ATE524765T1 - Fotoaktivierbare stickstoffbasen - Google Patents
Fotoaktivierbare stickstoffbasenInfo
- Publication number
- ATE524765T1 ATE524765T1 AT08718153T AT08718153T ATE524765T1 AT E524765 T1 ATE524765 T1 AT E524765T1 AT 08718153 T AT08718153 T AT 08718153T AT 08718153 T AT08718153 T AT 08718153T AT E524765 T1 ATE524765 T1 AT E524765T1
- Authority
- AT
- Austria
- Prior art keywords
- alkyl
- hydrogen
- nitrogen bases
- unsubstituted
- substituted
- Prior art date
Links
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 title 2
- 229910052757 nitrogen Inorganic materials 0.000 title 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 3
- 239000001257 hydrogen Substances 0.000 abstract 3
- 125000006702 (C1-C18) alkyl group Chemical group 0.000 abstract 2
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 abstract 2
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 abstract 2
- 125000006656 (C2-C4) alkenyl group Chemical group 0.000 abstract 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- 101001043818 Mus musculus Interleukin-31 receptor subunit alpha Proteins 0.000 abstract 1
- 125000002529 biphenylenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3C12)* 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 150000002431 hydrogen Chemical class 0.000 abstract 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 abstract 1
- 125000005647 linker group Chemical group 0.000 abstract 1
- 125000004957 naphthylene group Chemical group 0.000 abstract 1
- 229910052760 oxygen Inorganic materials 0.000 abstract 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 abstract 1
- 229910052717 sulfur Inorganic materials 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
- C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
- C07D487/04—Ortho-condensed systems
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
- G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Ceramic Engineering (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Paints Or Removers (AREA)
- Polymerisation Methods In General (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
- Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
- Indole Compounds (AREA)
- Plural Heterocyclic Compounds (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP07105510 | 2007-04-03 | ||
| PCT/EP2008/053456 WO2008119688A1 (en) | 2007-04-03 | 2008-03-25 | Photoactivable nitrogen bases |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE524765T1 true ATE524765T1 (de) | 2011-09-15 |
Family
ID=38016564
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT08718153T ATE524765T1 (de) | 2007-04-03 | 2008-03-25 | Fotoaktivierbare stickstoffbasen |
Country Status (9)
| Country | Link |
|---|---|
| US (3) | US9921477B2 (de) |
| EP (1) | EP2145231B1 (de) |
| JP (1) | JP5606308B2 (de) |
| KR (2) | KR101944734B1 (de) |
| CN (1) | CN101641643B (de) |
| AT (1) | ATE524765T1 (de) |
| CA (1) | CA2681201C (de) |
| MX (1) | MX2009010309A (de) |
| WO (1) | WO2008119688A1 (de) |
Families Citing this family (39)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BRPI0717655B1 (pt) * | 2006-09-29 | 2018-12-18 | Basf Se | bases fotolatentes para sistema à base de isocianatos bloqueados |
| ATE524765T1 (de) | 2007-04-03 | 2011-09-15 | Basf Se | Fotoaktivierbare stickstoffbasen |
| EP2285836B1 (de) * | 2008-06-06 | 2012-01-18 | Basf Se | Fotoinitiatormischungen |
| CN101967343A (zh) * | 2010-10-22 | 2011-02-09 | 广州市博兴化工科技有限公司 | 一种光固化色漆 |
| GB2491643A (en) | 2011-06-10 | 2012-12-12 | Lambson Ltd | Method of forming a polymeric material on a substrate |
| US9616460B2 (en) | 2011-12-02 | 2017-04-11 | Toyota Motor Engineering & Manufacturing North America, Inc. | Terminate-on-demand cationic polymerization method for forming a two-dimensional coating |
| US9758607B2 (en) | 2013-10-10 | 2017-09-12 | Research Foundation Of The City University Of New York | Polymer with antibacterial activity |
| DE102014202609B4 (de) | 2014-02-13 | 2020-06-04 | tooz technologies GmbH | Aminkatalysierte Thiolhärtung von Epoxidharzen |
| CN106537255A (zh) * | 2014-04-18 | 2017-03-22 | 陶氏环球技术有限责任公司 | 用于lcd的彩色滤光片的蒽醌化合物 |
| JP6802712B2 (ja) | 2014-06-23 | 2020-12-16 | カーボン，インコーポレイテッド | 三次元物体の製造に使用する多様な硬化機構を有するポリウレタン樹脂 |
| JP6731930B2 (ja) | 2015-02-05 | 2020-07-29 | カーボン，インコーポレイテッド | 断続的曝露による付加製造方法 |
| WO2016140886A1 (en) | 2015-03-05 | 2016-09-09 | Carbon3D, Inc. | Fabrication of three dimensional objects with multiple operating modes |
| CN107531886B (zh) | 2015-04-29 | 2020-08-07 | 3M创新有限公司 | 由多硫醇和聚环氧化合物制备聚合物网络的方法 |
| JP7069006B2 (ja) | 2015-09-04 | 2022-05-17 | カーボン，インコーポレイテッド | 積層造形用シアネートエステル二重硬化樹脂 |
| CN108291011B (zh) | 2015-09-09 | 2021-03-02 | 卡本有限公司 | 用于增材制造的环氧双重固化树脂 |
| US10647873B2 (en) | 2015-10-30 | 2020-05-12 | Carbon, Inc. | Dual cure article of manufacture with portions of differing solubility |
| US11891485B2 (en) | 2015-11-05 | 2024-02-06 | Carbon, Inc. | Silicone dual cure resins for additive manufacturing |
| WO2017112571A1 (en) | 2015-12-22 | 2017-06-29 | Carbon, Inc. | Dual cure additive manufacturing of rigid intermediates that generate semi-rigid, flexible, or elastic final products |
| WO2017112751A1 (en) | 2015-12-22 | 2017-06-29 | Carbon, Inc. | Blocked silicone dual cure resins for additive manufacturing |
| US10501572B2 (en) | 2015-12-22 | 2019-12-10 | Carbon, Inc. | Cyclic ester dual cure resins for additive manufacturing |
| WO2017112653A1 (en) | 2015-12-22 | 2017-06-29 | Carbon, Inc. | Dual precursor resin systems for additive manufacturing with dual cure resins |
| US10343331B2 (en) | 2015-12-22 | 2019-07-09 | Carbon, Inc. | Wash liquids for use in additive manufacturing with dual cure resins |
| JP6944935B2 (ja) | 2015-12-22 | 2021-10-06 | カーボン，インコーポレイテッド | 二重硬化樹脂を用いた積層造形による複数の中間体からの複合生産物の製作 |
| US10647054B2 (en) | 2015-12-22 | 2020-05-12 | Carbon, Inc. | Accelerants for additive manufacturing with dual cure resins |
| US10500786B2 (en) | 2016-06-22 | 2019-12-10 | Carbon, Inc. | Dual cure resins containing microwave absorbing materials and methods of using the same |
| EP3526301B1 (de) | 2016-10-14 | 2021-06-16 | Basf Se | Härtbare polymerzusammensetzung |
| WO2018094131A1 (en) * | 2016-11-21 | 2018-05-24 | Carbon, Inc. | Method of making three-dimensional object by delivering reactive component for subsequent cure |
| CA3044541A1 (en) | 2016-12-05 | 2018-06-14 | Arkema Inc. | Initiator blends and photocurable compositions containing such initiator blends useful for 3d printing |
| WO2018165090A1 (en) | 2017-03-09 | 2018-09-13 | Carbon, Inc. | Tough, high temperature polymers produced by stereolithography |
| US10367228B2 (en) * | 2017-04-07 | 2019-07-30 | Seeo, Inc. | Diester-based polymer electrolytes for high voltage lithium ion batteries |
| US10316213B1 (en) | 2017-05-01 | 2019-06-11 | Formlabs, Inc. | Dual-cure resins and related methods |
| WO2018237038A1 (en) | 2017-06-21 | 2018-12-27 | Carbon, Inc. | Method of additive manufacturing |
| AU2018373053C1 (en) | 2017-11-24 | 2021-04-01 | Lunella Biotech, Inc. | Triphenylphosphonium-derivative compounds for eradicating cancer stem cells |
| US11135649B2 (en) | 2018-02-27 | 2021-10-05 | Arizona Board Of Regents On Behalf Of Arizona State University | Direct metal printing with stereolithography |
| US11504903B2 (en) | 2018-08-28 | 2022-11-22 | Carbon, Inc. | 1K alcohol dual cure resins for additive manufacturing |
| EP3848179A1 (de) | 2020-01-10 | 2021-07-14 | Carl Zeiss Vision International GmbH | Inkjet-verfahren zur herstellung eines brillenglases |
| US20220011670A1 (en) * | 2020-07-08 | 2022-01-13 | International Business Machines Corporation | Resist underlayer surface modification |
| DE102022110540A1 (de) | 2022-04-29 | 2023-11-02 | tooz technologies GmbH | Verfahren zur anpassung des brechungsindex |
| CN117466862B (zh) * | 2022-07-20 | 2025-10-21 | 天津久日新材料股份有限公司 | 一种含硫光引发剂及其制备方法和应用 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0448154A1 (de) | 1990-03-20 | 1991-09-25 | Akzo Nobel N.V. | Beschichtungszusammensetzung enthaltend einen blockierten basischen Katalysator |
| EP0702707A1 (de) | 1993-05-26 | 1996-03-27 | Akzo Nobel N.V. | Beschichtungszusammensetzung einschliesslich eines uv-entblockbaren basischen katalysators |
| US6362301B1 (en) | 1994-06-13 | 2002-03-26 | Rohm And Haas Company | Curable composition |
| US5998496A (en) | 1995-10-31 | 1999-12-07 | Spectra Group Limited, Inc. | Photosensitive intramolecular electron transfer compounds |
| BR9707687A (pt) | 1996-02-22 | 1999-07-27 | Dsm Nv | Fotocatalisador aniônico |
| EP0971924B1 (de) | 1997-01-22 | 2002-08-21 | Ciba SC Holding AG | Fotoaktivierbare stickstoffhaltige basen, die auf alpha-aminoketonen basieren |
| BR9807790B1 (pt) | 1997-02-26 | 2010-05-18 | bases fotoativadas contendo nitrogênio baseadas em alfa-amÈnio cetonas, imìnio cetonas ou amidìnio cetonas e aril boratos, composição que as contém e processo para execução de reações catalisadas por base. | |
| KR100527614B1 (ko) * | 1997-03-18 | 2005-11-15 | 시바 스페셜티 케미칼스 홀딩 인크. | α-아미노 알켄 화합물, 이의 제조방법 및 당해 화합물을 포함하는 조성물 |
| EP0898202B1 (de) | 1997-08-22 | 2000-07-19 | Ciba SC Holding AG | Fotoerzeugung von Aminen aus alpha-Aminoacetophenonen |
| EP1105368B1 (de) | 1998-08-21 | 2002-10-30 | Ciba SC Holding AG | Photoaktivierbare stickstoffhaltige basen |
| JP4906221B2 (ja) | 2000-05-26 | 2012-03-28 | アクゾ ノーベル ナムローゼ フェンノートシャップ | 光活性化可能なコーティング組成物 |
| CA2459374C (en) * | 2001-10-17 | 2011-02-08 | Ciba Specialty Chemicals Holding Inc. | Photoactivable nitrogen bases |
| PL207529B1 (pl) * | 2002-04-19 | 2010-12-31 | Ciba Sc Holding Ag | Sposób wytwarzania powlekanego podłoża |
| EP1789188A2 (de) | 2004-07-21 | 2007-05-30 | CIBA SPECIALTY CHEMICALS HOLDING INC. Patent Departement | Verfahren zur photoaktivierung und verwendung eines katalysators mittels invertiertem zweistufigem verfahren |
| CN101490155A (zh) | 2006-07-17 | 2009-07-22 | 西巴控股有限公司 | 粘结方法 |
| BRPI0717655B1 (pt) | 2006-09-29 | 2018-12-18 | Basf Se | bases fotolatentes para sistema à base de isocianatos bloqueados |
| ATE524765T1 (de) | 2007-04-03 | 2011-09-15 | Basf Se | Fotoaktivierbare stickstoffbasen |
-
2008
- 2008-03-25 AT AT08718153T patent/ATE524765T1/de not_active IP Right Cessation
- 2008-03-25 KR KR1020147033474A patent/KR101944734B1/ko not_active Expired - Fee Related
- 2008-03-25 KR KR1020097022890A patent/KR101514093B1/ko not_active Expired - Fee Related
- 2008-03-25 JP JP2010501474A patent/JP5606308B2/ja not_active Expired - Fee Related
- 2008-03-25 CN CN200880009820XA patent/CN101641643B/zh not_active Expired - Fee Related
- 2008-03-25 MX MX2009010309A patent/MX2009010309A/es active IP Right Grant
- 2008-03-25 US US12/532,840 patent/US9921477B2/en active Active
- 2008-03-25 WO PCT/EP2008/053456 patent/WO2008119688A1/en not_active Ceased
- 2008-03-25 EP EP08718153A patent/EP2145231B1/de not_active Not-in-force
- 2008-03-25 CA CA2681201A patent/CA2681201C/en not_active Expired - Fee Related
-
2018
- 2018-01-26 US US15/880,695 patent/US10928728B2/en not_active Expired - Fee Related
-
2020
- 2020-10-09 US US17/066,750 patent/US20210033972A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| US20180217498A1 (en) | 2018-08-02 |
| US10928728B2 (en) | 2021-02-23 |
| US20210033972A1 (en) | 2021-02-04 |
| KR101944734B1 (ko) | 2019-02-07 |
| CA2681201C (en) | 2016-06-14 |
| MX2009010309A (es) | 2009-10-16 |
| US9921477B2 (en) | 2018-03-20 |
| CN101641643B (zh) | 2013-08-07 |
| KR101514093B1 (ko) | 2015-04-21 |
| US20100105794A1 (en) | 2010-04-29 |
| KR20150005683A (ko) | 2015-01-14 |
| WO2008119688A1 (en) | 2008-10-09 |
| CA2681201A1 (en) | 2008-10-09 |
| EP2145231B1 (de) | 2011-09-14 |
| CN101641643A (zh) | 2010-02-03 |
| EP2145231A1 (de) | 2010-01-20 |
| KR20100016136A (ko) | 2010-02-12 |
| JP5606308B2 (ja) | 2014-10-15 |
| JP2010523515A (ja) | 2010-07-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |