CA2281860C - Photoactivatable nitrogen-containing bases based on .alpha.-ammonium ketones, iminium ketones or amidinium ketones and aryl borates - Google Patents

Photoactivatable nitrogen-containing bases based on .alpha.-ammonium ketones, iminium ketones or amidinium ketones and aryl borates Download PDF

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Publication number
CA2281860C
CA2281860C CA002281860A CA2281860A CA2281860C CA 2281860 C CA2281860 C CA 2281860C CA 002281860 A CA002281860 A CA 002281860A CA 2281860 A CA2281860 A CA 2281860A CA 2281860 C CA2281860 C CA 2281860C
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CA
Canada
Prior art keywords
arh
compound
c18alkyl
phenyl
component system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CA002281860A
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English (en)
French (fr)
Other versions
CA2281860A1 (en
Inventor
Veronique Hall-Goulle
Sean Colm Turner
Allan Francis Cunningham
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of CA2281860A1 publication Critical patent/CA2281860A1/en
Application granted granted Critical
Publication of CA2281860C publication Critical patent/CA2281860C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/04—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters
    • C08F299/0485—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters from polyesters with side or terminal unsaturations
    • C08F299/0492—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters from polyesters with side or terminal unsaturations the unsaturation being in acrylic or methacrylic groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
    • C07F5/02—Boron compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
    • C07F5/02—Boron compounds
    • C07F5/027—Organoboranes and organoborohydrides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F4/00—Polymerisation catalysts
    • C08F4/42—Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors
    • C08F4/44—Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors selected from light metals, zinc, cadmium, mercury, copper, silver, gold, boron, gallium, indium, thallium, rare earths or actinides
    • C08F4/52—Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors selected from light metals, zinc, cadmium, mercury, copper, silver, gold, boron, gallium, indium, thallium, rare earths or actinides selected from boron, aluminium, gallium, indium, thallium or rare earths

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerization Catalysts (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Luminescent Compositions (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
CA002281860A 1997-02-26 1998-02-14 Photoactivatable nitrogen-containing bases based on .alpha.-ammonium ketones, iminium ketones or amidinium ketones and aryl borates Expired - Fee Related CA2281860C (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CH444/97 1997-02-26
CH44497 1997-02-26
PCT/EP1998/000846 WO1998038195A1 (en) 1997-02-26 1998-02-14 PHOTOACTIVATABLE NITROGEN-CONTAINING BASES BASED ON α-AMMONIUM KETONES, IMINIUM KETONES OR AMIDINIUM KETONES AND ARYL BORATES

Publications (2)

Publication Number Publication Date
CA2281860A1 CA2281860A1 (en) 1998-09-03
CA2281860C true CA2281860C (en) 2007-04-10

Family

ID=4187172

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002281860A Expired - Fee Related CA2281860C (en) 1997-02-26 1998-02-14 Photoactivatable nitrogen-containing bases based on .alpha.-ammonium ketones, iminium ketones or amidinium ketones and aryl borates

Country Status (10)

Country Link
EP (1) EP1032576B1 (enExample)
JP (1) JP4155603B2 (enExample)
KR (1) KR100542419B1 (enExample)
AU (1) AU726375B2 (enExample)
BR (1) BR9807790B1 (enExample)
CA (1) CA2281860C (enExample)
DE (1) DE69839020T2 (enExample)
TW (1) TW425399B (enExample)
WO (1) WO1998038195A1 (enExample)
ZA (1) ZA981556B (enExample)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7538104B2 (en) 2001-10-17 2009-05-26 Ciba Specialty Chemicals Corporation Photoactivable nitrogen bases
KR101132907B1 (ko) 2003-08-06 2012-04-03 미츠비시 가스 가가쿠 가부시키가이샤 광경화성 조성물 및 코팅제 조성물
EP1789188A2 (en) * 2004-07-21 2007-05-30 CIBA SPECIALTY CHEMICALS HOLDING INC. Patent Departement Process for the photoactivation and use of a catalyst by an inverted two-stage procedure
JP5606308B2 (ja) * 2007-04-03 2014-10-15 ビーエーエスエフ ソシエタス・ヨーロピア 光活性窒素塩基
US8329771B2 (en) 2008-03-31 2012-12-11 San-Apro Limited Photobase generator
TW201106101A (en) 2009-06-01 2011-02-16 Fujifilm Electronic Materials Chemically amplified positive photoresist composition
CN102971381A (zh) * 2010-06-30 2013-03-13 3M创新有限公司 可按需固化的聚硅氧烷涂层组合物
WO2013101742A1 (en) * 2011-12-29 2013-07-04 3M Innovative Properties Company Curable-on-demand polysiloxane coating composition
JP5912946B2 (ja) * 2012-01-11 2016-04-27 株式会社Adeka 感光性樹脂組成物
CN104144912B (zh) 2012-03-22 2018-07-31 株式会社艾迪科 化合物以及感光性树脂组合物
JP5997041B2 (ja) * 2012-12-26 2016-09-21 東京応化工業株式会社 感光性樹脂組成物
JP5978138B2 (ja) * 2013-01-22 2016-08-24 株式会社Adeka 新規化合物及び感光性樹脂組成物
US20160152783A1 (en) 2013-07-18 2016-06-02 Cemedine Co., Ltd. Photocurable composition
WO2015088021A1 (ja) 2013-12-13 2015-06-18 セメダイン株式会社 接着性を有する光硬化性組成物
JP6167089B2 (ja) * 2014-03-27 2017-07-19 富士フイルム株式会社 感光性樹脂組成物、硬化膜、硬化膜の製造方法および半導体デバイス
JP6942058B2 (ja) 2015-04-29 2021-09-29 ビーエスエヌ メディカル ゲーエムベーハー No生成のための多段階プロセス
BR112017023170B1 (pt) 2015-04-29 2022-08-16 Bsn Medical Gmbh Dispositivo de banho medicinal e seu uso
EP3395800B1 (en) 2017-04-26 2021-11-03 Henkel AG & Co. KGaA Heterocyclic quaternary nitrogen compounds comprising a polymeric substituent and their use as a photolatent catalyst in curable compositions
KR20210003869A (ko) 2018-04-26 2021-01-12 헨켈 아게 운트 코. 카게아아 경화성 조성물에서 잠재성 촉매로서 사용하기 위한 4급 질소 화합물
JP7384418B2 (ja) 2018-08-28 2023-11-21 学校法人東京理科大学 硬化性組成物、硬化物、及び硬化物の製造方法
WO2021261497A1 (ja) * 2020-06-26 2021-12-30 株式会社Adeka 化合物、開始剤、組成物、硬化物及び硬化物の製造方法
JP7866938B2 (ja) * 2020-06-26 2026-05-28 株式会社Adeka 組成物、硬化物及び硬化物の製造方法
WO2025131912A1 (en) 2023-12-22 2025-06-26 Essilor International Latent borate-ammonium or iminium salts as photo-activatable catalysts for polythiourethane based substrates

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2571113B2 (ja) * 1988-12-29 1997-01-16 富士写真フイルム株式会社 光重合性組成物
JP3293258B2 (ja) * 1993-09-01 2002-06-17 東洋インキ製造株式会社 ピリジニウム錯体およびその用途
JP3412199B2 (ja) * 1993-09-01 2003-06-03 東洋インキ製造株式会社 重合性組成物およびその硬化物の製造方法
JPH09263063A (ja) * 1996-01-22 1997-10-07 Toyo Ink Mfg Co Ltd 感エネルギー線画像形成用組成物、それを用いた画像形成媒体、および画像形成方法
JPH09227854A (ja) * 1996-02-26 1997-09-02 Toyo Ink Mfg Co Ltd 感エネルギー線酸発生剤、感エネルギー線酸発生剤組成物、硬化性組成物およびその硬化物
JPH09241614A (ja) * 1996-03-04 1997-09-16 Toyo Ink Mfg Co Ltd 感エネルギー線酸発生剤、感エネルギー線酸発生剤組成物、硬化性組成物およびその硬化物
JPH09316117A (ja) * 1996-06-03 1997-12-09 Toyo Ink Mfg Co Ltd 重合性組成物およびその硬化物
JPH09328507A (ja) * 1996-06-10 1997-12-22 Toyo Ink Mfg Co Ltd 重合開始剤、重合性組成物およびその硬化物
JPH101508A (ja) * 1996-06-17 1998-01-06 Toyo Ink Mfg Co Ltd 感活性線酸発生剤組成物、感応性組成物および画像記録用組成物
JPH107709A (ja) * 1996-06-24 1998-01-13 Toyo Ink Mfg Co Ltd 感エネルギー線活性剤組成物、それを用いた感応性組成物ならびに画像形成用組成物

Also Published As

Publication number Publication date
WO1998038195A1 (en) 1998-09-03
DE69839020T2 (de) 2009-03-19
BR9807790A (pt) 2000-02-15
AU726375B2 (en) 2000-11-02
EP1032576B1 (en) 2008-01-16
JP4155603B2 (ja) 2008-09-24
TW425399B (en) 2001-03-11
EP1032576A1 (en) 2000-09-06
KR20000075701A (ko) 2000-12-26
AU6497298A (en) 1998-09-18
JP2001513765A (ja) 2001-09-04
CA2281860A1 (en) 1998-09-03
ZA981556B (en) 1998-08-26
KR100542419B1 (ko) 2006-01-11
BR9807790B1 (pt) 2010-05-18
DE69839020D1 (de) 2008-03-06

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