JPS6214089B2 - - Google Patents
Info
- Publication number
- JPS6214089B2 JPS6214089B2 JP56033676A JP3367681A JPS6214089B2 JP S6214089 B2 JPS6214089 B2 JP S6214089B2 JP 56033676 A JP56033676 A JP 56033676A JP 3367681 A JP3367681 A JP 3367681A JP S6214089 B2 JPS6214089 B2 JP S6214089B2
- Authority
- JP
- Japan
- Prior art keywords
- scale
- boundary
- line
- lines
- exposed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 claims description 4
- 238000010894 electron beam technology Methods 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Electron Beam Exposure (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56033676A JPS57148347A (en) | 1981-03-09 | 1981-03-09 | Measurement of connection accuracy for electron beam exposure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56033676A JPS57148347A (en) | 1981-03-09 | 1981-03-09 | Measurement of connection accuracy for electron beam exposure |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57148347A JPS57148347A (en) | 1982-09-13 |
JPS6214089B2 true JPS6214089B2 (enrdf_load_stackoverflow) | 1987-03-31 |
Family
ID=12393049
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56033676A Granted JPS57148347A (en) | 1981-03-09 | 1981-03-09 | Measurement of connection accuracy for electron beam exposure |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57148347A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01118074U (enrdf_load_stackoverflow) * | 1988-02-02 | 1989-08-09 |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5834731U (ja) * | 1981-08-28 | 1983-03-07 | 三洋電機株式会社 | 電子ビ−ム露光用マスク |
JPS604216A (ja) * | 1983-06-21 | 1985-01-10 | Mitsubishi Electric Corp | 電子ビ−ム露光方法 |
JP2726411B2 (ja) * | 1986-05-09 | 1998-03-11 | 三菱電機株式会社 | パターン描画方法 |
JPH07111951B2 (ja) * | 1988-06-22 | 1995-11-29 | 日本電気株式会社 | 電子線描画用接続精度測定方法 |
JP2870461B2 (ja) * | 1995-12-18 | 1999-03-17 | 日本電気株式会社 | フォトマスクの目合わせマーク及び半導体装置 |
-
1981
- 1981-03-09 JP JP56033676A patent/JPS57148347A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01118074U (enrdf_load_stackoverflow) * | 1988-02-02 | 1989-08-09 |
Also Published As
Publication number | Publication date |
---|---|
JPS57148347A (en) | 1982-09-13 |