JPWO2019163069A1 - レーザ発振装置 - Google Patents
レーザ発振装置 Download PDFInfo
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- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
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- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
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- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/131—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
- H01S3/1312—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation by controlling the optical pumping
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- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/131—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
- H01S3/134—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
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- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
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- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/068—Stabilisation of laser output parameters
- H01S5/0683—Stabilisation of laser output parameters by monitoring the optical output parameters
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- H—ELECTRICITY
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- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/068—Stabilisation of laser output parameters
- H01S5/0683—Stabilisation of laser output parameters by monitoring the optical output parameters
- H01S5/0687—Stabilising the frequency of the laser
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0626—Energy control of the laser beam
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/70—Auxiliary operations or equipment
- B23K26/702—Auxiliary equipment
- B23K26/705—Beam measuring device
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- H—ELECTRICITY
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- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10069—Memorized or pre-programmed characteristics, e.g. look-up table [LUT]
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- H—ELECTRICITY
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- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/1305—Feedback control systems
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- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Lasers (AREA)
- Semiconductor Lasers (AREA)
Abstract
Description
図1は本発明の実施の形態に係るレーザ発振装置の構成図である。実施の形態に係るレーザ発振装置100は、互いに波長の異なる複数のレーザ光を結合して1つのレーザ光10として出力するレーザ発振部であるレーザ共振器1と、レーザ共振器1から出力されるレーザ光10の一部を反射する第1の部分反射ミラー2と、第1の部分反射ミラー2で反射されたレーザ光を検出する出力検出部3と、演算部4と、制御部5と、記憶部6と、駆動電源7とを備える。演算部4、制御部5及び記憶部6はレーザ出力制御部300を構成する。
(1)λ1からλ4の複数のレーザ光の出力の合計値Wa0[W]
(2)各センサのセンサ出力の合計値Va0(k)[V]
(3)λ1からλ4の複数のレーザ光のそれぞれの出力の値W0(n)[W]
(4)λ1からλ4の複数のレーザ光のそれぞれの出力に対応する各センサのセンサ出力V0(k,n)[V]
(5)λ1からλ4の複数のレーザ光のそれぞれに対する各センサのセンサ感度α(k,n)[kW/V]
(6)各センサの各波長に対する出力割合β0(k,n)
(7)各センサで検出されるレーザの波長f(k,n)
(8)同一波長を検出する複数のセンサg(k,n)
(9)レーザ出力Wa[W]
(10)各センサの目標出力電圧Va(k)[V](Va=Va0×Wa÷Wa0)
(11)各センサの各波長に対する目標出力電圧V(k,n)[V](V=Va×β0)
γ=Va−buck÷Va(k)・・・(1)
σ=(γmax−γmin)÷γave・・・(2)
ηave=1÷γave・・・(3)
Va(k)’=Va(k)×ηave・・・(4)
Vbuck1=V(k,n)・・・(5)
Vbuck2=Va−Vbuck1(k,n)・・・(6)
Vbuck3=Va−buck1×βh(k,n)・・・(7)
ηave=Wa÷Wa−buck・・・(8)
Vbuck=Va−buck×β0・・・(9)
(1)各モジュールのレーザ出力Wa0(m)[W]
(2)結合後のレーザ出力の値Wca0[W]
(3)複数の出力検出部41,42,43のそれぞれに設けられるセンサのセンサ出力(各波長の合計)Va0(m,k)[V]
(4)出力検出部40に設けられる複数のセンサのセンサ出力の合計値(各波長の合計)Vca0(k)[V]
(5)各モジュールの波長毎のレーザ出力W0(m,n)[W]
(6)W0に対応する各センサ出力電圧V0(m,k,n)[V]
(7)結合後のレーザ出力の波長毎のレーザ出力Wco(n)[W]
(8)Wcoに対応する各センサ出力電圧Vco(k,n)[V]
(9)複数の出力検出部41,42,43のそれぞれに設けられるセンサの波長毎のセンサ感度α(m,k,n)[kW/V]
(10)出力検出部40に設けられる複数のセンサの波長毎のセンサ感度αc(k,n)[kW/V]
(11)複数の出力検出部41,42,43のそれぞれに設けられるセンサの各波長に対する出力割合β0(m,k,n)
(12)出力検出部40に設けられる複数のセンサの各波長に対する出力割合βc0(k,n)
(13)各センサで検出されるレーザの波長f(m,k,n)
(14)同一波長を検出する複数のセンサg(m,k,n)
(15)レーザ出力Wca[W]
(16)複数の出力検出部41,42,43のそれぞれに設けられるセンサの目標出力電圧Va(m,k)[V](Va=Va0×Wca÷Wca0)
(17)出力検出部40に設けられる複数のセンサの目標出力電圧Vca(k)[V] (Vca=Vca0×Wca÷Wca0)
(18)複数の出力検出部41,42,43のそれぞれに設けられるセンサの各波長に対する目標出力電圧V(m,k,n)[V] (V=Va×β0)
(19)出力検出部40に設けられる複数のセンサの各波長に対する目標出力電圧Vc(k,n)[V] (Vc=Vca(k)×βc0(k,n))
γ=ΣVa−buck÷ΣVa・・・(10)
γc=Vca−buck÷Vca・・・(11)
σ=(γmax−γmin)÷γave・・・(12)
σc=(γc−max−γc−min)÷γc−ave・・・(13)
ηc−ave=1÷γc−ave・・・(14)
Va(m,k)’=Va(m,k)×ηc−ave・・・(15)
Vbuck1=V(m,k,n)・・・(16)
Vbuck2=Va(m,k)−Vbuck1(m,k,n)・・・(17)
Vbuck3=Va−buck1(m,k,n)×βh(m,k,n)・・・(18)
ηave=Wa(m)÷Wa−buck(m)・・・(19)
ηc−ave=1÷γave(m)・・・(20)
Vbuck=Va−buck×β0・・・(21)
(1)λ1からλ4の複数のレーザ光の出力の合計値Wa0−ck[W]
(2)各センサのセンサ出力の合計値Va0−ck(k)[V]
(3)簡易補正率s(s=(Va0−ck/Wa0−ck)/(Va0/Wa0))
Claims (5)
- 互いに波長の異なる第1のレーザ光を複数発生するレーザ発振部と、
複数の前記第1のレーザ光のそれぞれの波長に対する受光感度を示す感度特性が相互に異なり、複数の前記第1のレーザ光の出力に応じた第1の電圧を出力する複数のセンサと、
複数の前記センサのそれぞれの前記感度特性を用いて、複数の前記第1の電圧を補正し、補正後の複数の前記第1の電圧である複数の第2の電圧により前記レーザ発振部を制御するための演算部と、
を備えることを特徴とするレーザ発振装置。 - 前記演算部は、複数の前記第2の電圧の合計値を用いて、複数の前記第1のレーザ光を結合した第2のレーザ光の出力値が目標値と一致するように、前記レーザ発振部を制御することを特徴とする請求項1に記載のレーザ発振装置。
- 複数の前記センサが設けられる積分球を備えることを特徴とする請求項1又は2に記載のレーザ発振装置。
- サーマルセンサを備えることを特徴とする請求項1又は2に記載のレーザ発振装置。
- 前記複数のセンサが設けられる積分球と、
前記積分球に設けられるサーマルセンサと、
を備え、
前記演算部は、前記サーマルセンサで検出された電圧を用いて前記複数のセンサの前記感度特性を求めることを特徴とする請求項1又は2に記載のレーザ発振装置。
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PCT/JP2018/006579 WO2019163069A1 (ja) | 2018-02-22 | 2018-02-22 | レーザ発振装置 |
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JP6466036B1 JP6466036B1 (ja) | 2019-02-06 |
JPWO2019163069A1 true JPWO2019163069A1 (ja) | 2020-04-02 |
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US (1) | US10998692B2 (ja) |
JP (1) | JP6466036B1 (ja) |
CN (1) | CN111771310B (ja) |
DE (1) | DE112018006927B4 (ja) |
WO (1) | WO2019163069A1 (ja) |
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KR20220086656A (ko) * | 2019-11-29 | 2022-06-23 | 사이머 엘엘씨 | 복수의 레이저 빔을 결합하는 장치 및 방법 |
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JPS61219489A (ja) * | 1985-03-25 | 1986-09-29 | Mitsubishi Electric Corp | レ−ザ出力制御装置 |
JPS61292982A (ja) * | 1985-06-21 | 1986-12-23 | Mitsubishi Electric Corp | レ−ザパワ−メ−タ |
JPH0760912B2 (ja) * | 1986-03-28 | 1995-06-28 | 三菱電機株式会社 | レ−ザ出力制御装置 |
JPH09135047A (ja) * | 1995-11-08 | 1997-05-20 | Matsushita Electric Ind Co Ltd | レーザパワーモニタおよびレーザ発振器 |
JP2000029143A (ja) * | 1998-07-07 | 2000-01-28 | Fuji Photo Film Co Ltd | 半導体レーザ装置 |
US6541731B2 (en) * | 2000-01-25 | 2003-04-01 | Aculight Corporation | Use of multiple laser sources for rapid, flexible machining and production of vias in multi-layered substrates |
JP2002062189A (ja) | 2000-08-24 | 2002-02-28 | Shimadzu Corp | 分光測定用検出器及びこれを用いた積分球測定器および分光光度計 |
JP3717438B2 (ja) * | 2001-06-07 | 2005-11-16 | 古河電気工業株式会社 | 光モジュール、光送信器及びwdm光送信装置 |
JP3766347B2 (ja) * | 2002-05-16 | 2006-04-12 | 東芝電子エンジニアリング株式会社 | 光送信用デバイス |
US7292616B2 (en) * | 2005-02-09 | 2007-11-06 | Ultratech, Inc. | CO2 laser stabilization systems and methods |
US7436588B2 (en) * | 2006-10-05 | 2008-10-14 | Northrop Grumman Corporation | Method and system for hybrid coherent and incoherent diffractive beam combining |
JP2008145133A (ja) * | 2006-12-06 | 2008-06-26 | Horiba Ltd | 放射温度計 |
JP4047901B1 (ja) * | 2006-12-14 | 2008-02-13 | ダイトロンテクノロジー株式会社 | 半導体素子の波長測定装置及び半導体素子の検査装置 |
JP2010212549A (ja) * | 2009-03-12 | 2010-09-24 | Panasonic Corp | レーザ発振装置およびレーザ加工機 |
JP2013062484A (ja) | 2011-08-24 | 2013-04-04 | Gigaphoton Inc | レーザ装置 |
JP6022837B2 (ja) * | 2011-10-25 | 2016-11-09 | ギガフォトン株式会社 | エキシマレーザ装置及びエキシマレーザシステム |
DE102013207379A1 (de) * | 2013-04-23 | 2014-10-23 | Bundesdruckerei Gmbh | Verfahren und Vorrichtung zur Lasermarkierung mit Graustufenkalibrierung |
US9762022B2 (en) | 2013-12-05 | 2017-09-12 | Mitsubishi Electric Corporation | Multi wavelength laser device |
JP2015233105A (ja) * | 2014-06-11 | 2015-12-24 | キヤノン株式会社 | 光強度検出器、光強度検出方法、並びにこの光検出器を備えた露光装置、露光装置の照射光強度検出方法、露光装置の光センサ感度校正方法 |
JP6261471B2 (ja) * | 2014-07-31 | 2018-01-17 | 株式会社キーエンス | レーザ加工装置 |
JP6373714B2 (ja) * | 2014-10-14 | 2018-08-15 | 株式会社アマダホールディングス | ダイレクトダイオードレーザ加工装置及びその出力監視方法 |
WO2016142996A1 (ja) * | 2015-03-06 | 2016-09-15 | ギガフォトン株式会社 | 固体レーザシステム、及び露光装置用レーザ装置 |
JP6205586B2 (ja) * | 2015-04-27 | 2017-10-04 | パナソニックIpマネジメント株式会社 | レーザ出力測定装置及びレーザ加工方法 |
JP6667396B2 (ja) | 2016-07-26 | 2020-03-18 | 三菱電機株式会社 | 照明用レーザ装置 |
DE112016007261T5 (de) * | 2016-10-25 | 2019-06-13 | Mitsubishi Electric Corporation | Laserstrahlmaschine und Berechnungsvorrichtung für eine Laserstrahlmaschine |
WO2019215798A1 (ja) * | 2018-05-07 | 2019-11-14 | 三菱電機株式会社 | レーザ装置、レーザ加工機およびレーザ装置の出力制御方法 |
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2018
- 2018-02-22 CN CN201880089550.1A patent/CN111771310B/zh not_active Expired - Fee Related
- 2018-02-22 WO PCT/JP2018/006579 patent/WO2019163069A1/ja active Application Filing
- 2018-02-22 JP JP2018530910A patent/JP6466036B1/ja not_active Expired - Fee Related
- 2018-02-22 DE DE112018006927.3T patent/DE112018006927B4/de not_active Expired - Fee Related
- 2018-02-22 US US16/957,108 patent/US10998692B2/en active Active
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WO2019163069A1 (ja) | 2019-08-29 |
CN111771310A (zh) | 2020-10-13 |
DE112018006927T5 (de) | 2020-10-08 |
DE112018006927B4 (de) | 2022-02-10 |
US20200395733A1 (en) | 2020-12-17 |
US10998692B2 (en) | 2021-05-04 |
JP6466036B1 (ja) | 2019-02-06 |
CN111771310B (zh) | 2021-09-03 |
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