FR2956411B1 - Systeme de chauffage d'une source de depot en phase vapeur - Google Patents

Systeme de chauffage d'une source de depot en phase vapeur

Info

Publication number
FR2956411B1
FR2956411B1 FR1051098A FR1051098A FR2956411B1 FR 2956411 B1 FR2956411 B1 FR 2956411B1 FR 1051098 A FR1051098 A FR 1051098A FR 1051098 A FR1051098 A FR 1051098A FR 2956411 B1 FR2956411 B1 FR 2956411B1
Authority
FR
France
Prior art keywords
heating
vapor phase
deposition source
phase deposition
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR1051098A
Other languages
English (en)
Other versions
FR2956411A1 (fr
Inventor
Bruno Dussert-Vidalet
Cedric Guerard
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Astron Fiamm Safety SARL
Original Assignee
Astron Fiamm Safety SARL
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR1051098A priority Critical patent/FR2956411B1/fr
Application filed by Astron Fiamm Safety SARL filed Critical Astron Fiamm Safety SARL
Priority to EP11703008.0A priority patent/EP2536868B1/fr
Priority to IN6283DEN2012 priority patent/IN2012DN06283A/en
Priority to JP2012552425A priority patent/JP5766720B2/ja
Priority to PCT/EP2011/052172 priority patent/WO2011101325A1/fr
Priority to CA2786249A priority patent/CA2786249A1/fr
Priority to US13/574,675 priority patent/US20120285381A1/en
Priority to CN201180009700.1A priority patent/CN102762766B/zh
Publication of FR2956411A1 publication Critical patent/FR2956411A1/fr
Application granted granted Critical
Publication of FR2956411B1 publication Critical patent/FR2956411B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/4557—Heated nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45578—Elongated nozzles, tubes with holes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45587—Mechanical means for changing the gas flow

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
FR1051098A 2010-02-16 2010-02-16 Systeme de chauffage d'une source de depot en phase vapeur Expired - Fee Related FR2956411B1 (fr)

Priority Applications (8)

Application Number Priority Date Filing Date Title
FR1051098A FR2956411B1 (fr) 2010-02-16 2010-02-16 Systeme de chauffage d'une source de depot en phase vapeur
IN6283DEN2012 IN2012DN06283A (fr) 2010-02-16 2011-02-15
JP2012552425A JP5766720B2 (ja) 2010-02-16 2011-02-15 気相蒸着供給源のための加熱システム
PCT/EP2011/052172 WO2011101325A1 (fr) 2010-02-16 2011-02-15 Système de chauffage pour une source de dépôt en phase vapeur
EP11703008.0A EP2536868B1 (fr) 2010-02-16 2011-02-15 Système de chauffage pour une source de dépôt en phase vapeur
CA2786249A CA2786249A1 (fr) 2010-02-16 2011-02-15 Systeme de chauffage pour une source de depot en phase vapeur
US13/574,675 US20120285381A1 (en) 2010-02-16 2011-02-15 Heating system for a vapor-phase deposition source
CN201180009700.1A CN102762766B (zh) 2010-02-16 2011-02-15 用于汽相淀积源的加热系统

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1051098A FR2956411B1 (fr) 2010-02-16 2010-02-16 Systeme de chauffage d'une source de depot en phase vapeur

Publications (2)

Publication Number Publication Date
FR2956411A1 FR2956411A1 (fr) 2011-08-19
FR2956411B1 true FR2956411B1 (fr) 2012-04-06

Family

ID=42272607

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1051098A Expired - Fee Related FR2956411B1 (fr) 2010-02-16 2010-02-16 Systeme de chauffage d'une source de depot en phase vapeur

Country Status (8)

Country Link
US (1) US20120285381A1 (fr)
EP (1) EP2536868B1 (fr)
JP (1) JP5766720B2 (fr)
CN (1) CN102762766B (fr)
CA (1) CA2786249A1 (fr)
FR (1) FR2956411B1 (fr)
IN (1) IN2012DN06283A (fr)
WO (1) WO2011101325A1 (fr)

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KR20150055062A (ko) * 2012-10-17 2015-05-20 후지필름 가부시키가이샤 유기 재료의 증착 장치
CN104099571A (zh) * 2013-04-01 2014-10-15 上海和辉光电有限公司 蒸发源组件和薄膜沉积装置和薄膜沉积方法
JP6093251B2 (ja) * 2013-06-10 2017-03-08 長州産業株式会社 蒸着源
US20150024538A1 (en) * 2013-07-19 2015-01-22 Tsmc Solar Ltd. Vapor dispensing apparatus and method for solar panel
CN103695848B (zh) * 2013-12-30 2015-10-14 京东方科技集团股份有限公司 蒸镀设备及其蒸镀方法
CN104762600B (zh) * 2015-04-20 2017-05-10 京东方科技集团股份有限公司 蒸镀坩埚和蒸镀装置
CN104762601A (zh) * 2015-04-30 2015-07-08 京东方科技集团股份有限公司 一种蒸发源、蒸镀装置、蒸镀方法
CN105483620B (zh) * 2015-11-27 2018-03-30 京东方科技集团股份有限公司 喷嘴部件、蒸镀装置及制作有机发光二极管器件的方法
US20180037981A1 (en) * 2016-08-03 2018-02-08 Beijing Apollo Ding Rong Solar Technology Co., Ltd. Temperature-controlled chalcogen vapor distribution apparatus and method for uniform cigs deposition
DE102017003516A1 (de) 2017-04-11 2018-10-11 Creaphys Gmbh Beschichtungsvorrichtung und Verfahren zur reaktiven Dampfphasenabscheidung unter Vakuum auf einem Substrat
CN107190237A (zh) * 2017-06-26 2017-09-22 深圳市华星光电技术有限公司 蒸发源加热系统
CN108457132A (zh) * 2018-04-10 2018-08-28 浙江舒康科技有限公司 铝氨热管纸浆模塑热压干燥模具及干燥方法

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JPS5219184A (en) * 1975-08-06 1977-02-14 Osaka Kouon Denki Kk Vapor source
US4325986A (en) * 1979-05-29 1982-04-20 University Of Delaware Method for continuous deposition by vacuum evaporation
JPH0774433B2 (ja) * 1987-04-27 1995-08-09 日本電信電話株式会社 薄膜成長用蒸着装置
JPH0949072A (ja) * 1995-08-10 1997-02-18 Ulvac Japan Ltd 有機化合物用蒸発源
JP3691615B2 (ja) * 1996-12-06 2005-09-07 株式会社アルバック 有機材料用蒸発源
KR100302609B1 (ko) * 1999-05-10 2001-09-13 김영환 온도가변 가스 분사 장치
US6830626B1 (en) * 1999-10-22 2004-12-14 Kurt J. Lesker Company Method and apparatus for coating a substrate in a vacuum
US20030111014A1 (en) * 2001-12-18 2003-06-19 Donatucci Matthew B. Vaporizer/delivery vessel for volatile/thermally sensitive solid and liquid compounds
JP2004027252A (ja) * 2002-06-21 2004-01-29 Samsung Nec Mobile Display Co Ltd 有機薄膜形成装置の加熱容器
JP4041005B2 (ja) * 2003-04-02 2008-01-30 長州産業株式会社 薄膜堆積用分子線源とそれを使用した薄膜堆積方法
KR20050004379A (ko) * 2003-07-02 2005-01-12 삼성전자주식회사 원자층 증착용 가스 공급 장치
JP4344631B2 (ja) * 2004-03-02 2009-10-14 長州産業株式会社 有機物薄膜堆積用分子線源
EP1752555A1 (fr) * 2005-07-28 2007-02-14 Applied Materials GmbH & Co. KG Dispositif d'évaporation
PL1752554T3 (pl) * 2005-07-28 2008-03-31 Applied Mat Gmbh & Co Kg Urządzenie do naparowywania
JP2007186787A (ja) * 2005-12-14 2007-07-26 Hitachi Displays Ltd 蒸着坩堝並びにこれを備えた薄膜形成装置、及び表示装置の製造方法
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JP4768584B2 (ja) * 2006-11-16 2011-09-07 財団法人山形県産業技術振興機構 蒸発源およびこれを用いた真空蒸着装置
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JP2008274322A (ja) * 2007-04-26 2008-11-13 Sony Corp 蒸着装置
JP2009228091A (ja) * 2008-03-25 2009-10-08 Canon Inc 蒸着装置
KR101196564B1 (ko) * 2008-04-11 2012-11-01 도시바 미쓰비시덴키 산교시스템 가부시키가이샤 균열 장치
JP2010065282A (ja) * 2008-09-11 2010-03-25 Canon Inc 蒸発源
CN102301032A (zh) * 2008-12-18 2011-12-28 维易科精密仪器国际贸易(上海)有限公司 具有加热的泻流孔的真空沉积源
US20100159132A1 (en) * 2008-12-18 2010-06-24 Veeco Instruments, Inc. Linear Deposition Source
JP4827953B2 (ja) * 2009-07-24 2011-11-30 日立造船株式会社 蒸着装置

Also Published As

Publication number Publication date
FR2956411A1 (fr) 2011-08-19
CN102762766A (zh) 2012-10-31
US20120285381A1 (en) 2012-11-15
EP2536868A1 (fr) 2012-12-26
EP2536868B1 (fr) 2017-12-13
IN2012DN06283A (fr) 2015-09-25
JP5766720B2 (ja) 2015-08-19
WO2011101325A1 (fr) 2011-08-25
CA2786249A1 (fr) 2011-08-25
CN102762766B (zh) 2014-12-03
JP2013519787A (ja) 2013-05-30

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Effective date: 20181031