DE69709156D1 - Stabile lösungen bestehend aus silsesquioxanen oder silikonharze und einen lösungsmittel auf basis von silikon - Google Patents

Stabile lösungen bestehend aus silsesquioxanen oder silikonharze und einen lösungsmittel auf basis von silikon

Info

Publication number
DE69709156D1
DE69709156D1 DE69709156T DE69709156T DE69709156D1 DE 69709156 D1 DE69709156 D1 DE 69709156D1 DE 69709156 T DE69709156 T DE 69709156T DE 69709156 T DE69709156 T DE 69709156T DE 69709156 D1 DE69709156 D1 DE 69709156D1
Authority
DE
Germany
Prior art keywords
silicone
silsesquioxanes
solvent based
stable solutions
solutions consisting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69709156T
Other languages
English (en)
Other versions
DE69709156T2 (de
Inventor
P Hacker
Todd Krajewski
Scott Lefferts
Gary Davis
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honeywell International Inc
Original Assignee
AlliedSignal Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AlliedSignal Inc filed Critical AlliedSignal Inc
Publication of DE69709156D1 publication Critical patent/DE69709156D1/de
Application granted granted Critical
Publication of DE69709156T2 publication Critical patent/DE69709156T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00Processes of treating or compounding macromolecular substances
    • C08J3/02Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques
    • C08J3/09Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques in organic liquids
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00Processes of treating or compounding macromolecular substances
    • C08J3/02Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques
    • C08J3/09Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques in organic liquids
    • C08J3/091Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques in organic liquids characterised by the chemical constitution of the organic liquid
    • C08J3/098Other compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00Processes of treating or compounding macromolecular substances
    • C08J3/02Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques
    • C08J3/09Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques in organic liquids
    • C08J3/091Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques in organic liquids characterised by the chemical constitution of the organic liquid
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2383/00Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
    • C08J2383/04Polysiloxanes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Paints Or Removers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Silicon Polymers (AREA)
DE69709156T 1996-10-29 1997-10-27 Stabile lösungen bestehend aus silsesquioxanen oder silikonharze und einen lösungsmittel auf basis von silikon Expired - Fee Related DE69709156T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US2923596P 1996-10-29 1996-10-29
US08/955,802 US6020410A (en) 1996-10-29 1997-10-22 Stable solution of a silsesquioxane or siloxane resin and a silicone solvent
PCT/US1997/019299 WO1998018850A1 (en) 1996-10-29 1997-10-27 Stable solutions of a silsesquioxane or siloxane resin and a silicone solvent

Publications (2)

Publication Number Publication Date
DE69709156D1 true DE69709156D1 (de) 2002-01-24
DE69709156T2 DE69709156T2 (de) 2002-08-22

Family

ID=26704717

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69709156T Expired - Fee Related DE69709156T2 (de) 1996-10-29 1997-10-27 Stabile lösungen bestehend aus silsesquioxanen oder silikonharze und einen lösungsmittel auf basis von silikon

Country Status (8)

Country Link
US (1) US6020410A (de)
EP (1) EP0935632B1 (de)
JP (1) JP2002514238A (de)
KR (1) KR100512293B1 (de)
AU (1) AU5087298A (de)
CA (1) CA2269952A1 (de)
DE (1) DE69709156T2 (de)
WO (1) WO1998018850A1 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6287477B1 (en) * 1999-10-18 2001-09-11 Honeywell International Inc. Solvents for processing silsesquioxane and siloxane resins
US6509138B2 (en) 2000-01-12 2003-01-21 Semiconductor Research Corporation Solventless, resistless direct dielectric patterning
US6384119B1 (en) 2000-06-22 2002-05-07 Basf Corporation Coating compositions comprising volatile linear siloxane fluids
US20030096090A1 (en) * 2001-10-22 2003-05-22 Boisvert Ronald Paul Etch-stop resins
US6852367B2 (en) * 2001-11-20 2005-02-08 Shipley Company, L.L.C. Stable composition
US20040033371A1 (en) * 2002-05-16 2004-02-19 Hacker Nigel P. Deposition of organosilsesquioxane films
US8901268B2 (en) * 2004-08-03 2014-12-02 Ahila Krishnamoorthy Compositions, layers and films for optoelectronic devices, methods of production and uses thereof
JP2008547194A (ja) * 2005-06-15 2008-12-25 ダウ・コーニング・コーポレイション 水素シルセスキオキサンを硬化させていき、ナノスケールのトレンチ中において密にさせる方法
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
CN102666731B (zh) * 2009-12-04 2014-12-31 道康宁公司 硅倍半氧烷树脂的稳定化
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
JP6800879B2 (ja) * 2015-03-30 2020-12-16 メルク パテント ゲーエムベーハー シロキサン溶媒を含む有機機能性材料の調合物
JP6803842B2 (ja) 2015-04-13 2020-12-23 ハネウェル・インターナショナル・インコーポレーテッドHoneywell International Inc. オプトエレクトロニクス用途のためのポリシロキサン製剤及びコーティング
DE102017211727A1 (de) * 2017-07-10 2019-01-10 Tridonic Jennersdorf Gmbh Gebondete LED-Chips in einer Polymermatrix

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3615272A (en) * 1968-11-04 1971-10-26 Dow Corning Condensed soluble hydrogensilsesquioxane resin
US4756977A (en) * 1986-12-03 1988-07-12 Dow Corning Corporation Multilayer ceramics from hydrogen silsesquioxane
US4999397A (en) * 1989-07-28 1991-03-12 Dow Corning Corporation Metastable silane hydrolyzates and process for their preparation
US5010159A (en) * 1989-09-01 1991-04-23 Dow Corning Corporation Process for the synthesis of soluble, condensed hydridosilicon resins containing low levels of silanol
CA2027031A1 (en) * 1989-10-18 1991-04-19 Loren A. Haluska Hermetic substrate coatings in an inert gas atmosphere
US5091162A (en) * 1990-10-01 1992-02-25 Dow Corning Corporation Perhydrosiloxane copolymers and their use as coating materials
GB9105372D0 (en) * 1991-03-14 1991-05-01 Dow Corning Sa Method of making siloxane compositions
US5145723A (en) * 1991-06-05 1992-09-08 Dow Corning Corporation Process for coating a substrate with silica
JP3174416B2 (ja) * 1992-12-10 2001-06-11 ダウ・コ−ニング・コ−ポレ−ション 酸化ケイ素膜の形成方法
JP3210457B2 (ja) * 1992-12-14 2001-09-17 ダウ・コ−ニング・コ−ポレ−ション 酸化ケイ素膜の形成方法
TW492989B (en) * 1993-03-19 2002-07-01 Dow Corning Stabilization of hydrogen silsesquioxane resin solutions
US5320868A (en) * 1993-09-13 1994-06-14 Dow Corning Corporation Method of forming SI-O containing coatings
JPH07300560A (ja) * 1994-05-02 1995-11-14 Shin Etsu Chem Co Ltd シリコーン組成物
US5707683A (en) * 1996-02-22 1998-01-13 Dow Corning Corporation Electronic coating composition method of coating an electronic substrate, composition and article

Also Published As

Publication number Publication date
AU5087298A (en) 1998-05-22
CA2269952A1 (en) 1998-05-07
US6020410A (en) 2000-02-01
DE69709156T2 (de) 2002-08-22
KR20000052937A (ko) 2000-08-25
EP0935632B1 (de) 2001-12-12
KR100512293B1 (ko) 2005-09-05
EP0935632A1 (de) 1999-08-18
JP2002514238A (ja) 2002-05-14
WO1998018850A1 (en) 1998-05-07

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee