JP2007031828A - 蒸着装置 - Google Patents
蒸着装置 Download PDFInfo
- Publication number
- JP2007031828A JP2007031828A JP2006134633A JP2006134633A JP2007031828A JP 2007031828 A JP2007031828 A JP 2007031828A JP 2006134633 A JP2006134633 A JP 2006134633A JP 2006134633 A JP2006134633 A JP 2006134633A JP 2007031828 A JP2007031828 A JP 2007031828A
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- JP
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- Prior art keywords
- vapor deposition
- evaporator
- deposition apparatus
- evaporator chamber
- nozzle rod
- Prior art date
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- 238000007740 vapor deposition Methods 0.000 title claims abstract description 27
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 238000000151 deposition Methods 0.000 claims description 9
- 238000001816 cooling Methods 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 8
- 230000005484 gravity Effects 0.000 claims description 7
- 230000008021 deposition Effects 0.000 claims description 5
- 239000011810 insulating material Substances 0.000 claims description 5
- 230000008020 evaporation Effects 0.000 claims description 4
- 238000001704 evaporation Methods 0.000 claims description 4
- 239000000126 substance Substances 0.000 abstract description 4
- 239000002184 metal Substances 0.000 description 8
- 238000009413 insulation Methods 0.000 description 6
- 239000011521 glass Substances 0.000 description 4
- 230000008016 vaporization Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000011364 vaporized material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
Abstract
【解決手段】本発明は、基板、特に、例えばOLEDEのような感熱物質を含む基板を蒸着するための蒸着装置に関する。これらの基板から熱を遠ざけておくために、蒸着装置は、特殊なノズル棒を有する蒸発器チューブを含む。数個の直線状に配置されている開口部を有するこのノズル棒は、コーティング対象の基板の方向に蒸発器チューブに対して突き出ている。
【選択図】図1
Description
2 上部
3 下部
4,5 上部および下部接続クランプ
6 ボルト
7 頂面
8 入口チューブ
9,10 上部2の頂面上に位置する冷却手段ポート
11,12 下部3上に位置する冷却手段ポート
13 基板
14 矢印
15 ギャップ
17 蒸発器チューブ
18,50 ノズル棒
19,20 前縁部
21,32,33 ウェブ
22,51〜55 開口部
26 断熱層
27,28 側部
29 管状遮蔽
30,31 壁部
35 るつぼ
36 フレア
37 テーパ状部分
40 加熱システム
41 遮蔽
56〜60 円錐
Claims (13)
- 蒸着対象の材料の表面が地球の重力の方向にほぼ垂直に延びる蒸発器源(35)と、前記蒸発器源(35)の上に位置していて、その縦軸が地球の重力の方向に平行に延びる蒸発器室(17)とを備える基板を蒸着するための蒸着装置であって、前記蒸発器室(17)が、数個の直線状に配置されている出口開口部を備えるノズル棒(18)を含み、前記ノズル棒(18)内の前記出口開口部が、地球の重力の方向に垂直に延び、前記出口開口部(22)が位置する前記ノズル棒の領域が、前記蒸発器室(17)の前方に位置することを特徴とする蒸着装置。
- 前記蒸発器室(17)が、円筒状のチューブとして形成されることを特徴とする請求項1に記載の蒸着装置。
- 前記蒸発器室が、矩形チューブとして形成されることを特徴とする請求項1に記載の蒸着装置。
- 前記蒸発器室(17)が、前方に位置する前記ノズル棒(18)まで延びている断熱層(26)により囲まれていることを特徴とする請求項1に記載の蒸着装置。
- 前記ノズル棒(18)が、U字形をし、前記ノズル棒(18)の側面(27,28)の一方の端部が、前記蒸発器チューブ(17)に接続し、他方の端部がウェブ(21)に接続していることを特徴とする請求項1に記載の蒸着装置。
- 前記ノズル棒(18)が、それ自身の加熱システム(61,62)を備えることを特徴とする請求項1に記載の蒸着装置。
- 前記加熱システムが、抵抗加熱システムであることを特徴とする請求項6に記載の蒸着装置。
- 前記断熱層(26)が、遮蔽(29)により囲まれていることを特徴とする請求項4に記載の蒸着装置。
- 前記遮蔽(29)が、冷却手段チャネルを含む二重壁部を有するジャケット(30,31)により囲まれていることを特徴とする請求項8に記載の蒸着装置。
- 前方に位置する前記ノズル棒(18)が、前記蒸発器チューブ(17)の熱伝導性と少なくとも同じ熱伝導性を有することを特徴とする請求項1に記載の蒸着装置。
- 前記ノズル棒(50)が、直線状に配置され、その端部のところに開口部(51〜55)を有する数個の外側にテーパ状になっている円錐(56〜60)を有することを特徴とする請求項1に記載の蒸着装置。
- 前記円錐(56〜60)が、断熱材(26)内に埋め込まれることを特徴とする請求項11に記載の蒸着装置。
- 蒸発器源(35)および前記蒸発器室(17)の少なくとも近くに配置されている蒸発器室(17)を備えている基板を蒸着するための蒸着装置であって、この蒸発器室(17)が数個の出口開口部(22)を有するノズル棒(18)を備え、前記出口開口部(22)が位置する前記ノズル棒(18)の領域が、前記蒸発器室(17)の前方に位置していることと、その周囲上の前記蒸発器室(17)が、前記出口開口部(22)をカバーしないで、前記ノズル棒(18)まで延びる断熱層(26)を備えることとを特徴とする蒸着装置。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP05016365A EP1752554B1 (de) | 2005-07-28 | 2005-07-28 | Bedampfervorrichtung |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007031828A true JP2007031828A (ja) | 2007-02-08 |
JP4681498B2 JP4681498B2 (ja) | 2011-05-11 |
Family
ID=35427677
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006134633A Active JP4681498B2 (ja) | 2005-07-28 | 2006-05-15 | 蒸着装置 |
Country Status (9)
Country | Link |
---|---|
US (1) | US20070022955A1 (ja) |
EP (1) | EP1752554B1 (ja) |
JP (1) | JP4681498B2 (ja) |
KR (1) | KR100712311B1 (ja) |
CN (1) | CN1904130A (ja) |
AT (1) | ATE376078T1 (ja) |
DE (1) | DE502005001749D1 (ja) |
PL (1) | PL1752554T3 (ja) |
TW (1) | TWI314587B (ja) |
Cited By (6)
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JP2011060865A (ja) * | 2009-09-07 | 2011-03-24 | Optorun Co Ltd | リニア蒸着源とその使用方法、成膜装置並びに成膜方法 |
JP2012026009A (ja) * | 2010-07-26 | 2012-02-09 | Ulvac Japan Ltd | 薄膜形成装置 |
JP2013519787A (ja) * | 2010-02-16 | 2013-05-30 | アストロン フィアム セーフティー | 気相蒸着供給源のための加熱システム |
JP2018513910A (ja) * | 2015-07-13 | 2018-05-31 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 蒸発源 |
KR20190079472A (ko) * | 2017-12-27 | 2019-07-05 | 캐논 톡키 가부시키가이샤 | 증발원 및 증착 장치 |
JP2020002388A (ja) * | 2018-06-25 | 2020-01-09 | 株式会社アルバック | 真空蒸着装置用の蒸着源 |
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KR20200040537A (ko) * | 2018-10-10 | 2020-04-20 | 엘지디스플레이 주식회사 | 측향식 진공증착용 소스, 소스 어셈블리 및 이를 이용한 측향식 진공증착 장치 |
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Also Published As
Publication number | Publication date |
---|---|
TW200704812A (en) | 2007-02-01 |
KR20070014959A (ko) | 2007-02-01 |
EP1752554B1 (de) | 2007-10-17 |
ATE376078T1 (de) | 2007-11-15 |
JP4681498B2 (ja) | 2011-05-11 |
CN1904130A (zh) | 2007-01-31 |
TWI314587B (en) | 2009-09-11 |
DE502005001749D1 (de) | 2007-11-29 |
PL1752554T3 (pl) | 2008-03-31 |
EP1752554A1 (de) | 2007-02-14 |
US20070022955A1 (en) | 2007-02-01 |
KR100712311B1 (ko) | 2007-04-27 |
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