KR100856532B1 - 처리장치 - Google Patents

처리장치 Download PDF

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Publication number
KR100856532B1
KR100856532B1 KR1020010069655A KR20010069655A KR100856532B1 KR 100856532 B1 KR100856532 B1 KR 100856532B1 KR 1020010069655 A KR1020010069655 A KR 1020010069655A KR 20010069655 A KR20010069655 A KR 20010069655A KR 100856532 B1 KR100856532 B1 KR 100856532B1
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KR
South Korea
Prior art keywords
processed
processing unit
unit
horizontal
thermal processing
Prior art date
Application number
KR1020010069655A
Other languages
English (en)
Korean (ko)
Other versions
KR20020036741A (ko
Inventor
니시키오리마사히로
모토다키미오
Original Assignee
도쿄엘렉트론가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 도쿄엘렉트론가부시키가이샤 filed Critical 도쿄엘렉트론가부시키가이샤
Publication of KR20020036741A publication Critical patent/KR20020036741A/ko
Application granted granted Critical
Publication of KR100856532B1 publication Critical patent/KR100856532B1/ko

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
KR1020010069655A 2000-11-10 2001-11-09 처리장치 KR100856532B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2000-00343401 2000-11-10
JP2000343401A JP3930244B2 (ja) 2000-11-10 2000-11-10 処理装置

Publications (2)

Publication Number Publication Date
KR20020036741A KR20020036741A (ko) 2002-05-16
KR100856532B1 true KR100856532B1 (ko) 2008-09-04

Family

ID=18817775

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020010069655A KR100856532B1 (ko) 2000-11-10 2001-11-09 처리장치

Country Status (2)

Country Link
JP (1) JP3930244B2 (ja)
KR (1) KR100856532B1 (ja)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3725051B2 (ja) * 2001-07-27 2005-12-07 大日本スクリーン製造株式会社 基板処理装置
JP4410121B2 (ja) * 2005-02-08 2010-02-03 東京エレクトロン株式会社 塗布、現像装置及び塗布、現像方法
JP4476133B2 (ja) * 2005-02-24 2010-06-09 東京エレクトロン株式会社 処理システム
KR100897850B1 (ko) * 2007-06-18 2009-05-15 세메스 주식회사 기판 처리 장치
KR100904392B1 (ko) * 2007-06-18 2009-06-26 세메스 주식회사 기판 처리 장치
JP2008166820A (ja) * 2007-12-28 2008-07-17 Yoshitake Ito 基板処理装置、基板処理方法、基板の製造方法及び電子機器
JP2008109158A (ja) * 2007-12-28 2008-05-08 Yoshitake Ito 基板処理装置、基板処理方法、基板の製造方法及び電子機器
JP2008124502A (ja) * 2008-02-01 2008-05-29 Yoshitake Ito 基板処理装置及び基板処理方法及び基板の製造方法及び電子機器

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19980079544A (ko) * 1997-03-21 1998-11-25 이시다 아키라 기판처리장치, 및 기판반송장치 및 기판이재장치
KR19990014300A (ko) * 1997-07-30 1999-02-25 히가시 데쓰로 기판반송장치 및 그것을 이용한 기판처리장치
JPH1167875A (ja) * 1997-08-20 1999-03-09 Dainippon Screen Mfg Co Ltd 基板処理装置
KR19990023624A (ko) * 1997-08-15 1999-03-25 히가시 데쓰로 기판처리장치

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10261684A (ja) * 1997-03-19 1998-09-29 Dainippon Screen Mfg Co Ltd 基板処理装置
JP3481416B2 (ja) * 1997-04-07 2003-12-22 大日本スクリーン製造株式会社 基板処理装置及び方法
JP3928902B2 (ja) * 1998-02-20 2007-06-13 平田機工株式会社 基板製造ラインおよび基板製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19980079544A (ko) * 1997-03-21 1998-11-25 이시다 아키라 기판처리장치, 및 기판반송장치 및 기판이재장치
KR19990014300A (ko) * 1997-07-30 1999-02-25 히가시 데쓰로 기판반송장치 및 그것을 이용한 기판처리장치
KR19990023624A (ko) * 1997-08-15 1999-03-25 히가시 데쓰로 기판처리장치
JPH1167875A (ja) * 1997-08-20 1999-03-09 Dainippon Screen Mfg Co Ltd 基板処理装置

Also Published As

Publication number Publication date
KR20020036741A (ko) 2002-05-16
JP3930244B2 (ja) 2007-06-13
JP2002151384A (ja) 2002-05-24

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