JPS625344B2 - - Google Patents
Info
- Publication number
- JPS625344B2 JPS625344B2 JP55171606A JP17160680A JPS625344B2 JP S625344 B2 JPS625344 B2 JP S625344B2 JP 55171606 A JP55171606 A JP 55171606A JP 17160680 A JP17160680 A JP 17160680A JP S625344 B2 JPS625344 B2 JP S625344B2
- Authority
- JP
- Japan
- Prior art keywords
- polycrystalline silicon
- film
- silicon film
- capacitor
- oxide film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D88/00—Three-dimensional [3D] integrated devices
Landscapes
- Semiconductor Memories (AREA)
- Semiconductor Integrated Circuits (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55171606A JPS5795658A (en) | 1980-12-05 | 1980-12-05 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55171606A JPS5795658A (en) | 1980-12-05 | 1980-12-05 | Manufacture of semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5795658A JPS5795658A (en) | 1982-06-14 |
JPS625344B2 true JPS625344B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1987-02-04 |
Family
ID=15926275
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55171606A Granted JPS5795658A (en) | 1980-12-05 | 1980-12-05 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5795658A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5846666A (ja) * | 1981-09-14 | 1983-03-18 | Seiko Epson Corp | 半導体装置の製造方法 |
JPS61226951A (ja) * | 1985-04-01 | 1986-10-08 | Hitachi Ltd | キヤパシタ |
JP2621137B2 (ja) * | 1986-05-13 | 1997-06-18 | 富士通株式会社 | 半導体装置の製造方法 |
CN1112731C (zh) * | 1997-04-30 | 2003-06-25 | 三星电子株式会社 | 制造用于模拟功能的电容器的方法 |
-
1980
- 1980-12-05 JP JP55171606A patent/JPS5795658A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5795658A (en) | 1982-06-14 |