JPS563666A - Method and apparatus for regenerating chemical copper plating solution - Google Patents

Method and apparatus for regenerating chemical copper plating solution

Info

Publication number
JPS563666A
JPS563666A JP7716179A JP7716179A JPS563666A JP S563666 A JPS563666 A JP S563666A JP 7716179 A JP7716179 A JP 7716179A JP 7716179 A JP7716179 A JP 7716179A JP S563666 A JPS563666 A JP S563666A
Authority
JP
Japan
Prior art keywords
soln
exchange membranes
plating
solns
reaction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7716179A
Other languages
Japanese (ja)
Other versions
JPS6120629B2 (en
Inventor
Hitoshi Oka
Hiroshi Kikuchi
Ataru Yokono
Haruo Suzuki
Toyofusa Yoshimura
Akira Matsuo
Osamu Miyazawa
Isamu Tanaka
Tokio Isogai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP7716179A priority Critical patent/JPS563666A/en
Priority to US06/160,201 priority patent/US4324629A/en
Priority to DE3022962A priority patent/DE3022962C2/en
Priority to NLAANVRAGE8003553,A priority patent/NL188683C/en
Publication of JPS563666A publication Critical patent/JPS563666A/en
Publication of JPS6120629B2 publication Critical patent/JPS6120629B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE: To remove only reaction inhibitive components contained in a chemical copper plating soln., by using an electrodialyzer equipped with cation exchange membranes and/or anion exchange membranes.
CONSTITUTION: After continuous use of a chemical copper plating soln., SO4 2- formed from copper sulfate added for replenishing copper ions, HCOO- formed from formaldehyde used as a reducing agent for copper ions, Na+ formed from caustic soda which keeps the plating soln. alkaline, and CO3 2- formed from absorbed CO2, accumulate in the plating soln. and inhibit the reaction. To remove these components, the solns. contained respectively in a plating tank 1, an electrode soln. tank 10, and a concd. soln. tank 14 are delivered by circulating pumps 5, 11, 15 while being kept at 0.05atm to an electrodialyzer 9 which is equipped with eleven cation exchange membranes facing to the cathode, and with eleven anion exchange membranes facing to the anode, hereby these solns. are dialyzed, and one or more reaction-inhibitive components are removed selectively from these solns., hence the plating soln. is regenerated.
COPYRIGHT: (C)1981,JPO&Japio
JP7716179A 1979-06-19 1979-06-19 Method and apparatus for regenerating chemical copper plating solution Granted JPS563666A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP7716179A JPS563666A (en) 1979-06-19 1979-06-19 Method and apparatus for regenerating chemical copper plating solution
US06/160,201 US4324629A (en) 1979-06-19 1980-06-17 Process for regenerating chemical copper plating solution
DE3022962A DE3022962C2 (en) 1979-06-19 1980-06-19 Process for regenerating a chemical copper plating solution
NLAANVRAGE8003553,A NL188683C (en) 1979-06-19 1980-06-19 METHOD FOR REGENERATING A BATH FOR CHEMICAL COPYING.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7716179A JPS563666A (en) 1979-06-19 1979-06-19 Method and apparatus for regenerating chemical copper plating solution

Publications (2)

Publication Number Publication Date
JPS563666A true JPS563666A (en) 1981-01-14
JPS6120629B2 JPS6120629B2 (en) 1986-05-23

Family

ID=13626059

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7716179A Granted JPS563666A (en) 1979-06-19 1979-06-19 Method and apparatus for regenerating chemical copper plating solution

Country Status (1)

Country Link
JP (1) JPS563666A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56108868A (en) * 1979-03-05 1981-08-28 Electrochem Int Inc Regeneration of electroless plating electrodialitically by removing at least part of reaction product
JPS57200549A (en) * 1981-06-05 1982-12-08 Hitachi Ltd Continuous regeneration of chemical copper plating liquid
JPS57197764U (en) * 1981-06-09 1982-12-15
JPS5811775A (en) * 1981-07-13 1983-01-22 Matsushita Electric Ind Co Ltd Treatment method of chemical plating waste liquor of copper
JPS61235567A (en) * 1985-04-10 1986-10-20 Chuo Seisakusho:Kk Method and apparatus for filtering plating liquid
US7846316B2 (en) 2005-05-25 2010-12-07 Enthone Inc. Method for supplying a plating composition with deposition metal ion during a plating operation

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56108868A (en) * 1979-03-05 1981-08-28 Electrochem Int Inc Regeneration of electroless plating electrodialitically by removing at least part of reaction product
JPH0416549B2 (en) * 1979-03-05 1992-03-24 Electrochem Int Inc
JPS57200549A (en) * 1981-06-05 1982-12-08 Hitachi Ltd Continuous regeneration of chemical copper plating liquid
JPS6341983B2 (en) * 1981-06-05 1988-08-19 Hitachi Ltd
JPS57197764U (en) * 1981-06-09 1982-12-15
JPS5811775A (en) * 1981-07-13 1983-01-22 Matsushita Electric Ind Co Ltd Treatment method of chemical plating waste liquor of copper
JPS61235567A (en) * 1985-04-10 1986-10-20 Chuo Seisakusho:Kk Method and apparatus for filtering plating liquid
JPH0475315B2 (en) * 1985-04-10 1992-11-30
US7846316B2 (en) 2005-05-25 2010-12-07 Enthone Inc. Method for supplying a plating composition with deposition metal ion during a plating operation

Also Published As

Publication number Publication date
JPS6120629B2 (en) 1986-05-23

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