KR100326129B1 - 리이드접촉기 - Google Patents
리이드접촉기 Download PDFInfo
- Publication number
- KR100326129B1 KR100326129B1 KR1019930027537A KR930027537A KR100326129B1 KR 100326129 B1 KR100326129 B1 KR 100326129B1 KR 1019930027537 A KR1019930027537 A KR 1019930027537A KR 930027537 A KR930027537 A KR 930027537A KR 100326129 B1 KR100326129 B1 KR 100326129B1
- Authority
- KR
- South Korea
- Prior art keywords
- contactor
- conductive
- substrate
- photoresist
- beams
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 claims abstract description 41
- 238000000034 method Methods 0.000 claims abstract description 21
- 230000005291 magnetic effect Effects 0.000 claims description 19
- 239000000463 material Substances 0.000 claims description 4
- 239000004020 conductor Substances 0.000 claims description 2
- 239000000696 magnetic material Substances 0.000 claims description 2
- 239000010409 thin film Substances 0.000 claims 2
- 229920002120 photoresistant polymer Polymers 0.000 abstract description 74
- 238000001465 metallisation Methods 0.000 abstract description 34
- 238000004519 manufacturing process Methods 0.000 abstract description 30
- 229910052751 metal Inorganic materials 0.000 abstract description 28
- 239000002184 metal Substances 0.000 abstract description 28
- 239000010410 layer Substances 0.000 description 71
- 239000010931 gold Substances 0.000 description 19
- 229910052737 gold Inorganic materials 0.000 description 19
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 18
- 238000000465 moulding Methods 0.000 description 16
- 238000004070 electrodeposition Methods 0.000 description 11
- 239000011521 glass Substances 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- UGKDIUIOSMUOAW-UHFFFAOYSA-N iron nickel Chemical group [Fe].[Ni] UGKDIUIOSMUOAW-UHFFFAOYSA-N 0.000 description 8
- 238000003466 welding Methods 0.000 description 8
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 7
- 239000010936 titanium Substances 0.000 description 7
- 229910052719 titanium Inorganic materials 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- 238000010276 construction Methods 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 235000014676 Phragmites communis Nutrition 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 238000005520 cutting process Methods 0.000 description 4
- 235000012239 silicon dioxide Nutrition 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 3
- 238000010291 electrical method Methods 0.000 description 3
- 230000005294 ferromagnetic effect Effects 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- 238000002207 thermal evaporation Methods 0.000 description 3
- 229910000640 Fe alloy Inorganic materials 0.000 description 2
- 229910000990 Ni alloy Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000006297 dehydration reaction Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000003302 ferromagnetic material Substances 0.000 description 2
- 239000012634 fragment Substances 0.000 description 2
- 238000005459 micromachining Methods 0.000 description 2
- 230000000284 resting effect Effects 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 150000002343 gold Chemical class 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000003834 intracellular effect Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
- H01H1/00—Contacts
- H01H1/0036—Switches making use of microelectromechanical systems [MEMS]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
- H01H36/00—Switches actuated by change of magnetic field or of electric field, e.g. by change of relative position of magnet and switch, by shielding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
- H01H1/00—Contacts
- H01H1/64—Protective enclosures, baffle plates, or screens for contacts
- H01H1/66—Contacts sealed in an evacuated or gas-filled envelope, e.g. magnetic dry-reed contacts
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
- H01H1/00—Contacts
- H01H1/0036—Switches making use of microelectromechanical systems [MEMS]
- H01H2001/0078—Switches making use of microelectromechanical systems [MEMS] with parallel movement of the movable contact relative to the substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
- H01H36/00—Switches actuated by change of magnetic field or of electric field, e.g. by change of relative position of magnet and switch, by shielding
- H01H2036/0093—Micromechanical switches actuated by a change of the magnetic field
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Manufacture Of Switches (AREA)
- Contacts (AREA)
- Switches That Are Operated By Magnetic Or Electric Fields (AREA)
- Manufacturing Of Electrical Connectors (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR9215213A FR2699323B1 (fr) | 1992-12-15 | 1992-12-15 | Contacteur "reed" et procédé de fabrication de microstructures métalliques tridimensionnelles suspendues. |
| CH9215213 | 1992-12-15 | ||
| FR9215213 | 1992-12-15 | ||
| CH01991/93-0 | 1993-07-02 | ||
| CH199193 | 1993-07-02 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR940016737A KR940016737A (ko) | 1994-07-25 |
| KR100326129B1 true KR100326129B1 (ko) | 2002-11-13 |
Family
ID=25689202
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019930027537A Expired - Lifetime KR100326129B1 (ko) | 1992-12-15 | 1993-12-14 | 리이드접촉기 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US5430421A (enExample) |
| EP (1) | EP0602538B1 (enExample) |
| JP (1) | JPH06223686A (enExample) |
| KR (1) | KR100326129B1 (enExample) |
| DE (1) | DE69311277T2 (enExample) |
| HK (1) | HK1006604A1 (enExample) |
| TW (1) | TW264556B (enExample) |
Families Citing this family (40)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2721435B1 (fr) * | 1994-06-17 | 1996-08-02 | Asulab Sa | Microcontacteur magnétique et son procédé de fabrication. |
| DE19648539C2 (de) * | 1996-11-25 | 2000-04-13 | Mannesmann Vdo Ag | Passiver magnetischer Positionssensor |
| CH691559A5 (fr) * | 1997-04-21 | 2001-08-15 | Asulab Sa | Micro-contacteur magnétique et son procédé de fabrication. |
| EP0874379B1 (fr) * | 1997-04-23 | 2002-07-31 | Asulab S.A. | Micro-contacteur magnétique et son procédé de fabrication |
| DE19736674C1 (de) * | 1997-08-22 | 1998-11-26 | Siemens Ag | Mikromechanisches elektrostatisches Relais und Verfahren zu dessen Herstellung |
| EP0951068A1 (en) | 1998-04-17 | 1999-10-20 | Interuniversitair Micro-Elektronica Centrum Vzw | Method of fabrication of a microstructure having an inside cavity |
| US6147790A (en) * | 1998-06-02 | 2000-11-14 | Texas Instruments Incorporated | Spring-ring micromechanical device |
| KR100506073B1 (ko) * | 1998-10-26 | 2005-09-26 | 삼성전자주식회사 | 고진공패키징마이크로자이로스코프및그제조방법 |
| DE19854803A1 (de) * | 1998-11-27 | 2000-05-31 | Bosch Gmbh Robert | Verfahren zur Herstellung einer lokal verstärkten metallischen Mikrostruktur |
| JP3379484B2 (ja) * | 1999-07-09 | 2003-02-24 | 日本電気株式会社 | 高周波装置およびその製造方法 |
| US6780001B2 (en) * | 1999-07-30 | 2004-08-24 | Formfactor, Inc. | Forming tool for forming a contoured microelectronic spring mold |
| US6853067B1 (en) | 1999-10-12 | 2005-02-08 | Microassembly Technologies, Inc. | Microelectromechanical systems using thermocompression bonding |
| DE10043549C1 (de) * | 2000-09-01 | 2002-06-20 | Little Things Factory Gmbh | Mikroschalter und Verfahren zu dessen Herstellung |
| US6804552B2 (en) * | 2000-11-03 | 2004-10-12 | Medtronic, Inc. | MEMs switching circuit and method for an implantable medical device |
| US20020096421A1 (en) * | 2000-11-29 | 2002-07-25 | Cohn Michael B. | MEMS device with integral packaging |
| US6711317B2 (en) * | 2001-01-25 | 2004-03-23 | Lucent Technologies Inc. | Resiliently packaged MEMs device and method for making same |
| US20090163980A1 (en) * | 2007-12-21 | 2009-06-25 | Greatbatch Ltd. | Switch for turning off therapy delivery of an active implantable medical device during mri scans |
| US7301334B2 (en) * | 2001-09-17 | 2007-11-27 | Schneider Electric Industries Sas | Micro magnetic proximity sensor system |
| AUPR846701A0 (en) * | 2001-10-25 | 2001-11-15 | Microtechnology Centre Management Limited | A method of fabrication of micro-devices |
| JP2006524880A (ja) * | 2002-09-18 | 2006-11-02 | マグフュージョン, インコーポレイテッド | 積層電気機械構造の組み立て方法 |
| FR2849016B1 (fr) * | 2002-12-18 | 2005-06-10 | Commissariat Energie Atomique | Procede de realisation d'une micro-structure suspendue plane, utilisant une couche sacrificielle en materiau polymere et composant obtenu |
| US7215229B2 (en) * | 2003-09-17 | 2007-05-08 | Schneider Electric Industries Sas | Laminated relays with multiple flexible contacts |
| US7321282B2 (en) * | 2005-02-17 | 2008-01-22 | Honeywell International, Inc. | MEM's reed switch array |
| US7692521B1 (en) | 2005-05-12 | 2010-04-06 | Microassembly Technologies, Inc. | High force MEMS device |
| TWI395258B (zh) * | 2005-11-11 | 2013-05-01 | Semiconductor Energy Lab | 微結構以及微機電系統的製造方法 |
| US7463123B2 (en) * | 2005-11-22 | 2008-12-09 | University Of South Florida | Nanometer electromechanical switch and fabrication process |
| JP2007207498A (ja) * | 2006-01-31 | 2007-08-16 | Oki Sensor Device Corp | 機構デバイス |
| CN102067262B (zh) * | 2008-03-20 | 2013-11-27 | Ht微量分析有限公司 | 集成簧片开关 |
| US8665041B2 (en) * | 2008-03-20 | 2014-03-04 | Ht Microanalytical, Inc. | Integrated microminiature relay |
| US8451077B2 (en) | 2008-04-22 | 2013-05-28 | International Business Machines Corporation | MEMS switches with reduced switching voltage and methods of manufacture |
| US8635765B2 (en) * | 2011-06-15 | 2014-01-28 | International Business Machines Corporation | Method of forming micro-electrical-mechanical structure (MEMS) |
| DE102014210717A1 (de) * | 2014-06-05 | 2015-12-17 | Robert Bosch Gmbh | Füllstandssensor für Kraftfahrzeugtank mit metallischem Abstandshalterelement |
| CN104217893B (zh) * | 2014-09-26 | 2019-09-06 | 敬德强 | 大电流磁簧开关 |
| JP2016177989A (ja) * | 2015-03-20 | 2016-10-06 | アルプス電気株式会社 | 磁気リードスイッチの製造方法 |
| JP2017073230A (ja) * | 2015-10-05 | 2017-04-13 | アルプス電気株式会社 | 磁気リードスイッチ |
| JP2017073229A (ja) * | 2015-10-05 | 2017-04-13 | アルプス電気株式会社 | 磁気リードスイッチ |
| JP2017073228A (ja) * | 2015-10-05 | 2017-04-13 | アルプス電気株式会社 | 磁気リードスイッチ |
| JP2017073227A (ja) * | 2015-10-05 | 2017-04-13 | アルプス電気株式会社 | 磁気リードスイッチ |
| US10145906B2 (en) * | 2015-12-17 | 2018-12-04 | Analog Devices Global | Devices, systems and methods including magnetic structures |
| JP6950613B2 (ja) * | 2018-04-11 | 2021-10-13 | Tdk株式会社 | 磁気作動型memsスイッチ |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4920639A (en) * | 1989-08-04 | 1990-05-01 | Microelectronics And Computer Technology Corporation | Method of making a multilevel electrical airbridge interconnect |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE248454C (enExample) * | ||||
| JPS4928142U (enExample) * | 1972-06-16 | 1974-03-11 | ||
| SE378475B (enExample) * | 1974-02-07 | 1975-09-01 | Ygfors Trading Ab | |
| JPS51121170A (en) * | 1975-04-15 | 1976-10-22 | Yaskawa Denki Seisakusho Kk | Reed switch |
| JPS55115216A (en) * | 1979-02-27 | 1980-09-05 | Fujitsu Ltd | Method of forming movable electrode on base |
| US4915983A (en) * | 1985-06-10 | 1990-04-10 | The Foxboro Company | Multilayer circuit board fabrication process |
| JPS6188417A (ja) * | 1985-10-08 | 1986-05-06 | オムロン株式会社 | 無接点スイッチの製造方法 |
| DD248454B1 (de) * | 1986-04-18 | 1988-11-02 | Ilmenau Tech Hochschule | Miniaturisiertes elektromagnetisches schaltelement |
| JPH0710029B2 (ja) * | 1986-12-17 | 1995-02-01 | ザ・フォックスボロ・カンパニー | 積層回路基板の製造方法 |
| JPH073553Y2 (ja) * | 1987-10-26 | 1995-01-30 | 株式会社東海理化電機製作所 | 小型磁気スイッチ |
| DE3812414A1 (de) * | 1988-04-14 | 1989-10-26 | Standard Elektrik Lorenz Ag | Verfahren zum herstellen einer allseitig geschirmten signalleitung |
| JPH081542Y2 (ja) * | 1988-10-27 | 1996-01-17 | 株式会社東海理化電機製作所 | 磁気応動スイッチ |
| JPH0736295Y2 (ja) * | 1988-10-28 | 1995-08-16 | 株式会社東海理化電機製作所 | 過電流検出センサ |
| JPH02148637A (ja) * | 1988-11-30 | 1990-06-07 | Tokai Rika Co Ltd | 磁気応動スイッチ |
| US4899439A (en) * | 1989-06-15 | 1990-02-13 | Microelectronics And Computer Technology Corporation | Method of fabricating a high density electrical interconnect |
| JPH0636472B2 (ja) * | 1990-05-28 | 1994-05-11 | インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン | 多層配線基板の製造方法 |
-
1993
- 1993-12-09 DE DE69311277T patent/DE69311277T2/de not_active Expired - Lifetime
- 1993-12-09 EP EP93119829A patent/EP0602538B1/fr not_active Expired - Lifetime
- 1993-12-14 KR KR1019930027537A patent/KR100326129B1/ko not_active Expired - Lifetime
- 1993-12-14 US US08/166,359 patent/US5430421A/en not_active Expired - Lifetime
- 1993-12-15 JP JP5315223A patent/JPH06223686A/ja active Pending
-
1994
- 1994-01-24 TW TW083100633A patent/TW264556B/zh not_active IP Right Cessation
-
1998
- 1998-06-20 HK HK98105820A patent/HK1006604A1/xx not_active IP Right Cessation
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4920639A (en) * | 1989-08-04 | 1990-05-01 | Microelectronics And Computer Technology Corporation | Method of making a multilevel electrical airbridge interconnect |
Also Published As
| Publication number | Publication date |
|---|---|
| DE69311277T2 (de) | 1998-01-15 |
| JPH06223686A (ja) | 1994-08-12 |
| EP0602538A1 (fr) | 1994-06-22 |
| DE69311277D1 (de) | 1997-07-10 |
| EP0602538B1 (fr) | 1997-06-04 |
| US5430421A (en) | 1995-07-04 |
| HK1006604A1 (en) | 1999-03-05 |
| TW264556B (enExample) | 1995-12-01 |
| KR940016737A (ko) | 1994-07-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 19931214 |
|
| PG1501 | Laying open of application | ||
| A201 | Request for examination | ||
| PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 19981207 Comment text: Request for Examination of Application Patent event code: PA02011R01I Patent event date: 19931214 Comment text: Patent Application |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20001130 Patent event code: PE09021S01D |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20011207 |
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| GRNT | Written decision to grant | ||
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