KR100854803B1 - 기판 처리 장치 및 덮개 지지 장치 - Google Patents
기판 처리 장치 및 덮개 지지 장치 Download PDFInfo
- Publication number
- KR100854803B1 KR100854803B1 KR1020060127316A KR20060127316A KR100854803B1 KR 100854803 B1 KR100854803 B1 KR 100854803B1 KR 1020060127316 A KR1020060127316 A KR 1020060127316A KR 20060127316 A KR20060127316 A KR 20060127316A KR 100854803 B1 KR100854803 B1 KR 100854803B1
- Authority
- KR
- South Korea
- Prior art keywords
- processing chamber
- chamber
- lid
- processing apparatus
- substrate
- Prior art date
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/6719—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the processing chambers, e.g. modular processing chambers
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Drying Of Semiconductors (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2005-00360934 | 2005-12-14 | ||
JP2005360934A JP4355314B2 (ja) | 2005-12-14 | 2005-12-14 | 基板処理装置、及び該装置の蓋釣支装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20070063450A KR20070063450A (ko) | 2007-06-19 |
KR100854803B1 true KR100854803B1 (ko) | 2008-08-27 |
Family
ID=38165943
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020060127316A KR100854803B1 (ko) | 2005-12-14 | 2006-12-13 | 기판 처리 장치 및 덮개 지지 장치 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP4355314B2 (zh) |
KR (1) | KR100854803B1 (zh) |
CN (1) | CN100474506C (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101016044B1 (ko) * | 2010-07-01 | 2011-02-23 | 강우성 | 반도체 장비의 리드를 위한 자동 유지보수장치 |
KR20160035377A (ko) * | 2014-09-23 | 2016-03-31 | 주식회사 선익시스템 | 챔버장비 유지보수 시스템 |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9184072B2 (en) * | 2007-07-27 | 2015-11-10 | Mattson Technology, Inc. | Advanced multi-workpiece processing chamber |
KR101007711B1 (ko) * | 2008-05-19 | 2011-01-13 | 주식회사 에스에프에이 | 플라즈마 처리장치 |
KR101413526B1 (ko) * | 2008-07-30 | 2014-07-02 | (주)소슬 | 기판 처리 장치 |
JP5154491B2 (ja) * | 2009-03-30 | 2013-02-27 | 住友重機械工業株式会社 | チャンバーライン |
CN101673810B (zh) * | 2009-09-03 | 2011-06-22 | 东莞宏威数码机械有限公司 | 腔盖启闭机构 |
JP5526988B2 (ja) * | 2010-04-28 | 2014-06-18 | 東京エレクトロン株式会社 | 基板処理装置及び基板処理システム |
JP5585238B2 (ja) * | 2010-06-24 | 2014-09-10 | 東京エレクトロン株式会社 | 基板処理装置 |
JP5575558B2 (ja) * | 2010-06-30 | 2014-08-20 | 東京エレクトロン株式会社 | 処理装置 |
TWI415208B (zh) * | 2010-09-21 | 2013-11-11 | Sumitomo Heavy Industries | Chamber line |
CN102433539B (zh) * | 2010-09-29 | 2014-07-09 | 住友重机械工业株式会社 | 腔系列 |
JP2013229373A (ja) * | 2012-04-24 | 2013-11-07 | Tokyo Electron Ltd | 基板処理装置及びそのメンテナンス方法 |
KR102293092B1 (ko) | 2013-11-12 | 2021-08-23 | 도쿄엘렉트론가부시키가이샤 | 플라즈마 처리 장치 |
JP6293499B2 (ja) | 2014-01-27 | 2018-03-14 | 株式会社日立ハイテクノロジーズ | 真空処理装置 |
EP3220413B1 (de) * | 2016-03-15 | 2022-01-26 | Integrated Dynamics Engineering GmbH | Serviceeinrichtung |
KR102091781B1 (ko) * | 2016-12-20 | 2020-03-20 | 주식회사 원익아이피에스 | 기판처리장치 |
EP3422396B1 (de) * | 2017-06-28 | 2021-08-04 | Meyer Burger (Germany) GmbH | Vorrichtung zum transport eines substrats, behandlungsvorrichtung mit einer an einen substratträger einer solchen vorrichtung angepassten aufnahmeplatte und verfahren zum prozessieren eines substrates unter nutzung einer solchen vorrichtung zum transport eines substrats sowie behandlungsanlage |
JP6475877B2 (ja) * | 2018-02-14 | 2019-02-27 | 株式会社日立ハイテクノロジーズ | 真空処理装置 |
CN111863655B (zh) * | 2019-04-26 | 2024-04-12 | 北京北方华创微电子装备有限公司 | 开盖机构及半导体加工设备 |
JP7365822B2 (ja) * | 2019-08-22 | 2023-10-20 | 東京エレクトロン株式会社 | 基板処理システム |
KR102371550B1 (ko) * | 2020-08-31 | 2022-03-07 | 주식회사 엔이아이디 | 반도체 제조를 지원하는 제어 시스템을 조립하는 방법 및 시스템 |
JP7482746B2 (ja) | 2020-10-19 | 2024-05-14 | 東京エレクトロン株式会社 | 基板処理装置、基板処理システム、及びメンテナンス方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08225152A (ja) * | 1995-02-23 | 1996-09-03 | Sekisui Chem Co Ltd | 面材搬送・取付装置 |
KR20050045360A (ko) * | 2003-11-11 | 2005-05-17 | 주식회사 디엠에스 | 기판의 진공처리장치 |
KR20050113574A (ko) * | 2003-05-08 | 2005-12-02 | 가부시키가이샤 아루박 | 진공처리장치용 진공챔버 |
-
2005
- 2005-12-14 JP JP2005360934A patent/JP4355314B2/ja not_active Expired - Fee Related
-
2006
- 2006-10-25 CN CNB2006101375503A patent/CN100474506C/zh not_active Expired - Fee Related
- 2006-12-13 KR KR1020060127316A patent/KR100854803B1/ko active IP Right Grant
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08225152A (ja) * | 1995-02-23 | 1996-09-03 | Sekisui Chem Co Ltd | 面材搬送・取付装置 |
KR20050113574A (ko) * | 2003-05-08 | 2005-12-02 | 가부시키가이샤 아루박 | 진공처리장치용 진공챔버 |
KR20050045360A (ko) * | 2003-11-11 | 2005-05-17 | 주식회사 디엠에스 | 기판의 진공처리장치 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101016044B1 (ko) * | 2010-07-01 | 2011-02-23 | 강우성 | 반도체 장비의 리드를 위한 자동 유지보수장치 |
KR20160035377A (ko) * | 2014-09-23 | 2016-03-31 | 주식회사 선익시스템 | 챔버장비 유지보수 시스템 |
KR102328325B1 (ko) * | 2014-09-23 | 2021-11-18 | (주)선익시스템 | 챔버장비 유지보수 시스템 |
Also Published As
Publication number | Publication date |
---|---|
CN100474506C (zh) | 2009-04-01 |
JP2007165659A (ja) | 2007-06-28 |
KR20070063450A (ko) | 2007-06-19 |
CN1983515A (zh) | 2007-06-20 |
JP4355314B2 (ja) | 2009-10-28 |
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