JP2002530890A5 - - Google Patents
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- JP2002530890A5 JP2002530890A5 JP2000584527A JP2000584527A JP2002530890A5 JP 2002530890 A5 JP2002530890 A5 JP 2002530890A5 JP 2000584527 A JP2000584527 A JP 2000584527A JP 2000584527 A JP2000584527 A JP 2000584527A JP 2002530890 A5 JP2002530890 A5 JP 2002530890A5
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- JP
- Japan
- Prior art keywords
- cmp
- capacitor
- layer
- ferroelectric
- dielectric
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000010410 layer Substances 0.000 description 202
- 238000000034 method Methods 0.000 description 180
- 239000003990 capacitor Substances 0.000 description 160
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- 229910052751 metal Inorganic materials 0.000 description 43
- 238000004377 microelectronic Methods 0.000 description 43
- 239000002184 metal Substances 0.000 description 39
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- 229910021576 Iron(III) bromide Inorganic materials 0.000 description 3
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- DTMHTVJOHYTUHE-UHFFFAOYSA-N thiocyanogen Chemical compound N#CSSC#N DTMHTVJOHYTUHE-UHFFFAOYSA-N 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000010977 unit operation Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/200,499 | 1998-11-25 | ||
| US09/200,499 US6346741B1 (en) | 1997-11-20 | 1998-11-25 | Compositions and structures for chemical mechanical polishing of FeRAM capacitors and method of fabricating FeRAM capacitors using same |
| PCT/US1999/027754 WO2000031794A1 (en) | 1998-11-25 | 1999-11-23 | Chemical mechanical polishing of feram capacitors |
Publications (3)
| Publication Number | Publication Date |
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| JP2002530890A JP2002530890A (ja) | 2002-09-17 |
| JP2002530890A5 true JP2002530890A5 (https=) | 2012-11-01 |
| JP5128731B2 JP5128731B2 (ja) | 2013-01-23 |
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| Country | Link |
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| US (1) | US6346741B1 (https=) |
| EP (1) | EP1133792A4 (https=) |
| JP (1) | JP5128731B2 (https=) |
| KR (1) | KR20010089510A (https=) |
| WO (1) | WO2000031794A1 (https=) |
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1999
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- 1999-11-23 WO PCT/US1999/027754 patent/WO2000031794A1/en not_active Ceased
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- 1999-11-23 KR KR1020017006595A patent/KR20010089510A/ko not_active Withdrawn
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