JPWO2007066560A1 - 振動制御用質量体 - Google Patents
振動制御用質量体 Download PDFInfo
- Publication number
- JPWO2007066560A1 JPWO2007066560A1 JP2007515550A JP2007515550A JPWO2007066560A1 JP WO2007066560 A1 JPWO2007066560 A1 JP WO2007066560A1 JP 2007515550 A JP2007515550 A JP 2007515550A JP 2007515550 A JP2007515550 A JP 2007515550A JP WO2007066560 A1 JPWO2007066560 A1 JP WO2007066560A1
- Authority
- JP
- Japan
- Prior art keywords
- vibration control
- mass body
- members
- control mass
- vibration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
- F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
- F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
- C22C27/04—Alloys based on tungsten or molybdenum
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C32/00—Non-ferrous alloys containing at least 5% by weight but less than 50% by weight of oxides, carbides, borides, nitrides, silicides or other metal compounds, e.g. oxynitrides, sulfides, whether added as such or formed in situ
- C22C32/001—Non-ferrous alloys containing at least 5% by weight but less than 50% by weight of oxides, carbides, borides, nitrides, silicides or other metal compounds, e.g. oxynitrides, sulfides, whether added as such or formed in situ with only oxides
- C22C32/0015—Non-ferrous alloys containing at least 5% by weight but less than 50% by weight of oxides, carbides, borides, nitrides, silicides or other metal compounds, e.g. oxynitrides, sulfides, whether added as such or formed in situ with only oxides with only single oxides as main non-metallic constituents
- C22C32/0031—Matrix based on refractory metals, W, Mo, Nb, Hf, Ta, Zr, Ti, V or alloys thereof
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
- F16F7/00—Vibration-dampers; Shock-absorbers
- F16F7/10—Vibration-dampers; Shock-absorbers using inertia effect
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Aviation & Aerospace Engineering (AREA)
- Acoustics & Sound (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Powder Metallurgy (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Vibration Prevention Devices (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
まず、質量比率でタングステン(W)粉末:97%、ニッケル(Ni)粉末:2%、鉄(Fe)粉末:1%を配合し、ミキサで30分間乾式混合した。その後、上記の金属混合粉を篩目で1回篩い分けした。タイラ(Tyler)粒度メッシュが#150の篩目を用いた。
まず、質量比率でタングステン(W)粉末:97%、ニッケル(Ni)粉末:2%、鉄(Fe)粉末:1%を配合し、ミキサで30分間乾式混合した。その後、上記の金属混合粉を篩目で1回篩い分けした。タイラ(Tyler)粒度メッシュが#150の篩目を用いた。
Claims (15)
- 複数の部材(10、20、70)を備え、この複数の部材(10、20、70)の各々がタングステン合金からなり、このタングステン合金は主成分としてタングステンを80質量%以上99質量%以下含む、振動制御用質量体(100、200)。
- 前記タングステン合金は、0質量%を超え18質量%以下の含有量でニッケルと、鉄、銅およびコバルトからなる群より選ばれた少なくとも1種の金属と、不可避的不純物とを含む、請求項1に記載の振動制御用質量体(100、200)。
- 前記タングステン合金はタングステンを90質量%以上98質量%以下含み、比重が17.0g/cm3以上である、請求項1に記載の振動制御用質量体(100、200)。
- 当該振動制御用質量体は凹部(110)を有する、請求項1に記載の振動制御用質量体(100)。
- 当該振動制御用質量体は移動可能であり、前記複数の部材は接合された複数の板状部材(10、20)を含み、前記複数の板状部材(10、20)の接合面(14、24)は当該振動制御用質量体(100)の移動方向(P)に対してほぼ垂直である、請求項1に記載の振動制御用質量体(100)。
- 前記板状部材(10、20)は凹部(11、21)を有する、請求項5に記載の振動制御用質量体(100)。
- 前記複数の部材(10、20、70)は、ネジ(13、23、31、220)により締結されている、請求項1に記載の振動制御用質量体(100、200)。
- 当該振動制御用質量体は移動可能であり、前記ネジ(13、23)の進む方向は当該振動制御用質量体の移動方向(P)にほぼ平行である、請求項7に記載の振動制御用質量体(100)。
- 前記複数の部材(10、20)は拡散接合されている、請求項1に記載の振動制御用質量体(100)。
- 前記複数の部材(10、20)はろう付け接合されている、請求項1に記載の振動制御用質量体(100)。
- 前記複数の部材(10、20)は接着剤により接合されている、請求項1に記載の振動制御用質量体(100)。
- 前記複数の部材(10、20)を収容する容器(30)をさらに備え、この容器(30)はタングステン合金と異なる材料からなる、請求項1に記載の振動制御用質量体(100)。
- 移動体を有するステージ装置において移動体の移動に伴う振動を制御するために用いられる、請求項1に記載の振動制御用質量体(100、200)。
- 前記移動体がマスクまたは基板を保持して移動するものであり、前記ステージ装置が露光装置である、請求項13に記載の振動制御用質量体(100、200)。
- ステージ装置(502)に連結するための連結部材(62、72)を有し、この連結部材の厚みが5mm以上50mm以下である、請求項13に記載の振動制御用質量体(200、60、70)。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005356979 | 2005-12-09 | ||
JP2005356979 | 2005-12-09 | ||
PCT/JP2006/323895 WO2007066560A1 (ja) | 2005-12-09 | 2006-11-30 | 振動制御用質量体 |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007128856A Division JP4083205B1 (ja) | 2007-05-15 | 2007-05-15 | 振動制御用質量体 |
JP2008050029A Division JP2008196701A (ja) | 2005-12-09 | 2008-02-29 | 振動制御用質量体 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP4203109B2 JP4203109B2 (ja) | 2008-12-24 |
JPWO2007066560A1 true JPWO2007066560A1 (ja) | 2009-05-14 |
Family
ID=38122705
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007515550A Expired - Fee Related JP4203109B2 (ja) | 2005-12-09 | 2006-11-30 | 振動制御用質量体 |
JP2008050029A Pending JP2008196701A (ja) | 2005-12-09 | 2008-02-29 | 振動制御用質量体 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008050029A Pending JP2008196701A (ja) | 2005-12-09 | 2008-02-29 | 振動制御用質量体 |
Country Status (8)
Country | Link |
---|---|
US (1) | US20090039575A1 (ja) |
EP (1) | EP1959157A1 (ja) |
JP (2) | JP4203109B2 (ja) |
KR (1) | KR101314701B1 (ja) |
CN (1) | CN101326384B (ja) |
CA (1) | CA2631351C (ja) |
TW (1) | TW200728634A (ja) |
WO (1) | WO2007066560A1 (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101837342B (zh) * | 2009-03-20 | 2013-01-16 | 平湖市海特合金有限公司 | 用于机械振动的偏心块及其原料制备方法 |
US9249851B2 (en) * | 2012-11-14 | 2016-02-02 | The Boeing Company | Apparatus and method for tuning a vibratory response of a rotor blade |
JP6212716B2 (ja) * | 2014-02-21 | 2017-10-18 | パナソニックIpマネジメント株式会社 | 洗濯機 |
ES2693263T3 (es) * | 2014-10-01 | 2018-12-10 | Qsa Global Inc. | Dispositivos de blindaje para gammagrafía |
CN105154700A (zh) * | 2015-09-24 | 2015-12-16 | 瑞声精密制造科技(常州)有限公司 | 高比重钨合金的烧结工艺 |
JP2019078685A (ja) | 2017-10-26 | 2019-05-23 | 株式会社ブイ・テクノロジー | Ledチップの検査方法、その検査装置及びledディスプレイの製造方法 |
US12000455B2 (en) * | 2022-03-10 | 2024-06-04 | Taiwan Semiconductor Manufacturing Company, Ltd. | Systems and methods for reducing vibration of apparatuses |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2957424B2 (ja) * | 1993-10-08 | 1999-10-04 | 住友電気工業株式会社 | 耐食性タングステン基焼結合金 |
JPH0932880A (ja) * | 1995-07-17 | 1997-02-04 | Tokai Rubber Ind Ltd | ダイナミックダンパ |
JP3963410B2 (ja) * | 1997-04-22 | 2007-08-22 | キヤノン株式会社 | 位置決め装置およびこれを用いた露光装置 |
US5984233A (en) * | 1997-11-26 | 1999-11-16 | Lord Corporation | Elastomeric tuned vibration absorber |
JP3205987B2 (ja) | 1999-02-03 | 2001-09-04 | 三菱マテリアルシ−エムアイ株式会社 | タングステン基焼結合金部品 |
JP2001116082A (ja) * | 1999-10-15 | 2001-04-27 | Tokai Rubber Ind Ltd | 建築構造物の制振装置 |
JP2001193788A (ja) * | 1999-12-31 | 2001-07-17 | Inter Seiko Co Ltd | ダイナミックダンパ用ウエイトの製法 |
JP2003193167A (ja) * | 2001-12-26 | 2003-07-09 | Toho Kinzoku Co Ltd | 高密度合金 |
JP2004176825A (ja) * | 2002-11-27 | 2004-06-24 | Thk Co Ltd | ダイナミックダンパ付運動案内装置及びテーブル装置 |
JP2005030486A (ja) | 2003-07-11 | 2005-02-03 | Nikon Corp | 制振装置及びステージ装置並びに露光装置 |
JP2005098325A (ja) * | 2003-09-22 | 2005-04-14 | Sendai Nikon:Kk | 制振装置及び露光装置 |
-
2006
- 2006-11-30 KR KR1020087010490A patent/KR101314701B1/ko not_active IP Right Cessation
- 2006-11-30 CA CA2631351A patent/CA2631351C/en not_active Expired - Fee Related
- 2006-11-30 CN CN2006800463098A patent/CN101326384B/zh not_active Expired - Fee Related
- 2006-11-30 US US12/084,769 patent/US20090039575A1/en not_active Abandoned
- 2006-11-30 WO PCT/JP2006/323895 patent/WO2007066560A1/ja active Application Filing
- 2006-11-30 EP EP06833698A patent/EP1959157A1/en not_active Withdrawn
- 2006-11-30 JP JP2007515550A patent/JP4203109B2/ja not_active Expired - Fee Related
- 2006-12-08 TW TW095145976A patent/TW200728634A/zh not_active IP Right Cessation
-
2008
- 2008-02-29 JP JP2008050029A patent/JP2008196701A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
KR101314701B1 (ko) | 2013-10-07 |
KR20080077100A (ko) | 2008-08-21 |
TW200728634A (en) | 2007-08-01 |
US20090039575A1 (en) | 2009-02-12 |
CA2631351A1 (en) | 2007-06-14 |
TWI366634B (ja) | 2012-06-21 |
JP2008196701A (ja) | 2008-08-28 |
EP1959157A1 (en) | 2008-08-20 |
CN101326384B (zh) | 2012-01-04 |
WO2007066560A1 (ja) | 2007-06-14 |
CN101326384A (zh) | 2008-12-17 |
CA2631351C (en) | 2014-06-03 |
JP4203109B2 (ja) | 2008-12-24 |
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