JPWO2021150548A5 - - Google Patents

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Publication number
JPWO2021150548A5
JPWO2021150548A5 JP2022544651A JP2022544651A JPWO2021150548A5 JP WO2021150548 A5 JPWO2021150548 A5 JP WO2021150548A5 JP 2022544651 A JP2022544651 A JP 2022544651A JP 2022544651 A JP2022544651 A JP 2022544651A JP WO2021150548 A5 JPWO2021150548 A5 JP WO2021150548A5
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JP
Japan
Prior art keywords
edge ring
carrier plate
substrate
end effector
rotational position
Prior art date
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Application number
JP2022544651A
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English (en)
Japanese (ja)
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JP2023514065A5 (https=
JP2023514065A (ja
JP7719781B2 (ja
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Priority claimed from PCT/US2021/014089 external-priority patent/WO2021150548A1/en
Publication of JP2023514065A publication Critical patent/JP2023514065A/ja
Publication of JPWO2021150548A5 publication Critical patent/JPWO2021150548A5/ja
Publication of JP2023514065A5 publication Critical patent/JP2023514065A5/ja
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Publication of JP7719781B2 publication Critical patent/JP7719781B2/ja
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JP2022544651A 2020-01-23 2021-01-20 自動回転プリアライメントを用いたエッジリング搬送 Active JP7719781B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202062964908P 2020-01-23 2020-01-23
US62/964,908 2020-01-23
PCT/US2021/014089 WO2021150548A1 (en) 2020-01-23 2021-01-20 Edge ring transfer with automated rotational pre-alignment

Publications (4)

Publication Number Publication Date
JP2023514065A JP2023514065A (ja) 2023-04-05
JPWO2021150548A5 true JPWO2021150548A5 (https=) 2024-01-25
JP2023514065A5 JP2023514065A5 (https=) 2024-01-25
JP7719781B2 JP7719781B2 (ja) 2025-08-06

Family

ID=76991736

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022544651A Active JP7719781B2 (ja) 2020-01-23 2021-01-20 自動回転プリアライメントを用いたエッジリング搬送

Country Status (6)

Country Link
US (1) US12575365B2 (https=)
JP (1) JP7719781B2 (https=)
KR (2) KR102888626B1 (https=)
CN (1) CN115004352A (https=)
TW (1) TWI891711B (https=)
WO (1) WO2021150548A1 (https=)

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JP2022139927A (ja) * 2021-03-12 2022-09-26 キオクシア株式会社 半導体製造装置および半導体装置の製造方法
JP7720235B2 (ja) * 2021-11-26 2025-08-07 株式会社安川電機 アライメント装置、基板搬送システム、アライメント方法、及びプログラム
JP7749165B1 (ja) * 2024-02-22 2025-10-03 東京エレクトロン株式会社 基板処理装置
US12603261B2 (en) * 2024-04-04 2026-04-14 Applied Materials, Inc. Aligner station with lifting mechanism

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US7251883B2 (en) * 2002-09-30 2007-08-07 Sony Corporation Electronic-component alignment method and apparatus therefor
JP2004289003A (ja) * 2003-03-24 2004-10-14 Seiko Epson Corp 石英リング、プラズマ処理装置および半導体装置の製造方法
KR101590655B1 (ko) 2007-12-27 2016-02-18 램 리써치 코포레이션 동적 정렬 빔 교정의 방법 및 시스템
JP5227197B2 (ja) * 2008-06-19 2013-07-03 東京エレクトロン株式会社 フォーカスリング及びプラズマ処理装置
US8314371B2 (en) * 2008-11-06 2012-11-20 Applied Materials, Inc. Rapid thermal processing chamber with micro-positioning system
TWI421945B (zh) 2008-11-06 2014-01-01 Applied Materials Inc 含有微定位系統之快速熱處理腔室與處理基材之方法
SG170717A1 (en) * 2009-11-02 2011-05-30 Lam Res Corp Hot edge ring with sloped upper surface
JP5258981B2 (ja) * 2010-02-05 2013-08-07 東京エレクトロン株式会社 基板保持具及び基板搬送装置及び基板処理装置
JP6003011B2 (ja) 2011-03-31 2016-10-05 東京エレクトロン株式会社 基板処理装置
JP6212455B2 (ja) * 2014-03-12 2017-10-11 東芝メモリ株式会社 マーキング装置およびマーキング方法
JP6316082B2 (ja) 2014-04-30 2018-04-25 株式会社Screenホールディングス 基板処理装置および基板処理方法
US10242848B2 (en) * 2014-12-12 2019-03-26 Lam Research Corporation Carrier ring structure and chamber systems including the same
US10658222B2 (en) * 2015-01-16 2020-05-19 Lam Research Corporation Moveable edge coupling ring for edge process control during semiconductor wafer processing
US9881820B2 (en) * 2015-10-22 2018-01-30 Lam Research Corporation Front opening ring pod
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KR102433436B1 (ko) * 2018-07-04 2022-08-17 삼성전자주식회사 기판 처리 시스템, 기판 처리 시스템에서의 에지 링 정렬 검사 방법 및 이를 수행하기 위한 원반형 비젼 센서
KR102702089B1 (ko) * 2019-03-22 2024-09-03 삼성전자주식회사 에지 링을 갖는 기판 처리 장치
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