JPS623971B2 - - Google Patents

Info

Publication number
JPS623971B2
JPS623971B2 JP55120052A JP12005280A JPS623971B2 JP S623971 B2 JPS623971 B2 JP S623971B2 JP 55120052 A JP55120052 A JP 55120052A JP 12005280 A JP12005280 A JP 12005280A JP S623971 B2 JPS623971 B2 JP S623971B2
Authority
JP
Japan
Prior art keywords
wafer
mounting table
frame
wafer mounting
developer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55120052A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5745232A (en
Inventor
Kenzo Hatada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP12005280A priority Critical patent/JPS5745232A/ja
Publication of JPS5745232A publication Critical patent/JPS5745232A/ja
Publication of JPS623971B2 publication Critical patent/JPS623971B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP12005280A 1980-08-29 1980-08-29 Device and method for developing Granted JPS5745232A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12005280A JPS5745232A (en) 1980-08-29 1980-08-29 Device and method for developing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12005280A JPS5745232A (en) 1980-08-29 1980-08-29 Device and method for developing

Publications (2)

Publication Number Publication Date
JPS5745232A JPS5745232A (en) 1982-03-15
JPS623971B2 true JPS623971B2 (enrdf_load_stackoverflow) 1987-01-28

Family

ID=14776692

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12005280A Granted JPS5745232A (en) 1980-08-29 1980-08-29 Device and method for developing

Country Status (1)

Country Link
JP (1) JPS5745232A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04222492A (ja) * 1990-03-19 1992-08-12 General Motors Corp <Gm> モータ速度の制御方法

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59119451U (ja) * 1983-02-01 1984-08-11 セイコーインスツルメンツ株式会社 レジスト現像装置
JPS6010253U (ja) * 1983-06-30 1985-01-24 松下電工株式会社 防音リレ−
JPS61196535A (ja) * 1985-02-26 1986-08-30 Mitsubishi Electric Corp 半導体製造装置
JPS61251134A (ja) * 1985-04-30 1986-11-08 Toshiba Corp 自動現像装置
JPS62117324A (ja) * 1985-11-18 1987-05-28 Toshiba Corp 自動現像装置
JPS62117323A (ja) * 1985-11-18 1987-05-28 Toshiba Corp 自動現像装置
JPH0622201B2 (ja) * 1986-05-19 1994-03-23 黒谷 巌 半導体材料の現像処理装置
JPH0611024B2 (ja) * 1986-12-29 1994-02-09 東京エレクトロン株式会社 現像方法
JP2513680B2 (ja) * 1987-04-28 1996-07-03 東京エレクトロン株式会社 現像装置
JPS63271931A (ja) * 1987-04-28 1988-11-09 Tokyo Electron Ltd 現像装置
JPH0210824A (ja) * 1988-06-29 1990-01-16 Matsushita Electric Ind Co Ltd 電子線レジスト現像方法
JPH02246319A (ja) * 1989-03-20 1990-10-02 Toppan Printing Co Ltd 現像装置および現像方法
JP2588854B2 (ja) * 1995-01-27 1997-03-12 東京エレクトロン株式会社 現像装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5142067Y2 (enrdf_load_stackoverflow) * 1971-04-21 1976-10-13
JPS55108742U (enrdf_load_stackoverflow) * 1979-01-25 1980-07-30

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04222492A (ja) * 1990-03-19 1992-08-12 General Motors Corp <Gm> モータ速度の制御方法

Also Published As

Publication number Publication date
JPS5745232A (en) 1982-03-15

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