IN2012DN06283A - - Google Patents

Info

Publication number
IN2012DN06283A
IN2012DN06283A IN6283DEN2012A IN2012DN06283A IN 2012DN06283 A IN2012DN06283 A IN 2012DN06283A IN 6283DEN2012 A IN6283DEN2012 A IN 6283DEN2012A IN 2012DN06283 A IN2012DN06283 A IN 2012DN06283A
Authority
IN
India
Prior art keywords
vessel
zone
receptacle
orifice
heating
Prior art date
Application number
Inventor
Vidalet Bruno Dussert
Cédric Guerard
Original Assignee
Astron Fiamm Safety
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Astron Fiamm Safety filed Critical Astron Fiamm Safety
Publication of IN2012DN06283A publication Critical patent/IN2012DN06283A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/4557—Heated nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45578—Elongated nozzles, tubes with holes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45587—Mechanical means for changing the gas flow

Abstract

The patent describes a vapor phase deposition source comprising a vessel equipped with two zones. The first zone is for the production of vapor. It is equipped with a receptacle for the material and means for heating the material placed in the receptacle. The second is a diffusion zone comprising a vessel communicating with the production zone and equipped with at least one orifice so that the vapor phase material is transmitted towards the exterior of the vessel through the orifice. The source is characterized in that on the one hand the room comprises an inner wall and an outer envelope defining an intermediate space filled with a heat transporting liquid and on the other it is equipped with means for heating the coolant.
IN6283DEN2012 2010-02-16 2011-02-15 IN2012DN06283A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR1051098A FR2956411B1 (en) 2010-02-16 2010-02-16 SYSTEM FOR HEATING A VAPOR PHASE DEPOSITION SOURCE
US30559710P 2010-02-18 2010-02-18
PCT/EP2011/052172 WO2011101325A1 (en) 2010-02-16 2011-02-15 Heating system for a vapor-phase deposition source

Publications (1)

Publication Number Publication Date
IN2012DN06283A true IN2012DN06283A (en) 2015-09-25

Family

ID=42272607

Family Applications (1)

Application Number Title Priority Date Filing Date
IN6283DEN2012 IN2012DN06283A (en) 2010-02-16 2011-02-15

Country Status (8)

Country Link
US (1) US20120285381A1 (en)
EP (1) EP2536868B1 (en)
JP (1) JP5766720B2 (en)
CN (1) CN102762766B (en)
CA (1) CA2786249A1 (en)
FR (1) FR2956411B1 (en)
IN (1) IN2012DN06283A (en)
WO (1) WO2011101325A1 (en)

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WO2014061532A1 (en) * 2012-10-17 2014-04-24 富士フイルム株式会社 Apparatus for depositing organic material
CN104099571A (en) * 2013-04-01 2014-10-15 上海和辉光电有限公司 Evaporation source component, film deposition device and film deposition method
JP6093251B2 (en) * 2013-06-10 2017-03-08 長州産業株式会社 Vapor deposition source
US20150024538A1 (en) * 2013-07-19 2015-01-22 Tsmc Solar Ltd. Vapor dispensing apparatus and method for solar panel
CN103695848B (en) * 2013-12-30 2015-10-14 京东方科技集团股份有限公司 Evaporated device and evaporation coating method thereof
CN104762600B (en) * 2015-04-20 2017-05-10 京东方科技集团股份有限公司 Evaporated crucible and evaporation device
CN104762601A (en) * 2015-04-30 2015-07-08 京东方科技集团股份有限公司 Evaporator source, evaporation device and evaporation method
CN105483620B (en) * 2015-11-27 2018-03-30 京东方科技集团股份有限公司 Jet element, evaporation coating device and the method for making organic light emitting diode device
US20180037981A1 (en) * 2016-08-03 2018-02-08 Beijing Apollo Ding Rong Solar Technology Co., Ltd. Temperature-controlled chalcogen vapor distribution apparatus and method for uniform cigs deposition
DE102017003516A1 (en) * 2017-04-11 2018-10-11 Creaphys Gmbh Coating apparatus and method for reactive vapor deposition under vacuum on a substrate
CN107190237A (en) * 2017-06-26 2017-09-22 深圳市华星光电技术有限公司 Evaporation source heating system
CN108457132A (en) * 2018-04-10 2018-08-28 浙江舒康科技有限公司 Aluminium ammonia heat pipe paper mould hot-pressing drying mold and drying means

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JPS5219184A (en) * 1975-08-06 1977-02-14 Osaka Kouon Denki Kk Vapor source
US4325986A (en) * 1979-05-29 1982-04-20 University Of Delaware Method for continuous deposition by vacuum evaporation
JPH0774433B2 (en) * 1987-04-27 1995-08-09 日本電信電話株式会社 Vapor deposition equipment for thin film growth
JPH0949072A (en) * 1995-08-10 1997-02-18 Ulvac Japan Ltd Evaporating source for organic compound
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US6830626B1 (en) * 1999-10-22 2004-12-14 Kurt J. Lesker Company Method and apparatus for coating a substrate in a vacuum
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JP2004027252A (en) * 2002-06-21 2004-01-29 Samsung Nec Mobile Display Co Ltd Heating vessel of organic thin film deposition system
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Also Published As

Publication number Publication date
JP2013519787A (en) 2013-05-30
FR2956411A1 (en) 2011-08-19
EP2536868B1 (en) 2017-12-13
JP5766720B2 (en) 2015-08-19
EP2536868A1 (en) 2012-12-26
FR2956411B1 (en) 2012-04-06
WO2011101325A1 (en) 2011-08-25
CA2786249A1 (en) 2011-08-25
US20120285381A1 (en) 2012-11-15
CN102762766B (en) 2014-12-03
CN102762766A (en) 2012-10-31

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