KR101009793B1 - 플라이 아이 렌즈, 조명 광학 장치, 노광 장치 및 노광 방법 - Google Patents

플라이 아이 렌즈, 조명 광학 장치, 노광 장치 및 노광 방법 Download PDF

Info

Publication number
KR101009793B1
KR101009793B1 KR1020030033594A KR20030033594A KR101009793B1 KR 101009793 B1 KR101009793 B1 KR 101009793B1 KR 1020030033594 A KR1020030033594 A KR 1020030033594A KR 20030033594 A KR20030033594 A KR 20030033594A KR 101009793 B1 KR101009793 B1 KR 101009793B1
Authority
KR
South Korea
Prior art keywords
fly
eye
eye member
light source
irradiated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020030033594A
Other languages
English (en)
Korean (ko)
Other versions
KR20040012456A (ko
Inventor
다나카히로히사
다니츠오사무
도요다미츠노리
Original Assignee
가부시키가이샤 니콘
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 니콘 filed Critical 가부시키가이샤 니콘
Publication of KR20040012456A publication Critical patent/KR20040012456A/ko
Application granted granted Critical
Publication of KR101009793B1 publication Critical patent/KR101009793B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70158—Diffractive optical elements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Optics & Photonics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microscoopes, Condenser (AREA)
  • Projection Apparatus (AREA)
KR1020030033594A 2002-05-27 2003-05-27 플라이 아이 렌즈, 조명 광학 장치, 노광 장치 및 노광 방법 Expired - Fee Related KR101009793B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JPJP-P-2002-00152634 2002-05-27
JP2002152634 2002-05-27
JPJP-P-2003-00144198 2003-05-22
JP2003144198A JP4324957B2 (ja) 2002-05-27 2003-05-22 照明光学装置、露光装置および露光方法

Publications (2)

Publication Number Publication Date
KR20040012456A KR20040012456A (ko) 2004-02-11
KR101009793B1 true KR101009793B1 (ko) 2011-01-19

Family

ID=29422454

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020030033594A Expired - Fee Related KR101009793B1 (ko) 2002-05-27 2003-05-27 플라이 아이 렌즈, 조명 광학 장치, 노광 장치 및 노광 방법

Country Status (4)

Country Link
US (1) US6913373B2 (enExample)
EP (1) EP1367442A3 (enExample)
JP (1) JP4324957B2 (enExample)
KR (1) KR101009793B1 (enExample)

Families Citing this family (89)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4207478B2 (ja) 2002-07-12 2009-01-14 株式会社ニコン オプティカルインテグレータ、照明光学装置、露光装置および露光方法
TW200412617A (en) * 2002-12-03 2004-07-16 Nikon Corp Optical illumination device, method for adjusting optical illumination device, exposure device and exposure method
KR101547077B1 (ko) 2003-04-09 2015-08-25 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
WO2005017483A1 (ja) 2003-08-18 2005-02-24 Nikon Corporation 照度分布の評価方法、光学部材の製造方法、照明光学装置、露光装置および露光方法
TWI569308B (zh) 2003-10-28 2017-02-01 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造 方法
TWI385414B (zh) * 2003-11-20 2013-02-11 尼康股份有限公司 光學照明裝置、照明方法、曝光裝置、曝光方法以及元件製造方法
US7213933B2 (en) * 2004-01-02 2007-05-08 Entire Technology Co., Ltd. Direct type backlight module of diffuser plate and its manufacturing method thereof
US20070019179A1 (en) * 2004-01-16 2007-01-25 Damian Fiolka Polarization-modulating optical element
US8270077B2 (en) * 2004-01-16 2012-09-18 Carl Zeiss Smt Gmbh Polarization-modulating optical element
CN101793993B (zh) 2004-01-16 2013-04-03 卡尔蔡司Smt有限责任公司 光学元件、光学布置及系统
TWI395068B (zh) * 2004-01-27 2013-05-01 尼康股份有限公司 光學系統、曝光裝置以及曝光方法
TWI379344B (en) 2004-02-06 2012-12-11 Nikon Corp Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method
WO2005076083A1 (en) * 2004-02-07 2005-08-18 Carl Zeiss Smt Ag Illumination system for a microlithographic projection exposure apparatus
EP1716458B1 (en) 2004-02-17 2011-06-01 Carl Zeiss SMT GmbH Illumination system for a microlithographic projection exposure apparatus
JP2005310942A (ja) * 2004-04-20 2005-11-04 Canon Inc 露光装置、露光方法、及びそれを用いたデバイス製造方法
US7324280B2 (en) * 2004-05-25 2008-01-29 Asml Holding N.V. Apparatus for providing a pattern of polarization
US7206132B2 (en) 2004-08-06 2007-04-17 Visx, Incorporated Lenslet array for beam homogenization
JP4599936B2 (ja) * 2004-08-17 2010-12-15 株式会社ニコン 照明光学装置、照明光学装置の調整方法、露光装置、および露光方法
DE102005042005A1 (de) 2004-12-23 2006-07-06 Carl Zeiss Smt Ag Hochaperturiges Objektiv mit obskurierter Pupille
EP1837895B1 (en) * 2004-12-27 2016-02-24 Nikon Corporation Optical integrator, illumination optical apparatus, exposure apparatus, exposure method, and device manufacturing method
US7453645B2 (en) * 2004-12-30 2008-11-18 Asml Netherlands B.V. Spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby
DE502005010250D1 (de) * 2005-01-07 2010-10-21 Limo Patentverwaltung Gmbh Vorrichtung zur homogenisierung von licht
EP1844366B1 (en) 2005-01-31 2008-11-26 Olympus Corporation Illumination optical apparatus and optical apparatus
US20060172452A1 (en) * 2005-01-31 2006-08-03 Leica Microsystems Cms Gmbh Detector
US7385173B2 (en) * 2005-01-31 2008-06-10 Leica Microsystems Cms Gmbh Photosensitive array detector for spectrally split light
DE102005014640B4 (de) * 2005-03-31 2019-11-28 Carl Zeiss Sms Gmbh Anordnung zur Beleuchtung eines Objektes
TWI456267B (zh) * 2006-02-17 2014-10-11 Zeiss Carl Smt Gmbh 用於微影投射曝光設備之照明系統
JP5068271B2 (ja) 2006-02-17 2012-11-07 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ照明システム、及びこの種の照明システムを含む投影露光装置
KR101254843B1 (ko) * 2006-02-17 2013-04-15 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투영 노광 장치의 조명 시스템용 광 인터그레이터
WO2007119514A1 (ja) * 2006-04-17 2007-10-25 Nikon Corporation 照明光学装置、露光装置、およびデバイス製造方法
DE102006025025A1 (de) * 2006-05-26 2007-11-29 Carl Zeiss Smt Ag Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage, Mikrolithographie-Projektionsbelichtungsanlage und Projektionsbelichtungsverfahren
EP2161736B1 (en) 2006-06-16 2018-07-18 Nikon Corporation Variable slit device, illumination device, exposure apparatus, exposure method, and device manufacturing method
JP5105316B2 (ja) * 2006-07-07 2012-12-26 株式会社ニコン 照明光学装置、露光装置、およびデバイス製造方法
DE102007023411A1 (de) 2006-12-28 2008-07-03 Carl Zeiss Smt Ag Optisches Element, Beleuchtungsoptik für die Mikrolithographie mit mindestens einem derartigen optischen Element sowie Beleuchtungssystem mit einer derartigen Beleuchtungsoptik
JP2008182244A (ja) * 2007-01-25 2008-08-07 Carl Zeiss Smt Ag マイクロリソグラフ投影露光装置の照明系用光インテグレータ
DE102008006637A1 (de) 2007-01-25 2008-07-31 Carl Zeiss Smt Ag Optischer Integrator für ein Beleuchtungssystem einer mikrolithographischen Projektionsbelichtungsanlage
US8587764B2 (en) * 2007-03-13 2013-11-19 Nikon Corporation Optical integrator system, illumination optical apparatus, exposure apparatus, and device manufacturing method
JP4261591B2 (ja) * 2007-03-30 2009-04-30 アドバンスド・マスク・インスペクション・テクノロジー株式会社 照明光学装置および試料検査装置
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
CN101681123B (zh) * 2007-10-16 2013-06-12 株式会社尼康 照明光学系统、曝光装置以及元件制造方法
SG185313A1 (en) * 2007-10-16 2012-11-29 Nikon Corp Illumination optical system, exposure apparatus, and device manufacturing method
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
KR20100105649A (ko) * 2007-12-17 2010-09-29 가부시키가이샤 니콘 공간 광 변조 유닛, 조명 광학계, 노광 장치, 및 디바이스 제조 방법
TW200929333A (en) 2007-12-17 2009-07-01 Nikon Corp Illumination optical system, exposure apparatus, and device manufacturing method
ATE532105T1 (de) * 2007-12-21 2011-11-15 Zeiss Carl Smt Gmbh Beleuchtungsmethode
US8908151B2 (en) * 2008-02-14 2014-12-09 Nikon Corporation Illumination optical system, exposure apparatus, device manufacturing method, compensation filter, and exposure optical system
WO2009125511A1 (ja) * 2008-04-11 2009-10-15 株式会社ニコン 空間光変調ユニット、照明光学系、露光装置、およびデバイス製造方法
US20090257043A1 (en) * 2008-04-14 2009-10-15 Nikon Corporation Illumination optical system, exposure apparatus, device manufacturing method, and exposure optical system
CN105606344B (zh) 2008-05-28 2019-07-30 株式会社尼康 照明光学系统、照明方法、曝光装置以及曝光方法
EP2146248B1 (en) 2008-07-16 2012-08-29 Carl Zeiss SMT GmbH Illumination system of a microlithographic projection exposure apparatus
JP5190804B2 (ja) * 2008-07-16 2013-04-24 株式会社ニコン 減光ユニット、照明光学系、露光装置、およびデバイス製造方法
JPWO2010024106A1 (ja) * 2008-08-28 2012-01-26 株式会社ニコン 照明光学系、露光装置、およびデバイス製造方法
EP2169464A1 (en) * 2008-09-29 2010-03-31 Carl Zeiss SMT AG Illumination system of a microlithographic projection exposure apparatus
JP5365982B2 (ja) * 2008-10-02 2013-12-11 株式会社ニコン 照明光学系、露光装置、およびデバイス製造方法
WO2010061674A1 (ja) * 2008-11-28 2010-06-03 株式会社ニコン 補正ユニット、照明光学系、露光装置、およびデバイス製造方法
EP2202580B1 (en) 2008-12-23 2011-06-22 Carl Zeiss SMT GmbH Illumination system of a microlithographic projection exposure apparatus
WO2010073801A1 (ja) * 2008-12-25 2010-07-01 株式会社 ニコン 照明光学系、露光装置及びデバイスの製造方法
CN102349026B (zh) 2009-03-13 2015-07-29 卡尔蔡司Smt有限责任公司 微光刻投射曝光设备
WO2010105640A1 (en) 2009-03-19 2010-09-23 Carl Zeiss Smt Ag Illumination system of a microlithographic projection exposure apparatus
US8164046B2 (en) * 2009-07-16 2012-04-24 Carl Zeiss Smt Gmbh Illumination system for illuminating a mask in a microlithographic projection exposure apparatus
CN102472974B (zh) 2009-07-17 2014-05-07 卡尔蔡司Smt有限责任公司 微光刻投射曝光设备以及测量有关包含在其中的光学表面的参数的方法
US20110037962A1 (en) 2009-08-17 2011-02-17 Nikon Corporation Polarization converting unit, illumination optical system, exposure apparatus, and device manufacturing method
US8320056B2 (en) * 2009-08-20 2012-11-27 Lawrence Livermore National Security, Llc Spatial filters for high average power lasers
JP5504763B2 (ja) * 2009-09-02 2014-05-28 株式会社ニコン レンズアレイ及び光学系
JP5598733B2 (ja) 2009-12-23 2014-10-01 株式会社ニコン 空間光変調ユニット、照明光学系、露光装置、およびデバイス製造方法
EP2354853B1 (en) * 2010-02-09 2013-01-02 Carl Zeiss SMT GmbH Optical raster element, optical integrator and illumination system of a microlithographic projection exposure apparatus
KR20120116329A (ko) 2010-02-20 2012-10-22 가부시키가이샤 니콘 광원 최적화 방법, 노광 방법, 디바이스 제조 방법, 프로그램, 노광 장치, 리소그래피 시스템, 광원 평가 방법 및 광원 변조 방법
US9389519B2 (en) 2010-02-25 2016-07-12 Nikon Corporation Measuring method and measuring apparatus of pupil transmittance distribution, exposure method and exposure apparatus, and device manufacturing method
US20110205519A1 (en) * 2010-02-25 2011-08-25 Nikon Corporation Polarization converting unit, illumination optical system, exposure apparatus, and device manufacturing method
JP2011216863A (ja) * 2010-03-17 2011-10-27 Hitachi Via Mechanics Ltd ビームサイズ可変照明光学装置及びビームサイズ変更方法
JP2012004465A (ja) 2010-06-19 2012-01-05 Nikon Corp 照明光学系、露光装置、およびデバイス製造方法
JP5366019B2 (ja) 2010-08-02 2013-12-11 株式会社ニコン 伝送光学系、照明光学系、露光装置、およびデバイス製造方法
JP5807761B2 (ja) 2011-06-06 2015-11-10 株式会社ニコン 照明方法、照明光学装置、及び露光装置
JP6020834B2 (ja) 2011-06-07 2016-11-02 株式会社ニコン 照明光学系、露光装置、およびデバイス製造方法
TWI519816B (zh) 2011-06-13 2016-02-01 尼康股份有限公司 照明光學系統、曝光裝置以及元件製造方法
DE102011078885A1 (de) * 2011-07-08 2013-01-10 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zum Bestimmen der Absorption in einem Rohling
US9760012B2 (en) * 2011-08-04 2017-09-12 Nikon Corporation Illumination device
JP5495334B2 (ja) 2011-09-22 2014-05-21 Ｎｅｃエンジニアリング株式会社 光記録ヘッドおよび画像形成装置
JP6120001B2 (ja) 2011-10-24 2017-04-26 株式会社ニコン 照明光学系、露光装置、およびデバイス製造方法
US9732934B2 (en) 2011-10-28 2017-08-15 Nikon Corporation Illumination device for optimizing polarization in an illumination pupil
CN104395985B (zh) 2012-05-02 2018-01-30 株式会社尼康 光瞳亮度分布的评价方法和改善方法、照明光学系统及其调整方法、曝光装置、曝光方法以及器件制造方法
US8937770B2 (en) * 2012-07-24 2015-01-20 Coherent Gmbh Excimer laser apparatus projecting a beam with a selectively variable short-axis beam profile
FR2996016B1 (fr) 2012-09-25 2014-09-19 Sagem Defense Securite Illuminateur de photolithographie telecentrique selon deux directions
JP6674306B2 (ja) 2016-03-31 2020-04-01 キヤノン株式会社 照明装置、光学装置、インプリント装置、投影装置、及び物品の製造方法
WO2018130559A1 (en) * 2017-01-16 2018-07-19 Philips Lighting Holding B.V. Detecting coded light
KR102254690B1 (ko) * 2018-09-28 2021-05-21 이승훈 경화 노광장치
JP7256356B2 (ja) * 2018-09-28 2023-04-12 日亜化学工業株式会社 フライアイレンズ及び照明光学装置
CN117500631A (zh) * 2021-08-31 2024-02-02 极光先进雷射株式会社 激光加工装置、激光加工方法和电子器件的制造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1197340A (ja) * 1997-09-17 1999-04-09 Omron Corp 露光光学系、光加工装置、露光装置及び光結合装置
US6307682B1 (en) * 2000-02-16 2001-10-23 Silicon Valley Group, Inc. Zoom illumination system for use in photolithography

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USRE34634E (en) * 1982-02-26 1994-06-07 Nippon Kogaku Kabushiki Kaisha Light illumination device
JPS60232552A (ja) * 1984-05-02 1985-11-19 Canon Inc 照明光学系
JPS636540A (ja) * 1986-06-27 1988-01-12 Komatsu Ltd インテグレ−タ
JP3440458B2 (ja) 1993-06-18 2003-08-25 株式会社ニコン 照明装置、パターン投影方法及び半導体素子の製造方法
JP3278277B2 (ja) 1994-01-26 2002-04-30 キヤノン株式会社 投影露光装置及びこれを用いたデバイス製造方法
JP3633002B2 (ja) * 1994-05-09 2005-03-30 株式会社ニコン 照明光学装置、露光装置及び露光方法
JPH1041225A (ja) 1996-07-24 1998-02-13 Canon Inc 照明装置及びそれを用いた投影露光装置
DE19635942A1 (de) 1996-09-05 1998-03-12 Vitaly Dr Lissotschenko Optisches Strahlformungssystem
US5963305A (en) 1996-09-12 1999-10-05 Canon Kabushiki Kaisha Illumination system and exposure apparatus
US6144495A (en) * 1997-12-23 2000-11-07 Canon Kabushiki Kaisha Projection light source
US6741394B1 (en) 1998-03-12 2004-05-25 Nikon Corporation Optical integrator, illumination optical apparatus, exposure apparatus and observation apparatus
US6048081A (en) * 1998-06-15 2000-04-11 Richardson; Brian Edward Beam divergence and shape controlling module for projected light
JP2001176766A (ja) 1998-10-29 2001-06-29 Nikon Corp 照明装置及び投影露光装置
JP2000143278A (ja) * 1998-11-10 2000-05-23 Nikon Corp 耐久性の向上された投影露光装置及び結像光学系の製造方法
DE19855106A1 (de) * 1998-11-30 2000-05-31 Zeiss Carl Fa Beleuchtungssystem für die VUV-Mikrolithographie
DE10040898A1 (de) 2000-08-18 2002-02-28 Zeiss Carl Beleuchtungssystem für die Mikrolithographie
US6583937B1 (en) * 1998-11-30 2003-06-24 Carl-Zeiss Stiftung Illuminating system of a microlithographic projection exposure arrangement
EP1014196A3 (en) 1998-12-17 2002-05-29 Nikon Corporation Method and system of illumination for a projection optical apparatus
US6497488B1 (en) * 1999-08-06 2002-12-24 Ricoh Company, Ltd. Illumination system and projector
DE10062579A1 (de) * 1999-12-15 2001-06-21 Nikon Corp Optischer Integrierer,optische Beleuchtungseinrichtung, Photolithographie-Belichtungseinrichtung,und Beobachtungseinrichtung
JP3599648B2 (ja) * 2000-08-03 2004-12-08 キヤノン株式会社 照明装置、投影露光装置並びにそれを用いたデバイス製造方法
JP2002057081A (ja) 2000-08-07 2002-02-22 Nikon Corp 照明光学装置並びに露光装置及び露光方法
JP2002075835A (ja) 2000-08-30 2002-03-15 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置
JP3605047B2 (ja) * 2001-05-22 2004-12-22 キヤノン株式会社 照明装置、露光装置、デバイス製造方法及びデバイス

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1197340A (ja) * 1997-09-17 1999-04-09 Omron Corp 露光光学系、光加工装置、露光装置及び光結合装置
US6307682B1 (en) * 2000-02-16 2001-10-23 Silicon Valley Group, Inc. Zoom illumination system for use in photolithography

Also Published As

Publication number Publication date
JP2004056103A (ja) 2004-02-19
EP1367442A3 (en) 2005-11-02
EP1367442A2 (en) 2003-12-03
JP4324957B2 (ja) 2009-09-02
US6913373B2 (en) 2005-07-05
US20040036977A1 (en) 2004-02-26
KR20040012456A (ko) 2004-02-11

Similar Documents

Publication Publication Date Title
KR101009793B1 (ko) 플라이 아이 렌즈, 조명 광학 장치, 노광 장치 및 노광 방법
US7095560B2 (en) Diffractive optical device, refractive optical device, illumination optical system, exposure apparatus and exposure method
US7471456B2 (en) Optical integrator, illumination optical device, exposure device, and exposure method
KR101220636B1 (ko) 회절 광학 소자, 조명 광학 장치, 노광 장치, 노광 방법, 및 디바이스 제조 방법
JP5500454B2 (ja) オプティカルインテグレータ、照明光学装置、露光装置、露光方法、およびデバイス製造方法
US7126757B2 (en) Illumination apparatus, exposure apparatus using the same, and device fabricating method
KR20030017431A (ko) 조명 광학 장치, 노광 장치, 노광 방법 및 마이크로장치의 제조 방법
JP4366948B2 (ja) 照明光学装置、露光装置および露光方法
WO2007111146A1 (ja) 照明光学装置、露光装置、およびデバイス製造方法
US8223318B2 (en) Illuminating optical apparatus, exposure apparatus and device manufacturing method
US8638420B2 (en) Optical integrator, illuminating optical device, exposure apparatus and device manufacturing method
JP2004266259A (ja) 照明光学装置、露光装置および露光方法
JP2009071011A (ja) オプティカルインテグレータ、照明光学系、露光装置、およびデバイス製造方法
JP2003178952A (ja) 照明光学装置、露光装置および露光方法
JP2004311742A (ja) 光学系の調整方法、照明光学装置、露光装置、および露光方法
WO2006059549A1 (ja) 照明光学装置、その製造方法、露光装置、および露光方法
JP2006140393A (ja) 照明光学装置、露光装置、および露光方法
WO2004112107A1 (ja) 照明光学装置、露光装置および露光方法
JP2003178951A (ja) 回折光学装置、屈折光学装置、照明光学装置、露光装置および露光方法
JP2007287885A (ja) 照明光学装置、露光装置、およびデバイス製造方法
JP5604813B2 (ja) 照明光学系、露光装置、およびデバイス製造方法
JP2004207389A (ja) 照明光学装置、露光装置、露光方法、照明光学装置の調整方法、および露光装置の製造方法
JP2002131690A (ja) 照明光学装置および該照明光学装置を備えた露光装置
JP2005158784A (ja) 露光装置および露光方法
JP2008021767A (ja) 照明光学装置、露光装置、およびデバイス製造方法

Legal Events

Date Code Title Description
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

D13-X000 Search requested

St.27 status event code: A-1-2-D10-D13-srh-X000

D14-X000 Search report completed

St.27 status event code: A-1-2-D10-D14-srh-X000

R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U11-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

LAPS Lapse due to unpaid annual fee
PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20140114

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20140114

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000