JP4155603B2 - α−アンモニウムケトン、イミニウムケトンまたはアミジニウムケトンおよびアリールボラートに基づく、光による活性化が可能な窒素含有塩基 - Google Patents

α−アンモニウムケトン、イミニウムケトンまたはアミジニウムケトンおよびアリールボラートに基づく、光による活性化が可能な窒素含有塩基 Download PDF

Info

Publication number
JP4155603B2
JP4155603B2 JP53724898A JP53724898A JP4155603B2 JP 4155603 B2 JP4155603 B2 JP 4155603B2 JP 53724898 A JP53724898 A JP 53724898A JP 53724898 A JP53724898 A JP 53724898A JP 4155603 B2 JP4155603 B2 JP 4155603B2
Authority
JP
Japan
Prior art keywords
arh
formula
alkyl
group
phenyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP53724898A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001513765A5 (enExample
JP2001513765A (ja
Inventor
オール−グール,ベロニク
コルム ターナー,ショーン
フランシス カニングハム,アラン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of JP2001513765A publication Critical patent/JP2001513765A/ja
Publication of JP2001513765A5 publication Critical patent/JP2001513765A5/ja
Application granted granted Critical
Publication of JP4155603B2 publication Critical patent/JP4155603B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/04Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters
    • C08F299/0485Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters from polyesters with side or terminal unsaturations
    • C08F299/0492Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters from polyesters with side or terminal unsaturations the unsaturation being in acrylic or methacrylic groups
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F5/00Compounds containing elements of Groups 3 or 13 of the Periodic Table
    • C07F5/02Boron compounds
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F5/00Compounds containing elements of Groups 3 or 13 of the Periodic Table
    • C07F5/02Boron compounds
    • C07F5/027Organoboranes and organoborohydrides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F4/00Polymerisation catalysts
    • C08F4/42Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors
    • C08F4/44Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors selected from light metals, zinc, cadmium, mercury, copper, silver, gold, boron, gallium, indium, thallium, rare earths or actinides
    • C08F4/52Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors selected from light metals, zinc, cadmium, mercury, copper, silver, gold, boron, gallium, indium, thallium, rare earths or actinides selected from boron, aluminium, gallium, indium, thallium or rare earths

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerization Catalysts (AREA)
  • Polymerisation Methods In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Epoxy Resins (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Luminescent Compositions (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
JP53724898A 1997-02-26 1998-02-14 α−アンモニウムケトン、イミニウムケトンまたはアミジニウムケトンおよびアリールボラートに基づく、光による活性化が可能な窒素含有塩基 Expired - Fee Related JP4155603B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CH444/97 1997-02-26
CH44497 1997-02-26
PCT/EP1998/000846 WO1998038195A1 (en) 1997-02-26 1998-02-14 PHOTOACTIVATABLE NITROGEN-CONTAINING BASES BASED ON α-AMMONIUM KETONES, IMINIUM KETONES OR AMIDINIUM KETONES AND ARYL BORATES

Publications (3)

Publication Number Publication Date
JP2001513765A JP2001513765A (ja) 2001-09-04
JP2001513765A5 JP2001513765A5 (enExample) 2005-10-06
JP4155603B2 true JP4155603B2 (ja) 2008-09-24

Family

ID=4187172

Family Applications (1)

Application Number Title Priority Date Filing Date
JP53724898A Expired - Fee Related JP4155603B2 (ja) 1997-02-26 1998-02-14 α−アンモニウムケトン、イミニウムケトンまたはアミジニウムケトンおよびアリールボラートに基づく、光による活性化が可能な窒素含有塩基

Country Status (10)

Country Link
EP (1) EP1032576B1 (enExample)
JP (1) JP4155603B2 (enExample)
KR (1) KR100542419B1 (enExample)
AU (1) AU726375B2 (enExample)
BR (1) BR9807790B1 (enExample)
CA (1) CA2281860C (enExample)
DE (1) DE69839020T2 (enExample)
TW (1) TW425399B (enExample)
WO (1) WO1998038195A1 (enExample)
ZA (1) ZA981556B (enExample)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE360629T1 (de) 2001-10-17 2007-05-15 Ciba Sc Holding Ag Photoaktivierbare stickstoffbasen
EP1652870B1 (en) 2003-08-06 2009-06-17 Mitsubishi Gas Chemical Company, Inc. Photocurable composition and coating composition
JP2008506826A (ja) * 2004-07-21 2008-03-06 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド 光活性化方法及び逆転した2段階工程による触媒の使用
CA2681201C (en) 2007-04-03 2016-06-14 Basf Se Photoactivable nitrogen bases
KR101588912B1 (ko) * 2008-03-31 2016-01-26 산아프로 가부시키가이샤 광염기 발생제
TW201106101A (en) * 2009-06-01 2011-02-16 Fujifilm Electronic Materials Chemically amplified positive photoresist composition
US8968868B2 (en) * 2010-06-30 2015-03-03 3M Innovative Properties Company Curable-on-demand composition comprising dual reactive silane functionality
JP6336398B2 (ja) * 2011-12-29 2018-06-06 スリーエム イノベイティブ プロパティズ カンパニー オンデマンド型硬化性ポリシロキサンコーティング組成物
JP5912946B2 (ja) * 2012-01-11 2016-04-27 株式会社Adeka 感光性樹脂組成物
EP2829534B1 (en) 2012-03-22 2019-10-09 Adeka Corporation Novel compound and photosensitive resin composition
JP5997041B2 (ja) * 2012-12-26 2016-09-21 東京応化工業株式会社 感光性樹脂組成物
JP5978138B2 (ja) * 2013-01-22 2016-08-24 株式会社Adeka 新規化合物及び感光性樹脂組成物
KR102305831B1 (ko) 2013-07-18 2021-09-27 세메다인 가부시키 가이샤 광경화성 조성물, 경화물 및 그의 제조 방법, 그리고 관련 제품 및 그의 제조 방법
JP6409784B2 (ja) 2013-12-13 2018-10-24 セメダイン株式会社 接着性を有する光硬化性組成物
JP6167089B2 (ja) * 2014-03-27 2017-07-19 富士フイルム株式会社 感光性樹脂組成物、硬化膜、硬化膜の製造方法および半導体デバイス
MX375374B (es) 2015-04-29 2025-03-06 Bsn Medical Gmbh Dispositivo de baño médico.
CA2984044A1 (en) 2015-04-29 2016-11-03 Bsn Medical Gmbh Steady-state no production via ph control
EP3395800B1 (en) 2017-04-26 2021-11-03 Henkel AG & Co. KGaA Heterocyclic quaternary nitrogen compounds comprising a polymeric substituent and their use as a photolatent catalyst in curable compositions
WO2019206416A1 (en) 2018-04-26 2019-10-31 Henkel Ag & Co. Kgaa A quaternary nitrogen compound for use as a latent catalyst in curable compositions
CN112805311A (zh) 2018-08-28 2021-05-14 学校法人东京理科大学 固化性组合物、固化物和固化物的制造方法
JP7731353B2 (ja) * 2020-06-26 2025-08-29 株式会社Adeka 化合物、開始剤、組成物、硬化物及び硬化物の製造方法
KR20230029579A (ko) 2020-06-26 2023-03-03 가부시키가이샤 아데카 조성물, 경화물 및 경화물의 제조 방법
WO2025131912A1 (en) 2023-12-22 2025-06-26 Essilor International Latent borate-ammonium or iminium salts as photo-activatable catalysts for polythiourethane based substrates

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2571113B2 (ja) * 1988-12-29 1997-01-16 富士写真フイルム株式会社 光重合性組成物
JP3293258B2 (ja) * 1993-09-01 2002-06-17 東洋インキ製造株式会社 ピリジニウム錯体およびその用途
JP3412199B2 (ja) * 1993-09-01 2003-06-03 東洋インキ製造株式会社 重合性組成物およびその硬化物の製造方法
JPH09263063A (ja) * 1996-01-22 1997-10-07 Toyo Ink Mfg Co Ltd 感エネルギー線画像形成用組成物、それを用いた画像形成媒体、および画像形成方法
JPH09227854A (ja) * 1996-02-26 1997-09-02 Toyo Ink Mfg Co Ltd 感エネルギー線酸発生剤、感エネルギー線酸発生剤組成物、硬化性組成物およびその硬化物
JPH09241614A (ja) * 1996-03-04 1997-09-16 Toyo Ink Mfg Co Ltd 感エネルギー線酸発生剤、感エネルギー線酸発生剤組成物、硬化性組成物およびその硬化物
JPH09316117A (ja) * 1996-06-03 1997-12-09 Toyo Ink Mfg Co Ltd 重合性組成物およびその硬化物
JPH09328507A (ja) * 1996-06-10 1997-12-22 Toyo Ink Mfg Co Ltd 重合開始剤、重合性組成物およびその硬化物
JPH101508A (ja) * 1996-06-17 1998-01-06 Toyo Ink Mfg Co Ltd 感活性線酸発生剤組成物、感応性組成物および画像記録用組成物
JPH107709A (ja) * 1996-06-24 1998-01-13 Toyo Ink Mfg Co Ltd 感エネルギー線活性剤組成物、それを用いた感応性組成物ならびに画像形成用組成物

Also Published As

Publication number Publication date
BR9807790B1 (pt) 2010-05-18
KR20000075701A (ko) 2000-12-26
AU6497298A (en) 1998-09-18
AU726375B2 (en) 2000-11-02
CA2281860C (en) 2007-04-10
TW425399B (en) 2001-03-11
DE69839020D1 (de) 2008-03-06
EP1032576A1 (en) 2000-09-06
EP1032576B1 (en) 2008-01-16
KR100542419B1 (ko) 2006-01-11
BR9807790A (pt) 2000-02-15
WO1998038195A1 (en) 1998-09-03
CA2281860A1 (en) 1998-09-03
DE69839020T2 (de) 2009-03-19
JP2001513765A (ja) 2001-09-04
ZA981556B (en) 1998-08-26

Similar Documents

Publication Publication Date Title
KR100505529B1 (ko) α-아미노 케톤을 기본으로 하는 광 활성화 질소 함유 염기
JP4155603B2 (ja) α−アンモニウムケトン、イミニウムケトンまたはアミジニウムケトンおよびアリールボラートに基づく、光による活性化が可能な窒素含有塩基
KR100527614B1 (ko) α-아미노 알켄 화합물, 이의 제조방법 및 당해 화합물을 포함하는 조성물
KR100938769B1 (ko) 광활성화 가능한 질소 염기
US6489374B1 (en) Photoactivatable bases containing nitrogen
AU2002346968A1 (en) Photoactivable nitrogen bases
US6551761B1 (en) Photoactivatable nitrogen-containing bases based on α-ammonium ketones, iminium ketones or amidinium ketones and aryl borates
MXPA99007895A (en) PHOTOACTIVATABLE NITROGEN-CONTAINING BASES BASED ON&agr;-AMMONIUM KETONES, IMINIUM KETONES OR AMIDINIUM KETONES AND ARYL BORATES
MXPA99008508A (en) PHOTOACTIVATABLE NITROGEN-CONTAINING BASES BASED ON&agr;-AMINO ALKENES

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050210

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20050210

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20071204

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20080221

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20080331

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080515

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20080701

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20080708

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110718

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110718

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120718

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120718

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130718

Year of fee payment: 5

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees