KR100542419B1 - α-암모늄 케톤, 이미늄 케톤 또는 아미디늄 케톤 및 아릴 보레이트계의 광활성화 가능한 질소 함유 염기, 이의 제조방법 및 이를 포함하는 조성물 - Google Patents

α-암모늄 케톤, 이미늄 케톤 또는 아미디늄 케톤 및 아릴 보레이트계의 광활성화 가능한 질소 함유 염기, 이의 제조방법 및 이를 포함하는 조성물 Download PDF

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Publication number
KR100542419B1
KR100542419B1 KR1019997007769A KR19997007769A KR100542419B1 KR 100542419 B1 KR100542419 B1 KR 100542419B1 KR 1019997007769 A KR1019997007769 A KR 1019997007769A KR 19997007769 A KR19997007769 A KR 19997007769A KR 100542419 B1 KR100542419 B1 KR 100542419B1
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arh
formula
alkyl
ketones
phenyl
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Korean (ko)
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KR20000075701A (ko
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할-고울레베로니쿠에
터너신콜름
쿠닝함알란프란시스
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시바 스페셜티 케미칼스 홀딩 인크.
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/04Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters
    • C08F299/0485Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters from polyesters with side or terminal unsaturations
    • C08F299/0492Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters from polyesters with side or terminal unsaturations the unsaturation being in acrylic or methacrylic groups
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F5/00Compounds containing elements of Groups 3 or 13 of the Periodic Table
    • C07F5/02Boron compounds
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F5/00Compounds containing elements of Groups 3 or 13 of the Periodic Table
    • C07F5/02Boron compounds
    • C07F5/027Organoboranes and organoborohydrides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F4/00Polymerisation catalysts
    • C08F4/42Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors
    • C08F4/44Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors selected from light metals, zinc, cadmium, mercury, copper, silver, gold, boron, gallium, indium, thallium, rare earths or actinides
    • C08F4/52Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors selected from light metals, zinc, cadmium, mercury, copper, silver, gold, boron, gallium, indium, thallium, rare earths or actinides selected from boron, aluminium, gallium, indium, thallium or rare earths

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Polymerization Catalysts (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Luminescent Compositions (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Epoxy Resins (AREA)
KR1019997007769A 1997-02-26 1998-02-14 α-암모늄 케톤, 이미늄 케톤 또는 아미디늄 케톤 및 아릴 보레이트계의 광활성화 가능한 질소 함유 염기, 이의 제조방법 및 이를 포함하는 조성물 Expired - Fee Related KR100542419B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CH44497 1997-02-26
CH444/97 1997-02-26
PCT/EP1998/000846 WO1998038195A1 (en) 1997-02-26 1998-02-14 PHOTOACTIVATABLE NITROGEN-CONTAINING BASES BASED ON α-AMMONIUM KETONES, IMINIUM KETONES OR AMIDINIUM KETONES AND ARYL BORATES

Publications (2)

Publication Number Publication Date
KR20000075701A KR20000075701A (ko) 2000-12-26
KR100542419B1 true KR100542419B1 (ko) 2006-01-11

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KR1019997007769A Expired - Fee Related KR100542419B1 (ko) 1997-02-26 1998-02-14 α-암모늄 케톤, 이미늄 케톤 또는 아미디늄 케톤 및 아릴 보레이트계의 광활성화 가능한 질소 함유 염기, 이의 제조방법 및 이를 포함하는 조성물

Country Status (10)

Country Link
EP (1) EP1032576B1 (enExample)
JP (1) JP4155603B2 (enExample)
KR (1) KR100542419B1 (enExample)
AU (1) AU726375B2 (enExample)
BR (1) BR9807790B1 (enExample)
CA (1) CA2281860C (enExample)
DE (1) DE69839020T2 (enExample)
TW (1) TW425399B (enExample)
WO (1) WO1998038195A1 (enExample)
ZA (1) ZA981556B (enExample)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2459374C (en) 2001-10-17 2011-02-08 Ciba Specialty Chemicals Holding Inc. Photoactivable nitrogen bases
DE602004021604D1 (de) 2003-08-06 2009-07-30 Mitsubishi Gas Chemical Co Ammensetzung
EP1789188A2 (en) * 2004-07-21 2007-05-30 CIBA SPECIALTY CHEMICALS HOLDING INC. Patent Departement Process for the photoactivation and use of a catalyst by an inverted two-stage procedure
ATE524765T1 (de) * 2007-04-03 2011-09-15 Basf Se Fotoaktivierbare stickstoffbasen
KR101588912B1 (ko) * 2008-03-31 2016-01-26 산아프로 가부시키가이샤 광염기 발생제
TW201106101A (en) 2009-06-01 2011-02-16 Fujifilm Electronic Materials Chemically amplified positive photoresist composition
CN102971380B (zh) * 2010-06-30 2015-08-19 3M创新有限公司 包含双反应性硅烷官能团的可按需固化组合物
CN104080838B (zh) * 2011-12-29 2016-08-17 3M创新有限公司 可按需固化的聚硅氧烷涂料组合物
JP5912946B2 (ja) * 2012-01-11 2016-04-27 株式会社Adeka 感光性樹脂組成物
WO2013141014A1 (ja) 2012-03-22 2013-09-26 株式会社Adeka 新規化合物及び感光性樹脂組成物
JP5997041B2 (ja) * 2012-12-26 2016-09-21 東京応化工業株式会社 感光性樹脂組成物
JP5978138B2 (ja) * 2013-01-22 2016-08-24 株式会社Adeka 新規化合物及び感光性樹脂組成物
EP3023462A4 (en) 2013-07-18 2017-04-12 Cemedine Co., Ltd. Photocurable composition
KR102330121B1 (ko) 2013-12-13 2021-11-23 세메다인 가부시키 가이샤 접착성을 갖는 광경화성 조성물
JP6167089B2 (ja) * 2014-03-27 2017-07-19 富士フイルム株式会社 感光性樹脂組成物、硬化膜、硬化膜の製造方法および半導体デバイス
AU2016256186B2 (en) 2015-04-29 2020-01-16 Bsn Medical Gmbh Multi-step process for no production
JP6812361B2 (ja) 2015-04-29 2021-01-13 ビーエスエヌ メディカル ゲーエムベーハー 医療用入浴機器
EP3395800B1 (en) 2017-04-26 2021-11-03 Henkel AG & Co. KGaA Heterocyclic quaternary nitrogen compounds comprising a polymeric substituent and their use as a photolatent catalyst in curable compositions
BR112019010869A2 (pt) 2018-04-26 2020-03-03 Henkel Ag & Co. Kgaa Composto de nitrogênio quaternário para uso como um catalisador latente em composições curáveis
US12110360B2 (en) 2018-08-28 2024-10-08 Tokyo University Of Science Foundation Curable composition, cured product, and method of producing cured product
KR20230029579A (ko) 2020-06-26 2023-03-03 가부시키가이샤 아데카 조성물, 경화물 및 경화물의 제조 방법
WO2021261497A1 (ja) * 2020-06-26 2021-12-30 株式会社Adeka 化合物、開始剤、組成物、硬化物及び硬化物の製造方法
WO2025131912A1 (en) 2023-12-22 2025-06-26 Essilor International Latent borate-ammonium or iminium salts as photo-activatable catalysts for polythiourethane based substrates

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0377321A2 (en) * 1988-12-29 1990-07-11 Fuji Photo Film Co., Ltd. Photopolymerizable composition
JPH0770068A (ja) * 1993-09-01 1995-03-14 Toyo Ink Mfg Co Ltd ピリジニウム錯体およびその用途

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3412199B2 (ja) * 1993-09-01 2003-06-03 東洋インキ製造株式会社 重合性組成物およびその硬化物の製造方法
JPH09263063A (ja) * 1996-01-22 1997-10-07 Toyo Ink Mfg Co Ltd 感エネルギー線画像形成用組成物、それを用いた画像形成媒体、および画像形成方法
JPH09227854A (ja) * 1996-02-26 1997-09-02 Toyo Ink Mfg Co Ltd 感エネルギー線酸発生剤、感エネルギー線酸発生剤組成物、硬化性組成物およびその硬化物
JPH09241614A (ja) * 1996-03-04 1997-09-16 Toyo Ink Mfg Co Ltd 感エネルギー線酸発生剤、感エネルギー線酸発生剤組成物、硬化性組成物およびその硬化物
JPH09316117A (ja) * 1996-06-03 1997-12-09 Toyo Ink Mfg Co Ltd 重合性組成物およびその硬化物
JPH09328507A (ja) * 1996-06-10 1997-12-22 Toyo Ink Mfg Co Ltd 重合開始剤、重合性組成物およびその硬化物
JPH101508A (ja) * 1996-06-17 1998-01-06 Toyo Ink Mfg Co Ltd 感活性線酸発生剤組成物、感応性組成物および画像記録用組成物
JPH107709A (ja) * 1996-06-24 1998-01-13 Toyo Ink Mfg Co Ltd 感エネルギー線活性剤組成物、それを用いた感応性組成物ならびに画像形成用組成物

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0377321A2 (en) * 1988-12-29 1990-07-11 Fuji Photo Film Co., Ltd. Photopolymerizable composition
JPH0770068A (ja) * 1993-09-01 1995-03-14 Toyo Ink Mfg Co Ltd ピリジニウム錯体およびその用途

Also Published As

Publication number Publication date
EP1032576A1 (en) 2000-09-06
DE69839020T2 (de) 2009-03-19
ZA981556B (en) 1998-08-26
KR20000075701A (ko) 2000-12-26
EP1032576B1 (en) 2008-01-16
AU726375B2 (en) 2000-11-02
DE69839020D1 (de) 2008-03-06
BR9807790A (pt) 2000-02-15
CA2281860A1 (en) 1998-09-03
JP4155603B2 (ja) 2008-09-24
WO1998038195A1 (en) 1998-09-03
TW425399B (en) 2001-03-11
JP2001513765A (ja) 2001-09-04
AU6497298A (en) 1998-09-18
BR9807790B1 (pt) 2010-05-18
CA2281860C (en) 2007-04-10

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