KR100912280B1 - 기판처리시스템 - Google Patents

기판처리시스템 Download PDF

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Publication number
KR100912280B1
KR100912280B1 KR1020020075426A KR20020075426A KR100912280B1 KR 100912280 B1 KR100912280 B1 KR 100912280B1 KR 1020020075426 A KR1020020075426 A KR 1020020075426A KR 20020075426 A KR20020075426 A KR 20020075426A KR 100912280 B1 KR100912280 B1 KR 100912280B1
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KR
South Korea
Prior art keywords
unit
substrate
pass
processing
units
Prior art date
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Expired - Fee Related
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KR1020020075426A
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English (en)
Korean (ko)
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KR20030044881A (ko
Inventor
타노우에신야
하야시마코토
사카타토미히로
Original Assignee
도쿄엘렉트론가부시키가이샤
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Publication date
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Publication of KR20030044881A publication Critical patent/KR20030044881A/ko
Application granted granted Critical
Publication of KR100912280B1 publication Critical patent/KR100912280B1/ko
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/14—Wafer cassette transporting

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020020075426A 2001-11-30 2002-11-29 기판처리시스템 Expired - Fee Related KR100912280B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2001-00367010 2001-11-30
JP2001367010A JP3911624B2 (ja) 2001-11-30 2001-11-30 処理システム

Publications (2)

Publication Number Publication Date
KR20030044881A KR20030044881A (ko) 2003-06-09
KR100912280B1 true KR100912280B1 (ko) 2009-08-17

Family

ID=19176824

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020020075426A Expired - Fee Related KR100912280B1 (ko) 2001-11-30 2002-11-29 기판처리시스템

Country Status (4)

Country Link
JP (1) JP3911624B2 (enrdf_load_stackoverflow)
KR (1) KR100912280B1 (enrdf_load_stackoverflow)
CN (1) CN1249776C (enrdf_load_stackoverflow)
TW (1) TWI248657B (enrdf_load_stackoverflow)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101074388B1 (ko) 2004-12-22 2011-10-17 엘지디스플레이 주식회사 액정표시장치용 제조 장비
CN101273312B (zh) * 2005-01-28 2012-07-04 应用材料公司 增强衬底载具搬运器操作的方法和装置
JP4745040B2 (ja) * 2005-12-05 2011-08-10 東京エレクトロン株式会社 基板搬送装置及び基板処理装置
US7690881B2 (en) * 2006-08-30 2010-04-06 Asm Japan K.K. Substrate-processing apparatus with buffer mechanism and substrate-transferring apparatus
JP4560022B2 (ja) * 2006-09-12 2010-10-13 東京エレクトロン株式会社 塗布、現像装置及び塗布、現像装置の制御方法並びに記憶媒体
JP6339057B2 (ja) * 2015-09-29 2018-06-06 株式会社日立国際電気 基板処理装置、半導体装置の製造方法、プログラム
CN106044229A (zh) * 2016-07-22 2016-10-26 京东方科技集团股份有限公司 一种掩模板搬运设备及曝光机组系统
JP6601360B2 (ja) * 2016-09-30 2019-11-06 株式会社ダイフク 物品搬送設備
US10996661B2 (en) * 2017-01-13 2021-05-04 Fuji Corporation Manufacturing management device
JP6655689B1 (ja) * 2018-09-21 2020-02-26 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
JP7142566B2 (ja) * 2018-12-27 2022-09-27 東京エレクトロン株式会社 基板処理装置および基板処理方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07297258A (ja) * 1994-04-26 1995-11-10 Tokyo Electron Ltd 板状体の搬送装置
JPH11260883A (ja) * 1998-03-09 1999-09-24 Dainippon Screen Mfg Co Ltd 基板処理装置
JPH11274265A (ja) * 1998-03-26 1999-10-08 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2001117064A (ja) * 1999-10-19 2001-04-27 Tokyo Electron Ltd 搬送装置の位置合わせ機構および位置合わせ方法、ならびに基板処理装置
KR20010084137A (ko) * 2000-02-24 2001-09-06 구본준, 론 위라하디락사 인라인 형태로 구성된 액정표시소자의 검사장치
JP2001291664A (ja) * 2000-02-01 2001-10-19 Tokyo Electron Ltd 基板処理装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07297258A (ja) * 1994-04-26 1995-11-10 Tokyo Electron Ltd 板状体の搬送装置
JPH11260883A (ja) * 1998-03-09 1999-09-24 Dainippon Screen Mfg Co Ltd 基板処理装置
JPH11274265A (ja) * 1998-03-26 1999-10-08 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2001117064A (ja) * 1999-10-19 2001-04-27 Tokyo Electron Ltd 搬送装置の位置合わせ機構および位置合わせ方法、ならびに基板処理装置
JP2001291664A (ja) * 2000-02-01 2001-10-19 Tokyo Electron Ltd 基板処理装置
KR20010084137A (ko) * 2000-02-24 2001-09-06 구본준, 론 위라하디락사 인라인 형태로 구성된 액정표시소자의 검사장치

Also Published As

Publication number Publication date
CN1249776C (zh) 2006-04-05
TW200302540A (en) 2003-08-01
JP3911624B2 (ja) 2007-05-09
CN1426087A (zh) 2003-06-25
KR20030044881A (ko) 2003-06-09
TWI248657B (en) 2006-02-01
JP2003168713A (ja) 2003-06-13

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