CN106540895B - 清洗系统 - Google Patents
清洗系统 Download PDFInfo
- Publication number
- CN106540895B CN106540895B CN201510589656.6A CN201510589656A CN106540895B CN 106540895 B CN106540895 B CN 106540895B CN 201510589656 A CN201510589656 A CN 201510589656A CN 106540895 B CN106540895 B CN 106540895B
- Authority
- CN
- China
- Prior art keywords
- cleaning
- round brush
- grinding film
- cleaning case
- cleaning system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 142
- 238000000227 grinding Methods 0.000 claims abstract description 79
- 239000007788 liquid Substances 0.000 claims abstract description 20
- 239000007921 spray Substances 0.000 claims abstract description 18
- 238000005201 scrubbing Methods 0.000 claims abstract description 3
- 230000003028 elevating effect Effects 0.000 claims description 24
- 230000005540 biological transmission Effects 0.000 claims description 6
- 239000002699 waste material Substances 0.000 claims description 6
- 238000005507 spraying Methods 0.000 claims description 3
- 230000007423 decrease Effects 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 4
- 239000000243 solution Substances 0.000 description 16
- 239000000835 fiber Substances 0.000 description 10
- 239000013307 optical fiber Substances 0.000 description 9
- 235000013312 flour Nutrition 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000009837 dry grinding Methods 0.000 description 2
- 230000029142 excretion Effects 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000006210 lotion Substances 0.000 description 1
- 230000008450 motivation Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/50—Cleaning by methods involving the use of tools involving cleaning of the cleaning members
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
- B08B1/12—Brushes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
- B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/50—Cleaning by methods involving the use of tools involving cleaning of the cleaning members
- B08B1/52—Cleaning by methods involving the use of tools involving cleaning of the cleaning members using fluids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/50—Cleaning by methods involving the use of tools involving cleaning of the cleaning members
- B08B1/54—Cleaning by methods involving the use of tools involving cleaning of the cleaning members using mechanical tools
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
- B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
- B24B53/02—Devices or means for dressing or conditioning abrasive surfaces of plane surfaces on abrasive tools
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Cleaning In General (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
Description
Claims (14)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201510589656.6A CN106540895B (zh) | 2015-09-16 | 2015-09-16 | 清洗系统 |
TW105130004A TWI702992B (zh) | 2015-09-16 | 2016-09-14 | 清洗系統 |
KR1020187010562A KR102147328B1 (ko) | 2015-09-16 | 2016-09-16 | 세정 시스템 |
EP16778884.3A EP3349920B1 (en) | 2015-09-16 | 2016-09-16 | Cleaning system |
PCT/IB2016/055543 WO2017046763A1 (en) | 2015-09-16 | 2016-09-16 | Cleaning system |
US15/980,906 US10814356B2 (en) | 2015-09-16 | 2018-05-16 | Cleaning system for a polishing film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201510589656.6A CN106540895B (zh) | 2015-09-16 | 2015-09-16 | 清洗系统 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN106540895A CN106540895A (zh) | 2017-03-29 |
CN106540895B true CN106540895B (zh) | 2019-06-04 |
Family
ID=57121457
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201510589656.6A Active CN106540895B (zh) | 2015-09-16 | 2015-09-16 | 清洗系统 |
Country Status (6)
Country | Link |
---|---|
US (1) | US10814356B2 (zh) |
EP (1) | EP3349920B1 (zh) |
KR (1) | KR102147328B1 (zh) |
CN (1) | CN106540895B (zh) |
TW (1) | TWI702992B (zh) |
WO (1) | WO2017046763A1 (zh) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106541329B (zh) * | 2015-09-16 | 2019-01-01 | 泰科电子(上海)有限公司 | 集成设备 |
CN107983683A (zh) * | 2017-12-01 | 2018-05-04 | 朱康余 | 一种眼科医院用视力检测镜片清洗装置 |
CN108212845A (zh) * | 2018-01-10 | 2018-06-29 | 侯如升 | 一种便于维修的化纤尼龙生产用清洗装置 |
CN111796362B (zh) * | 2018-08-08 | 2022-06-10 | 杭州富通通信技术股份有限公司 | 用于预制尾纤的研磨设备 |
CN109092746A (zh) * | 2018-08-17 | 2018-12-28 | 天马(安徽)国药科技股份有限公司 | 一种中药材粉碎机全方位清洗装置 |
CN109625854A (zh) * | 2018-12-11 | 2019-04-16 | 科捷智能装备有限公司 | 输送线自动清扫装置及其方法 |
CN113663956B (zh) * | 2020-05-14 | 2023-04-18 | 奥佳华智能健康科技集团股份有限公司 | 手机清洁装置 |
CN111957632A (zh) * | 2020-08-14 | 2020-11-20 | 成都奥捷通信技术有限公司 | 一种适配器端面清洗装置及其清洗方法 |
CN112157103A (zh) * | 2020-09-22 | 2021-01-01 | 张芸 | 一种智能机器人加工用零部件清洗装置 |
CN112452928A (zh) * | 2020-11-02 | 2021-03-09 | 王宝根 | 一种硅片自动除尘装置 |
CN113145564A (zh) * | 2021-04-06 | 2021-07-23 | 温州职业技术学院 | 一种金属半成品除油除锈清洗设备 |
CN114087478A (zh) * | 2021-11-19 | 2022-02-25 | 江苏首擎软件科技有限公司 | 一种能够短距离且双向投影的长焦投影仪 |
GB2618595A (en) * | 2022-05-12 | 2023-11-15 | Meech Static Eliminators Ltd | Apparatus and method for web cleaning |
CN115318695A (zh) * | 2022-09-23 | 2022-11-11 | 成都金大立科技有限公司 | 一种pcb加工光纤自动清洁设备及清洁方法 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4476601A (en) * | 1982-04-17 | 1984-10-16 | Dainippon Screen Manufacturing Co., Ltd. | Washing apparatus |
JPH0786218A (ja) * | 1993-09-17 | 1995-03-31 | Dainippon Screen Mfg Co Ltd | 基板洗浄装置 |
EP0718871A2 (en) * | 1994-12-21 | 1996-06-26 | Shin-Etsu Handotai Co., Ltd. | Washing of wafers and wafer washing and drying apparatus |
US5690544A (en) * | 1995-03-31 | 1997-11-25 | Nec Corporation | Wafer polishing apparatus having physical cleaning means to remove particles from polishing pad |
WO2002043923A1 (de) * | 2000-11-29 | 2002-06-06 | Infineon Technologies Ag | Reinigungsvorrichtung zum reinigen von für das polieren von halbleiterwafern verwendeten poliertüchern |
CN203470368U (zh) * | 2013-07-31 | 2014-03-12 | 合肥京东方光电科技有限公司 | 一种清洁装置 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0422411Y2 (zh) * | 1984-10-26 | 1992-05-22 | ||
JPH1190359A (ja) * | 1997-09-19 | 1999-04-06 | Speedfam Clean System Kk | オーバーフロー式スクラブ洗浄方法及び装置 |
JP3615931B2 (ja) * | 1998-03-26 | 2005-02-02 | 株式会社荏原製作所 | ポリッシング装置および該ポリッシング装置におけるコンディショニング方法 |
US6244944B1 (en) * | 1999-08-31 | 2001-06-12 | Micron Technology, Inc. | Method and apparatus for supporting and cleaning a polishing pad for chemical-mechanical planarization of microelectronic substrates |
JP2001138233A (ja) * | 1999-11-19 | 2001-05-22 | Sony Corp | 研磨装置、研磨方法および研磨工具の洗浄方法 |
JP2001246331A (ja) * | 2000-03-08 | 2001-09-11 | Sharp Corp | 洗浄装置 |
US6722964B2 (en) * | 2000-04-04 | 2004-04-20 | Ebara Corporation | Polishing apparatus and method |
US6561880B1 (en) * | 2002-01-29 | 2003-05-13 | Taiwan Semiconductor Manufacturing Co., Ltd. | Apparatus and method for cleaning the polishing pad of a linear polisher |
US7846007B2 (en) * | 2006-06-30 | 2010-12-07 | Memc Electronic Materials, Inc. | System and method for dressing a wafer polishing pad |
KR100849986B1 (ko) * | 2006-09-28 | 2008-08-01 | 김해용 | 호스의 세척건조장치 및 그 방법 |
KR101105357B1 (ko) | 2011-04-25 | 2012-01-16 | 박태영 | 이송벨트의 이물질 제거장치 |
JP2013089797A (ja) * | 2011-10-19 | 2013-05-13 | Ebara Corp | 基板洗浄方法及び基板洗浄装置 |
TWI636518B (zh) * | 2013-04-23 | 2018-09-21 | 荏原製作所股份有限公司 | 基板處理裝置及處理基板之製造方法 |
CN104416462B (zh) * | 2013-08-20 | 2017-02-15 | 上海华虹宏力半导体制造有限公司 | 抛光垫修整盘的清洗装置 |
CN203711383U (zh) * | 2013-12-26 | 2014-07-16 | 中铝西南铝板带有限公司 | 刷辊在线清洗装置 |
-
2015
- 2015-09-16 CN CN201510589656.6A patent/CN106540895B/zh active Active
-
2016
- 2016-09-14 TW TW105130004A patent/TWI702992B/zh active
- 2016-09-16 KR KR1020187010562A patent/KR102147328B1/ko active IP Right Grant
- 2016-09-16 EP EP16778884.3A patent/EP3349920B1/en active Active
- 2016-09-16 WO PCT/IB2016/055543 patent/WO2017046763A1/en active Application Filing
-
2018
- 2018-05-16 US US15/980,906 patent/US10814356B2/en active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4476601A (en) * | 1982-04-17 | 1984-10-16 | Dainippon Screen Manufacturing Co., Ltd. | Washing apparatus |
JPH0786218A (ja) * | 1993-09-17 | 1995-03-31 | Dainippon Screen Mfg Co Ltd | 基板洗浄装置 |
EP0718871A2 (en) * | 1994-12-21 | 1996-06-26 | Shin-Etsu Handotai Co., Ltd. | Washing of wafers and wafer washing and drying apparatus |
US5690544A (en) * | 1995-03-31 | 1997-11-25 | Nec Corporation | Wafer polishing apparatus having physical cleaning means to remove particles from polishing pad |
WO2002043923A1 (de) * | 2000-11-29 | 2002-06-06 | Infineon Technologies Ag | Reinigungsvorrichtung zum reinigen von für das polieren von halbleiterwafern verwendeten poliertüchern |
CN203470368U (zh) * | 2013-07-31 | 2014-03-12 | 合肥京东方光电科技有限公司 | 一种清洁装置 |
Also Published As
Publication number | Publication date |
---|---|
US20180257112A1 (en) | 2018-09-13 |
WO2017046763A1 (en) | 2017-03-23 |
KR20180104282A (ko) | 2018-09-20 |
EP3349920B1 (en) | 2023-12-20 |
CN106540895A (zh) | 2017-03-29 |
TWI702992B (zh) | 2020-09-01 |
TW201722571A (zh) | 2017-07-01 |
KR102147328B1 (ko) | 2020-08-24 |
US10814356B2 (en) | 2020-10-27 |
EP3349920A1 (en) | 2018-07-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
CB02 | Change of applicant information |
Address after: 200131 Shanghai City, Pudong New Area China England Road (Shanghai) Free Trade Zone No. 999 building 15 layer F, G site Applicant after: Tyco Electronics (Shanghai) Co., Ltd. Applicant after: Tailian Corporation Applicant after: Zhuhai Yingzhi Technology Co., Ltd. Address before: 200131 Shanghai City, Pudong New Area China England Road (Shanghai) Free Trade Zone No. 999 building 15 layer F, G site Applicant before: Tyco Electronics (Shanghai) Co., Ltd. Applicant before: Tyco Electronics Corp. Applicant before: Zhuhai Yingzhi Technology Co., Ltd. |
|
CB02 | Change of applicant information | ||
GR01 | Patent grant | ||
GR01 | Patent grant |