JPS6225749B2 - - Google Patents
Info
- Publication number
- JPS6225749B2 JPS6225749B2 JP3823680A JP3823680A JPS6225749B2 JP S6225749 B2 JPS6225749 B2 JP S6225749B2 JP 3823680 A JP3823680 A JP 3823680A JP 3823680 A JP3823680 A JP 3823680A JP S6225749 B2 JPS6225749 B2 JP S6225749B2
- Authority
- JP
- Japan
- Prior art keywords
- ions
- chemical copper
- plating solution
- solution
- copper plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007747 plating Methods 0.000 claims description 132
- 239000010949 copper Substances 0.000 claims description 69
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 67
- 229910052802 copper Inorganic materials 0.000 claims description 67
- 239000000126 substance Substances 0.000 claims description 67
- 238000000909 electrodialysis Methods 0.000 claims description 37
- 150000002500 ions Chemical class 0.000 claims description 30
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 claims description 28
- 229910001431 copper ion Inorganic materials 0.000 claims description 28
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims description 23
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 20
- 239000002253 acid Substances 0.000 claims description 13
- 239000002738 chelating agent Substances 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 11
- 239000001569 carbon dioxide Substances 0.000 claims description 10
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 10
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 claims description 10
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 9
- 239000003638 chemical reducing agent Substances 0.000 claims description 9
- 230000002452 interceptive effect Effects 0.000 claims description 6
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 claims description 6
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 claims description 5
- 238000005115 demineralization Methods 0.000 claims description 5
- 230000002328 demineralizing effect Effects 0.000 claims description 5
- 235000019253 formic acid Nutrition 0.000 claims description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 4
- 150000008044 alkali metal hydroxides Chemical class 0.000 claims description 4
- 150000007513 acids Chemical class 0.000 claims description 2
- 229910052751 metal Inorganic materials 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 239000000243 solution Substances 0.000 description 83
- 238000010979 pH adjustment Methods 0.000 description 18
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 15
- 239000007788 liquid Substances 0.000 description 10
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 238000000502 dialysis Methods 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 8
- 238000009825 accumulation Methods 0.000 description 7
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 6
- 150000001450 anions Chemical class 0.000 description 6
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 230000006866 deterioration Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- -1 hydroxide ions Chemical class 0.000 description 5
- 238000007254 oxidation reaction Methods 0.000 description 5
- 230000035699 permeability Effects 0.000 description 5
- 238000011069 regeneration method Methods 0.000 description 5
- 229910001415 sodium ion Inorganic materials 0.000 description 5
- 239000012528 membrane Substances 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 3
- 229910001413 alkali metal ion Inorganic materials 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 230000008929 regeneration Effects 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- FKNQFGJONOIPTF-UHFFFAOYSA-N Sodium cation Chemical compound [Na+] FKNQFGJONOIPTF-UHFFFAOYSA-N 0.000 description 2
- 239000003011 anion exchange membrane Substances 0.000 description 2
- 238000005341 cation exchange Methods 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 2
- 239000003014 ion exchange membrane Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 230000001172 regenerating effect Effects 0.000 description 2
- 238000012958 reprocessing Methods 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 235000019254 sodium formate Nutrition 0.000 description 2
- HLBBKKJFGFRGMU-UHFFFAOYSA-M sodium formate Chemical compound [Na+].[O-]C=O HLBBKKJFGFRGMU-UHFFFAOYSA-M 0.000 description 2
- 239000002351 wastewater Substances 0.000 description 2
- ROFVEXUMMXZLPA-UHFFFAOYSA-N Bipyridyl Chemical group N1=CC=CC=C1C1=CC=CC=N1 ROFVEXUMMXZLPA-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000004480 active ingredient Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000002242 deionisation method Methods 0.000 description 1
- 238000011033 desalting Methods 0.000 description 1
- PEVJCYPAFCUXEZ-UHFFFAOYSA-J dicopper;phosphonato phosphate Chemical compound [Cu+2].[Cu+2].[O-]P([O-])(=O)OP([O-])([O-])=O PEVJCYPAFCUXEZ-UHFFFAOYSA-J 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 239000008098 formaldehyde solution Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 125000006413 ring segment Chemical group 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Landscapes
- Chemically Coating (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3823680A JPS56136967A (en) | 1980-03-27 | 1980-03-27 | Method and apparatus for deionizing chemical copper plating bath |
| US06/160,201 US4324629A (en) | 1979-06-19 | 1980-06-17 | Process for regenerating chemical copper plating solution |
| DE3022962A DE3022962C2 (de) | 1979-06-19 | 1980-06-19 | Verfahren zum Regenerieren einer chemischen Verkupferungslösung |
| NLAANVRAGE8003553,A NL188683C (nl) | 1979-06-19 | 1980-06-19 | Werkwijze voor het regenereren van een bad voor het chemisch verkoperen. |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3823680A JPS56136967A (en) | 1980-03-27 | 1980-03-27 | Method and apparatus for deionizing chemical copper plating bath |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56136967A JPS56136967A (en) | 1981-10-26 |
| JPS6225749B2 true JPS6225749B2 (enrdf_load_stackoverflow) | 1987-06-04 |
Family
ID=12519657
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3823680A Granted JPS56136967A (en) | 1979-06-19 | 1980-03-27 | Method and apparatus for deionizing chemical copper plating bath |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56136967A (enrdf_load_stackoverflow) |
-
1980
- 1980-03-27 JP JP3823680A patent/JPS56136967A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS56136967A (en) | 1981-10-26 |
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