KR100818226B1 - 감광성 조성물 및 블랙 매트릭스 - Google Patents

감광성 조성물 및 블랙 매트릭스 Download PDF

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Publication number
KR100818226B1
KR100818226B1 KR1020060054816A KR20060054816A KR100818226B1 KR 100818226 B1 KR100818226 B1 KR 100818226B1 KR 1020060054816 A KR1020060054816 A KR 1020060054816A KR 20060054816 A KR20060054816 A KR 20060054816A KR 100818226 B1 KR100818226 B1 KR 100818226B1
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KR
South Korea
Prior art keywords
group
photosensitive composition
formula
compound
black
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KR1020060054816A
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English (en)
Korean (ko)
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KR20060134809A (ko
Inventor
마사루 시다
미츠루 곤도
기요시 우치카와
Original Assignee
도쿄 오카 고교 가부시키가이샤
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Publication of KR20060134809A publication Critical patent/KR20060134809A/ko
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Publication of KR100818226B1 publication Critical patent/KR100818226B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
KR1020060054816A 2005-06-22 2006-06-19 감광성 조성물 및 블랙 매트릭스 KR100818226B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JPJP-P-2005-00181616 2005-06-22
JP2005181616 2005-06-22
JPJP-P-2005-00205187 2005-07-14
JP2005205187A JP4627227B2 (ja) 2005-06-22 2005-07-14 感光性組成物およびブラックマトリクス

Publications (2)

Publication Number Publication Date
KR20060134809A KR20060134809A (ko) 2006-12-28
KR100818226B1 true KR100818226B1 (ko) 2008-04-01

Family

ID=37792870

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020060054816A KR100818226B1 (ko) 2005-06-22 2006-06-19 감광성 조성물 및 블랙 매트릭스

Country Status (4)

Country Link
JP (1) JP4627227B2 (ja)
KR (1) KR100818226B1 (ja)
CN (1) CN1928713B (ja)
TW (1) TWI304154B (ja)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008059670A1 (fr) * 2006-11-15 2008-05-22 Taiyo Ink Mfg. Co., Ltd. Composition de résine photodurcissable/thermodurcissable, object durci et plaque de câblage imprimée
WO2008059935A1 (fr) * 2006-11-15 2008-05-22 Taiyo Ink Mfg. Co., Ltd. Composition de résine photodurcissable/thermodurcissable, produit durci et planche de câblage imprimé
JP5003200B2 (ja) * 2007-02-26 2012-08-15 Ｊｓｒ株式会社 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子
CN101675388B (zh) * 2007-05-11 2012-07-18 日立化成工业株式会社 光敏性树脂组合物、光敏性元件、抗蚀剂图案的形成方法及印刷电路板的制造方法
WO2008140017A1 (ja) * 2007-05-11 2008-11-20 Hitachi Chemical Company, Ltd. 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
JP5045747B2 (ja) * 2007-05-29 2012-10-10 旭硝子株式会社 感光性組成物、隔壁、ブラックマトリックス
JP5274132B2 (ja) * 2007-07-17 2013-08-28 富士フイルム株式会社 硬化性組成物、カラーフィルタ用硬化性組成物、パターン形成方法、カラーフィルタ、及びその製造方法
JP2009237294A (ja) * 2008-03-27 2009-10-15 The Inctec Inc ブラックマトリクス形成用感光性樹脂組成物
JP5192876B2 (ja) * 2008-03-28 2013-05-08 富士フイルム株式会社 感光性樹脂組成物、遮光性カラーフィルター及びその製造方法、並びに、固体撮像素子
JP5173528B2 (ja) * 2008-03-28 2013-04-03 富士フイルム株式会社 感光性樹脂組成物、遮光性カラーフィルター及びその製造方法、並びに、固体撮像素子
JP5189395B2 (ja) * 2008-03-31 2013-04-24 富士フイルム株式会社 感光性樹脂組成物、遮光性カラーフィルター及びその製造方法、並びに、固体撮像素子
JP5528677B2 (ja) 2008-03-31 2014-06-25 富士フイルム株式会社 重合性組成物、固体撮像素子用遮光性カラーフィルタ、固体撮像素子および固体撮像素子用遮光性カラーフィルタの製造方法
JP5268415B2 (ja) * 2008-04-28 2013-08-21 富士フイルム株式会社 重合性組成物及びそれを用いた固体撮像素子用遮光性カラーフィルタ並びに固体撮像素子
JP5546801B2 (ja) * 2008-06-10 2014-07-09 富士フイルム株式会社 紫外光レーザー露光用感光性樹脂組成物、パターン形成方法、その方法を用いて製造したカラーフィルタ、カラーフィルタの製造方法および液晶表示装置
JP5340198B2 (ja) * 2009-02-26 2013-11-13 富士フイルム株式会社 分散組成物
US8663880B2 (en) * 2009-04-16 2014-03-04 Fujifilm Corporation Polymerizable composition for color filter, color filter, and solid-state imaging device
TWI519899B (zh) * 2009-07-07 2016-02-01 富士軟片股份有限公司 遮光薄膜用著色組成物、遮光圖案、其形成方法、固態影像感應裝置及其製造方法
KR101068622B1 (ko) * 2009-12-22 2011-09-28 주식회사 엘지화학 기판접착력이 향상된 고차광성 블랙매트릭스 조성물
CN102436142B (zh) 2010-09-29 2013-11-06 第一毛织株式会社 黑色光敏树脂组合物以及使用其的光阻层
JP6375236B2 (ja) * 2014-02-04 2018-08-15 新日鉄住金化学株式会社 遮光膜用感光性組成物、及びその硬化物

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62201859A (ja) 1986-02-28 1987-09-05 Asahi Chem Ind Co Ltd 新規なオキシムエステル化合物及びその合成法
JPS62286961A (ja) 1986-06-05 1987-12-12 Asahi Chem Ind Co Ltd 新規なオキシムエステル化合物及びその製造方法
KR20010082580A (ko) * 1999-12-15 2001-08-30 에프. 아. 프라저, 에른스트 알테르 (에. 알테르), 한스 페터 비틀린 (하. 페. 비틀린), 피. 랍 보프, 브이. 스펜글러, 페. 아에글러 옥심 에스테르 광개시제
KR20040007700A (ko) * 2001-06-11 2004-01-24 시바 스페셜티 케미칼스 홀딩 인크. 결합된 구조를 가지는 옥심 에스테르 광개시제

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004240241A (ja) * 2003-02-07 2004-08-26 Jsr Corp 感光性樹脂組成物、表示パネル用スペーサーおよび表示パネル
JP4442292B2 (ja) * 2003-06-10 2010-03-31 三菱化学株式会社 光重合性組成物、カラーフィルター及び液晶表示装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62201859A (ja) 1986-02-28 1987-09-05 Asahi Chem Ind Co Ltd 新規なオキシムエステル化合物及びその合成法
JPS62286961A (ja) 1986-06-05 1987-12-12 Asahi Chem Ind Co Ltd 新規なオキシムエステル化合物及びその製造方法
KR20010082580A (ko) * 1999-12-15 2001-08-30 에프. 아. 프라저, 에른스트 알테르 (에. 알테르), 한스 페터 비틀린 (하. 페. 비틀린), 피. 랍 보프, 브이. 스펜글러, 페. 아에글러 옥심 에스테르 광개시제
KR20040007700A (ko) * 2001-06-11 2004-01-24 시바 스페셜티 케미칼스 홀딩 인크. 결합된 구조를 가지는 옥심 에스테르 광개시제

Also Published As

Publication number Publication date
TWI304154B (en) 2008-12-11
KR20060134809A (ko) 2006-12-28
CN1928713A (zh) 2007-03-14
TW200700903A (en) 2007-01-01
JP2007033467A (ja) 2007-02-08
JP4627227B2 (ja) 2011-02-09
CN1928713B (zh) 2010-12-29

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