JPS6426648U - - Google Patents

Info

Publication number
JPS6426648U
JPS6426648U JP1988089540U JP8954088U JPS6426648U JP S6426648 U JPS6426648 U JP S6426648U JP 1988089540 U JP1988089540 U JP 1988089540U JP 8954088 U JP8954088 U JP 8954088U JP S6426648 U JPS6426648 U JP S6426648U
Authority
JP
Japan
Prior art keywords
vacuum
elastic support
support member
workpiece
support members
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1988089540U
Other languages
English (en)
Other versions
JPH07446Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS6426648U publication Critical patent/JPS6426648U/ja
Application granted granted Critical
Publication of JPH07446Y2 publication Critical patent/JPH07446Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Jigs For Machine Tools (AREA)
  • Sheets, Magazines, And Separation Thereof (AREA)

Description

【図面の簡単な説明】
第１図は本考案に係る真空装置に加工物を装着
した状態を示す部分切欠正面図、第２図は第１図
の―線に沿う断面図、第３図は第２図ので
囲まれた部分の拡大図、第４図は第２図ので囲
まれた部分の拡大図、第５図は本考案に係る真空
装置を電鋳装置内で使用している状態を示す断面
図である。 １…ベース、２…弾性支持部材、３…遊端面、
４…支持面、５…加工物、６…スペーシング（真
空空間部）、７…シール手段、８…リツプ部、９
…支持パツト、１０…パツド体、１１…織物、１
２…真空ダクト、１３…排出装置、１４…液体、
１５…容器、１６…カバー、１７…ヒンジ部、１
８…軸受、２０…中空チユーブ、２１…ノズル、
２２…インジエクタ体、２３…ベンチユリーダク
ト、２４…吹出し開口。

Claims (1)

  1. 【実用新案登録請求の範囲】 １ 個々に離間した一組の支持部材２を支持する
    ためのベース１と、加工物５用の支持面４を形成
    する前記支持部材２の遊端面３と、前記支持部材
    間に内容物排出可能な真空空間部の一部を形成す
    るスペーシング６と、一組の前記支持部材２を包
    囲し且つ保持されるべき前記加工物に対し密封し
    て真空を維持するシール手段とを具えた加工物保
    持用の真空装置において、 前記組は、弾性変形可能な材料からなる複数の
    弾性支持部材を有し、 前記シール手段は移動自在の部分８を具え、前
    記加工物を位置決めした後に前記真空空間部の内
    容物を排出した場合、前記弾性支持部材の横寸法
    を増加させ、これと同時に前記真空空間部の容積
    を減少させるような前記弾性支持部材の軸線方向
    変形と同時期に前記シール手段の前記部分８を移
    動させることを特徴とする加工物保持用の真空装
    置。 ２ 請求項１記載の真空装置において、前記弾性
    支持部材２は、実質的に平行でかつ平坦なパツド
    体１０を具えた支持パツド９に属すると共に、前
    記パツド体１０から一側に突出したことを特徴と
    する真空装置。 ３ 請求項２記載の真空装置において、前記パツ
    ド体１０と前記弾性支持部材２は、少なくとも大
    部分で弾性材料から形成された一体ユニツトを構
    成することを特徴とする真空装置。 ４ 請求項１記載の真空装置において、前記弾性
    支持部材２をエラストマー材で形成したことを特
    徴とする真空装置。 ５ 請求項１記載の真空装置において、前記シー
    ル手段７は、軸線方向に変形可能な弾性シールリ
    ツプ部８をもつ環状本体を具えたことを特徴とす
    る真空装置。 ６ 請求項１記載の真空装置において、液体１４
    内に沈められた加工物を保持するために、加工液
    に作用するエジエクタポンプを具えた排出装置１
    ３を前記真空空間部に接続したことを特徴とする
    真空装置。
JP1988089540U 1987-07-08 1988-07-07 加工物保持用の真空装置 Expired - Lifetime JPH07446Y2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL8701603 1987-07-08
NL8701603A NL8701603A (nl) 1987-07-08 1987-07-08 Vacuuminrichting voor het vastzuigen van werkstukken.

Publications (2)

Publication Number Publication Date
JPS6426648U true JPS6426648U (ja) 1989-02-15
JPH07446Y2 JPH07446Y2 (ja) 1995-01-11

Family

ID=19850275

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1988089540U Expired - Lifetime JPH07446Y2 (ja) 1987-07-08 1988-07-07 加工物保持用の真空装置

Country Status (6)

Country Link
US (1) US4856766A (ja)
EP (1) EP0298564B1 (ja)
JP (1) JPH07446Y2 (ja)
KR (1) KR940003291Y1 (ja)
DE (1) DE3874981T2 (ja)
NL (1) NL8701603A (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0639818U (ja) * 1992-11-09 1994-05-27 東燃化学株式会社 木材の搬出用シューター
WO2007072855A1 (ja) * 2005-12-21 2007-06-28 Toyota Jidosha Kabushiki Kaisha 半導体薄膜製造装置
WO2011084531A3 (en) * 2009-12-15 2011-11-24 Solexel, Inc. Mobile vacuum carriers for thin wafer processing
JP2017220483A (ja) * 2016-06-03 2017-12-14 日本特殊陶業株式会社 真空チャック及び真空チャックの製造方法
JP2018533763A (ja) * 2015-10-29 2018-11-15 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置用基板テーブル、および基板の装填方法

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8922225D0 (en) * 1989-10-03 1989-11-15 Superion Ltd Apparatus and methods relating to ion implantation
EP0456426B1 (en) * 1990-05-07 2004-09-15 Canon Kabushiki Kaisha Vacuum type wafer holder
US5143450A (en) * 1991-02-01 1992-09-01 Aetrium, Inc. Apparatus for handling devices under varying temperatures
JPH0521584A (ja) * 1991-07-16 1993-01-29 Nikon Corp 保持装置
US5671910A (en) * 1992-05-06 1997-09-30 James C. Carne Vacuum plates
JPH06268051A (ja) * 1993-03-10 1994-09-22 Mitsubishi Electric Corp ウエハ剥し装置
US5660699A (en) * 1995-02-20 1997-08-26 Kao Corporation Electroplating apparatus
US5724121A (en) * 1995-05-12 1998-03-03 Hughes Danbury Optical Systems, Inc. Mounting member method and apparatus with variable length supports
JPH1022184A (ja) * 1996-06-28 1998-01-23 Sony Corp 基板張り合わせ装置
JP3376258B2 (ja) 1996-11-28 2003-02-10 キヤノン株式会社 陽極化成装置及びそれに関連する装置及び方法
ATE218240T1 (de) * 1997-03-12 2002-06-15 Tapematic Spa Vorrichtung zum unterstützen von optischen datenspeicherscheiben
US5993302A (en) * 1997-12-31 1999-11-30 Applied Materials, Inc. Carrier head with a removable retaining ring for a chemical mechanical polishing apparatus
US6080050A (en) 1997-12-31 2000-06-27 Applied Materials, Inc. Carrier head including a flexible membrane and a compliant backing member for a chemical mechanical polishing apparatus
US5989444A (en) * 1998-02-13 1999-11-23 Zywno; Marek Fluid bearings and vacuum chucks and methods for producing same
DE29814100U1 (de) * 1998-08-06 1999-12-16 Schmalz J Gmbh Blocksauger
EP1109207A1 (de) * 1999-12-14 2001-06-20 Esec SA Ansaugvorrichtung zum Niederhalten eines Substrates
CH695405A5 (de) 1999-12-14 2006-04-28 Esec Trading Sa Die Bonder und Wire Bonder mit einer Ansaugvorrichtung zum Flachziehen und Niederhalten eines gewölbten Substrats.
EP1170781A1 (de) * 2000-07-03 2002-01-09 Esec Trading S.A. Greifwerkzeug
EP1170783A1 (en) * 2000-07-03 2002-01-09 Esec Trading S.A. Pick-up-tool
CH695075A5 (de) 2000-07-03 2005-11-30 Esec Trading Sa Greifwerkzeug.
US6771482B2 (en) * 2001-07-30 2004-08-03 Unaxis Usa Inc. Perimeter seal for backside cooling of substrates
ITMI20012014A1 (it) * 2001-09-27 2003-03-27 Lpe Spa Utensile per maneggiare fette e stazione per crescita epitassiale
EP1475670B1 (en) * 2003-05-09 2008-10-29 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1475667A1 (en) * 2003-05-09 2004-11-10 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
DE202004012259U1 (de) * 2004-08-05 2005-04-07 Weha Ludwig Werwein Gmbh Saugvorrichtung für Plattenbearbeitung
JP5312923B2 (ja) 2008-01-31 2013-10-09 大日本スクリーン製造株式会社 基板処理装置
KR100936643B1 (ko) * 2009-06-22 2010-01-14 지기용 페달식 회전탈수장치
US9966293B2 (en) * 2014-09-19 2018-05-08 Infineon Technologies Ag Wafer arrangement and method for processing a wafer
CN107004574B (zh) 2014-12-12 2020-06-30 佳能株式会社 基板保持装置、光刻设备以及物品制造方法
US9917000B2 (en) * 2015-10-01 2018-03-13 Infineon Technologies Ag Wafer carrier, method for manufacturing the same and method for carrying a wafer
US10699934B2 (en) 2015-10-01 2020-06-30 Infineon Technologies Ag Substrate carrier, a processing arrangement and a method
KR101926726B1 (ko) * 2018-06-28 2018-12-07 주식회사 기가레인 부산물 증착 문제가 개선된 립실 및 이를 포함하는 반도체 공정 장치

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS472261U (ja) * 1971-01-27 1972-08-25
JPS50155472U (ja) * 1974-06-12 1975-12-23

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2133518A (en) * 1937-08-20 1938-10-18 William C Huebner Vacuum holder
US2983638A (en) * 1958-02-05 1961-05-09 Du Pont Laminating blanket
US2936139A (en) * 1959-04-08 1960-05-10 Oscar L Lindstrom Resilient non-skid supporting shoes with suction cup
SE444526B (sv) * 1978-01-23 1986-04-21 Western Electric Co Sett att i lege och plan placera en substratbricka
SU829536A1 (ru) * 1979-07-30 1981-05-15 Предприятие П/Я А-1813 Пневматический захват
US4530635A (en) * 1983-06-15 1985-07-23 The Perkin-Elmer Corporation Wafer transferring chuck assembly

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS472261U (ja) * 1971-01-27 1972-08-25
JPS50155472U (ja) * 1974-06-12 1975-12-23

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0639818U (ja) * 1992-11-09 1994-05-27 東燃化学株式会社 木材の搬出用シューター
WO2007072855A1 (ja) * 2005-12-21 2007-06-28 Toyota Jidosha Kabushiki Kaisha 半導体薄膜製造装置
JP2007173467A (ja) * 2005-12-21 2007-07-05 Toyota Motor Corp 半導体薄膜製造装置
WO2011084531A3 (en) * 2009-12-15 2011-11-24 Solexel, Inc. Mobile vacuum carriers for thin wafer processing
JP2018533763A (ja) * 2015-10-29 2018-11-15 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置用基板テーブル、および基板の装填方法
JP2020118983A (ja) * 2015-10-29 2020-08-06 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置用基板テーブル、および基板の装填方法
JP2022010193A (ja) * 2015-10-29 2022-01-14 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置用基板テーブル、および基板の装填方法
JP2017220483A (ja) * 2016-06-03 2017-12-14 日本特殊陶業株式会社 真空チャック及び真空チャックの製造方法

Also Published As

Publication number Publication date
NL8701603A (nl) 1989-02-01
US4856766A (en) 1989-08-15
EP0298564B1 (en) 1992-09-30
JPH07446Y2 (ja) 1995-01-11
KR940003291Y1 (ko) 1994-05-19
KR890003634U (ko) 1989-04-13
DE3874981D1 (de) 1992-11-05
DE3874981T2 (de) 1993-04-15
EP0298564A1 (en) 1989-01-11

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