JPS645455B2 - - Google Patents

Info

Publication number
JPS645455B2
JPS645455B2 JP57064561A JP6456182A JPS645455B2 JP S645455 B2 JPS645455 B2 JP S645455B2 JP 57064561 A JP57064561 A JP 57064561A JP 6456182 A JP6456182 A JP 6456182A JP S645455 B2 JPS645455 B2 JP S645455B2
Authority
JP
Japan
Prior art keywords
brush
hook
semiconductor substrate
weight
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57064561A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58182234A (ja
Inventor
Masahiko Oka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Priority to JP57064561A priority Critical patent/JPS58182234A/ja
Priority to US06/463,423 priority patent/US4476601A/en
Publication of JPS58182234A publication Critical patent/JPS58182234A/ja
Publication of JPS645455B2 publication Critical patent/JPS645455B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0412—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
    • B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
    • B08B1/34—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members rotating about an axis parallel to the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/50—Cleaning by methods involving the use of tools involving cleaning of the cleaning members
    • B08B1/52—Cleaning by methods involving the use of tools involving cleaning of the cleaning members using fluids

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning In General (AREA)
JP57064561A 1982-04-17 1982-04-17 複数種のブラシ使用可能な洗浄装置 Granted JPS58182234A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP57064561A JPS58182234A (ja) 1982-04-17 1982-04-17 複数種のブラシ使用可能な洗浄装置
US06/463,423 US4476601A (en) 1982-04-17 1983-02-03 Washing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57064561A JPS58182234A (ja) 1982-04-17 1982-04-17 複数種のブラシ使用可能な洗浄装置

Publications (2)

Publication Number Publication Date
JPS58182234A JPS58182234A (ja) 1983-10-25
JPS645455B2 true JPS645455B2 (ref) 1989-01-30

Family

ID=13261762

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57064561A Granted JPS58182234A (ja) 1982-04-17 1982-04-17 複数種のブラシ使用可能な洗浄装置

Country Status (2)

Country Link
US (1) US4476601A (ref)
JP (1) JPS58182234A (ref)

Families Citing this family (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI841510A7 (fi) * 1983-04-26 1984-10-27 Czeczerski Nordfried Hierontalaite.
JPS6139523A (ja) * 1984-07-31 1986-02-25 Shioya Seisakusho:Kk スクラビング装置
JPS63243657A (ja) * 1986-08-26 1988-10-11 Takashi Mori 球形ドーム洗浄装置
JPS6391467A (ja) * 1986-10-06 1988-04-22 昭和アルミニウム株式会社 凝縮器
US4741783A (en) * 1986-12-31 1988-05-03 Masonite Corporation Apparatus and method for rotary buffing
JP2660248B2 (ja) * 1988-01-06 1997-10-08 株式会社 半導体エネルギー研究所 光を用いた膜形成方法
JP2617535B2 (ja) * 1988-10-18 1997-06-04 東京エレクトロン株式会社 洗浄装置
US5144711A (en) * 1991-03-25 1992-09-08 Westech Systems, Inc. Cleaning brush for semiconductor wafer
US5423103A (en) * 1993-12-23 1995-06-13 Machine Research Corporation Of Chicago Laser disc buffing apparatus
JP3328426B2 (ja) * 1994-05-12 2002-09-24 東京エレクトロン株式会社 洗浄装置
KR0171491B1 (ko) * 1994-09-20 1999-03-30 이시다 아키라 회전식 기판세정장치
JPH08238463A (ja) * 1995-03-03 1996-09-17 Ebara Corp 洗浄方法及び洗浄装置
JP3447869B2 (ja) * 1995-09-20 2003-09-16 株式会社荏原製作所 洗浄方法及び装置
USD389961S (en) 1995-11-16 1998-01-27 Mcbeath Gary Club washer
JP3599474B2 (ja) * 1996-03-25 2004-12-08 株式会社荏原製作所 洗浄液用ノズル装置
US5813082A (en) * 1996-07-24 1998-09-29 International Business Machines Corporation Pad and roller assembly for cleaning semiconductor wafers
US5924154A (en) * 1996-08-29 1999-07-20 Ontrak Systems, Inc. Brush assembly apparatus
TW353784B (en) * 1996-11-19 1999-03-01 Tokyo Electron Ltd Apparatus and method for washing substrate
JP3290910B2 (ja) * 1997-02-19 2002-06-10 東京エレクトロン株式会社 洗浄装置
US5964650A (en) * 1997-03-10 1999-10-12 Digital Innovations, L.L.C. Method and apparatus for repairing optical discs
ATE309884T1 (de) * 1998-04-27 2005-12-15 Tokyo Seimitsu Co Ltd Oberflächenbearbeitungsverfahren und oberflächenbearbeitungsvorrichtung für halbleiterscheiben
US6240588B1 (en) 1999-12-03 2001-06-05 Lam Research Corporation Wafer scrubbing brush core
US6557202B1 (en) 1999-12-03 2003-05-06 Lam Research Corporation Wafer scrubbing brush core having an internal motor and method of making the same
US6461224B1 (en) * 2000-03-31 2002-10-08 Lam Research Corporation Off-diameter method for preparing semiconductor wafers
US6418584B1 (en) 2000-05-24 2002-07-16 Speedfam-Ipec Corporation Apparatus and process for cleaning a work piece
EP1189260B1 (en) * 2000-09-08 2007-03-07 Qimonda Dresden GmbH & Co. oHG Wafer cleaning apparatus
US6530103B2 (en) * 2001-06-21 2003-03-11 Taiwan Semiconductor Manufacturing Company, Ltd. Method and apparatus for eliminating wafer breakage during wafer transfer by a vacuum pad
US7121919B2 (en) * 2001-08-30 2006-10-17 Micron Technology, Inc. Chemical mechanical polishing system and process
US6651284B2 (en) * 2001-10-11 2003-11-25 Silicon Integrated Systems Corp. Scrubbing assembly for wafer-cleaning device
DE10338682B4 (de) * 2002-09-25 2010-03-18 Georg Weber Vorrichtung zum Bearbeiten von im wesentlichen flachen Werkstücken
US20040259471A1 (en) * 2003-06-23 2004-12-23 Antenen Research Co. Articulating constant force finishing tool actuator
US7014543B1 (en) 2003-12-09 2006-03-21 Digital Innovations, Llc Optical disc resurfacing and buffing apparatus
WO2005079652A1 (en) * 2004-02-13 2005-09-01 Digital Innovations, Llc Disc cleaner
JP4667264B2 (ja) * 2006-02-08 2011-04-06 パナソニック株式会社 半導体基板の洗浄方法及び半導体基板の洗浄装置
ITVI20070235A1 (it) * 2007-08-13 2009-02-14 Equitan S R L Macchina perfezionata per la pulizia di superfici laminari flessibili.
US9694469B2 (en) * 2013-02-21 2017-07-04 IPR Innovative Products Resources Inc. Portable modular deburring machine
CN106540895B (zh) * 2015-09-16 2019-06-04 泰科电子(上海)有限公司 清洗系统
CN106824851B (zh) * 2016-12-16 2019-06-25 海门黄海创业园服务有限公司 一种病房管道线清洁装置
JP6875154B2 (ja) * 2017-03-06 2021-05-19 株式会社荏原製作所 セルフクリーニング装置、基板処理装置、および洗浄具のセルフクリーニング方法
CN107570450A (zh) * 2017-10-10 2018-01-12 东旭集团有限公司 用于盘刷结构的维护台
CN109482538A (zh) * 2018-12-10 2019-03-19 北京半导体专用设备研究所（中国电子科技集团公司第四十五研究所） 晶圆洗刷装置
CN111604301B (zh) * 2020-06-08 2021-11-09 江西奔特科技有限公司 应用于废旧pcb电路板的摆动式清洗构件
CN112246703B (zh) * 2020-09-28 2021-12-10 深圳市凯华五金制品有限公司 一种基于自身重力的脚踏式冲压光杠清洗装置
CN112452928A (zh) * 2020-11-02 2021-03-09 王宝根 一种硅片自动除尘装置
US11684149B2 (en) * 2021-03-25 2023-06-27 Malcomb Davis Paint brush cleaning system

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2156881A (en) * 1938-06-16 1939-05-02 French Renovating Company Cushion scrubbing machine
SU638324A1 (ru) * 1977-07-11 1978-12-25 Омский Теплично- Парниковый Комбинат Устройство дл мойки остеклени кровли теплиц

Also Published As

Publication number Publication date
US4476601A (en) 1984-10-16
JPS58182234A (ja) 1983-10-25

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