JPS6311783B2 - - Google Patents
Info
- Publication number
- JPS6311783B2 JPS6311783B2 JP58082421A JP8242183A JPS6311783B2 JP S6311783 B2 JPS6311783 B2 JP S6311783B2 JP 58082421 A JP58082421 A JP 58082421A JP 8242183 A JP8242183 A JP 8242183A JP S6311783 B2 JPS6311783 B2 JP S6311783B2
- Authority
- JP
- Japan
- Prior art keywords
- silicon nitride
- film
- nitride film
- silicon
- region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/68—Floating-gate IGFETs
- H10D30/681—Floating-gate IGFETs having only two programming levels
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
- H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
- H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
- H10D84/85—Complementary IGFETs, e.g. CMOS
- H10D84/858—Complementary IGFETs, e.g. CMOS comprising a P-type well but not an N-type well
Landscapes
- Non-Volatile Memory (AREA)
- Semiconductor Memories (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58082421A JPS59207665A (ja) | 1983-05-10 | 1983-05-10 | 半導体装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58082421A JPS59207665A (ja) | 1983-05-10 | 1983-05-10 | 半導体装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59207665A JPS59207665A (ja) | 1984-11-24 |
JPS6311783B2 true JPS6311783B2 (enrdf_load_stackoverflow) | 1988-03-16 |
Family
ID=13774119
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58082421A Granted JPS59207665A (ja) | 1983-05-10 | 1983-05-10 | 半導体装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59207665A (enrdf_load_stackoverflow) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61136274A (ja) * | 1984-12-07 | 1986-06-24 | Toshiba Corp | 半導体装置 |
-
1983
- 1983-05-10 JP JP58082421A patent/JPS59207665A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS59207665A (ja) | 1984-11-24 |
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