JPWO2010101163A1 - 機能素子内蔵基板及びそれを用いた電子デバイス - Google Patents
機能素子内蔵基板及びそれを用いた電子デバイス Download PDFInfo
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- JPWO2010101163A1 JPWO2010101163A1 JP2011502769A JP2011502769A JPWO2010101163A1 JP WO2010101163 A1 JPWO2010101163 A1 JP WO2010101163A1 JP 2011502769 A JP2011502769 A JP 2011502769A JP 2011502769 A JP2011502769 A JP 2011502769A JP WO2010101163 A1 JPWO2010101163 A1 JP WO2010101163A1
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- H01L23/538—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
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Abstract
Description
機能素子と、
該機能素子を埋設する絶縁層と、
該絶縁層の2つの主面に配設される配線層と、
前記絶縁層中であって、前記機能素子の側方に、前記2つの主面に配設される配線層間を接続する絶縁層貫通ビアと
を有し、
前記機能素子は、該機能素子の基板を貫通する基板貫通ビアを有し、前記2つの主面に配設される配線層間の電気的接続の少なくとも一部が、該基板貫通ビアを介することを特徴とする機能素子内蔵基板である。
(2)高アスペクトな開口部底の残渣を除去する技術、
(3)高アスペクトな開口部底に銅などの導電体を形成する技術、特にめっき技術。
図1に、本発明の実施形態1に係る機能素子内蔵基板100の要部の模式的断面図を示す。本実施形態1に係る機能素子内蔵基板100は、LSIに代表される半導体素子等の機能素子101、機能素子101を埋設する絶縁層102、絶縁層102の2つの主面(上面及び裏面)に第1配線層103及び第2配線層108を備える。機能素子101には、機能素子を構成する基板を貫通するビアを含む素子貫通ビア106が1個又は複数形成されている。素子貫通ビア106には、導電材料が形成されており、機能素子101の上面から下面へ導通可能となっている。絶縁層102には絶縁層貫通ビア107が設けられており、第1配線層103と第2配線層108を接続している。この例では、機能素子101の上面(図示する上方向の面)に電子回路(不図示)やパッド(不図示)が形成される場合を示しており、機能素子の下面には接着層105を設けている。素子貫通ビア106はこの接着層105をも貫通している。機能素子101の上面には第1配線層103との接続部104が形成されており、第1配線層103と第2配線層108とは、機能素子101に形成した素子貫通ビア106を介しても電気的に接続されている。
次に、上記実施形態1とは異なる機能素子内蔵基板の一例について説明する。本実施形態2に係る機能素子内蔵基板200は、以下の点を除く基本的な構成は上記実施形態1と同様である。すなわち、上記実施形態1においては、機能素子101の下部に接着層105を設けていたのに対し、本実施形態2においては、接着層105を設けておらず、また、機能素子内蔵基板の上下の配線層を多層に形成している点において相違する。
実施形態3では、実施形態1の変形例を示す。本実施形態3に係る機能素子内蔵基板300は、以下の点を除く基本的な構成は上記実施形態1と同様である。すなわち、図4の模式的断面図に示すように、上記実施形態1においては、機能素子101の下部に接着層105を設けていたのに対し、本実施形態3においては、機能素子301の下部には接着層105を設けておらず、また、第1配線層303及び第2配線層308をソルダーレジスト層332、331で保護し、さらに、外部基板(不図示)と接続する外部端子333をソルダーレジスト層331の開口部に設けている。図4において、符号301〜308は、図1の符号101〜108にそれぞれ相当する。
実施形態4では、実施形態2の変形例を示す。図5に実施形態4に係る機能素子内蔵基板400の概略断面図を示す。本実施形態4では実施形態2の機能素子内蔵基板200の下部にソルダーレジスト層431と外部端子433を設けている以外、実施形態2と同様である。図5において、符号401〜421は、図2の符号201〜221にそれぞれ相当する。
次に、本発明の機能素子内蔵基板を用いた電子デバイスの実施形態について説明する。本実施形態5に係る電子デバイス500は、機能素子内蔵基板上に上パッケージ536を搭載してPoP形状としたものである。第2配線層512から下の構造は、上記の実施形態4と同様であり、図6における符号501〜512,516〜521,531,533は、図5の符号401〜412,416〜421,431,433と同様の意味を示す。第2配線層512は、ソルダーレジスト層532で保護されており、上パッケージ536に設けたBGAなどの外部端子534で上パッケージ536と接続されている。また、上パッケージ536は機能素子内蔵基板上のソルダーレジスト層532に接着剤層535で固定されている。
実施形態5の変形例を実施形態6として示す。本実施形態6に係る電子デバイス600は、図7に示すように、機能素子内蔵基板を上下逆転している。図7における符号601〜618は、図5の符号501〜518と同様の意味を示し、符号631〜636は、図6の符号531〜536と同様である。
その他、本発明の変形例について、製造工程を参照しつつ説明する。図8(a)〜(k)は本実施形態7に係る機能素子内蔵基板700の製造工程を説明するもので、実施形態4の変形例を示す。本実施形態7に係る機能素子内蔵基板700は、以下の点を除く基本的な構成は上記実施形態4と同様である。すなわち、第6配線層421が、上記実施形態4においては、第6絶縁層419の図中下側の表面上に形成されているのに対し、本実施形態7においては、第6配線層721は第6絶縁層719の図中上側の内面側に形成されている点において相違する。これは、製造方法の相違に基づくものである。
以上の実施形態において、機能素子を埋める絶縁層(第1絶縁層)は、1種の絶縁層で形成しているが、本発明はこれに限定されず、2種以上の絶縁層で構成されていてもよい。本実施形態8として、図9の工程断面図を参照しつつ説明する。図9に示す機能素子内蔵基板800の構成は、上記実施形態1の変形例として説明するが、その他の実施形態に適用できることはいうまでもない。
本実施形態9に係る機能素子内蔵基板900は、実施形態1で説明した複数の機能素子をX方向に積層する場合を説明するものである。本実施形態では2つの機能素子901aと901bとの回路形成面を対向させて積層する場合について説明するが、これに限定されず、回路形成面が同方向を向いている場合や他方向を向いている場合であっても適用することができる。
500,600:電子デバイス
101,201,301,401,501,601,701,801,901a,901b:機能素子
102,302,802:絶縁層
202,402,502,602,702,902a,902b:第1絶縁層
103,203,303,403,503,603,703,803,903a,903b:第1配線層
104,204,304,404,504,604,704,804,904a,904b:素子接続ビア
105,805,905:接着層
106,206,306,406,506,606,706,806,906:素子貫通ビア
107,307,807:絶縁層貫通ビア
207,407,507,607,707,907a,907b:第1絶縁層貫通ビア
108,208,308,408,508,608,708,808,908a,908b:第2配線層
209,409,509,609,709,909a,909b:第2絶縁層
210,410,510,610,710,910a,910b:第3絶縁層
211,411,511,611,711:第1−第3配線接続ビア
911b:接続ビア
212,412,512,612,712:第3配線層
213,413,613,713:第4絶縁層
214,414,614,714:第3−第5配線接続ビア
215,415,615,715:第5配線層
216,416,516,616,716:第5絶縁層
217,417,517,617,717;第2−第4配線接続ビア
218,418,518,618,718:第4配線層
219,419,519,719:第6絶縁層
220,420,520,720:第4−第6配線接続ビア
221,421,521,721:第6配線層
331,332,431,531,532,631,632,731:ソルダーレジスト層
333,433,533,534,633,634,733:外部端子(BGA)
535,635:接着剤層
536,636:上パッケージ
241,242,741,742,841,842:ビアホール
250,750,850:支持体
861:絶縁材料
Claims (14)
- 機能素子と、
該機能素子を埋設する絶縁層と、
該絶縁層の2つの主面に配設される配線層と、
前記絶縁層中であって、前記機能素子の側方に、前記2つの主面に配設される配線層間を接続する絶縁層貫通ビアと
を有し、
前記機能素子は、該機能素子の基板を貫通する基板貫通ビアを有し、前記2つの主面に配設される配線層間の電気的接続の少なくとも一部が、該基板貫通ビアを介することを特徴とする機能素子内蔵基板。 - 前記機能素子は、前記基板貫通ビアを含む、機能素子の表面から裏面に貫通する素子貫通ビアを有する請求項1に記載の機能素子内蔵基板。
- 前記機能素子の回路から、前記機能素子の回路の形成面と対向する側に配設された配線層への電気的接続の一部が、前記基板貫通ビアを介することを特徴とする請求項1又は2に記載の機能素子内蔵基板。
- 前記機能素子は、半導体素子である請求項1乃至3のいずれかに記載の機能素子内蔵基板。
- 前記半導体素子は、シリコンを基板とする半導体素子である請求項4に記載の機能素子内蔵基板。
- 前記基板貫通ビアは、導電性の微細粒子が添加された充填材で構成されている請求項1乃至5のいずれか1項に記載の機能素子内蔵基板。
- 前記基板貫通ビアは、金属材料で構成されている請求項1乃至5のいずれか1項に記載の機能素子内蔵基板。
- 前記2つの主面に配設される配線層の少なくとも一方が、多層配線である請求項1乃至7のいずれかに記載の機能素子内蔵基板。
- 前記機能素子の回路が、機能素子の回路面上に設けられた絶縁層を貫通する接続ビアを介して、前記機能素子の回路面上の配線層と電気的に接続されており、前記機能素子の側方に設けられる絶縁層貫通ビアを形成する絶縁層と、前記機能素子の回路面上に設けられた絶縁層とが異なる材料で構成される請求項1乃至8のいずれかに記載の機能素子内蔵基板。
- 機能素子を複数内蔵し、少なくとも1つの機能素子が前記基板貫通ビアを有する機能素子である請求項1乃至9のいずれかに記載の機能素子内蔵基板。
- 少なくとも2つの機能素子が前記機能素子内蔵基板の厚み方向に積層され、隣接する2つの機能素子の回路が両機能素子間の配線層を介して電気的に接続されており、上層の機能素子と下層の機能素子の下に配設される配線層との電気的接続が、前記下層の機能素子の側方に形成された絶縁層貫通ビアと前記下層の機能素子の基板を貫通する基板貫通ビアとの両方を介して行われる請求項10に記載の機能素子内蔵基板。
- 前記機能素子内蔵基板の外部接続面にソルダーレジスト層を有する請求項1乃至11に記載の機能素子内蔵基板。
- 前記ソルダーレジスト層は、配線層の一部を露出する開口部を有し、該開口部に外部接続用の端子を有する請求項12に記載の機能素子内蔵基板。
- 請求項1乃至13のいずれかに記載の機能素子内蔵基板と、該機能素子内蔵基板の上面に搭載される上パッケージを有する電子デバイスであって、前記上パッケージと、該上パッケージに対して前記機能素子内蔵基板に内蔵される機能素子の下部にあたる配線層とが電気的に接続されており、その一部が、前記機能素子基板を貫通する基板貫通ビアを介して行われることを特徴とする電子デバイス。
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014123725A (ja) * | 2012-12-21 | 2014-07-03 | Samsung Electro-Mechanics Co Ltd | 高密度及び低密度基板領域を備えるハイブリッド基板及びその製造方法 |
Families Citing this family (70)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101313391B1 (ko) | 2004-11-03 | 2013-10-01 | 테세라, 인코포레이티드 | 적층형 패키징 |
US8058101B2 (en) | 2005-12-23 | 2011-11-15 | Tessera, Inc. | Microelectronic packages and methods therefor |
JP5143211B2 (ja) * | 2009-12-28 | 2013-02-13 | パナソニック株式会社 | 半導体モジュール |
JP5581830B2 (ja) * | 2010-06-11 | 2014-09-03 | 富士通株式会社 | 部品内蔵基板の製造方法及び部品内蔵基板 |
US9159708B2 (en) | 2010-07-19 | 2015-10-13 | Tessera, Inc. | Stackable molded microelectronic packages with area array unit connectors |
US8482111B2 (en) | 2010-07-19 | 2013-07-09 | Tessera, Inc. | Stackable molded microelectronic packages |
JP5589735B2 (ja) * | 2010-10-06 | 2014-09-17 | 日本電気株式会社 | 電子部品内蔵基板及びその製造方法 |
KR101075241B1 (ko) | 2010-11-15 | 2011-11-01 | 테세라, 인코포레이티드 | 유전체 부재에 단자를 구비하는 마이크로전자 패키지 |
JP5879030B2 (ja) * | 2010-11-16 | 2016-03-08 | 新光電気工業株式会社 | 電子部品パッケージ及びその製造方法 |
US20120146206A1 (en) * | 2010-12-13 | 2012-06-14 | Tessera Research Llc | Pin attachment |
US8736065B2 (en) * | 2010-12-22 | 2014-05-27 | Intel Corporation | Multi-chip package having a substrate with a plurality of vertically embedded die and a process of forming the same |
US8618659B2 (en) | 2011-05-03 | 2013-12-31 | Tessera, Inc. | Package-on-package assembly with wire bonds to encapsulation surface |
KR101128063B1 (ko) | 2011-05-03 | 2012-04-23 | 테세라, 인코포레이티드 | 캡슐화 층의 표면에 와이어 본드를 구비하는 패키지 적층형 어셈블리 |
JP5779970B2 (ja) * | 2011-05-13 | 2015-09-16 | イビデン株式会社 | プリント配線板及びプリント配線板の製造方法 |
JP5660462B2 (ja) * | 2011-05-13 | 2015-01-28 | イビデン株式会社 | プリント配線板 |
JP2013030593A (ja) * | 2011-07-28 | 2013-02-07 | J Devices:Kk | 半導体装置、該半導体装置を垂直に積層した半導体モジュール構造及びその製造方法 |
TWI628990B (zh) | 2011-10-11 | 2018-07-01 | 日商日立化成股份有限公司 | 具有導體電路的構造體及其製造方法 |
US8836136B2 (en) | 2011-10-17 | 2014-09-16 | Invensas Corporation | Package-on-package assembly with wire bond vias |
US8946757B2 (en) | 2012-02-17 | 2015-02-03 | Invensas Corporation | Heat spreading substrate with embedded interconnects |
US8372741B1 (en) | 2012-02-24 | 2013-02-12 | Invensas Corporation | Method for package-on-package assembly with wire bonds to encapsulation surface |
US9349706B2 (en) | 2012-02-24 | 2016-05-24 | Invensas Corporation | Method for package-on-package assembly with wire bonds to encapsulation surface |
JP5977051B2 (ja) * | 2012-03-21 | 2016-08-24 | 新光電気工業株式会社 | 半導体パッケージ、半導体装置及び半導体パッケージの製造方法 |
US8835228B2 (en) | 2012-05-22 | 2014-09-16 | Invensas Corporation | Substrate-less stackable package with wire-bond interconnect |
US9391008B2 (en) | 2012-07-31 | 2016-07-12 | Invensas Corporation | Reconstituted wafer-level package DRAM |
US9502390B2 (en) | 2012-08-03 | 2016-11-22 | Invensas Corporation | BVA interposer |
US8866287B2 (en) | 2012-09-29 | 2014-10-21 | Intel Corporation | Embedded structures for package-on-package architecture |
US8975738B2 (en) | 2012-11-12 | 2015-03-10 | Invensas Corporation | Structure for microelectronic packaging with terminals on dielectric mass |
US9496211B2 (en) * | 2012-11-21 | 2016-11-15 | Intel Corporation | Logic die and other components embedded in build-up layers |
US8878353B2 (en) | 2012-12-20 | 2014-11-04 | Invensas Corporation | Structure for microelectronic packaging with bond elements to encapsulation surface |
US9136254B2 (en) | 2013-02-01 | 2015-09-15 | Invensas Corporation | Microelectronic package having wire bond vias and stiffening layer |
US20160118346A1 (en) * | 2013-05-20 | 2016-04-28 | Meiko Electronics Co., Ltd. | Device embedded substrate and manufacturing method thereof |
US9167710B2 (en) | 2013-08-07 | 2015-10-20 | Invensas Corporation | Embedded packaging with preformed vias |
US9685365B2 (en) | 2013-08-08 | 2017-06-20 | Invensas Corporation | Method of forming a wire bond having a free end |
KR101514539B1 (ko) | 2013-08-29 | 2015-04-22 | 삼성전기주식회사 | 전자부품 내장기판 |
US20150076714A1 (en) | 2013-09-16 | 2015-03-19 | Invensas Corporation | Microelectronic element with bond elements to encapsulation surface |
JP2015065400A (ja) * | 2013-09-25 | 2015-04-09 | サムソン エレクトロ−メカニックス カンパニーリミテッド. | 素子内蔵型印刷回路基板及びその製造方法 |
WO2015047330A1 (en) * | 2013-09-27 | 2015-04-02 | Intel Corporation | Die package with superposer substrate for passive components |
US9583456B2 (en) | 2013-11-22 | 2017-02-28 | Invensas Corporation | Multiple bond via arrays of different wire heights on a same substrate |
US9263394B2 (en) | 2013-11-22 | 2016-02-16 | Invensas Corporation | Multiple bond via arrays of different wire heights on a same substrate |
US9379074B2 (en) | 2013-11-22 | 2016-06-28 | Invensas Corporation | Die stacks with one or more bond via arrays of wire bond wires and with one or more arrays of bump interconnects |
US9583411B2 (en) | 2014-01-17 | 2017-02-28 | Invensas Corporation | Fine pitch BVA using reconstituted wafer with area array accessible for testing |
US10381326B2 (en) | 2014-05-28 | 2019-08-13 | Invensas Corporation | Structure and method for integrated circuits packaging with increased density |
JP2015226013A (ja) * | 2014-05-29 | 2015-12-14 | イビデン株式会社 | プリント配線板およびその製造方法 |
US9646917B2 (en) | 2014-05-29 | 2017-05-09 | Invensas Corporation | Low CTE component with wire bond interconnects |
US9412714B2 (en) | 2014-05-30 | 2016-08-09 | Invensas Corporation | Wire bond support structure and microelectronic package including wire bonds therefrom |
JP6378616B2 (ja) * | 2014-11-12 | 2018-08-22 | イビデン株式会社 | 電子部品内蔵プリント配線板 |
US9735084B2 (en) | 2014-12-11 | 2017-08-15 | Invensas Corporation | Bond via array for thermal conductivity |
CN105845635B (zh) * | 2015-01-16 | 2018-12-07 | 恒劲科技股份有限公司 | 电子封装结构 |
JP6511830B2 (ja) * | 2015-01-29 | 2019-05-15 | 日立化成株式会社 | 半導体装置の製造方法 |
US9888579B2 (en) | 2015-03-05 | 2018-02-06 | Invensas Corporation | Pressing of wire bond wire tips to provide bent-over tips |
US9502372B1 (en) | 2015-04-30 | 2016-11-22 | Invensas Corporation | Wafer-level packaging using wire bond wires in place of a redistribution layer |
US9761554B2 (en) | 2015-05-07 | 2017-09-12 | Invensas Corporation | Ball bonding metal wire bond wires to metal pads |
JP2016213372A (ja) * | 2015-05-12 | 2016-12-15 | 日立化成株式会社 | 半導体装置及び半導体装置の製造方法 |
US9401350B1 (en) * | 2015-07-29 | 2016-07-26 | Qualcomm Incorporated | Package-on-package (POP) structure including multiple dies |
US10490528B2 (en) | 2015-10-12 | 2019-11-26 | Invensas Corporation | Embedded wire bond wires |
US9490222B1 (en) | 2015-10-12 | 2016-11-08 | Invensas Corporation | Wire bond wires for interference shielding |
US10332854B2 (en) | 2015-10-23 | 2019-06-25 | Invensas Corporation | Anchoring structure of fine pitch bva |
US10181457B2 (en) | 2015-10-26 | 2019-01-15 | Invensas Corporation | Microelectronic package for wafer-level chip scale packaging with fan-out |
US9911718B2 (en) | 2015-11-17 | 2018-03-06 | Invensas Corporation | ‘RDL-First’ packaged microelectronic device for a package-on-package device |
US9659848B1 (en) | 2015-11-18 | 2017-05-23 | Invensas Corporation | Stiffened wires for offset BVA |
US9984992B2 (en) | 2015-12-30 | 2018-05-29 | Invensas Corporation | Embedded wire bond wires for vertical integration with separate surface mount and wire bond mounting surfaces |
US9935075B2 (en) | 2016-07-29 | 2018-04-03 | Invensas Corporation | Wire bonding method and apparatus for electromagnetic interference shielding |
US10299368B2 (en) | 2016-12-21 | 2019-05-21 | Invensas Corporation | Surface integrated waveguides and circuit structures therefor |
JP2018206797A (ja) * | 2017-05-30 | 2018-12-27 | アオイ電子株式会社 | 半導体装置および半導体装置の製造方法 |
KR20200038279A (ko) | 2017-09-11 | 2020-04-10 | 라이징 테크놀로지즈 가부시키가이샤 | 전자회로장치 및 전자회로장치의 제조방법 |
JP6515243B2 (ja) * | 2018-11-14 | 2019-05-15 | アオイ電子株式会社 | 半導体装置の製造方法 |
US11277917B2 (en) | 2019-03-12 | 2022-03-15 | Advanced Semiconductor Engineering, Inc. | Embedded component package structure, embedded type panel substrate and manufacturing method thereof |
JP7371882B2 (ja) | 2019-04-12 | 2023-10-31 | 株式会社ライジングテクノロジーズ | 電子回路装置および電子回路装置の製造方法 |
CN112335036A (zh) | 2019-05-16 | 2021-02-05 | 莱新科技股份有限公司 | 电子电路装置以及电子电路装置的制造方法 |
JP2020065088A (ja) * | 2020-01-29 | 2020-04-23 | 株式会社アムコー・テクノロジー・ジャパン | 半導体装置及びその製造方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004247475A (ja) * | 2003-02-13 | 2004-09-02 | Shinko Electric Ind Co Ltd | 電子部品実装構造及びその製造方法 |
JP2006147869A (ja) * | 2004-11-19 | 2006-06-08 | Oki Electric Ind Co Ltd | 素子内蔵基板およびその製造方法 |
JP2007027472A (ja) * | 2005-07-19 | 2007-02-01 | Namics Corp | 部品内蔵デバイス及び製造方法 |
WO2008120755A1 (ja) * | 2007-03-30 | 2008-10-09 | Nec Corporation | 機能素子内蔵回路基板及びその製造方法、並びに電子機器 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007180529A (ja) * | 2005-12-02 | 2007-07-12 | Nec Electronics Corp | 半導体装置およびその製造方法 |
WO2008087701A1 (ja) * | 2007-01-15 | 2008-07-24 | Zycube Co., Ltd. | 三次元半導体集積回路装置及びその製造方法 |
JP2008258522A (ja) * | 2007-04-09 | 2008-10-23 | Renesas Technology Corp | 半導体装置の製造方法 |
JP5018270B2 (ja) * | 2007-06-22 | 2012-09-05 | パナソニック株式会社 | 半導体積層体とそれを用いた半導体装置 |
-
2010
- 2010-03-03 JP JP2010046590A patent/JP5471605B2/ja not_active Expired - Fee Related
- 2010-03-03 WO PCT/JP2010/053382 patent/WO2010101163A1/ja active Application Filing
- 2010-03-03 JP JP2011502769A patent/JPWO2010101163A1/ja active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004247475A (ja) * | 2003-02-13 | 2004-09-02 | Shinko Electric Ind Co Ltd | 電子部品実装構造及びその製造方法 |
JP2006147869A (ja) * | 2004-11-19 | 2006-06-08 | Oki Electric Ind Co Ltd | 素子内蔵基板およびその製造方法 |
JP2007027472A (ja) * | 2005-07-19 | 2007-02-01 | Namics Corp | 部品内蔵デバイス及び製造方法 |
WO2008120755A1 (ja) * | 2007-03-30 | 2008-10-09 | Nec Corporation | 機能素子内蔵回路基板及びその製造方法、並びに電子機器 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
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