KR100643061B1 - 강유전체 랜덤 액세스 메모리 캐패시터의 화학 및 기계적 폴리싱 방법 - Google Patents

강유전체 랜덤 액세스 메모리 캐패시터의 화학 및 기계적 폴리싱 방법 Download PDF

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KR100643061B1
KR100643061B1 KR1020007005522A KR20007005522A KR100643061B1 KR 100643061 B1 KR100643061 B1 KR 100643061B1 KR 1020007005522 A KR1020007005522 A KR 1020007005522A KR 20007005522 A KR20007005522 A KR 20007005522A KR 100643061 B1 KR100643061 B1 KR 100643061B1
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capacitor
sio
chemical
group
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KR20010032312A (ko
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반부스키르크페터시
키르린페터에스
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어드밴스드 테크놀러지 머티리얼즈, 인코포레이티드
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00—Resistors, capacitors or inductors
    • H10D1/60—Capacitors
    • H10D1/68—Capacitors having no potential barriers
    • H10D1/682—Capacitors having no potential barriers having dielectrics comprising perovskite structures
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B53/00—Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory capacitors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00—Resistors, capacitors or inductors
    • H10D1/60—Capacitors
    • H10D1/68—Capacitors having no potential barriers
    • H10D1/692—Electrodes
    • H10D1/696—Electrodes comprising multiple layers, e.g. comprising a barrier layer and a metal layer
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H10P52/40—Chemomechanical polishing [CMP]
    • H10P52/403—Chemomechanical polishing [CMP] of conductive or resistive materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H10P95/06—Planarisation of inorganic insulating materials
    • H10P95/062—Planarisation of inorganic insulating materials involving a dielectric removal step
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B12/00—Dynamic random access memory [DRAM] devices
    • H10B12/01—Manufacture or treatment
    • H10B12/02—Manufacture or treatment for one transistor one-capacitor [1T-1C] memory cells
    • H10B12/03—Making the capacitor or connections thereto
    • H10B12/033—Making the capacitor or connections thereto the capacitor extending over the transistor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B12/00—Dynamic random access memory [DRAM] devices
    • H10B12/01—Manufacture or treatment
    • H10B12/02—Manufacture or treatment for one transistor one-capacitor [1T-1C] memory cells
    • H10B12/03—Making the capacitor or connections thereto
    • H10B12/038—Making the capacitor or connections thereto the capacitor being in a trench in the substrate

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  • Semiconductor Memories (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Drying Of Semiconductors (AREA)
KR1020007005522A 1997-11-20 1998-11-17 강유전체 랜덤 액세스 메모리 캐패시터의 화학 및 기계적 폴리싱 방법 Expired - Fee Related KR100643061B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/975,366 US5976928A (en) 1997-11-20 1997-11-20 Chemical mechanical polishing of FeRAM capacitors
US8/975,366 1997-11-20
US08/975,366 1997-11-20

Publications (2)

Publication Number Publication Date
KR20010032312A KR20010032312A (ko) 2001-04-16
KR100643061B1 true KR100643061B1 (ko) 2006-11-10

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KR1020007005522A Expired - Fee Related KR100643061B1 (ko) 1997-11-20 1998-11-17 강유전체 랜덤 액세스 메모리 캐패시터의 화학 및 기계적 폴리싱 방법

Country Status (6)

Country Link
US (1) US5976928A (https=)
EP (1) EP1040518A4 (https=)
JP (1) JP2001524755A (https=)
KR (1) KR100643061B1 (https=)
AU (1) AU1589399A (https=)
WO (1) WO1999027581A1 (https=)

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