JP4681498B2 - 蒸着装置 - Google Patents
蒸着装置 Download PDFInfo
- Publication number
- JP4681498B2 JP4681498B2 JP2006134633A JP2006134633A JP4681498B2 JP 4681498 B2 JP4681498 B2 JP 4681498B2 JP 2006134633 A JP2006134633 A JP 2006134633A JP 2006134633 A JP2006134633 A JP 2006134633A JP 4681498 B2 JP4681498 B2 JP 4681498B2
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- JP
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- Prior art keywords
- vapor deposition
- evaporator
- evaporator chamber
- nozzle bar
- nozzle
- Prior art date
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- 238000007740 vapor deposition Methods 0.000 title claims abstract description 28
- 239000000758 substrate Substances 0.000 claims abstract description 23
- 238000000151 deposition Methods 0.000 claims description 9
- 238000001816 cooling Methods 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 8
- 230000005484 gravity Effects 0.000 claims description 7
- 230000008021 deposition Effects 0.000 claims description 5
- 230000008020 evaporation Effects 0.000 claims description 4
- 238000001704 evaporation Methods 0.000 claims description 4
- 239000000463 material Substances 0.000 abstract description 8
- 238000000034 method Methods 0.000 abstract description 3
- 239000006200 vaporizer Substances 0.000 abstract 2
- 239000002184 metal Substances 0.000 description 8
- 238000009413 insulation Methods 0.000 description 6
- 239000011521 glass Substances 0.000 description 4
- 239000011810 insulating material Substances 0.000 description 4
- 230000008016 vaporization Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000011364 vaporized material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
Description
2 上部
3 下部
4,5 上部および下部接続クランプ
6 ボルト
7 頂面
8 入口チューブ
9,10 上部2の頂面上に位置する冷却手段ポート
11,12 下部3上に位置する冷却手段ポート
13 基板
14 矢印
15 ギャップ
17 蒸発器チューブ
18,50 ノズル棒
19,20 前縁部
21,32,33 ウェブ
22,51〜55 開口部
26 断熱層
27,28 側部
29 管状遮蔽
30,31 壁部
35 るつぼ
36 フレア
37 テーパ状部分
40 加熱システム
41 遮蔽
56〜60 円錐
Claims (12)
- 蒸着対象の基板の表面が地球の重力方向に対し垂直に向いている基板を蒸着するための装置であって、
蒸発器源(35)と前記蒸発器源(35)の上に位置していて、その縦軸が地球の重力の方向に平行に延びる蒸発器室(17)を備え、
前記蒸発器室(17)が、数個の直線状に配置されている出口開口部(22)を備えるノズル棒(18)を含み、前記ノズル棒(18)にある前記出口開口部(22)の方向は、地球の重力方向に対して垂直に向いており、前記ノズル棒(18)上にある前記出口開放部(22)の位置が、前記蒸発器室(17)の壁よりも外側に突出した位置に配置されており、
前記蒸発器室(17)が断熱層(26)により囲まれ、前記断熱層(26)は蒸発器室(17)の壁から突出したノズル棒(18)まで延びている
ことを特徴とする蒸着装置。 - 蒸発器室(17)が、円筒状のチューブとして形成されることを特徴とする請求項1に記載の蒸着装置。
- 蒸発器室(17)が、断面が矩形状のチューブとして形成されることを特徴とする請求項1に記載の蒸着装置。
- ノズル棒(18)が、2つの側面(27、28)とそれを結ぶウェブ(21)とでU字形をし、ノズル棒(18)の前記側面(27、28)の一方の端部が、蒸発器室(17)に接続し、他方の端部がウェブ(21)に接続していることを特徴とする請求項1に記載の蒸着装置。
- ノズル棒(18)が、それ自身に加熱システム(61、62)を備えることを特徴とする特徴とする請求項1に記載の蒸着装置。
- 加熱システムが、抵抗線による加熱システムであることを特徴とする特徴とする請求項5に記載の蒸着装置。
- 断熱層(26)が、遮蔽(29)により囲まれていることを特徴とする請求項1に記載の蒸着装置。
- 遮蔽(29)は、冷却手段を通すチャンネルを含む、2重壁部を有するジャケット(30、31)により囲まれていることを特徴とする請求項7に記載の蒸着装置。
- ノズル棒(18)が、蒸発器室(17)の熱伝導性と少なくとも同じ熱伝導性を有することを特徴とする請求項1に記載の蒸着装置。
- ノズル棒(18)が、数個の、先細になったテーパ状の円錐体(56〜60)を備え、前記円錐体は、前記ノズル棒に直線状に配置され、その端部に開口部(51〜55)を有することを特徴とする請求項1に記載の蒸着装置。
- 円錐体(56〜60)が、断熱層(26)内に埋め込まれていることを特徴とする請求項10に記載の蒸着装置。
- 蒸発器源(35)及び前記蒸発器源(35)に近接して配置されている蒸発器室(17)を備えている基板を蒸着するための蒸着装置であって、
前記蒸発器室(17)が数個の出口開口部(22)を有するノズル棒(18)を備え、
ノズル棒(18)の、前記出口開口部(22)の位置する部分が、前記蒸発器室(17)の壁よりも外側に突出した位置に配置され、さらに、前記蒸発器室の外壁周囲全体にわたり、その出口開口部を除いて、ノズル棒まで延びている断熱層が備えられていることを特徴とする蒸着装置。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP05016365A EP1752554B1 (de) | 2005-07-28 | 2005-07-28 | Bedampfervorrichtung |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007031828A JP2007031828A (ja) | 2007-02-08 |
JP4681498B2 true JP4681498B2 (ja) | 2011-05-11 |
Family
ID=35427677
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006134633A Active JP4681498B2 (ja) | 2005-07-28 | 2006-05-15 | 蒸着装置 |
Country Status (9)
Country | Link |
---|---|
US (1) | US20070022955A1 (ja) |
EP (1) | EP1752554B1 (ja) |
JP (1) | JP4681498B2 (ja) |
KR (1) | KR100712311B1 (ja) |
CN (1) | CN1904130A (ja) |
AT (1) | ATE376078T1 (ja) |
DE (1) | DE502005001749D1 (ja) |
PL (1) | PL1752554T3 (ja) |
TW (1) | TWI314587B (ja) |
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Citations (4)
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JP2003502494A (ja) * | 1998-11-12 | 2003-01-21 | フレックス プロダクツ インコーポレイテッド | 直線開口蒸着装置および被覆方法 |
JP2004183100A (ja) * | 2002-11-30 | 2004-07-02 | Applied Films Gmbh & Co Kg | 蒸着装置 |
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JPH0762239B2 (ja) | 1990-09-28 | 1995-07-05 | 三菱重工業株式会社 | 真空蒸着装置 |
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JPH1088325A (ja) | 1996-09-09 | 1998-04-07 | Nissin Electric Co Ltd | 薄膜形成装置 |
US6572700B2 (en) * | 1997-12-26 | 2003-06-03 | Sumitomo Electric Industries, Ltd. | Semiconductor crystal, and method and apparatus of production thereof |
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KR100647578B1 (ko) * | 2002-07-11 | 2006-11-17 | 삼성에스디아이 주식회사 | 증착장치 및 증착방법 |
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KR100659762B1 (ko) * | 2005-01-17 | 2006-12-19 | 삼성에스디아이 주식회사 | 증발원, 증착장치 및 이를 이용한 증착방법 |
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- 2005-07-28 DE DE502005001749T patent/DE502005001749D1/de active Active
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- 2006-03-30 TW TW095111160A patent/TWI314587B/zh active
- 2006-04-19 CN CNA200610066686XA patent/CN1904130A/zh active Pending
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JP2003502494A (ja) * | 1998-11-12 | 2003-01-21 | フレックス プロダクツ インコーポレイテッド | 直線開口蒸着装置および被覆方法 |
JP2004183100A (ja) * | 2002-11-30 | 2004-07-02 | Applied Films Gmbh & Co Kg | 蒸着装置 |
JP2004214185A (ja) * | 2002-12-19 | 2004-07-29 | Sony Corp | 蒸着装置および有機エレクトロルミネッセンス素子の製造方法 |
JP2005002450A (ja) * | 2003-06-13 | 2005-01-06 | Pioneer Electronic Corp | 蒸着方法、蒸着ヘッド、及び有機エレクトロルミネッセンス表示パネルの製造装置 |
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KR20070014959A (ko) | 2007-02-01 |
JP2007031828A (ja) | 2007-02-08 |
DE502005001749D1 (de) | 2007-11-29 |
ATE376078T1 (de) | 2007-11-15 |
KR100712311B1 (ko) | 2007-04-27 |
EP1752554B1 (de) | 2007-10-17 |
TWI314587B (en) | 2009-09-11 |
PL1752554T3 (pl) | 2008-03-31 |
EP1752554A1 (de) | 2007-02-14 |
US20070022955A1 (en) | 2007-02-01 |
TW200704812A (en) | 2007-02-01 |
CN1904130A (zh) | 2007-01-31 |
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