances 0.000 claims description 8
- 229920000573 polyethylene Polymers 0.000 claims description 8
- 229910052760 oxygen Inorganic materials 0.000 claims description 7
- 239000001301 oxygen Substances 0.000 claims description 7
- 239000004677 Nylon Substances 0.000 claims description 6
- 229920001778 nylon Polymers 0.000 claims description 6
- 229920002554 vinyl polymer Polymers 0.000 claims description 6
- CKUAXEQHGKSLHN-UHFFFAOYSA-N [C].[N] Chemical compound [C].[N] CKUAXEQHGKSLHN-UHFFFAOYSA-N 0.000 claims 2
- 239000010453 quartz Substances 0.000 description 17
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 17
- 239000007789 gas Substances 0.000 description 9
- 125000004429 atom Chemical group 0.000 description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 239000012535 impurity Substances 0.000 description 5
- 229940126657 Compound 17 Drugs 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 150000002431 hydrogen Chemical class 0.000 description 4
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 3
- 229910052796 boron Inorganic materials 0.000 description 3
- 229910002804 graphite Inorganic materials 0.000 description 3
- 239000010439 graphite Substances 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005247 gettering Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000015654 memory Effects 0.000 description 2
- 125000004430 oxygen atom Chemical group O* 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 101710097492 RNA polymerase sigma factor RpoS Proteins 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/20—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/02—Single-crystal growth by pulling from a melt, e.g. Czochralski method adding crystallising materials or reactants forming it in situ to the melt
- C30B15/04—Single-crystal growth by pulling from a melt, e.g. Czochralski method adding crystallising materials or reactants forming it in situ to the melt adding doping materials, e.g. for n-p-junction
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
실시예1 | 실시예2 | 비교예 | |
카본농도 평균값 (×1016atoms/cc New ASTM) |
3.06 | 3.01 | 2.82 |
σ | 0.20 | 0.12 | 0.32 |
라이프타임 평균값 (μsec) |
582 | 580 | 560 |
σ | 38 | 45 | 44 |
Claims (19)
- 삭제
- 쵸크랄스키법에 의해 탄소를 도프하여 실리콘 단결정을 제조하는 방법에 있어서, 유기화합물, 유기화합물 및 실리콘웨이퍼, 탄소분말 및 실리콘웨이퍼, 유기화합물 및 탄소분말, 유기화합물과 탄소분말 및 실리콘웨이퍼 중에서 선택되는 어느 하나의 탄소 도프제를 여러 장의 실리콘웨이퍼 사이에 유기화합물 및/또는 탄소분말을 끼운 형태로 실리콘 다결정원료와 함께 도가니 내에 충전하여 용융한 후, 상기 용융하여 얻은 융액에서 실리콘 단결정을 육성하는 것을 특징으로 하는 탄소 도프 실리콘 단결정의 제조방법.
- 쵸크랄스키법에 의해 탄소를 도프하여 실리콘 단결정을 제조하는 방법에 있어서, 유기화합물 및 탄소분말 또는 유기화합물과 탄소분말 및 실리콘웨이퍼로 구성된 탄소 도프제를 봉지 형태의 유기화합물 중에 탄소분말을 봉입한 형태로, 실리콘 다결정원료와 함께 도가니 내에 충전하여 용융한 후, 상기 용융하여 얻은 융액에서 실리콘 단결정을 육성하는 것을 특징으로 하는 탄소 도프 실리콘 단결정의 제조방법.
- 삭제
- 삭제
- 제2항에 있어서,상기 유기화합물로서, 탄소-수소계, 또는 탄소-수소-산소계로 이루어진 것을 사용하는 것을 특징으로 하는 탄소 도프 실리콘 단결정의 제조방법.
- 제3항에 있어서,상기 유기화합물로서, 탄소-수소계, 또는 탄소-수소-산소계로 이루어진 것을 사용하는 것을 특징으로 하는 탄소 도프 실리콘 단결정의 제조방법.
- 삭제
- 삭제
- 제2항에 있어서,상기 유기화합물로서, 탄소-질소계를 포함하는 것을 사용하고, 탄소에 더해 질소를 도프하는 것을 특징으로 하는 탄소 도프 실리콘 단결정의 제조방법.
- 제3항에 있어서,상기 유기화합물로서, 탄소-질소계를 포함하는 것을 사용하고, 탄소에 더해 질소를 도프하는 것을 특징으로 하는 탄소 도프 실리콘 단결정의 제조방법.
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 제2항, 제3항, 제6항, 제7항, 제10항 및 제11항 중 어느 한 항에 있어서,상기 유기화합물로서, 폴리에틸렌, 비닐계 폴리머, 나일론 중 어느 하나 이상을 사용하는 것을 특징으로 하는 탄소 도프 실리콘 단결정의 제조방법.
- 삭제
- 삭제
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2004-00140032 | 2004-05-10 | ||
JP2004140032A JP4507690B2 (ja) | 2004-05-10 | 2004-05-10 | シリコン単結晶の製造方法及びシリコン単結晶 |
PCT/JP2005/006254 WO2005108655A1 (ja) | 2004-05-10 | 2005-03-31 | シリコン単結晶の製造方法及びシリコン単結晶 |
Publications (2)
Publication Number | Publication Date |
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KR20070007912A KR20070007912A (ko) | 2007-01-16 |
KR101073517B1 true KR101073517B1 (ko) | 2011-10-17 |
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KR1020067023273A KR101073517B1 (ko) | 2004-05-10 | 2005-03-31 | 실리콘 단결정 제조방법 및 실리콘 단결정 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7909930B2 (ko) |
EP (1) | EP1746186B1 (ko) |
JP (1) | JP4507690B2 (ko) |
KR (1) | KR101073517B1 (ko) |
WO (1) | WO2005108655A1 (ko) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4983161B2 (ja) * | 2005-10-24 | 2012-07-25 | 株式会社Sumco | シリコン半導体基板およびその製造方法 |
JP4805681B2 (ja) * | 2006-01-12 | 2011-11-02 | ジルトロニック アクチエンゲゼルシャフト | エピタキシャルウェーハおよびエピタキシャルウェーハの製造方法 |
JP2008087972A (ja) * | 2006-09-29 | 2008-04-17 | Covalent Materials Corp | シリコン単結晶の製造方法 |
JP5061728B2 (ja) | 2007-05-30 | 2012-10-31 | 信越半導体株式会社 | シリコン単結晶の育成方法 |
JP5239265B2 (ja) * | 2007-09-07 | 2013-07-17 | 株式会社Sumco | シリコン単結晶引上げ用種結晶及び該種結晶を使用したシリコン単結晶の製造方法 |
JP5104437B2 (ja) * | 2008-03-18 | 2012-12-19 | 株式会社Sumco | 炭素ドープ単結晶製造方法 |
KR101121814B1 (ko) | 2010-01-25 | 2012-03-21 | 주식회사 엘지실트론 | 단결정 잉곳 제조방법 |
JP5500138B2 (ja) * | 2011-08-25 | 2014-05-21 | 信越半導体株式会社 | 炭素ドープシリコン単結晶の製造方法 |
JP6741179B1 (ja) * | 2020-02-18 | 2020-08-19 | 信越半導体株式会社 | シリコン単結晶の製造方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2001274166A (ja) * | 2000-03-27 | 2001-10-05 | Wacker Nsce Corp | シリコン単結晶基板及びその製造方法 |
JP2002173395A (ja) * | 2000-11-30 | 2002-06-21 | Shin Etsu Handotai Co Ltd | Gaドープシリコン単結晶の製造方法とシリコン単結晶 |
Family Cites Families (11)
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JP2754103B2 (ja) | 1991-10-09 | 1998-05-20 | 信越半導体株式会社 | 種結晶を用いたドープ剤の添加方法 |
JP2785585B2 (ja) | 1992-04-21 | 1998-08-13 | 信越半導体株式会社 | シリコン単結晶の製造方法 |
JP4688984B2 (ja) * | 1997-12-26 | 2011-05-25 | 株式会社Sumco | シリコンウエーハ及び結晶育成方法 |
JPH11302099A (ja) | 1998-04-21 | 1999-11-02 | Sumitomo Metal Ind Ltd | シリコン単結晶の製造方法 |
JPH11312683A (ja) * | 1998-04-28 | 1999-11-09 | Sumitomo Metal Ind Ltd | 半導体単結晶シリコンの製造方法 |
JP3670513B2 (ja) | 1999-04-28 | 2005-07-13 | 東芝セラミックス株式会社 | シリコン単結晶の製造方法 |
JP2001199794A (ja) | 2000-01-17 | 2001-07-24 | Toshiba Ceramics Co Ltd | シリコン単結晶インゴット、その製造方法およびシリコンウェーハの製造方法 |
US20020179003A1 (en) * | 2000-04-14 | 2002-12-05 | Makoto Iida | Silicon wafer, silicon epitaxial wafer, anneal wafer and method for producing them |
JP2002293691A (ja) | 2001-03-30 | 2002-10-09 | Shin Etsu Handotai Co Ltd | シリコン単結晶の製造方法及びシリコン単結晶並びにシリコンウエーハ |
KR20030035152A (ko) | 2001-10-30 | 2003-05-09 | 주식회사 하이닉스반도체 | 반도체웨이퍼 제조방법 |
US6673147B2 (en) * | 2001-12-06 | 2004-01-06 | Seh America, Inc. | High resistivity silicon wafer having electrically inactive dopant and method of producing same |
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2004
- 2004-05-10 JP JP2004140032A patent/JP4507690B2/ja not_active Expired - Fee Related
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2005
- 2005-03-31 WO PCT/JP2005/006254 patent/WO2005108655A1/ja not_active Application Discontinuation
- 2005-03-31 EP EP05727712A patent/EP1746186B1/en active Active
- 2005-03-31 KR KR1020067023273A patent/KR101073517B1/ko active IP Right Grant
- 2005-03-31 US US11/587,061 patent/US7909930B2/en active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2001274166A (ja) * | 2000-03-27 | 2001-10-05 | Wacker Nsce Corp | シリコン単結晶基板及びその製造方法 |
JP2002173395A (ja) * | 2000-11-30 | 2002-06-21 | Shin Etsu Handotai Co Ltd | Gaドープシリコン単結晶の製造方法とシリコン単結晶 |
Also Published As
Publication number | Publication date |
---|---|
EP1746186B1 (en) | 2012-09-12 |
EP1746186A1 (en) | 2007-01-24 |
US20070266930A1 (en) | 2007-11-22 |
WO2005108655A1 (ja) | 2005-11-17 |
US7909930B2 (en) | 2011-03-22 |
EP1746186A4 (en) | 2010-01-13 |
JP2005320203A (ja) | 2005-11-17 |
KR20070007912A (ko) | 2007-01-16 |
JP4507690B2 (ja) | 2010-07-21 |
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