JPS5745232A - Device and method for developing - Google Patents

Device and method for developing

Info

Publication number
JPS5745232A
JPS5745232A JP12005280A JP12005280A JPS5745232A JP S5745232 A JPS5745232 A JP S5745232A JP 12005280 A JP12005280 A JP 12005280A JP 12005280 A JP12005280 A JP 12005280A JP S5745232 A JPS5745232 A JP S5745232A
Authority
JP
Japan
Prior art keywords
wafer
developing solution
frame body
solution
developing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12005280A
Other languages
Japanese (ja)
Other versions
JPS623971B2 (en
Inventor
Kenzo Hatada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP12005280A priority Critical patent/JPS5745232A/en
Publication of JPS5745232A publication Critical patent/JPS5745232A/en
Publication of JPS623971B2 publication Critical patent/JPS623971B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To economically perform a uniform developing having no dimensional irregularity by a method wherein a wafer placing stand having the diameter larger than that of a wafer, a frame body to be used for formation of a concaved section, which is deeper than the thickness of the wafer, and a device with which a developing solution is feeded are provided. CONSTITUTION:The wafer 11 is placed on the wafer placing stand 12, the frame body 16 comes down, the concaved section which is deeper than the wafer thickness is formed and the wfer 11 is develped by dripping the developing solution from a nozzle 15 and filling the solution in the concaved section. The developing solution is scattered by raising the frame body 16 and rotating the placing stand 12, and then the developing solution is completely removed by dripping a rinsing solution. Through these procedures wherein no pressure is applied to the surface of the substrate with resist on it, no irregularity of measurements in the developed pattern width is generated and also the quantity of the developing solution used can be reduced.
JP12005280A 1980-08-29 1980-08-29 Device and method for developing Granted JPS5745232A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12005280A JPS5745232A (en) 1980-08-29 1980-08-29 Device and method for developing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12005280A JPS5745232A (en) 1980-08-29 1980-08-29 Device and method for developing

Publications (2)

Publication Number Publication Date
JPS5745232A true JPS5745232A (en) 1982-03-15
JPS623971B2 JPS623971B2 (en) 1987-01-28

Family

ID=14776692

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12005280A Granted JPS5745232A (en) 1980-08-29 1980-08-29 Device and method for developing

Country Status (1)

Country Link
JP (1) JPS5745232A (en)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59119451U (en) * 1983-02-01 1984-08-11 セイコーインスツルメンツ株式会社 resist developing device
JPS6010253U (en) * 1983-06-30 1985-01-24 松下電工株式会社 soundproof relay
JPS61196535A (en) * 1985-02-26 1986-08-30 Mitsubishi Electric Corp Semiconductor manufacturing device
JPS61251134A (en) * 1985-04-30 1986-11-08 Toshiba Corp Automatic developing apparatus
JPS62117324A (en) * 1985-11-18 1987-05-28 Toshiba Corp Automatic developing device
JPS62117323A (en) * 1985-11-18 1987-05-28 Toshiba Corp Automatic developing device
JPS62269316A (en) * 1986-05-19 1987-11-21 Kurotani Iwao Processor for develoment of semiconductor material
JPS63168026A (en) * 1986-12-29 1988-07-12 Tokyo Electron Ltd Developer
JPS63271930A (en) * 1987-04-28 1988-11-09 Tokyo Electron Ltd Development device
US4855775A (en) * 1987-04-28 1989-08-08 Tokyo Electron Limited Developing apparatus
JPH0210824A (en) * 1988-06-29 1990-01-16 Matsushita Electric Ind Co Ltd Electron-beam resist developing method
JPH02246319A (en) * 1989-03-20 1990-10-02 Toppan Printing Co Ltd Developer and developing method
JPH07263338A (en) * 1995-01-27 1995-10-13 Tokyo Electron Ltd Developing device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4969756A (en) * 1990-03-19 1990-11-13 General Motors Corporation Motor driven actuator speed control

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4725976U (en) * 1971-04-21 1972-11-24
JPS55108742U (en) * 1979-01-25 1980-07-30

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4725976U (en) * 1971-04-21 1972-11-24
JPS55108742U (en) * 1979-01-25 1980-07-30

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59119451U (en) * 1983-02-01 1984-08-11 セイコーインスツルメンツ株式会社 resist developing device
JPH0218508Y2 (en) * 1983-06-30 1990-05-23
JPS6010253U (en) * 1983-06-30 1985-01-24 松下電工株式会社 soundproof relay
JPS61196535A (en) * 1985-02-26 1986-08-30 Mitsubishi Electric Corp Semiconductor manufacturing device
JPS61251134A (en) * 1985-04-30 1986-11-08 Toshiba Corp Automatic developing apparatus
JPS62117324A (en) * 1985-11-18 1987-05-28 Toshiba Corp Automatic developing device
JPS62117323A (en) * 1985-11-18 1987-05-28 Toshiba Corp Automatic developing device
JPS62269316A (en) * 1986-05-19 1987-11-21 Kurotani Iwao Processor for develoment of semiconductor material
JPS63168026A (en) * 1986-12-29 1988-07-12 Tokyo Electron Ltd Developer
JPS63271930A (en) * 1987-04-28 1988-11-09 Tokyo Electron Ltd Development device
US4855775A (en) * 1987-04-28 1989-08-08 Tokyo Electron Limited Developing apparatus
JPH0210824A (en) * 1988-06-29 1990-01-16 Matsushita Electric Ind Co Ltd Electron-beam resist developing method
JPH02246319A (en) * 1989-03-20 1990-10-02 Toppan Printing Co Ltd Developer and developing method
JPH07263338A (en) * 1995-01-27 1995-10-13 Tokyo Electron Ltd Developing device

Also Published As

Publication number Publication date
JPS623971B2 (en) 1987-01-28

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