DE69839020D1 - Photoaktivierbare stcikstoffhaltige basen auf der grundlage von alpha-ammoniumketonen, iminiumketonen oder amidiniumketonen und arylboraten - Google Patents

Photoaktivierbare stcikstoffhaltige basen auf der grundlage von alpha-ammoniumketonen, iminiumketonen oder amidiniumketonen und arylboraten

Info

Publication number
DE69839020D1
DE69839020D1 DE69839020T DE69839020T DE69839020D1 DE 69839020 D1 DE69839020 D1 DE 69839020D1 DE 69839020 T DE69839020 T DE 69839020T DE 69839020 T DE69839020 T DE 69839020T DE 69839020 D1 DE69839020 D1 DE 69839020D1
Authority
DE
Germany
Prior art keywords
ketones
stcic
arylborates
photoactivable
iminium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69839020T
Other languages
English (en)
Other versions
DE69839020T2 (de
Inventor
Veronique Hall-Goulle
Sean Colm Turner
Allan Francis Cunningham
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Ciba SC Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG, Ciba SC Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of DE69839020D1 publication Critical patent/DE69839020D1/de
Application granted granted Critical
Publication of DE69839020T2 publication Critical patent/DE69839020T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/04—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters
    • C08F299/0485—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters from polyesters with side or terminal unsaturations
    • C08F299/0492—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters from polyesters with side or terminal unsaturations the unsaturation being in acrylic or methacrylic groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
    • C07F5/02—Boron compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
    • C07F5/02—Boron compounds
    • C07F5/027—Organoboranes and organoborohydrides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F4/00—Polymerisation catalysts
    • C08F4/42—Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors
    • C08F4/44—Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors selected from light metals, zinc, cadmium, mercury, copper, silver, gold, boron, gallium, indium, thallium, rare earths or actinides
    • C08F4/52—Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors selected from light metals, zinc, cadmium, mercury, copper, silver, gold, boron, gallium, indium, thallium, rare earths or actinides selected from boron, aluminium, gallium, indium, thallium or rare earths

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Luminescent Compositions (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Polymerisation Methods In General (AREA)
  • Polymerization Catalysts (AREA)
  • Epoxy Resins (AREA)
DE69839020T 1997-02-26 1998-02-14 Photoaktivierbare stickstoffhaltige Basen auf Basis von ALPHA-Ammonium-, Iminium- oder Amidiniumketonen und Arylboraten Expired - Lifetime DE69839020T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CH44497 1997-02-26
CH44497 1997-02-26
PCT/EP1998/000846 WO1998038195A1 (en) 1997-02-26 1998-02-14 PHOTOACTIVATABLE NITROGEN-CONTAINING BASES BASED ON α-AMMONIUM KETONES, IMINIUM KETONES OR AMIDINIUM KETONES AND ARYL BORATES

Publications (2)

Publication Number Publication Date
DE69839020D1 true DE69839020D1 (de) 2008-03-06
DE69839020T2 DE69839020T2 (de) 2009-03-19

Family

ID=4187172

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69839020T Expired - Lifetime DE69839020T2 (de) 1997-02-26 1998-02-14 Photoaktivierbare stickstoffhaltige Basen auf Basis von ALPHA-Ammonium-, Iminium- oder Amidiniumketonen und Arylboraten

Country Status (10)

Country Link
EP (1) EP1032576B1 (de)
JP (1) JP4155603B2 (de)
KR (1) KR100542419B1 (de)
AU (1) AU726375B2 (de)
BR (1) BR9807790B1 (de)
CA (1) CA2281860C (de)
DE (1) DE69839020T2 (de)
TW (1) TW425399B (de)
WO (1) WO1998038195A1 (de)
ZA (1) ZA981556B (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100938769B1 (ko) 2001-10-17 2010-01-27 시바 홀딩 인크 광활성화 가능한 질소 염기
JP4765626B2 (ja) * 2003-08-06 2011-09-07 三菱瓦斯化学株式会社 光硬化性組成物及びコーティング剤組成物
KR101166746B1 (ko) * 2004-07-21 2012-07-27 시바 홀딩 인크 반전 2단계 공정에 의한 촉매의 광활성화 방법 및 당해촉매의 용도
EP2145231B1 (de) 2007-04-03 2011-09-14 Basf Se Fotoaktivierbare stickstoffbasen
JP5801052B2 (ja) * 2008-03-31 2015-10-28 サンアプロ株式会社 光塩基発生剤
TW201106101A (en) * 2009-06-01 2011-02-16 Fujifilm Electronic Materials Chemically amplified positive photoresist composition
CN102971381A (zh) * 2010-06-30 2013-03-13 3M创新有限公司 可按需固化的聚硅氧烷涂层组合物
CN104080838B (zh) * 2011-12-29 2016-08-17 3M创新有限公司 可按需固化的聚硅氧烷涂料组合物
JP5912946B2 (ja) * 2012-01-11 2016-04-27 株式会社Adeka 感光性樹脂組成物
JP6208119B2 (ja) 2012-03-22 2017-10-04 株式会社Adeka 新規化合物及び感光性樹脂組成物
JP5997041B2 (ja) * 2012-12-26 2016-09-21 東京応化工業株式会社 感光性樹脂組成物
JP5978138B2 (ja) * 2013-01-22 2016-08-24 株式会社Adeka 新規化合物及び感光性樹脂組成物
US20160152783A1 (en) 2013-07-18 2016-06-02 Cemedine Co., Ltd. Photocurable composition
JP6409784B2 (ja) 2013-12-13 2018-10-24 セメダイン株式会社 接着性を有する光硬化性組成物
JP6167089B2 (ja) * 2014-03-27 2017-07-19 富士フイルム株式会社 感光性樹脂組成物、硬化膜、硬化膜の製造方法および半導体デバイス
CA2984033C (en) 2015-04-29 2023-08-15 Bsn Medical Gmbh Medical bathing equipment
CA2984044A1 (en) 2015-04-29 2016-11-03 Bsn Medical Gmbh Multi-step process for nitric oxide (no) production
EP3395800B1 (de) 2017-04-26 2021-11-03 Henkel AG & Co. KGaA Einem polymeren substituenten beinhaltende heterozyclische quaternäre stickstoffverbindungen und ihre verwendung als photolatenter katalysator in härtbaren zusammensetzungen
WO2019206416A1 (en) 2018-04-26 2019-10-31 Henkel Ag & Co. Kgaa A quaternary nitrogen compound for use as a latent catalyst in curable compositions
EP3845577B1 (de) 2018-08-28 2023-05-10 Tokyo University of Science Foundation Härtbare zusammensetzung, gehärtetes produkt und verfahren zur herstellung des gehärteten produkts
WO2021261497A1 (ja) * 2020-06-26 2021-12-30 株式会社Adeka 化合物、開始剤、組成物、硬化物及び硬化物の製造方法
JPWO2021261498A1 (de) 2020-06-26 2021-12-30

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2571113B2 (ja) * 1988-12-29 1997-01-16 富士写真フイルム株式会社 光重合性組成物
JP3293258B2 (ja) * 1993-09-01 2002-06-17 東洋インキ製造株式会社 ピリジニウム錯体およびその用途
JP3412199B2 (ja) * 1993-09-01 2003-06-03 東洋インキ製造株式会社 重合性組成物およびその硬化物の製造方法
JPH09263063A (ja) * 1996-01-22 1997-10-07 Toyo Ink Mfg Co Ltd 感エネルギー線画像形成用組成物、それを用いた画像形成媒体、および画像形成方法
JPH09227854A (ja) * 1996-02-26 1997-09-02 Toyo Ink Mfg Co Ltd 感エネルギー線酸発生剤、感エネルギー線酸発生剤組成物、硬化性組成物およびその硬化物
JPH09241614A (ja) * 1996-03-04 1997-09-16 Toyo Ink Mfg Co Ltd 感エネルギー線酸発生剤、感エネルギー線酸発生剤組成物、硬化性組成物およびその硬化物
JPH09316117A (ja) * 1996-06-03 1997-12-09 Toyo Ink Mfg Co Ltd 重合性組成物およびその硬化物
JPH09328507A (ja) * 1996-06-10 1997-12-22 Toyo Ink Mfg Co Ltd 重合開始剤、重合性組成物およびその硬化物
JPH101508A (ja) * 1996-06-17 1998-01-06 Toyo Ink Mfg Co Ltd 感活性線酸発生剤組成物、感応性組成物および画像記録用組成物
JPH107709A (ja) * 1996-06-24 1998-01-13 Toyo Ink Mfg Co Ltd 感エネルギー線活性剤組成物、それを用いた感応性組成物ならびに画像形成用組成物

Also Published As

Publication number Publication date
KR20000075701A (ko) 2000-12-26
TW425399B (en) 2001-03-11
KR100542419B1 (ko) 2006-01-11
CA2281860C (en) 2007-04-10
ZA981556B (en) 1998-08-26
JP4155603B2 (ja) 2008-09-24
EP1032576B1 (de) 2008-01-16
AU6497298A (en) 1998-09-18
DE69839020T2 (de) 2009-03-19
AU726375B2 (en) 2000-11-02
WO1998038195A1 (en) 1998-09-03
JP2001513765A (ja) 2001-09-04
BR9807790B1 (pt) 2010-05-18
CA2281860A1 (en) 1998-09-03
BR9807790A (pt) 2000-02-15
EP1032576A1 (de) 2000-09-06

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Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: CIBA HOLDING INC., BASEL, CH

8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Representative=s name: MAIWALD PATENTANWALTSGESELLSCHAFT MBH, 80335 MUENC