DE602004021604D1 - Ammensetzung - Google Patents

Ammensetzung

Info

Publication number
DE602004021604D1
DE602004021604D1 DE602004021604T DE602004021604T DE602004021604D1 DE 602004021604 D1 DE602004021604 D1 DE 602004021604D1 DE 602004021604 T DE602004021604 T DE 602004021604T DE 602004021604 T DE602004021604 T DE 602004021604T DE 602004021604 D1 DE602004021604 D1 DE 602004021604D1
Authority
DE
Germany
Prior art keywords
ammensetzung
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602004021604T
Other languages
English (en)
Inventor
Hitoshi Okazaki
Junya Hayakawa
M Takeuchi
Masahiro Jono
Kenji Ishii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Gas Chemical Co Inc
Original Assignee
Mitsubishi Gas Chemical Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Gas Chemical Co Inc filed Critical Mitsubishi Gas Chemical Co Inc
Publication of DE602004021604D1 publication Critical patent/DE602004021604D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L81/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing sulfur with or without nitrogen, oxygen or carbon only; Compositions of polysulfones; Compositions of derivatives of such polymers
    • C08L81/02—Polythioethers; Polythioether-ethers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
    • C08G75/02—Polythioethers
    • C08G75/06—Polythioethers from cyclic thioethers
    • C08G75/08—Polythioethers from cyclic thioethers from thiiranes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
    • C08K5/45—Heterocyclic compounds having sulfur in the ring
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D181/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing sulfur, with or without nitrogen, oxygen, or carbon only; Coating compositions based on polysulfones; Coating compositions based on derivatives of such polymers
    • C09D181/02—Polythioethers; Polythioether-ethers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Paints Or Removers (AREA)
DE602004021604T 2003-08-06 2004-08-04 Ammensetzung Active DE602004021604D1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003288288 2003-08-06
JP2004029979 2004-02-05
PCT/JP2004/011520 WO2005014696A1 (ja) 2003-08-06 2004-08-04 光硬化性組成物及びコーティング剤組成物

Publications (1)

Publication Number Publication Date
DE602004021604D1 true DE602004021604D1 (de) 2009-07-30

Family

ID=34137920

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004021604T Active DE602004021604D1 (de) 2003-08-06 2004-08-04 Ammensetzung

Country Status (7)

Country Link
US (1) US7691555B2 (de)
EP (1) EP1652870B1 (de)
JP (1) JP4765626B2 (de)
KR (1) KR101132907B1 (de)
DE (1) DE602004021604D1 (de)
TW (1) TWI349689B (de)
WO (1) WO2005014696A1 (de)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4843955B2 (ja) * 2004-02-16 2011-12-21 三菱瓦斯化学株式会社 光塩基発生剤
JP5019759B2 (ja) * 2006-02-14 2012-09-05 株式会社トクヤマ カップリング剤組成物およびその用途
KR100955570B1 (ko) * 2006-09-18 2010-04-30 주식회사 엘지화학 저온 경화형 보호막 형성용 조성물, 이로부터 제조되는보호막, 및 이를 포함하는 기재
CN101553549B (zh) * 2006-12-14 2013-02-20 旭化成电子材料株式会社 光产碱剂和光固化性树脂组合物
KR101285060B1 (ko) * 2007-01-18 2013-07-10 주식회사 엘지화학 저온 경화형 고굴절막 형성용 조성물, 이로부터 제조되는고굴절막, 및 이를 포함하는 기재
KR101552739B1 (ko) * 2010-02-10 2015-09-14 (주)엘지하우시스 하드코팅 형성용 시트
JP5621458B2 (ja) * 2010-09-22 2014-11-12 三菱瓦斯化学株式会社 光学デバイス
WO2012147708A1 (ja) * 2011-04-28 2012-11-01 三菱瓦斯化学株式会社 硬化性組成物および光学用接着剤
JP5834474B2 (ja) * 2011-04-28 2015-12-24 三菱瓦斯化学株式会社 硬化性組成物および光学接着剤
CN103562272B (zh) * 2011-04-28 2015-07-08 三菱瓦斯化学株式会社 固化性组合物及光学用粘接剂
JP5742443B2 (ja) * 2011-05-06 2015-07-01 三菱瓦斯化学株式会社 硬化性組成物および光学接着剤
CA2864080C (en) 2012-02-07 2023-04-25 Vibrant Holdings, Llc Substrates, peptide arrays, and methods
US10006909B2 (en) 2012-09-28 2018-06-26 Vibrant Holdings, Llc Methods, systems, and arrays for biomolecular analysis
CA2891651C (en) * 2012-11-14 2019-01-22 Vibrant Holdings, Llc Substrates, systems, and methods for array synthesis and biomolecular analysis
US10286376B2 (en) 2012-11-14 2019-05-14 Vibrant Holdings, Llc Substrates, systems, and methods for array synthesis and biomolecular analysis
CN102993123B (zh) * 2012-12-21 2015-07-29 天津久日化学股份有限公司 一种高分子型多官能团α-胺烷基苯乙酮光引发剂
EP2980180A4 (de) 2013-03-28 2016-09-14 San Apro Ltd Photobasisgenerator
JP6396003B2 (ja) 2013-06-03 2018-09-26 富士フイルム株式会社 反射防止膜を備えた光学部材
WO2014208656A1 (ja) * 2013-06-27 2014-12-31 三菱瓦斯化学株式会社 硬化性組成物
CN105392845B (zh) 2013-07-18 2020-10-20 思美定株式会社 光固化性组合物
WO2015083331A1 (ja) 2013-12-04 2015-06-11 サンアプロ株式会社 光塩基発生剤
US9718999B2 (en) 2013-12-13 2017-08-01 Cemedine Co., Ltd Photocurable composition having adhesive properties
TWI730037B (zh) * 2016-01-26 2021-06-11 日商富士軟片和光純藥股份有限公司 光硬化方法，及用於該光硬化方法之化合物和組成物
WO2018218250A2 (en) 2017-05-26 2018-11-29 Vibrant Holdings, Llc Photoactive compounds and methods for biomolecule detection and sequencing
CN115151591B (zh) * 2020-06-26 2024-03-01 株式会社艾迪科 组合物、固化物及固化物的制造方法
JPWO2021261497A1 (de) * 2020-06-26 2021-12-30
CN113512211B (zh) * 2021-07-21 2022-03-15 赣州能之光新材料有限公司 紫外光交联聚烯烃母粒的制备方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1024024A (en) * 1963-04-08 1966-03-30 Dow Corning Improvements in or relating to polymerising or co-polymerising organosilicon compounds
JPH0642582B2 (ja) * 1988-06-27 1994-06-01 シャープ株式会社 誘電体多層被覆膜
US5807975A (en) * 1995-08-16 1998-09-15 Mitsubishi Gas Chemical Company,Inc. Alkyl sulfide type episulfide compound
JP3864998B2 (ja) 1995-09-08 2007-01-10 三菱瓦斯化学株式会社 新規な分岐アルキルスルフィド型エピスルフィド化合物
JP3491660B2 (ja) * 1995-08-16 2004-01-26 三菱瓦斯化学株式会社 新規な直鎖アルキルスルフィド型エピスルフィド化合物
JPH09255781A (ja) 1996-01-17 1997-09-30 Mitsubishi Gas Chem Co Inc 新規なエピスルフィド化合物
US5945504A (en) * 1996-01-17 1999-08-31 Mitsubishi Gas Chemical Company, Inc. Episulfide compound
JP3489369B2 (ja) * 1997-01-31 2004-01-19 松下電器産業株式会社 ゴキブリ忌避剤含有電子部品材料を用いた電子部品
DE69839020T2 (de) * 1997-02-26 2009-03-19 Ciba Holding Inc. Photoaktivierbare stickstoffhaltige Basen auf Basis von ALPHA-Ammonium-, Iminium- oder Amidiniumketonen und Arylboraten
JPH1171521A (ja) 1997-06-23 1999-03-16 Fuji Xerox Co Ltd 潤滑離型材料用組成物、潤滑離型材料、潤滑離型膜の作製方法、潤滑離型膜、定着用部材、定着装置、およびカラー画像形成方法
US6635195B1 (en) 2000-02-04 2003-10-21 Essilor International Compagnie Generale D'optique Cationic photopolymerization of diepisulfides and application to the manufacture of optical lenses
JP3918411B2 (ja) 2000-08-01 2007-05-23 三菱化学株式会社 硬化性組成物及びその硬化物
JP2002105110A (ja) 2000-10-04 2002-04-10 Mitsubishi Chemicals Corp 硬化性組成物、その硬化物および用途
US6592801B2 (en) * 2001-04-30 2003-07-15 Essilor International Compagnie Generale D'optique Photopolymerization of episulfides using metal complexes and its use for making ophthalmic lenses
US7420005B2 (en) * 2001-06-28 2008-09-02 Dai Nippon Printing Co., Ltd. Photocurable resin composition, finely embossed pattern-forming sheet, finely embossed transfer sheet, optical article, stamper and method of forming finely embossed pattern
JP4952966B2 (ja) 2001-07-19 2012-06-13 三菱瓦斯化学株式会社 樹脂の製造方法
US6872333B2 (en) * 2002-02-07 2005-03-29 Mitsubishi Gas Chemical Company, Ltd. Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof
JP2003261648A (ja) 2002-03-12 2003-09-19 Mitsubishi Chemicals Corp ヘテロ環含有化合物およびそれを含む組成物

Also Published As

Publication number Publication date
KR20060065667A (ko) 2006-06-14
US20070066702A1 (en) 2007-03-22
JP4765626B2 (ja) 2011-09-07
TW200508343A (en) 2005-03-01
KR101132907B1 (ko) 2012-04-03
US7691555B2 (en) 2010-04-06
EP1652870B1 (de) 2009-06-17
WO2005014696A1 (ja) 2005-02-17
EP1652870A1 (de) 2006-05-03
TWI349689B (en) 2011-10-01
JPWO2005014696A1 (ja) 2006-11-16
EP1652870A4 (de) 2006-08-09

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Legal Events

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