KR100778945B1 - 증발 장치 - Google Patents
증발 장치 Download PDFInfo
- Publication number
- KR100778945B1 KR100778945B1 KR1020060052770A KR20060052770A KR100778945B1 KR 100778945 B1 KR100778945 B1 KR 100778945B1 KR 1020060052770 A KR1020060052770 A KR 1020060052770A KR 20060052770 A KR20060052770 A KR 20060052770A KR 100778945 B1 KR100778945 B1 KR 100778945B1
- Authority
- KR
- South Korea
- Prior art keywords
- evaporator tube
- heating
- evaporator
- heating system
- tube
- Prior art date
Links
- 238000010438 heat treatment Methods 0.000 claims abstract description 52
- 238000001704 evaporation Methods 0.000 claims abstract description 15
- 230000008020 evaporation Effects 0.000 claims abstract description 15
- 239000000463 material Substances 0.000 claims abstract description 10
- 239000011248 coating agent Substances 0.000 claims abstract description 8
- 238000000576 coating method Methods 0.000 claims abstract description 8
- 239000000758 substrate Substances 0.000 claims abstract description 7
- 238000000034 method Methods 0.000 claims 4
- 229910052782 aluminium Inorganic materials 0.000 abstract description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 2
- 238000009413 insulation Methods 0.000 description 8
- 238000001816 cooling Methods 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 125000006850 spacer group Chemical group 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005485 electric heating Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- WYTGDNHDOZPMIW-RCBQFDQVSA-N alstonine Natural products C1=CC2=C3C=CC=CC3=NC2=C2N1C[C@H]1[C@H](C)OC=C(C(=O)OC)[C@H]1C2 WYTGDNHDOZPMIW-RCBQFDQVSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000012809 cooling fluid Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 150000003481 tantalum Chemical class 0.000 description 1
- 238000001947 vapour-phase growth Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/484—Insulated gate field-effect transistors [IGFETs] characterised by the channel regions
- H10K10/486—Insulated gate field-effect transistors [IGFETs] characterised by the channel regions the channel region comprising two or more active layers, e.g. forming pn heterojunctions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
Claims (11)
- 일렬로 배열된 분배기(30-33) 및 가열 시스템을 구비한 증발기(19,90)를 포함하고, 기화될 물질의 표면이 제1 평면에 뻗어있는 기판을 코팅하기 위한 증발 장치에 있어서,상기 일렬로 배열된 분배기(30-33)는 상기 제1 평면에 수직인 제2 평면에 위치하고 상기 가열 시스템은 상기 증발기(19,90) 내벽에 제공되는 것을 특징으로 하는 증발 장치.
- 제1항에 있어서,상기 가열 시스템은 전기 저항 가열 시스템인 것을 특징으로 하는 증발 장치.
- 삭제
- 삭제
- 제1항에 있어서,상기 가열 시스템(35,36)은 일렬로 배열된 분배기 개구(30-33) 옆에 일직선으로 배치되는 것을 특징으로 하는 증발 장치.
- 삭제
- 삭제
- 제1항에 있어서,상기 증발기(19,90)는 관형(tubular)인 것을 특징으로 하는 증발 장치.
- 제1항에 있어서,상기 가열 시스템은 꼬불꼬불한 형태의 가열 요소(35,36)를 포함하는 것을 특징으로 하는 증발 장치.
- 삭제
- 삭제
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP05016364 | 2005-07-28 | ||
EP05016364A EP1752555A1 (de) | 2005-07-28 | 2005-07-28 | Verdampfervorrichtung |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20070014960A KR20070014960A (ko) | 2007-02-01 |
KR100778945B1 true KR100778945B1 (ko) | 2007-11-22 |
Family
ID=35427460
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020060052770A KR100778945B1 (ko) | 2005-07-28 | 2006-06-12 | 증발 장치 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20070022956A1 (ko) |
EP (1) | EP1752555A1 (ko) |
JP (1) | JP4711882B2 (ko) |
KR (1) | KR100778945B1 (ko) |
CN (1) | CN1904129A (ko) |
TW (1) | TWI295694B (ko) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8986455B2 (en) * | 2007-10-12 | 2015-03-24 | Jln Solar, Inc. | Thermal evaporation sources for wide-area deposition |
JP5512660B2 (ja) * | 2008-05-30 | 2014-06-04 | アプライド マテリアルズ インコーポレイテッド | 基板をコーティングするための装置 |
EP2379768A4 (en) * | 2008-12-18 | 2013-11-13 | Veeco Instr Inc | VACUUM SEPARATION SOURCES WITH HEATED EXHAUST OPENINGS |
KR101172275B1 (ko) * | 2009-12-31 | 2012-08-08 | 에스엔유 프리시젼 주식회사 | 기화 장치 및 이의 제어 방법 |
FR2956411B1 (fr) * | 2010-02-16 | 2012-04-06 | Astron Fiamm Safety | Systeme de chauffage d'une source de depot en phase vapeur |
KR101265067B1 (ko) * | 2010-06-10 | 2013-05-16 | 한국과학기술연구원 | 측면 방출형 선형증발원, 그 제작 방법 및 선형증발기 |
FR2981667B1 (fr) * | 2011-10-21 | 2014-07-04 | Riber | Systeme d'injection pour dispositif de depot de couches minces par evaporation sous vide |
US20130105483A1 (en) * | 2011-10-28 | 2013-05-02 | Applied Materials, Inc. | Apparatus for sublimating solid state precursors |
KR20140025795A (ko) * | 2012-08-22 | 2014-03-05 | 에스엔유 프리시젼 주식회사 | 선택적 선형 증발 장치 |
US20150024538A1 (en) * | 2013-07-19 | 2015-01-22 | Tsmc Solar Ltd. | Vapor dispensing apparatus and method for solar panel |
WO2015139777A1 (en) * | 2014-03-21 | 2015-09-24 | Applied Materials, Inc. | Evaporation source for organic material |
JP6205028B1 (ja) * | 2016-07-22 | 2017-09-27 | マシン・テクノロジー株式会社 | 蒸発装置およびそれに用いる固定具 |
CN106637091B (zh) * | 2017-02-24 | 2019-08-30 | 旭科新能源股份有限公司 | 用于薄膜太阳能电池制造的高温蒸发炉 |
CN107299322A (zh) * | 2017-08-07 | 2017-10-27 | 旭科新能源股份有限公司 | 一种立式低温蒸发束源炉 |
CN117660927A (zh) * | 2022-08-29 | 2024-03-08 | 中微半导体设备(上海)股份有限公司 | 一种温度控制部件及cvd反应装置 |
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JP2003007464A (ja) | 2001-04-26 | 2003-01-10 | Eastman Kodak Co | 有機層蒸着装置 |
JP2003253430A (ja) | 2002-03-01 | 2003-09-10 | Ulvac Japan Ltd | 蒸発容器とその蒸発容器を有する成膜装置 |
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JP2004183100A (ja) | 2002-11-30 | 2004-07-02 | Applied Films Gmbh & Co Kg | 蒸着装置 |
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-
2005
- 2005-07-28 EP EP05016364A patent/EP1752555A1/de not_active Ceased
-
2006
- 2006-03-17 US US11/384,174 patent/US20070022956A1/en not_active Abandoned
- 2006-03-30 TW TW095111161A patent/TWI295694B/zh not_active IP Right Cessation
- 2006-04-19 CN CNA2006100666855A patent/CN1904129A/zh active Pending
- 2006-05-15 JP JP2006134634A patent/JP4711882B2/ja active Active
- 2006-06-12 KR KR1020060052770A patent/KR100778945B1/ko active IP Right Grant
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2003007464A (ja) | 2001-04-26 | 2003-01-10 | Eastman Kodak Co | 有機層蒸着装置 |
JP2003253430A (ja) | 2002-03-01 | 2003-09-10 | Ulvac Japan Ltd | 蒸発容器とその蒸発容器を有する成膜装置 |
KR20040007812A (ko) * | 2002-07-11 | 2004-01-28 | 삼성에스디아이 주식회사 | 증착장치 및 증착방법 |
JP2004183100A (ja) | 2002-11-30 | 2004-07-02 | Applied Films Gmbh & Co Kg | 蒸着装置 |
Also Published As
Publication number | Publication date |
---|---|
TW200704796A (en) | 2007-02-01 |
EP1752555A1 (de) | 2007-02-14 |
CN1904129A (zh) | 2007-01-31 |
KR20070014960A (ko) | 2007-02-01 |
JP4711882B2 (ja) | 2011-06-29 |
TWI295694B (en) | 2008-04-11 |
JP2007031829A (ja) | 2007-02-08 |
US20070022956A1 (en) | 2007-02-01 |
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