KR100570252B1 - 리소그래피 장치에 사용하는 균형화 위치결정 시스템 - Google Patents

리소그래피 장치에 사용하는 균형화 위치결정 시스템 Download PDF

Info

Publication number
KR100570252B1
KR100570252B1 KR1020000078676A KR20000078676A KR100570252B1 KR 100570252 B1 KR100570252 B1 KR 100570252B1 KR 1020000078676 A KR1020000078676 A KR 1020000078676A KR 20000078676 A KR20000078676 A KR 20000078676A KR 100570252 B1 KR100570252 B1 KR 100570252B1
Authority
KR
South Korea
Prior art keywords
objective table
balance
mask
mass
balance mass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020000078676A
Other languages
English (en)
Korean (ko)
Other versions
KR20010067452A (ko
Inventor
크완임분파트리크
Original Assignee
에이에스엠엘 네델란즈 비.브이.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 에이에스엠엘 네델란즈 비.브이. filed Critical 에이에스엠엘 네델란즈 비.브이.
Publication of KR20010067452A publication Critical patent/KR20010067452A/ko
Application granted granted Critical
Publication of KR100570252B1 publication Critical patent/KR100570252B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70766—Reaction force control means, e.g. countermass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Epidemiology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Vibration Prevention Devices (AREA)
KR1020000078676A 1999-12-21 2000-12-19 리소그래피 장치에 사용하는 균형화 위치결정 시스템 Expired - Fee Related KR100570252B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP99310371.2 1999-12-21
EP99310371 1999-12-21

Publications (2)

Publication Number Publication Date
KR20010067452A KR20010067452A (ko) 2001-07-12
KR100570252B1 true KR100570252B1 (ko) 2006-04-12

Family

ID=8241828

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020000078676A Expired - Fee Related KR100570252B1 (ko) 1999-12-21 2000-12-19 리소그래피 장치에 사용하는 균형화 위치결정 시스템

Country Status (5)

Country Link
US (3) US6449030B1 (enExample)
JP (4) JP4279449B2 (enExample)
KR (1) KR100570252B1 (enExample)
DE (1) DE60033773T2 (enExample)
TW (1) TW546551B (enExample)

Families Citing this family (54)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW546551B (en) * 1999-12-21 2003-08-11 Asml Netherlands Bv Balanced positioning system for use in lithographic apparatus
JP3814453B2 (ja) 2000-01-11 2006-08-30 キヤノン株式会社 位置決め装置、半導体露光装置およびデバイス製造方法
TW588222B (en) * 2000-02-10 2004-05-21 Asml Netherlands Bv Cooling of voice coil motors in lithographic projection apparatus
JP4474020B2 (ja) * 2000-06-23 2010-06-02 キヤノン株式会社 移動装置及び露光装置
EP1189018B1 (de) * 2000-09-15 2009-02-25 Vistec Electron Beam GmbH Sechsachsiges Positioniersystem mit magnetfeldfreiem Raum
US6603531B1 (en) 2000-11-16 2003-08-05 Nikon Corporation Stage assembly including a reaction assembly that is connected by actuators
US6885430B2 (en) * 2000-11-16 2005-04-26 Nikon Corporation System and method for resetting a reaction mass assembly of a stage assembly
US6958808B2 (en) * 2000-11-16 2005-10-25 Nikon Corporation System and method for resetting a reaction mass assembly of a stage assembly
US6757053B1 (en) 2000-11-16 2004-06-29 Nikon Corporation Stage assembly including a reaction mass assembly
US6593997B1 (en) * 2000-11-16 2003-07-15 Nikon Corporation Stage assembly including a reaction assembly
US6906334B2 (en) * 2000-12-19 2005-06-14 Nikon Corporation Curved I-core
US6987558B2 (en) * 2001-01-16 2006-01-17 Nikon Corporation Reaction mass for a stage device
JP2002283174A (ja) * 2001-03-26 2002-10-03 Fanuc Ltd 直線駆動装置
JP2003059797A (ja) * 2001-08-09 2003-02-28 Canon Inc 移動装置、ステージ装置及び露光装置
US6597435B2 (en) * 2001-10-09 2003-07-22 Nikon Corporation Reticle stage with reaction force cancellation
JP4011919B2 (ja) * 2002-01-16 2007-11-21 キヤノン株式会社 移動装置及び露光装置並びに半導体デバイスの製造方法
KR100588114B1 (ko) * 2002-02-12 2006-06-09 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 디바이스 제조방법
JP3679767B2 (ja) * 2002-02-26 2005-08-03 キヤノン株式会社 ステージ位置決め装置及びその制御方法、露光装置、半導体デバイスの製造方法
US7061577B2 (en) 2002-03-26 2006-06-13 Nikon Corporation Image adjustor including damping assembly
US6724466B2 (en) * 2002-03-26 2004-04-20 Nikon Corporation Stage assembly including a damping assembly
US7268504B2 (en) * 2002-05-24 2007-09-11 Kollomorgen Corporation Stator position feedback controller
KR100522885B1 (ko) * 2002-06-07 2005-10-20 에이에스엠엘 네델란즈 비.브이. 리소그래피장치 및 디바이스제조방법
SG126732A1 (en) * 2002-09-30 2006-11-29 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
JP3962669B2 (ja) * 2002-10-08 2007-08-22 キヤノン株式会社 移動装置及び露光装置並びにデバイスの製造方法
JP2004152902A (ja) * 2002-10-29 2004-05-27 Canon Inc 位置決め装置
US6963821B2 (en) * 2003-02-11 2005-11-08 Nikon Corporation Stage counter mass system
SG2012031738A (en) 2003-04-11 2015-07-30 Nippon Kogaku Kk Apparatus having an immersion fluid system configured to maintain immersion fluid in a gap adjacent an optical assembly
TWI442694B (zh) * 2003-05-30 2014-06-21 Asml Netherlands Bv 微影裝置及元件製造方法
US20040252287A1 (en) * 2003-06-11 2004-12-16 Michael Binnard Reaction frame assembly that functions as a reaction mass
KR101931923B1 (ko) 2003-06-19 2018-12-21 가부시키가이샤 니콘 노광 장치 및 디바이스 제조방법
TWI245163B (en) 2003-08-29 2005-12-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7221433B2 (en) 2004-01-28 2007-05-22 Nikon Corporation Stage assembly including a reaction assembly having a connector assembly
US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
US7224432B2 (en) * 2004-05-14 2007-05-29 Canon Kabushiki Kaisha Stage device, exposure apparatus, and device manufacturing method
EP1805544A1 (en) * 2004-10-27 2007-07-11 Carl Zeiss SMT AG A six degree of freedom (dof) actuator reaction mass
US7193683B2 (en) * 2005-01-06 2007-03-20 Nikon Corporation Stage design for reflective optics
US7456935B2 (en) * 2005-04-05 2008-11-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilizing a positioning device for positioning an object table
US7696652B2 (en) 2005-11-01 2010-04-13 Asml Netherlands B.V. Electromagnetic actuator, method of manufacturing a part of an electromagnetic actuator, and lithographic apparatus comprising and electromagnetic actuator
US20070268475A1 (en) * 2006-05-16 2007-11-22 Nikon Corporation System and method for controlling a stage assembly
US7502103B2 (en) * 2006-05-31 2009-03-10 Asml Netherlands B.V. Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate
US7538273B2 (en) * 2006-08-08 2009-05-26 Asml Netherlands B.V. Cable connection to decrease the passing on of vibrations from a first object to a second object
US20080285004A1 (en) * 2007-05-18 2008-11-20 Nikon Corporation Monolithic, Non-Contact Six Degree-of-Freedom Stage Apparatus
NL1036161A1 (nl) * 2007-11-20 2009-05-25 Asml Netherlands Bv Combination of structure and an active damping system, and a lithographic apparatus.
KR101584827B1 (ko) * 2008-03-07 2016-01-13 가부시키가이샤 니콘 이동체 장치 및 노광 장치
US8144310B2 (en) 2008-04-14 2012-03-27 Asml Netherlands B.V. Positioning system, lithographic apparatus and device manufacturing method
CN102782806A (zh) * 2010-03-04 2012-11-14 株式会社安川电机 工作台装置
DE102011006024A1 (de) * 2011-03-24 2012-09-27 Carl Zeiss Smt Gmbh Anordnung zur Vibrationsisolation einer Nutzlast
JP5844468B2 (ja) * 2011-09-12 2016-01-20 マッパー・リソグラフィー・アイピー・ビー．ブイ． ターゲット位置決め装置、ターゲット位置決め装置を駆動する方法、およびそのようなターゲット位置決め装置を備えているリソグラフィシステム
NL2009902A (en) 2011-12-27 2013-07-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
JP6010686B2 (ja) * 2012-04-27 2016-10-19 エーエスエムエル ネザーランズ ビー．ブイ． アクチュエータを備えるリソグラフィ装置、およびアクチュエータを保護する方法
CN103809384B (zh) * 2012-11-12 2016-03-09 上海微电子装备有限公司 工件台与掩模台公用的平衡质量系统及光刻机
KR101911395B1 (ko) 2014-04-16 2018-10-24 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치, 리소그래피 장치에서 대상물을 위치시키는 방법 및 디바이스 제조 방법
DE102019207940A1 (de) * 2019-05-29 2020-12-03 Brose Fahrzeugteile SE & Co. Kommanditgesellschaft, Würzburg Verfahren zum dynamischen Wuchten eines Rotationskörpers
US12346010B2 (en) * 2022-04-29 2025-07-01 International Business Machines Corporation Alignment system and tool for visual inspection

Family Cites Families (49)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6018918A (ja) 1983-07-13 1985-01-31 Canon Inc ステージ装置
US4781067A (en) 1987-04-30 1988-11-01 Sonoscan, Inc. Balanced scanning mechanism
US5523193A (en) 1988-05-31 1996-06-04 Texas Instruments Incorporated Method and apparatus for patterning and imaging member
JP2960423B2 (ja) 1988-11-16 1999-10-06 株式会社日立製作所 試料移動装置及び半導体製造装置
US5208497A (en) 1989-04-17 1993-05-04 Sharp Kabushiki Kaisha Linear driving apparatus
NL8902471A (nl) 1989-10-05 1991-05-01 Philips Nv Tweetraps positioneerinrichting.
JPH03273607A (ja) 1990-03-23 1991-12-04 Canon Inc 移動テーブル装置
ATE123885T1 (de) 1990-05-02 1995-06-15 Fraunhofer Ges Forschung Belichtungsvorrichtung.
JP2752248B2 (ja) 1990-11-30 1998-05-18 シャープ株式会社 リニアモータ装置
NL9100202A (nl) 1991-02-05 1992-09-01 Asm Lithography Bv Lithografische inrichting met een hangende objecttafel.
NL9100407A (nl) 1991-03-07 1992-10-01 Philips Nv Optisch lithografische inrichting met een krachtgecompenseerd machinegestel.
US5301013A (en) 1991-07-30 1994-04-05 U.S. Philips Corporation Positioning device having two manipulators operating in parallel, and optical lithographic device provided with such a positioning device
JP2714502B2 (ja) * 1991-09-18 1998-02-16 キヤノン株式会社 移動ステージ装置
US5229872A (en) 1992-01-21 1993-07-20 Hughes Aircraft Company Exposure device including an electrically aligned electronic mask for micropatterning
DE69322983T2 (de) 1992-02-21 1999-07-15 Canon K.K., Tokio/Tokyo System zum Steuern von Trägerplatten
US5477304A (en) 1992-10-22 1995-12-19 Nikon Corporation Projection exposure apparatus
JP3277581B2 (ja) 1993-02-01 2002-04-22 株式会社ニコン ステージ装置および露光装置
US5537186A (en) 1993-08-03 1996-07-16 Canon Kabushiki Kaisha Movable stage mechanism and exposure apparatus using the same
JP3073879B2 (ja) 1994-03-25 2000-08-07 キヤノン株式会社 除振装置
US5528118A (en) * 1994-04-01 1996-06-18 Nikon Precision, Inc. Guideless stage with isolated reaction stage
US5874820A (en) 1995-04-04 1999-02-23 Nikon Corporation Window frame-guided stage mechanism
US5715064A (en) 1994-06-17 1998-02-03 International Business Machines Corporation Step and repeat apparatus having enhanced accuracy and increased throughput
JP3800616B2 (ja) * 1994-06-27 2006-07-26 株式会社ニコン 目標物移動装置、位置決め装置及び可動ステージ装置
US6246204B1 (en) 1994-06-27 2001-06-12 Nikon Corporation Electromagnetic alignment and scanning apparatus
US5826129A (en) 1994-06-30 1998-10-20 Tokyo Electron Limited Substrate processing system
US5623853A (en) 1994-10-19 1997-04-29 Nikon Precision Inc. Precision motion stage with single guide beam and follower stage
US5763966A (en) 1995-03-15 1998-06-09 Hinds; Walter E. Single plane motor system generating orthogonal movement
JP3506158B2 (ja) 1995-04-14 2004-03-15 株式会社ニコン 露光装置及び走査型露光装置、並びに走査露光方法
TW316874B (enExample) 1995-05-30 1997-10-01 Philips Electronics Nv
US5750897A (en) 1995-06-14 1998-05-12 Canon Kabushiki Kaisha Active anti-vibration apparatus and method of manufacturing the same
WO1997033205A1 (en) 1996-03-06 1997-09-12 Philips Electronics N.V. Differential interferometer system and lithographic step-and-scan apparatus provided with such a system
JP3571471B2 (ja) 1996-09-03 2004-09-29 東京エレクトロン株式会社 処理方法，塗布現像処理システム及び処理システム
JP3548353B2 (ja) * 1996-10-15 2004-07-28 キヤノン株式会社 ステージ装置およびこれを用いた露光装置ならびにデバイス製造方法
WO1998028665A1 (en) 1996-12-24 1998-07-02 Koninklijke Philips Electronics N.V. Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device
US5815246A (en) 1996-12-24 1998-09-29 U.S. Philips Corporation Two-dimensionally balanced positioning device, and lithographic device provided with such a positioning device
US6170622B1 (en) 1997-03-07 2001-01-09 Canon Kabushiki Kaisha Anti-vibration apparatus and anti-vibration method thereof
US6262796B1 (en) * 1997-03-10 2001-07-17 Asm Lithography B.V. Positioning device having two object holders
US5981118A (en) 1997-04-11 1999-11-09 Fujitsu Ltd. Method for charged particle beam exposure with fixed barycenter through balancing stage scan
US6028376A (en) * 1997-04-22 2000-02-22 Canon Kabushiki Kaisha Positioning apparatus and exposure apparatus using the same
US6408045B1 (en) * 1997-11-11 2002-06-18 Canon Kabushiki Kaisha Stage system and exposure apparatus with the same
US5959427A (en) * 1998-03-04 1999-09-28 Nikon Corporation Method and apparatus for compensating for reaction forces in a stage assembly
JP4109747B2 (ja) 1998-05-07 2008-07-02 キヤノン株式会社 アクティブ除振装置および露光装置
TWI242113B (en) 1998-07-17 2005-10-21 Asml Netherlands Bv Positioning device and lithographic projection apparatus comprising such a device
US6252234B1 (en) 1998-08-14 2001-06-26 Nikon Corporation Reaction force isolation system for a planar motor
US6286655B1 (en) 1999-04-29 2001-09-11 Advanced Sorting Technologies, Llc Inclined conveyor
AU6005499A (en) * 1999-10-07 2001-04-23 Nikon Corporation Substrate, stage device, method of driving stage, exposure system and exposure method
TW546551B (en) 1999-12-21 2003-08-11 Asml Netherlands Bv Balanced positioning system for use in lithographic apparatus
TWI264617B (en) 1999-12-21 2006-10-21 Asml Netherlands Bv Balanced positioning system for use in lithographic apparatus
US6281655B1 (en) 1999-12-23 2001-08-28 Nikon Corporation High performance stage assembly

Also Published As

Publication number Publication date
US20020191173A1 (en) 2002-12-19
US6449030B1 (en) 2002-09-10
US20040041994A1 (en) 2004-03-04
JP4490875B2 (ja) 2010-06-30
JP2009141371A (ja) 2009-06-25
KR20010067452A (ko) 2001-07-12
JP2001351856A (ja) 2001-12-21
TW546551B (en) 2003-08-11
US6671036B2 (en) 2003-12-30
US6924882B2 (en) 2005-08-02
DE60033773D1 (de) 2007-04-19
US20020048009A1 (en) 2002-04-25
DE60033773T2 (de) 2007-11-08
JP2005333145A (ja) 2005-12-02
JP4279449B2 (ja) 2009-06-17
JP4621765B2 (ja) 2011-01-26
JP4914885B2 (ja) 2012-04-11
JP2009135507A (ja) 2009-06-18

Similar Documents

Publication Publication Date Title
KR100570252B1 (ko) 리소그래피 장치에 사용하는 균형화 위치결정 시스템
US6525803B2 (en) Balanced positioning system for use in lithographic apparatus
JP5505871B2 (ja) 移動体装置及び露光装置
KR20020038592A (ko) 기판, 스테이지 장치, 스테이지 구동 방법, 노광 장치 및노광 방법
US7586218B2 (en) Moving apparatus, exposure apparatus, and device manufacturing method
US6504162B1 (en) Stage device, control system, and method for stabilizing wafer stage and wafer table
EP1111469B1 (en) Lithographic apparatus with a balanced positioning system
EP1111470B1 (en) Lithographic apparatus with a balanced positioning system
US20040119964A1 (en) Double isolation fine stage
US20060033043A1 (en) Stacked six degree-of-freedom table
EP1780771A1 (en) Aligning apparatus, aligning method, exposure apparatus, exposure method and device manufacturing method
JP2006173238A (ja) ステージ装置、露光装置及びデバイスの製造方法
US7692768B2 (en) Iron core motor driven automatic reticle blind
EP1335248A1 (en) Lithographic apparatus and device manufacturing method
HK1104377A (en) Aligning apparatus, aligning method, exposure apparatus, exposure method and device manufacturing method

Legal Events

Date Code Title Description
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

A201 Request for examination
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U11-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

R17-X000 Change to representative recorded

St.27 status event code: A-5-5-R10-R17-oth-X000

LAPS Lapse due to unpaid annual fee
PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20090406

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20090406

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000