KR100545928B1 - 용량식 진공 측정 셀 - Google Patents

용량식 진공 측정 셀 Download PDF

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Publication number
KR100545928B1
KR100545928B1 KR1020007006868A KR20007006868A KR100545928B1 KR 100545928 B1 KR100545928 B1 KR 100545928B1 KR 1020007006868 A KR1020007006868 A KR 1020007006868A KR 20007006868 A KR20007006868 A KR 20007006868A KR 100545928 B1 KR100545928 B1 KR 100545928B1
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KR
South Korea
Prior art keywords
membrane
measuring cell
housing body
vacuum
cell according
Prior art date
Application number
KR1020007006868A
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English (en)
Korean (ko)
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KR20010033399A (ko
Inventor
죠르크만페르
올슨래이
Original Assignee
어낵시스 발처스 리미티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication of KR20010033399A publication Critical patent/KR20010033399A/ko
Application granted granted Critical
Publication of KR100545928B1 publication Critical patent/KR100545928B1/ko

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
    • G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
    • G01L9/0072—Transmitting or indicating the displacement of flexible diaphragms using variations in capacitance
    • G01L9/0075—Transmitting or indicating the displacement of flexible diaphragms using variations in capacitance using a ceramic diaphragm, e.g. alumina, fused quartz, glass
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/43—Electric condenser making
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/43—Electric condenser making
    • Y10T29/435—Solid dielectric type
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49007—Indicating transducer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155—Manufacturing circuit on or in base
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49174—Assembling terminal to elongated conductor
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49204—Contact or terminal manufacturing
    • Y10T29/49224—Contact or terminal manufacturing with coating

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Measuring Fluid Pressure (AREA)
KR1020007006868A 1997-12-23 1998-12-04 용량식 진공 측정 셀 KR100545928B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CH2950/97 1997-12-23
CH295097 1997-12-23
PCT/CH1998/000515 WO1999034184A1 (de) 1997-12-23 1998-12-04 Kapazitive vakuummesszelle

Publications (2)

Publication Number Publication Date
KR20010033399A KR20010033399A (ko) 2001-04-25
KR100545928B1 true KR100545928B1 (ko) 2006-01-25

Family

ID=4245293

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020007006868A KR100545928B1 (ko) 1997-12-23 1998-12-04 용량식 진공 측정 셀

Country Status (8)

Country Link
US (2) US6591687B1 (de)
EP (2) EP1070239B1 (de)
JP (3) JP2002500351A (de)
KR (1) KR100545928B1 (de)
CN (1) CN1182378C (de)
DE (1) DE59803948D1 (de)
HK (1) HK1033975A1 (de)
WO (2) WO1999034184A1 (de)

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US20040099061A1 (en) * 1997-12-22 2004-05-27 Mks Instruments Pressure sensor for detecting small pressure differences and low pressures
JP4334139B2 (ja) * 1997-12-23 2009-09-30 インフィコン ゲゼルシャフト ミット ベシュレンクテル ハフツング 容量式の真空測定セルのためのダイヤフラム
DE10212947C1 (de) * 2002-03-22 2003-09-18 Nord Micro Ag & Co Ohg Drucksensor, insbesondere zur kapazitiven Bestimmung des Absolutdrucks
US6647794B1 (en) * 2002-05-06 2003-11-18 Rosemount Inc. Absolute pressure sensor
DE10223588B4 (de) * 2002-05-27 2013-08-01 Endress + Hauser Gmbh + Co. Kg Druckmessgerät und Verfahren zu seiner Herstellung
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CN103234692A (zh) * 2013-04-17 2013-08-07 上海祖发实业有限公司 一种传感型真空度测量装置
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WO2016180455A1 (de) 2015-05-08 2016-11-17 Inficon ag Verfahren zur verarbeitung eines messsignals einer druckmesszelle sowie eine messzellenanordnung
CN205262665U (zh) 2015-06-22 2016-05-25 意法半导体股份有限公司 压力传感器
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CN107843772A (zh) * 2016-09-19 2018-03-27 中国科学院微电子研究所 一种灵敏度倍增真空规管组
CN107843385A (zh) * 2016-09-19 2018-03-27 中国科学院微电子研究所 一种三氧化二铝薄膜真空规管
DE102018114300A1 (de) * 2018-06-14 2019-12-19 Endress+Hauser SE+Co. KG Druckmesseinrichtung und Verfahren zu deren Herstellung
CN109813490B (zh) * 2018-12-20 2020-12-08 兰州空间技术物理研究所 一种mems电容式真空规及其制作方法
CN110702301A (zh) * 2019-11-19 2020-01-17 川北真空科技(北京)有限公司 一种薄膜真空计
WO2021164853A1 (de) 2020-02-18 2021-08-26 Inficon ag Verfahren zur bestimmung eines druckes in einer druckmesszelle sowie eine messzellenanordnung
JP7444628B2 (ja) * 2020-02-19 2024-03-06 アズビル株式会社 圧力センサ
CN111664968A (zh) * 2020-07-15 2020-09-15 襄阳臻芯传感科技有限公司 一种陶瓷电容式压力传感器的制作方法
CN114001858B (zh) * 2020-07-28 2024-04-05 中微半导体设备(上海)股份有限公司 电容式薄膜真空计、等离子体反应装置和膜层制备方法
CN114486062B (zh) * 2022-03-31 2022-07-15 季华实验室 一种消除薄膜应力的电容薄膜真空计
CN115165163A (zh) * 2022-09-06 2022-10-11 昆山灵科传感技术有限公司 压力感测结构及其制作方法、压力传感器及其制作方法

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WO1995028624A1 (en) * 1994-04-14 1995-10-26 Cecap Ab Stabilized pressure sensor
EP0701112A2 (de) * 1994-09-06 1996-03-13 Ngk Insulators, Ltd. Membranstruktur aus Keramik mit einem konvexen Teil und Verfahren zu ihrer Herstellung

Also Published As

Publication number Publication date
CN1182378C (zh) 2004-12-29
JP4764468B2 (ja) 2011-09-07
EP1042657A1 (de) 2000-10-11
KR20010033399A (ko) 2001-04-25
US6591687B1 (en) 2003-07-15
JP2002500350A (ja) 2002-01-08
JP2009008693A (ja) 2009-01-15
HK1033975A1 (en) 2001-10-05
JP2002500351A (ja) 2002-01-08
US7140085B2 (en) 2006-11-28
US20040012942A1 (en) 2004-01-22
CN1283267A (zh) 2001-02-07
WO1999034184A1 (de) 1999-07-08
EP1070239A1 (de) 2001-01-24
WO1999034183A1 (de) 1999-07-08
EP1070239B1 (de) 2002-04-24
DE59803948D1 (de) 2002-05-29

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