JPWO2022230874A1 - - Google Patents

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Publication number
JPWO2022230874A1
JPWO2022230874A1 JP2023517555A JP2023517555A JPWO2022230874A1 JP WO2022230874 A1 JPWO2022230874 A1 JP WO2022230874A1 JP 2023517555 A JP2023517555 A JP 2023517555A JP 2023517555 A JP2023517555 A JP 2023517555A JP WO2022230874 A1 JPWO2022230874 A1 JP WO2022230874A1
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JP
Japan
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Application number
JP2023517555A
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Japanese (ja)
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JPWO2022230874A5 (https=
JP7434666B2 (ja
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Publication of JPWO2022230874A1 publication Critical patent/JPWO2022230874A1/ja
Priority to JP2023177758A priority Critical patent/JP7717769B2/ja
Publication of JPWO2022230874A5 publication Critical patent/JPWO2022230874A5/ja
Application granted granted Critical
Publication of JP7434666B2 publication Critical patent/JP7434666B2/ja
Active legal-status Critical Current
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J135/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical, and containing at least another carboxyl radical in the molecule, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J135/02—Homopolymers or copolymers of esters
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/12—Esters of phenols or saturated alcohols
    • C08F222/20—Esters containing oxygen in addition to the carboxy oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/49—Phosphorus-containing compounds
    • C08K5/51—Phosphorus bound to oxygen
    • C08K5/53—Phosphorus bound to oxygen bound to oxygen and to carbon only
    • C08K5/5397—Phosphine oxides
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02—Non-macromolecular additives
    • C09J11/06—Non-macromolecular additives organic
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J4/00—Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; adhesives, based on monomers of macromolecular compounds of groups C09J183/00 - C09J183/16
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J5/00—Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
    • H10P72/7402—Wafer tapes, e.g. grinding or dicing support tapes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2800/00—Copolymer characterised by the proportions of the comonomers expressed
    • C08F2800/20—Copolymer characterised by the proportions of the comonomers expressed as weight or mass percentages
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00—Additional features of adhesives in the form of films or foils
    • C09J2301/40—Additional features of adhesives in the form of films or foils characterized by the presence of essential components
    • C09J2301/416—Additional features of adhesives in the form of films or foils characterized by the presence of essential components use of irradiation
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2433/00—Presence of (meth)acrylic polymer
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
    • H10P72/7412—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support the auxiliary support including means facilitating the separation of a device or wafer from the auxiliary support
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
    • H10P72/7416—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
    • H10P72/744—Details of chemical or physical process used for separating the auxiliary support from a device or a wafer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2023517555A 2021-04-26 2022-04-26 組成物 Active JP7434666B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2023177758A JP7717769B2 (ja) 2021-04-26 2023-10-13 組成物

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021074443 2021-04-26
JP2021074443 2021-04-26
PCT/JP2022/018883 WO2022230874A1 (ja) 2021-04-26 2022-04-26 組成物

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2023177758A Division JP7717769B2 (ja) 2021-04-26 2023-10-13 組成物

Publications (3)

Publication Number Publication Date
JPWO2022230874A1 true JPWO2022230874A1 (https=) 2022-11-03
JPWO2022230874A5 JPWO2022230874A5 (https=) 2023-12-14
JP7434666B2 JP7434666B2 (ja) 2024-02-20

Family

ID=83848476

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2023517555A Active JP7434666B2 (ja) 2021-04-26 2022-04-26 組成物
JP2023177758A Active JP7717769B2 (ja) 2021-04-26 2023-10-13 組成物

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2023177758A Active JP7717769B2 (ja) 2021-04-26 2023-10-13 組成物

Country Status (7)

Country Link
US (1) US20240218215A1 (https=)
EP (1) EP4328279A4 (https=)
JP (2) JP7434666B2 (https=)
KR (1) KR102835889B1 (https=)
CN (1) CN117242146A (https=)
TW (1) TWI907695B (https=)
WO (1) WO2022230874A1 (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023008789A (ja) * 2021-07-02 2023-01-19 日鉄ケミカル＆マテリアル株式会社 接着剤層形成用組成物、積層体、積層体の製造方法および積層体の処理方法
WO2023181609A1 (ja) * 2022-03-24 2023-09-28 デンカ株式会社 仮固定用組成物
WO2023181635A1 (ja) * 2022-03-24 2023-09-28 デンカ株式会社 仮固定用組成物
JPWO2024162049A1 (https=) * 2023-01-31 2024-08-08
CN120641516A (zh) * 2023-01-31 2025-09-12 电化株式会社 临时固定用组合物、临时固定用粘接剂以及薄型晶片的制造方法
CN120641517A (zh) * 2023-01-31 2025-09-12 电化株式会社 抑制气泡残留的临时固定用组合物
KR20250144436A (ko) * 2023-03-10 2025-10-10 덴카 주식회사 판형 기재의 가공 방법
TW202602960A (zh) * 2024-03-14 2026-01-16 日商電化股份有限公司 組合物、暫時固定用組合物、及使用其之晶圓之製造方法
KR102851651B1 (ko) * 2024-12-05 2025-08-28 솔루스첨단소재 주식회사 광경화성 아크릴 수지 조성물 및 이의 경화물
CN121343546A (zh) * 2025-12-18 2026-01-16 深圳好电科技有限公司 临时键合胶及其应用

Citations (8)

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Publication number Priority date Publication date Assignee Title
JP2004064040A (ja) * 2002-06-03 2004-02-26 Three M Innovative Properties Co 被研削基材を含む積層体、その製造方法並びに積層体を用いた極薄基材の製造方法及びそのための装置
WO2010010900A1 (ja) * 2008-07-22 2010-01-28 電気化学工業株式会社 部材の仮固定・剥離方法及びそれに好適な仮固定用接着剤
JP2010079958A (ja) * 2008-09-24 2010-04-08 Sekisui Chem Co Ltd 仮接着用接着剤
JP2010248352A (ja) * 2009-04-14 2010-11-04 Denki Kagaku Kogyo Kk 接着剤用（メタ）アクリル系樹脂組成物
WO2013031678A1 (ja) * 2011-08-26 2013-03-07 電気化学工業株式会社 硬化性樹脂組成物
JP2014091774A (ja) * 2012-11-02 2014-05-19 Denki Kagaku Kogyo Kk （メタ）アクリル系樹脂組成物及び接着・解体方法
WO2020101000A1 (ja) * 2018-11-14 2020-05-22 デンカ株式会社 組成物
WO2021235406A1 (ja) * 2020-05-21 2021-11-25 デンカ株式会社 組成物

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JP4593328B2 (ja) * 2005-03-18 2010-12-08 電気化学工業株式会社 仮固定用接着剤組成物及び仮固定方法
US8187411B2 (en) * 2005-03-18 2012-05-29 Denki Kagaku Kogyo Kabushiki Kaisha Adherent composition and method of temporarily fixing member therewith
JP2006328104A (ja) 2005-05-23 2006-12-07 Jsr Corp 接着剤組成物
JP2007197517A (ja) 2006-01-24 2007-08-09 Three M Innovative Properties Co 接着性封止組成物、封止フィルム及び有機ｅｌ素子
JP5404992B2 (ja) 2006-03-20 2014-02-05 電気化学工業株式会社 仮固定用組成物、部材の仮固定方法とそれに用いる基材
WO2009148722A2 (en) 2008-06-02 2009-12-10 3M Innovative Properties Company Adhesive encapsulating composition and electronic devices made therewith
JP5362291B2 (ja) 2008-08-26 2013-12-11 日東電工株式会社 アクリル系粘着剤組成物、アクリル系粘着剤層およびアクリル系粘着テープ又はシート
US8366873B2 (en) 2010-04-15 2013-02-05 Suss Microtec Lithography, Gmbh Debonding equipment and methods for debonding temporary bonded wafers
JP5570832B2 (ja) 2010-01-29 2014-08-13 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子
JP5731137B2 (ja) 2010-06-15 2015-06-10 電気化学工業株式会社 エキシマ光照射による接着体の解体方法
KR101381118B1 (ko) * 2011-11-04 2014-04-04 제일모직주식회사 이방 전도성 접착 필름용 조성물 및 이를 이용한 이방 전도성 접착 필름
JP6140441B2 (ja) 2012-12-27 2017-05-31 富士フイルム株式会社 半導体装置製造用仮接着剤、並びに、それを用いた接着性支持体、及び、半導体装置の製造方法
JP6377956B2 (ja) 2013-05-24 2018-08-22 タツモ株式会社 剥離装置
JP2016030702A (ja) * 2014-07-25 2016-03-07 サンライズ・エム・エス・アイ株式会社 タッチパネル等に用いるガラス基盤の製造方法
JP6156443B2 (ja) 2014-08-13 2017-07-05 Jsr株式会社 積層体および基材の処理方法
CN107428890B (zh) * 2015-04-22 2020-12-22 电化株式会社 组合物
JP2017226785A (ja) 2016-06-23 2017-12-28 東ソー株式会社 活性エネルギー線硬化型複合樹脂組成物、及び該組成物を用いた活性エネルギー線硬化型複合樹脂接着剤、又は光学部材接合用粘着テープ
CN112789305B (zh) 2018-10-18 2023-08-15 三键有限公司 光固性组合物
EP3651182A1 (en) 2018-11-12 2020-05-13 FEI Company Charged particle microscope for examining a specimen, and method of determining an aberration of said charged particle microscope
WO2021132049A1 (ja) * 2019-12-27 2021-07-01 ホヤ レンズ タイランド リミテッド フォトクロミック物品の保護層形成用重合性組成物、フォトクロミック物品および眼鏡

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004064040A (ja) * 2002-06-03 2004-02-26 Three M Innovative Properties Co 被研削基材を含む積層体、その製造方法並びに積層体を用いた極薄基材の製造方法及びそのための装置
WO2010010900A1 (ja) * 2008-07-22 2010-01-28 電気化学工業株式会社 部材の仮固定・剥離方法及びそれに好適な仮固定用接着剤
JP2010079958A (ja) * 2008-09-24 2010-04-08 Sekisui Chem Co Ltd 仮接着用接着剤
JP2010248352A (ja) * 2009-04-14 2010-11-04 Denki Kagaku Kogyo Kk 接着剤用（メタ）アクリル系樹脂組成物
WO2013031678A1 (ja) * 2011-08-26 2013-03-07 電気化学工業株式会社 硬化性樹脂組成物
JP2014091774A (ja) * 2012-11-02 2014-05-19 Denki Kagaku Kogyo Kk （メタ）アクリル系樹脂組成物及び接着・解体方法
WO2020101000A1 (ja) * 2018-11-14 2020-05-22 デンカ株式会社 組成物
WO2021235406A1 (ja) * 2020-05-21 2021-11-25 デンカ株式会社 組成物

Also Published As

Publication number Publication date
JP2024009973A (ja) 2024-01-23
KR20230156137A (ko) 2023-11-13
EP4328279A1 (en) 2024-02-28
WO2022230874A1 (ja) 2022-11-03
TW202248231A (zh) 2022-12-16
US20240218215A1 (en) 2024-07-04
KR102835889B1 (ko) 2025-07-21
TWI907695B (zh) 2025-12-11
CN117242146A (zh) 2023-12-15
JP7717769B2 (ja) 2025-08-04
JP7434666B2 (ja) 2024-02-20
EP4328279A4 (en) 2024-10-23

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