JPS5219184A - Vapor source - Google Patents

Vapor source

Info

Publication number
JPS5219184A
JPS5219184A JP9646175A JP9646175A JPS5219184A JP S5219184 A JPS5219184 A JP S5219184A JP 9646175 A JP9646175 A JP 9646175A JP 9646175 A JP9646175 A JP 9646175A JP S5219184 A JPS5219184 A JP S5219184A
Authority
JP
Japan
Prior art keywords
vapor source
vapor
molecular
source capable
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9646175A
Other languages
Japanese (ja)
Other versions
JPS5750874B2 (en
Inventor
Toshinori Takagi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OOSAKA KOUON DENKI KK
OSAKA KOUON DENKI KK
Original Assignee
OOSAKA KOUON DENKI KK
OSAKA KOUON DENKI KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by OOSAKA KOUON DENKI KK, OSAKA KOUON DENKI KK filed Critical OOSAKA KOUON DENKI KK
Priority to JP9646175A priority Critical patent/JPS5219184A/en
Priority to GB4345975A priority patent/GB1483966A/en
Priority to DE2547552A priority patent/DE2547552B2/en
Priority to US05/625,041 priority patent/US4152478A/en
Publication of JPS5219184A publication Critical patent/JPS5219184A/en
Priority to US06/011,917 priority patent/US4217855A/en
Publication of JPS5750874B2 publication Critical patent/JPS5750874B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/221—Ion beam deposition

Abstract

PURPOSE:A vapor source capable of obtaining atom-or molecular-form vapor particles.
JP9646175A 1974-10-23 1975-08-06 Vapor source Granted JPS5219184A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP9646175A JPS5219184A (en) 1975-08-06 1975-08-06 Vapor source
GB4345975A GB1483966A (en) 1974-10-23 1975-10-22 Vapourized-metal cluster ion source and ionized-cluster beam deposition
DE2547552A DE2547552B2 (en) 1974-10-23 1975-10-23 Layer vapor deposition process and equipment
US05/625,041 US4152478A (en) 1974-10-23 1975-10-23 Ionized-cluster deposited on a substrate and method of depositing ionized cluster on a substrate
US06/011,917 US4217855A (en) 1974-10-23 1979-02-13 Vaporized-metal cluster ion source and ionized-cluster beam deposition device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9646175A JPS5219184A (en) 1975-08-06 1975-08-06 Vapor source

Publications (2)

Publication Number Publication Date
JPS5219184A true JPS5219184A (en) 1977-02-14
JPS5750874B2 JPS5750874B2 (en) 1982-10-29

Family

ID=14165658

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9646175A Granted JPS5219184A (en) 1974-10-23 1975-08-06 Vapor source

Country Status (1)

Country Link
JP (1) JPS5219184A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4599727B2 (en) * 2001-02-21 2010-12-15 株式会社デンソー Vapor deposition equipment
JP2013519787A (en) * 2010-02-16 2013-05-30 アストロン フィアム セーフティー Heating system for vapor deposition sources

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4599727B2 (en) * 2001-02-21 2010-12-15 株式会社デンソー Vapor deposition equipment
JP2013519787A (en) * 2010-02-16 2013-05-30 アストロン フィアム セーフティー Heating system for vapor deposition sources

Also Published As

Publication number Publication date
JPS5750874B2 (en) 1982-10-29

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