KR100762522B1 - 도포, 현상 장치 및 그 방법 - Google Patents

도포, 현상 장치 및 그 방법 Download PDF

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Publication number
KR100762522B1
KR100762522B1 KR1020060021016A KR20060021016A KR100762522B1 KR 100762522 B1 KR100762522 B1 KR 100762522B1 KR 1020060021016 A KR1020060021016 A KR 1020060021016A KR 20060021016 A KR20060021016 A KR 20060021016A KR 100762522 B1 KR100762522 B1 KR 100762522B1
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South Korea
Prior art keywords
unit
block
substrate
coating
transfer
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Korean (ko)
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KR20060097613A (ko
Inventor
마사미 아키모토
신이치 하야시
야스시 하야시다
노부아키 마츠오카
요시오 기무라
잇세이 유에다
히카루 이토
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동경 엘렉트론 주식회사
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67742—Mechanical parts of transfer devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
    • H01L21/67173—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers in-line arrangement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
    • H01L21/67178—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers vertical arrangement

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Robotics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1020060021016A 2005-03-11 2006-03-06 도포, 현상 장치 및 그 방법 Active KR100762522B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2005-00069723 2005-03-11
JP2005069723A JP4566035B2 (ja) 2005-03-11 2005-03-11 塗布、現像装置及びその方法

Publications (2)

Publication Number Publication Date
KR20060097613A KR20060097613A (ko) 2006-09-14
KR100762522B1 true KR100762522B1 (ko) 2007-10-01

Family

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Family Applications (1)

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KR1020060021016A Active KR100762522B1 (ko) 2005-03-11 2006-03-06 도포, 현상 장치 및 그 방법

Country Status (3)

Country Link
US (1) US8408158B2 (enExample)
JP (1) JP4566035B2 (enExample)
KR (1) KR100762522B1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101001511B1 (ko) * 2007-06-29 2010-12-14 가부시키가이샤 소쿠도 기판처리장치
US8289496B2 (en) 2009-01-30 2012-10-16 Semes Co., Ltd. System and method for treating substrate

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US8111374B2 (en) 2005-09-09 2012-02-07 Nikon Corporation Analysis method, exposure method, and device manufacturing method
JP4992718B2 (ja) * 2005-09-09 2012-08-08 株式会社ニコン 解析方法、露光方法及びデバイス製造方法
JP4684858B2 (ja) * 2005-11-10 2011-05-18 東京エレクトロン株式会社 リンス処理方法、現像処理方法、現像処理装置、制御プログラムおよびコンピュータ読取可能な記憶媒体
KR100650259B1 (ko) * 2005-12-20 2006-11-27 동부일렉트로닉스 주식회사 포토레지스트막 도포장치 및 이를 이용한 포토리소그라피방법
JP4999415B2 (ja) * 2006-09-29 2012-08-15 東京エレクトロン株式会社 基板処理装置及び基板処理方法並びに基板処理装置の用力供給装置及び基板処理装置の用力供給方法
JP5132920B2 (ja) * 2006-11-22 2013-01-30 東京エレクトロン株式会社 塗布・現像装置および基板搬送方法、ならびにコンピュータプログラム
JP4331199B2 (ja) * 2006-11-29 2009-09-16 東京エレクトロン株式会社 液浸露光用塗布膜形成装置および塗布膜形成方法
JP5149513B2 (ja) * 2007-02-15 2013-02-20 株式会社Ｓｏｋｕｄｏ 基板処理装置
KR100882474B1 (ko) * 2007-06-22 2009-02-06 세메스 주식회사 세정 유닛을 갖는 기판 처리 장치
JP4979079B2 (ja) * 2007-07-09 2012-07-18 東京エレクトロン株式会社 基板処理装置
TW200919117A (en) 2007-08-28 2009-05-01 Tokyo Electron Ltd Coating-developing apparatus, coating-developing method and storage medium
KR20090041154A (ko) * 2007-10-23 2009-04-28 삼성전자주식회사 기판 세정 장치 및 기판 세정 방법
JP5128918B2 (ja) 2007-11-30 2013-01-23 株式会社Ｓｏｋｕｄｏ 基板処理装置
JP5318403B2 (ja) 2007-11-30 2013-10-16 株式会社Ｓｏｋｕｄｏ 基板処理装置
JP5179170B2 (ja) 2007-12-28 2013-04-10 株式会社Ｓｏｋｕｄｏ 基板処理装置
JP5001828B2 (ja) 2007-12-28 2012-08-15 株式会社Ｓｏｋｕｄｏ 基板処理装置
JP5344734B2 (ja) * 2007-12-28 2013-11-20 株式会社Ｓｏｋｕｄｏ 基板処理装置
JP5378686B2 (ja) * 2008-01-10 2013-12-25 株式会社Ｓｏｋｕｄｏ 基板処理装置
JP5237082B2 (ja) * 2008-12-24 2013-07-17 株式会社Ｓｏｋｕｄｏ 基板処理装置
JP2010177673A (ja) * 2009-01-30 2010-08-12 Semes Co Ltd 基板処理設備及び基板処理方法
KR101109074B1 (ko) * 2009-01-30 2012-02-20 세메스 주식회사 기판 처리 시스템 및 기판 처리 방법
JP4757924B2 (ja) * 2009-02-26 2011-08-24 東京エレクトロン株式会社 基板処理装置
WO2011084727A2 (en) * 2009-12-21 2011-07-14 Henkel Corporation Method and system for regulating adhesive application
JP5408059B2 (ja) * 2010-07-09 2014-02-05 東京エレクトロン株式会社 塗布、現像装置、塗布、現像方法及び記憶媒体
JP5713081B2 (ja) * 2010-07-09 2015-05-07 東京エレクトロン株式会社 塗布、現像装置
JP5503006B2 (ja) * 2010-08-06 2014-05-28 東京エレクトロン株式会社 基板処理システム、搬送モジュール、基板処理方法及び半導体素子の製造方法
JP5212443B2 (ja) * 2010-09-13 2013-06-19 東京エレクトロン株式会社 塗布、現像装置、塗布、現像方法及び記憶媒体
CN103608484B (zh) * 2011-04-20 2016-06-22 Oled工厂有限责任公司 用于气相沉积应用的测量设备和方法
CN106373911B (zh) * 2011-09-22 2019-04-09 东京毅力科创株式会社 基板处理装置及基板处理方法
TWI550686B (zh) * 2011-11-04 2016-09-21 東京威力科創股份有限公司 基板處理系統、基板運送方法及電腦記憶媒體
JP6152281B2 (ja) * 2013-02-25 2017-06-21 株式会社ニューフレアテクノロジー パターン検査方法及びパターン検査装置
JP2013243406A (ja) * 2013-08-13 2013-12-05 Tokyo Electron Ltd 塗布、現像装置、塗布、現像方法及び記憶媒体
JP5590201B2 (ja) * 2013-08-13 2014-09-17 東京エレクトロン株式会社 塗布、現像装置、塗布、現像方法及び記憶媒体
JP5644916B2 (ja) * 2013-08-13 2014-12-24 東京エレクトロン株式会社 塗布、現像装置
JP5752827B2 (ja) * 2014-03-26 2015-07-22 東京エレクトロン株式会社 基板処理システム、基板搬送方法、プログラム及びコンピュータ記憶媒体
JP6209554B2 (ja) * 2015-04-15 2017-10-04 株式会社Ｓｃｒｅｅｎセミコンダクターソリューションズ 基板処理方法
JP6049929B2 (ja) * 2016-03-11 2016-12-21 株式会社Ｓｃｒｅｅｎセミコンダクターソリューションズ 基板処理方法
CN205608389U (zh) * 2016-05-11 2016-09-28 重庆京东方光电科技有限公司 一种缓存装置及设有该缓存装置的涂胶显影机
JP6557647B2 (ja) * 2016-11-22 2019-08-07 株式会社Ｓｃｒｅｅｎセミコンダクターソリューションズ 基板処理装置
JP7314634B2 (ja) * 2019-06-11 2023-07-26 東京エレクトロン株式会社 塗布装置及び塗布方法
KR102754326B1 (ko) * 2020-11-10 2025-01-13 가부시키가이샤 스기노 마신 처리시스템

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101001511B1 (ko) * 2007-06-29 2010-12-14 가부시키가이샤 소쿠도 기판처리장치
US8851008B2 (en) 2007-06-29 2014-10-07 Sokudo Co., Ltd. Parallel substrate treatment for a plurality of substrate treatment lines
US8289496B2 (en) 2009-01-30 2012-10-16 Semes Co., Ltd. System and method for treating substrate
US9059224B2 (en) 2009-01-30 2015-06-16 Semes Co., Ltd. System and method for treating substrate

Also Published As

Publication number Publication date
KR20060097613A (ko) 2006-09-14
JP2006253501A (ja) 2006-09-21
JP4566035B2 (ja) 2010-10-20
US20060201423A1 (en) 2006-09-14
US8408158B2 (en) 2013-04-02

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