KR100912280B1 - 기판처리시스템 - Google Patents

기판처리시스템 Download PDF

Info

Publication number
KR100912280B1
KR100912280B1 KR1020020075426A KR20020075426A KR100912280B1 KR 100912280 B1 KR100912280 B1 KR 100912280B1 KR 1020020075426 A KR1020020075426 A KR 1020020075426A KR 20020075426 A KR20020075426 A KR 20020075426A KR 100912280 B1 KR100912280 B1 KR 100912280B1
Authority
KR
South Korea
Prior art keywords
unit
substrate
pass
processing
units
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020020075426A
Other languages
English (en)
Korean (ko)
Other versions
KR20030044881A (ko
Inventor
타노우에신야
하야시마코토
사카타토미히로
Original Assignee
도쿄엘렉트론가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 도쿄엘렉트론가부시키가이샤 filed Critical 도쿄엘렉트론가부시키가이샤
Publication of KR20030044881A publication Critical patent/KR20030044881A/ko
Application granted granted Critical
Publication of KR100912280B1 publication Critical patent/KR100912280B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/14—Wafer cassette transporting

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020020075426A 2001-11-30 2002-11-29 기판처리시스템 Expired - Fee Related KR100912280B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001367010A JP3911624B2 (ja) 2001-11-30 2001-11-30 処理システム
JPJP-P-2001-00367010 2001-11-30

Publications (2)

Publication Number Publication Date
KR20030044881A KR20030044881A (ko) 2003-06-09
KR100912280B1 true KR100912280B1 (ko) 2009-08-17

Family

ID=19176824

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020020075426A Expired - Fee Related KR100912280B1 (ko) 2001-11-30 2002-11-29 기판처리시스템

Country Status (4)

Country Link
JP (1) JP3911624B2 (enExample)
KR (1) KR100912280B1 (enExample)
CN (1) CN1249776C (enExample)
TW (1) TWI248657B (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101074388B1 (ko) 2004-12-22 2011-10-17 엘지디스플레이 주식회사 액정표시장치용 제조 장비
KR101079487B1 (ko) * 2005-01-28 2011-11-03 어플라이드 머티어리얼스, 인코포레이티드 기판 캐리어 핸들러의 향상된 동작을 위한 방법 및 장치
JP4745040B2 (ja) * 2005-12-05 2011-08-10 東京エレクトロン株式会社 基板搬送装置及び基板処理装置
US7690881B2 (en) * 2006-08-30 2010-04-06 Asm Japan K.K. Substrate-processing apparatus with buffer mechanism and substrate-transferring apparatus
JP4560022B2 (ja) 2006-09-12 2010-10-13 東京エレクトロン株式会社 塗布、現像装置及び塗布、現像装置の制御方法並びに記憶媒体
JP6339057B2 (ja) * 2015-09-29 2018-06-06 株式会社日立国際電気 基板処理装置、半導体装置の製造方法、プログラム
CN106044229A (zh) * 2016-07-22 2016-10-26 京东方科技集团股份有限公司 一种掩模板搬运设备及曝光机组系统
JP6601360B2 (ja) * 2016-09-30 2019-11-06 株式会社ダイフク 物品搬送設備
CN110140092B (zh) * 2017-01-13 2022-05-13 株式会社富士 生产管理装置
JP6655689B1 (ja) * 2018-09-21 2020-02-26 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
JP7142566B2 (ja) * 2018-12-27 2022-09-27 東京エレクトロン株式会社 基板処理装置および基板処理方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07297258A (ja) * 1994-04-26 1995-11-10 Tokyo Electron Ltd 板状体の搬送装置
JPH11260883A (ja) * 1998-03-09 1999-09-24 Dainippon Screen Mfg Co Ltd 基板処理装置
JPH11274265A (ja) * 1998-03-26 1999-10-08 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2001117064A (ja) * 1999-10-19 2001-04-27 Tokyo Electron Ltd 搬送装置の位置合わせ機構および位置合わせ方法、ならびに基板処理装置
KR20010084137A (ko) * 2000-02-24 2001-09-06 구본준, 론 위라하디락사 인라인 형태로 구성된 액정표시소자의 검사장치
JP2001291664A (ja) * 2000-02-01 2001-10-19 Tokyo Electron Ltd 基板処理装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07297258A (ja) * 1994-04-26 1995-11-10 Tokyo Electron Ltd 板状体の搬送装置
JPH11260883A (ja) * 1998-03-09 1999-09-24 Dainippon Screen Mfg Co Ltd 基板処理装置
JPH11274265A (ja) * 1998-03-26 1999-10-08 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2001117064A (ja) * 1999-10-19 2001-04-27 Tokyo Electron Ltd 搬送装置の位置合わせ機構および位置合わせ方法、ならびに基板処理装置
JP2001291664A (ja) * 2000-02-01 2001-10-19 Tokyo Electron Ltd 基板処理装置
KR20010084137A (ko) * 2000-02-24 2001-09-06 구본준, 론 위라하디락사 인라인 형태로 구성된 액정표시소자의 검사장치

Also Published As

Publication number Publication date
CN1249776C (zh) 2006-04-05
TW200302540A (en) 2003-08-01
JP3911624B2 (ja) 2007-05-09
CN1426087A (zh) 2003-06-25
TWI248657B (en) 2006-02-01
KR20030044881A (ko) 2003-06-09
JP2003168713A (ja) 2003-06-13

Similar Documents

Publication Publication Date Title
KR100575320B1 (ko) 기판처리장치
KR100618108B1 (ko) 기판처리장치
KR101010086B1 (ko) 기판처리장치
KR101035465B1 (ko) 현상방법 및 현상장치
TWI538090B (zh) 基板處理裝置
KR101018512B1 (ko) 기판의 회수 방법 및 기판 처리 장치
US7899568B2 (en) Substrate processing method, substrate processing system, and computer-readable storage medium
US8113141B2 (en) Apparatus for processing a substrate
KR100912280B1 (ko) 기판처리시스템
KR20100027039A (ko) 처리 시스템
US20060201615A1 (en) Coating and developing system
JP3928902B2 (ja) 基板製造ラインおよび基板製造方法
KR100439608B1 (ko) 레지스트도포·현상처리시스템
KR101136158B1 (ko) 현상처리방법 및 현상처리장치
US20080268383A1 (en) Coating and developing system, coating and developing method and storage medium
KR100935971B1 (ko) 처리방법 및 처리장치
JP2004304003A (ja) 処理システム
KR101052946B1 (ko) 처리시스템
JPH09162263A (ja) 基板処理装置及びこれに用いる基板搬送装置
KR100542630B1 (ko) 반도체 제조 설비
KR100821411B1 (ko) 처리장치
KR100666354B1 (ko) 포토리소그라피 공정을 위한 반도체 제조장치
KR20100036974A (ko) 레지스트 도포 현상 처리 시스템
KR100590711B1 (ko) 처리시스템
KR20080024301A (ko) 베이크 유닛 및 이를 이용한 기판처리방법

Legal Events

Date Code Title Description
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

D13-X000 Search requested

St.27 status event code: A-1-2-D10-D13-srh-X000

D14-X000 Search report completed

St.27 status event code: A-1-2-D10-D14-srh-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U11-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

FPAY Annual fee payment

Payment date: 20120724

Year of fee payment: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

FPAY Annual fee payment

Payment date: 20130719

Year of fee payment: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

FPAY Annual fee payment

Payment date: 20140721

Year of fee payment: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

LAPS Lapse due to unpaid annual fee
PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20150808

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20150808

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000