JPS57148347A - Measurement of connection accuracy for electron beam exposure - Google Patents

Measurement of connection accuracy for electron beam exposure

Info

Publication number
JPS57148347A
JPS57148347A JP56033676A JP3367681A JPS57148347A JP S57148347 A JPS57148347 A JP S57148347A JP 56033676 A JP56033676 A JP 56033676A JP 3367681 A JP3367681 A JP 3367681A JP S57148347 A JPS57148347 A JP S57148347A
Authority
JP
Japan
Prior art keywords
graduations
vernier
main
boundary
measurement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56033676A
Other languages
Japanese (ja)
Other versions
JPS6214089B2 (en
Inventor
Hitoshi Takemura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP56033676A priority Critical patent/JPS57148347A/en
Publication of JPS57148347A publication Critical patent/JPS57148347A/en
Publication of JPS6214089B2 publication Critical patent/JPS6214089B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Abstract

PURPOSE:To obtain high connection accuracy for not only parallel but perpendicular directions to a field boundary, by providing main and vernier graduations across and with a certain angle to the field boundary to measure two neighboring exposure boundaries, and by observing a difference between them. CONSTITUTION:Main 7 and vernier 9 graduations are provided across a boundary 2 between neighboring fields FL and FR to measure two neighboring exposure boundaries. In this constitution, the main graduations 7 consists of central long graduations C and graduations of equal intervals on both sides, and so does the vernier graduations 9. All the graduations are inclined 45 deg. or 135 deg. to the boundary 2, and aligned on the bases of central graduations C and CS for the main 7 and the vernier 9. This enables to tell the correct connection by only reading the graduations.
JP56033676A 1981-03-09 1981-03-09 Measurement of connection accuracy for electron beam exposure Granted JPS57148347A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56033676A JPS57148347A (en) 1981-03-09 1981-03-09 Measurement of connection accuracy for electron beam exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56033676A JPS57148347A (en) 1981-03-09 1981-03-09 Measurement of connection accuracy for electron beam exposure

Publications (2)

Publication Number Publication Date
JPS57148347A true JPS57148347A (en) 1982-09-13
JPS6214089B2 JPS6214089B2 (en) 1987-03-31

Family

ID=12393049

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56033676A Granted JPS57148347A (en) 1981-03-09 1981-03-09 Measurement of connection accuracy for electron beam exposure

Country Status (1)

Country Link
JP (1) JPS57148347A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5834731U (en) * 1981-08-28 1983-03-07 三洋電機株式会社 Electron beam exposure mask
JPS604216A (en) * 1983-06-21 1985-01-10 Mitsubishi Electric Corp Electron beam exposure
JPS62263633A (en) * 1986-05-09 1987-11-16 Mitsubishi Electric Corp Drawing of pattern
JPH025407A (en) * 1988-06-22 1990-01-10 Nec Corp Measurement of connection accuracy for electron beam lithography
KR100242503B1 (en) * 1995-12-18 2000-03-02 가네꼬 히사시 Misregistration detecting marks for pattern formen on semiconductor substrate

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01118074U (en) * 1988-02-02 1989-08-09

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5834731U (en) * 1981-08-28 1983-03-07 三洋電機株式会社 Electron beam exposure mask
JPS604216A (en) * 1983-06-21 1985-01-10 Mitsubishi Electric Corp Electron beam exposure
JPS62263633A (en) * 1986-05-09 1987-11-16 Mitsubishi Electric Corp Drawing of pattern
JPH025407A (en) * 1988-06-22 1990-01-10 Nec Corp Measurement of connection accuracy for electron beam lithography
KR100242503B1 (en) * 1995-12-18 2000-03-02 가네꼬 히사시 Misregistration detecting marks for pattern formen on semiconductor substrate

Also Published As

Publication number Publication date
JPS6214089B2 (en) 1987-03-31

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