JPWO2023145235A5 - - Google Patents
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- Publication number
- JPWO2023145235A5 JPWO2023145235A5 JP2023576656A JP2023576656A JPWO2023145235A5 JP WO2023145235 A5 JPWO2023145235 A5 JP WO2023145235A5 JP 2023576656 A JP2023576656 A JP 2023576656A JP 2023576656 A JP2023576656 A JP 2023576656A JP WO2023145235 A5 JPWO2023145235 A5 JP WO2023145235A5
- Authority
- JP
- Japan
- Prior art keywords
- inspection
- ray
- inspection device
- detectors
- ray detector
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007689 inspection Methods 0.000 claims 67
- 238000000034 method Methods 0.000 claims 9
- 239000004065 semiconductor Substances 0.000 claims 7
- 238000001514 detection method Methods 0.000 claims 6
- 239000000126 substance Substances 0.000 claims 2
- 230000005540 biological transmission Effects 0.000 claims 1
- 229910003460 diamond Inorganic materials 0.000 claims 1
- 239000010432 diamond Substances 0.000 claims 1
- 238000010894 electron beam technology Methods 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022013653 | 2022-01-31 | ||
| JP2022013653 | 2022-01-31 | ||
| PCT/JP2022/043905 WO2023145235A1 (ja) | 2022-01-31 | 2022-11-29 | 検査装置および検査方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2023145235A1 JPWO2023145235A1 (https=) | 2023-08-03 |
| JPWO2023145235A5 true JPWO2023145235A5 (https=) | 2024-10-04 |
| JP7667321B2 JP7667321B2 (ja) | 2025-04-22 |
Family
ID=87471017
Family Applications (6)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023576656A Active JP7667321B2 (ja) | 2022-01-31 | 2022-11-29 | 検査装置および検査方法 |
| JP2023576659A Active JP7667883B2 (ja) | 2022-01-31 | 2022-11-29 | 検査装置および検査方法 |
| JP2023576657A Active JP7667322B2 (ja) | 2022-01-31 | 2022-11-29 | 検査装置および検査方法 |
| JP2023576658A Active JP7667882B2 (ja) | 2022-01-31 | 2022-11-29 | 検査装置および検査方法 |
| JP2023001301A Active JP7615183B2 (ja) | 2022-01-31 | 2023-01-06 | 検査装置および検査方法 |
| JP2024230910A Pending JP2025039599A (ja) | 2022-01-31 | 2024-12-26 | 検査装置および検査方法 |
Family Applications After (5)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023576659A Active JP7667883B2 (ja) | 2022-01-31 | 2022-11-29 | 検査装置および検査方法 |
| JP2023576657A Active JP7667322B2 (ja) | 2022-01-31 | 2022-11-29 | 検査装置および検査方法 |
| JP2023576658A Active JP7667882B2 (ja) | 2022-01-31 | 2022-11-29 | 検査装置および検査方法 |
| JP2023001301A Active JP7615183B2 (ja) | 2022-01-31 | 2023-01-06 | 検査装置および検査方法 |
| JP2024230910A Pending JP2025039599A (ja) | 2022-01-31 | 2024-12-26 | 検査装置および検査方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (6) | US11921059B2 (https=) |
| EP (5) | EP4474800A4 (https=) |
| JP (6) | JP7667321B2 (https=) |
| KR (5) | KR20240141192A (https=) |
| CN (5) | CN118661094A (https=) |
| TW (6) | TWI846289B (https=) |
| WO (5) | WO2023145101A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP4474800A4 (en) * | 2022-01-31 | 2026-01-07 | Canon Anelva Corp | INSPECTION DEVICE AND INSPECTION PROCEDURE |
Family Cites Families (55)
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| JPH01244344A (ja) * | 1988-03-25 | 1989-09-28 | Hitachi Ltd | Ｘ線吸収スペクトル測定装置 |
| JPH07119717B2 (ja) * | 1989-12-12 | 1995-12-20 | シャープ株式会社 | 半導体材料評価装置 |
| JPH0534131A (ja) * | 1991-08-05 | 1993-02-09 | Fujitsu Ltd | 画像処理方法及び画像処理装置 |
| JPH05346411A (ja) * | 1992-04-16 | 1993-12-27 | Rigaku Denki Kogyo Kk | 蛍光ｘ線分析装置 |
| DE69510734T2 (de) * | 1994-03-02 | 2000-02-17 | Koninklijke Philips Electronics N.V., Eindhoven | Röntgenspektrometer mit streifendem ausfallwinkel |
| JP3165615B2 (ja) * | 1995-03-17 | 2001-05-14 | 財団法人国際超電導産業技術研究センター | 表面元素分析方法及び装置 |
| KR100233312B1 (ko) * | 1995-08-09 | 1999-12-01 | 야마모토 카즈모토 | 전반사 형광 x선 분석 장치 및 방법 |
| US5742658A (en) * | 1996-05-23 | 1998-04-21 | Advanced Micro Devices, Inc. | Apparatus and method for determining the elemental compositions and relative locations of particles on the surface of a semiconductor wafer |
| JPH09318565A (ja) * | 1996-05-24 | 1997-12-12 | Rigaku Ind Co | Ｘ線分析方法および装置 |
| JP2984232B2 (ja) * | 1996-10-25 | 1999-11-29 | 株式会社テクノス研究所 | Ｘ線分析装置およびｘ線照射角設定方法 |
| US6005915A (en) | 1997-11-07 | 1999-12-21 | Advanced Micro Devices, Inc. | Apparatus and method for measuring the roughness of a target material surface based upon the scattering of incident X-ray photons |
| US6108398A (en) * | 1998-07-13 | 2000-08-22 | Jordan Valley Applied Radiation Ltd. | X-ray microfluorescence analyzer |
| JP2000055841A (ja) * | 1998-08-13 | 2000-02-25 | Fujitsu Ltd | Ｘ線分析方法 |
| DE19934987B4 (de) | 1999-07-26 | 2004-11-11 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Röntgenanode und ihre Verwendung |
| DE19948382A1 (de) | 1999-10-07 | 2001-05-03 | Gemetec Ges Fuer Mestechnik Un | Detektor für grosse Waferflächen |
| JP2001208708A (ja) | 2000-01-31 | 2001-08-03 | Japan Science & Technology Corp | 斜出射電子線プローブマイクロｘ線分析による異物の分析方法およびその装置 |
| US6829327B1 (en) * | 2000-09-22 | 2004-12-07 | X-Ray Optical Systems, Inc. | Total-reflection x-ray fluorescence apparatus and method using a doubly-curved optic |
| JP2002202272A (ja) | 2000-12-28 | 2002-07-19 | Shimadzu Corp | Ｘ線透視検査装置 |
| JP3673825B2 (ja) | 2001-03-27 | 2005-07-20 | 独立行政法人物質・材料研究機構 | 斜出射ｘ線分析方法 |
| JP3998556B2 (ja) * | 2002-10-17 | 2007-10-31 | 株式会社東研 | 高分解能ｘ線顕微検査装置 |
| US7065176B2 (en) | 2003-05-28 | 2006-06-20 | General Electric Company | Method and system to inspect a component |
| JP2005121468A (ja) | 2003-10-16 | 2005-05-12 | Tohken Co Ltd | 蛍光ｘ線を利用した毛髪等の食品異物検査装置 |
| JP2005292077A (ja) * | 2004-04-05 | 2005-10-20 | Fuji Electric Holdings Co Ltd | Ｘ線顕微鏡装置 |
| US7916834B2 (en) * | 2007-02-12 | 2011-03-29 | Thermo Niton Analyzers Llc | Small spot X-ray fluorescence (XRF) analyzer |
| JP2007212468A (ja) * | 2007-03-16 | 2007-08-23 | Tohken Co Ltd | 高分解機能ｘ線顕微検査装置 |
| JP5127313B2 (ja) | 2007-06-15 | 2013-01-23 | 義久 石黒 | 検査システム |
| JP2009075018A (ja) * | 2007-09-21 | 2009-04-09 | Technos:Kk | 蛍光ｘ線分析装置および蛍光ｘ線分析方法 |
| JP5489412B2 (ja) | 2008-03-26 | 2014-05-14 | 株式会社マーストーケンソリューション | 蛍光ｘ線分析機能付き高分解能ｘ線顕微装置 |
| JP5292323B2 (ja) | 2010-01-25 | 2013-09-18 | 株式会社リガク | 微小部ｘ線計測装置 |
| JP4914514B2 (ja) | 2010-07-02 | 2012-04-11 | 株式会社リガク | 蛍光ｘ線分析装置および方法 |
| JP5887760B2 (ja) * | 2011-08-24 | 2016-03-16 | 富士通株式会社 | 半導体装置の検査方法及び半導体装置の製造方法 |
| JP5881159B2 (ja) | 2012-03-27 | 2016-03-09 | 株式会社リガク | 異種物質の検査装置及び異種物質の検査方法 |
| US9194828B2 (en) * | 2012-05-22 | 2015-11-24 | Aribex, Inc. | Handheld x-ray system for 3D scatter imaging |
| US20140067316A1 (en) * | 2012-08-30 | 2014-03-06 | Kabushiki Kaisha Toshiba | Measuring apparatus, detector deviation monitoring method and measuring method |
| JP6026936B2 (ja) * | 2013-03-28 | 2016-11-16 | 株式会社日立ハイテクサイエンス | 異物検出装置 |
| US9551677B2 (en) * | 2014-01-21 | 2017-01-24 | Bruker Jv Israel Ltd. | Angle calibration for grazing-incidence X-ray fluorescence (GIXRF) |
| US9594036B2 (en) * | 2014-02-28 | 2017-03-14 | Sigray, Inc. | X-ray surface analysis and measurement apparatus |
| EP2927948A1 (en) | 2014-04-04 | 2015-10-07 | Nordson Corporation | X-ray inspection apparatus for inspecting semiconductor wafers |
| CN107076684B (zh) | 2014-09-02 | 2021-04-02 | 株式会社尼康 | 测量处理装置、测量处理方法和测量处理程序 |
| US10514345B2 (en) * | 2014-10-14 | 2019-12-24 | Rigaku Corporation | X-ray thin film inspection device |
| US10269536B2 (en) * | 2015-03-25 | 2019-04-23 | Hitachi High-Technologies Corporation | Electron microscope |
| CN108401442B (zh) * | 2015-06-30 | 2021-01-15 | 伊利诺斯工具制品有限公司 | 联机x射线测量设备和方法 |
| US10295486B2 (en) | 2015-08-18 | 2019-05-21 | Sigray, Inc. | Detector for X-rays with high spatial and high spectral resolution |
| JP6630365B2 (ja) * | 2015-12-15 | 2020-01-15 | 株式会社堀場製作所 | Ｘ線管、及び、ｘ線分析装置 |
| CN105758345B (zh) * | 2016-04-22 | 2018-06-05 | 武汉科技大学 | 一种在线测量带钢镀层厚度的x射线荧光成像装置 |
| CN206020314U (zh) * | 2016-09-09 | 2017-03-15 | 广州市怡文环境科技股份有限公司 | 一种全反射x射线荧光分析系统 |
| JP6867224B2 (ja) * | 2017-04-28 | 2021-04-28 | 浜松ホトニクス株式会社 | Ｘ線管及びｘ線発生装置 |
| US10895541B2 (en) | 2018-01-06 | 2021-01-19 | Kla-Tencor Corporation | Systems and methods for combined x-ray reflectometry and photoelectron spectroscopy |
| JP2019215205A (ja) | 2018-06-12 | 2019-12-19 | ローム株式会社 | 撮像装置、撮像方法、及び検査装置 |
| JP6601854B1 (ja) * | 2018-06-21 | 2019-11-06 | 株式会社リガク | 蛍光ｘ線分析システム |
| JP7153525B2 (ja) * | 2018-10-12 | 2022-10-14 | アンリツ株式会社 | Ｘ線検査装置 |
| WO2020084890A1 (ja) | 2018-10-25 | 2020-04-30 | 株式会社堀場製作所 | Ｘ線分析装置及びｘ線発生ユニット |
| CN113877059B (zh) | 2020-07-03 | 2025-12-09 | 何浩明 | 具有调整机构以使贴片单元贴合人体的衣物结构 |
| CN114486971A (zh) * | 2022-01-25 | 2022-05-13 | 深圳市埃芯半导体科技有限公司 | 多源设计的x射线分析系统和方法 |
| EP4474800A4 (en) * | 2022-01-31 | 2026-01-07 | Canon Anelva Corp | INSPECTION DEVICE AND INSPECTION PROCEDURE |
-
2022
- 2022-03-31 EP EP22923964.5A patent/EP4474800A4/en active Pending
- 2022-03-31 CN CN202280090523.2A patent/CN118661094A/zh active Pending
- 2022-03-31 WO PCT/JP2022/016709 patent/WO2023145101A1/ja not_active Ceased
- 2022-03-31 KR KR1020247028367A patent/KR20240141192A/ko active Pending
- 2022-11-29 JP JP2023576656A patent/JP7667321B2/ja active Active
- 2022-11-29 EP EP22924089.0A patent/EP4474803A4/en active Pending
- 2022-11-29 WO PCT/JP2022/043908 patent/WO2023145238A1/ja not_active Ceased
- 2022-11-29 KR KR1020247028350A patent/KR20240141191A/ko not_active Withdrawn
- 2022-11-29 JP JP2023576659A patent/JP7667883B2/ja active Active
- 2022-11-29 CN CN202280090521.3A patent/CN118661093A/zh not_active Withdrawn
- 2022-11-29 JP JP2023576657A patent/JP7667322B2/ja active Active
- 2022-11-29 WO PCT/JP2022/043907 patent/WO2023145237A1/ja not_active Ceased
- 2022-11-29 KR KR1020247027476A patent/KR20240136405A/ko not_active Withdrawn
- 2022-11-29 KR KR1020247028368A patent/KR20240135667A/ko active Pending
- 2022-11-29 KR KR1020247027603A patent/KR20240136411A/ko not_active Withdrawn
- 2022-11-29 JP JP2023576658A patent/JP7667882B2/ja active Active
- 2022-11-29 CN CN202280090513.9A patent/CN118891514A/zh not_active Withdrawn
- 2022-11-29 WO PCT/JP2022/043906 patent/WO2023145236A1/ja not_active Ceased
- 2022-11-29 EP EP22924090.8A patent/EP4474804A4/en active Pending
- 2022-11-29 CN CN202280090522.8A patent/CN118901003A/zh active Pending
- 2022-11-29 EP EP22924088.2A patent/EP4474802A4/en active Pending
- 2022-11-29 CN CN202280090524.7A patent/CN118679379A/zh not_active Withdrawn
- 2022-11-29 EP EP22924087.4A patent/EP4474801A4/en active Pending
- 2022-11-29 WO PCT/JP2022/043905 patent/WO2023145235A1/ja not_active Ceased
-
2023
- 2023-01-06 JP JP2023001301A patent/JP7615183B2/ja active Active
- 2023-01-19 TW TW112102600A patent/TWI846289B/zh active
- 2023-01-19 TW TW113116471A patent/TW202433050A/zh unknown
- 2023-01-30 TW TW112103028A patent/TWI845135B/zh active
- 2023-01-30 TW TW112103030A patent/TWI845136B/zh active
- 2023-01-30 TW TW112103029A patent/TWI874900B/zh active
- 2023-01-30 TW TW112103027A patent/TWI866041B/zh active
- 2023-07-11 US US18/350,093 patent/US11921059B2/en active Active
- 2023-07-11 US US18/350,255 patent/US11971370B2/en active Active
- 2023-07-11 US US18/350,054 patent/US11927554B2/en active Active
- 2023-07-11 US US18/350,221 patent/US11977038B2/en active Active
- 2023-07-11 US US18/350,361 patent/US12241848B2/en active Active
-
2024
- 2024-07-18 US US18/776,818 patent/US20240369502A1/en active Pending
- 2024-12-26 JP JP2024230910A patent/JP2025039599A/ja active Pending
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